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11. 发明申请

US20080219824A1 MULTIPLE SUBSTRATE TRANSFER ROBOT 有权
标题翻译：多基底转移机器人
公开(公告)号：US20080219824A1
公开(公告)日：2008-09-11
申请号：US12049051
申请日：2008-03-14
申请人： JACOB NEWMAN , Dinesh Kanawade , Nir Merry
发明人： JACOB NEWMAN , Dinesh Kanawade , Nir Merry
IPC分类号： B23Q1/26
CPC分类号： H01L21/67115 , H01L21/67754 , H01L21/68735 , H01L21/68771
摘要： Embodiments of multiple substrate transfer robots and substrate processing systems have been disclosed herein. In some embodiments, a multiple substrate transfer robot is provided and may include an arm capable of extending along a horizontal direction; and a wrist coupled to the arm and having a plurality of blades coupled thereto, each blade configured to horizontally support a substrate thereupon and vertically disposed with respect to each of the other blades. In some embodiments, a substrate processing system is provided and may include a substrate processing chamber having a plurality of susceptors, wherein each susceptor is vertically disposed and capable of holding a semiconductor substrate; and a substrate transfer robot having a plurality of blades for transferring a plurality of substrates to and from the processing chamber, each blade configured to horizontally support a substrate thereupon and vertically disposed with respect to each of the other blades.
摘要翻译：本文已经公开了多个基板传送机器人和基板处理系统的实施例。在一些实施例中，提供多个基板传送机器人，并且可以包括能够沿着水平方向延伸的臂; 以及手腕，其联接到所述臂并且具有耦合到其上的多个叶片，每个叶片构造成水平地支撑其上的基板并且相对于每个其它叶片垂直设置。在一些实施例中，提供了基板处理系统，并且可以包括具有多个基座的基板处理室，其中每个基座垂直设置并能够保持半导体基板; 以及基板传送机器人，其具有用于将多个基板传送到处理室和从处理室传送多个基板的多个叶片，每个叶片构造成水平地支撑其上的基板并且相对于每个其它叶片垂直设置。

12. 发明申请

US20060156979A1 Substrate processing apparatus using a batch processing chamber 审中-公开
标题翻译：使用批处理室的基板处理装置
公开(公告)号：US20060156979A1
公开(公告)日：2006-07-20
申请号：US11286063
申请日：2005-11-22
申请人： Randhir Thakur , Steve Ghanayem , Joseph Yudovsky , Aaron Webb , Adam Brailove , Nir Merry , Vinay Shah , Andreas Hegedus
发明人： Randhir Thakur , Steve Ghanayem , Joseph Yudovsky , Aaron Webb , Adam Brailove , Nir Merry , Vinay Shah , Andreas Hegedus
IPC分类号： H01L21/322 , C23C16/00
CPC分类号： H01L21/67109 , C23C16/4412 , C23C16/45546 , C23C16/45593 , C23C16/4584 , C23C16/481 , C23C16/54 , H01L21/67017 , H01L21/67115 , H01L21/67167 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67757 , H01L21/67781
摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects due to exposure to a contaminating environment. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence that are performed on the cluster tool. In another embodiment, two or more batch chambers are used to process multiple substrates using one or more of the disproportionately long processing steps in a processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.
摘要翻译：本发明的方面包括使用适于在一个或多个批次和/或单个基板处理室中处理基板以增加系统吞吐量的多室处理系统（例如，集群工具）来处理基板的方法和装置。在一个实施例中，系统被配置为执行仅包含批处理室的衬底处理序列，或批处理和单个衬底处理室，以优化生产量并且由于暴露于污染环境而最小化处理缺陷。在一个实施例中，批处理室用于通过执行与在集群工具上执行的衬底处理序列中的其他工艺配方步骤相比不成比例地长的工艺配方步骤来增加系统吞吐量。在另一个实施方案中，使用两个或更多个间隔室来处理多个基板，使用处理顺序中的一个或多个不成比例的长处理步骤。本发明的方面还包括用于将前体输送到处理室的装置和方法，使得可以执行可重复的ALD或CVD沉积工艺。

13. 发明授权

US5772501A Indoor environmental conditioning system and method for controlling the circulation of non-conditioned air 失效
标题翻译：室内环境调节系统及无空调空气流通控制方法
公开(公告)号：US5772501A
公开(公告)日：1998-06-30
申请号：US542310
申请日：1995-10-12
申请人： Nir Merry , Robert M. Russ , Larry A. Lincoln , Thomas L. Webster
发明人： Nir Merry , Robert M. Russ , Larry A. Lincoln , Thomas L. Webster
IPC分类号： F24F3/044 , F24F11/00
CPC分类号： F24F11/0076 , F24F3/044 , Y02B30/767
摘要： An indoor environmental conditioning system and a method for controlling the circulation of non-conditioned air. The system comprises a conditioning source, air distribution source and air distribution conduit. The air may be propelled at at least two different flow rates.
摘要翻译：一种室内环境调节系统和一种控制非调节空气循环的方法。该系统包括调节源，空气分配源和空气分配管道。空气可以以至少两个不同的流速推进。

14. 发明授权

US5602758A Installation link-up procedure 失效
标题翻译：安装连接程序
公开(公告)号：US5602758A
公开(公告)日：1997-02-11
申请号：US378514
申请日：1995-01-26
申请人： Larry A. Lincoln , Robert M. Russ , William W. Bassett , Nir Merry , Thomas L. Webster
发明人： Larry A. Lincoln , Robert M. Russ , William W. Bassett , Nir Merry , Thomas L. Webster
IPC分类号： F24F11/00 , F25B29/00
CPC分类号： F24F11/006 , F24F2011/0067 , F24F2011/0068
摘要： An apparatus and method for preparing an indoor environmental conditioning system for spaces, for operation. The apparatus and method are advantageously configured for use with an indoor environmental conditioning system in which the spaces are provided with an indoor environmental conditioning input and an indoor environmental conditioning sensor, both operably connected to an indoor environmental conditioning source. Each space is further provided with means for actuating the indoor environmental conditioning source. The apparatus and method enable the indoor environmental conditioning system to be placed in an initial condition such that no space can receive, and no sensor report, indoor environmental conditioning. The indoor environmental conditioning inputs are actuated one at a time, and operably linked thereafter with the indoor environmental conditioning sensor which reports a change in environmental conditioning status.
摘要翻译：一种用于空间的室内环境调节系统的设备和方法，用于操作。该装置和方法有利地配置为与室内环境调节系统一起使用，其中空间设置有室内环境调节输入和室内环境调节传感器，两者可操作地连接到室内环境调节源。每个空间还设置有用于致动室内环境调节源的装置。该装置和方法使得室内环境调节系统处于初始状态，使得没有空间可以接收，并且没有传感器报告，室内环境调节。室内环境调节输入一次一个致动，然后与室内环境调节传感器可操作地连接，报告环境调节状态的变化。

15. 发明授权

US08425977B2 Substrate processing chamber with off-center gas delivery funnel 有权
标题翻译：基板处理室与偏心气体输送漏斗
公开(公告)号：US08425977B2
公开(公告)日：2013-04-23
申请号：US12240120
申请日：2008-09-29
申请人： Nir Merry , Son T. Nguyen
发明人： Nir Merry , Son T. Nguyen
IPC分类号： C23C16/455
CPC分类号： C23C16/45544 , C23C16/45502 , C23C16/45563
摘要： Methods and apparatus for processing substrates are disclosed herein. The process chamber includes a chamber body, a substrate support pedestal, a pump port and a gas injection funnel. The chamber body has an inner volume and the substrate support pedestal is disposed in the inner volume of the chamber body. The pump port is coupled to the inner volume and is disposed off-center from a central axis of the substrate support pedestal. The pump port provides azimuthally non-uniform pumping proximate to a surface of the substrate support pedestal and creates localized regions of high pressure and low pressure within the inner volume during use. The gas injection funnel is disposed in a ceiling of the chamber body and opposite the substrate support pedestal. The gas injection funnel is offset from the central axis of the substrate support pedestal and is disposed in a region of low pressure.
摘要翻译：本文公开了处理衬底的方法和设备。处理室包括室主体，基板支撑基座，泵口和气体注入漏斗。腔体具有内部体积，并且衬底支撑基座设置在腔体的内部体积中。泵口连接到内部体积并且设置在离基板支撑基座的中心轴线偏心的位置。泵端口提供靠近基板支撑基座的表面的方位不均匀的泵送，并且在使用期间在内部体积内产生高压和低压的局部区域。气体注入漏斗设置在室主体的顶部并与衬底支撑基座相对。气体注入漏斗偏离衬底支撑基座的中心轴线并且设置在低压区域中。

16. 发明授权

US08419855B2 Substrate processing chamber with off-center gas delivery funnel 有权
公开(公告)号：US08419855B2
公开(公告)日：2013-04-16
申请号：US13190967
申请日：2011-07-26
申请人： Nir Merry , Son T. Nguyen
发明人： Nir Merry , Son T. Nguyen
IPC分类号： C23C16/455
CPC分类号： C23C16/45544 , C23C16/45502 , C23C16/45563
摘要： Methods and apparatus for processing substrates are disclosed herein. The process chamber includes a chamber body, a substrate support pedestal, a pump port and a gas injection funnel. The chamber body has an inner volume and the substrate support pedestal is disposed in the inner volume of the chamber body. The pump port is coupled to the inner volume and is disposed off-center from a central axis of the substrate support pedestal. The pump port provides azimuthally non-uniform pumping proximate to a surface of the substrate support pedestal and creates localized regions of high pressure and low pressure within the inner volume during use. The gas injection funnel is disposed in a ceiling of the chamber body and opposite the substrate support pedestal. The gas injection funnel is offset from the central axis of the substrate support pedestal and is disposed in a region of low pressure.

17. 发明授权

US08314371B2 Rapid thermal processing chamber with micro-positioning system 有权
标题翻译：具有微型定位系统的快速热处理室
公开(公告)号：US08314371B2
公开(公告)日：2012-11-20
申请号：US12611958
申请日：2009-11-04
申请人： Khurshed Sorabji , Joseph M. Ranish , Wolfgang Aderhold , Aaron M. Hunter , Blake R. Koelmel , Alexander N. Lerner , Nir Merry
发明人： Khurshed Sorabji , Joseph M. Ranish , Wolfgang Aderhold , Aaron M. Hunter , Blake R. Koelmel , Alexander N. Lerner , Nir Merry
IPC分类号： H01B1/00
CPC分类号： H01L21/67259 , C23C16/46 , H01L21/324 , H01L21/67115 , H01L21/68 , H01L21/681 , H01L21/6835 , H01L21/68742
摘要： Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.
摘要翻译：描述了包括将衬底轴向对准衬底支撑件或经验确定的位置的用于快速热处理平面衬底的方法和装置。所述方法和装置包括确定衬底和衬底支撑件的相对取向的传感器系统。

18. 发明申请

US20120183915A1 USE OF INFRARED CAMERA FOR REAL-TIME TEMPERATURE MONITORING AND CONTROL 有权
标题翻译：使用红外摄像机进行实时温度监测和控制
公开(公告)号：US20120183915A1
公开(公告)日：2012-07-19
申请号：US13433780
申请日：2012-03-29
申请人： Nir Merry , Stephen Moffatt , Kailash Patalay , David Keith Carlson
发明人： Nir Merry , Stephen Moffatt , Kailash Patalay , David Keith Carlson
IPC分类号： F27D19/00
CPC分类号： F27B17/0025 , C23C16/481 , C23C16/52 , H01L21/67115 , H01L21/67248
摘要： Embodiments of the invention generally contemplate an apparatus and method for monitoring and controlling the temperature of a substrate during processing. One embodiment of the apparatus and method takes advantage of an infrared camera to obtain the temperature profile of multiple regions or the entire surface of the substrate and a system controller to calculate and coordinate in real time an optimized strategy for reducing any possible temperature non-uniformity found on the substrate during processing.
摘要翻译：本发明的实施例通常考虑用于在处理期间监测和控制衬底的温度的装置和方法。该装置和方法的一个实施例利用红外相机获得多个区域或基板的整个表面的温度分布，以及系统控制器实时计算和协调用于降低任何可能的温度不均匀性的优化策略在加工过程中在基板上发现。

19. 发明申请

US20100116205A1 PROCESS EQUIPMENT ARCHITECTURE 审中-公开
标题翻译：过程设备架构
公开(公告)号：US20100116205A1
公开(公告)日：2010-05-13
申请号：US12266970
申请日：2008-11-07
申请人： Jacob Newman , Dinesh Kanawade , Miriam Schwartz , Nir Merry , Michael Thomas Haag
发明人： Jacob Newman , Dinesh Kanawade , Miriam Schwartz , Nir Merry , Michael Thomas Haag
IPC分类号： B05C11/00
CPC分类号： H01L21/6719
摘要： Embodiments of the present invention relate to improvements to single-substrate, multi-chamber processing platform architecture for minimizing fabrication facility floor space requirements. Prior art systems require significant floor space around all sides to allow for adequate installation and servicing. Embodiments of the present invention provide platforms that allow for servicing the chambers and supporting systems via a front and rear of the platform allowing multiple, side-by-side platform placement within a fabrication facility, while providing improved serviceability of the platform components.
摘要翻译：本发明的实施例涉及对用于最小化制造设备占地面积要求的单基板多室处理平台架构的改进。现有技术的系统需要围绕所有侧面的显着的地板空间以允许适当的安装和维修。本发明的实施例提供了平台，其允许经由平台的前部和后部维护腔室和支撑系统，从而允许在制造设备内多个并排平台放置，同时提供平台组件的改进的可维护性。

20. 发明申请

US20090004405A1 Thermal Batch Reactor with Removable Susceptors 审中-公开
标题翻译：热分批反应器与可移动的受体
公开(公告)号：US20090004405A1
公开(公告)日：2009-01-01
申请号：US11771800
申请日：2007-06-29
申请人： Nir Merry , Joseph Yudovsky
发明人： Nir Merry , Joseph Yudovsky
IPC分类号： C23C16/455
CPC分类号： C23C16/4586 , C23C16/46 , H01L21/67306 , H01L21/67309 , Y10T428/13
摘要： An apparatus and method for uniform heating and gas flow in a batch processing chamber are provided. The apparatus includes a quartz chamber body, removable heater blocks which surround the quartz chamber body, an inject assembly coupled to one side of the quartz chamber body, and a substrate boat having removable susceptors. In one embodiment, the boat may be configured with a plurality of susceptors to control substrate heating during batch processing.
摘要翻译：提供了一种用于在批处理室中均匀加热和气流的装置和方法。该装置包括石英室主体，围绕石英室主体的可移除加热块，耦合到石英室主体的一侧的注入组件和具有可拆卸基座的基板舟。在一个实施例中，船可以配置有多个基座，以在批处理期间控制基板加热。

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