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11. 发明申请

US20110286005A1 WELDING INSPECTION METHOD AND APPARATUS THEREOF 有权
标题翻译：焊接检验方法及其设备
公开(公告)号：US20110286005A1
公开(公告)日：2011-11-24
申请号：US13111217
申请日：2011-05-19
申请人： Setsu YAMAMOTO , Takahiro Miura , Takeshi Hoshi , Tsuyoshi Ogawa , Yoshihiro Fujita , Shozo Hirano , Kazumi Watanabe , Satoshi Nagai , Masahiro Yoshida , Satoru Asai , Makoto Ochiai , Jun Semboshi
发明人： Setsu YAMAMOTO , Takahiro Miura , Takeshi Hoshi , Tsuyoshi Ogawa , Yoshihiro Fujita , Shozo Hirano , Kazumi Watanabe , Satoshi Nagai , Masahiro Yoshida , Satoru Asai , Makoto Ochiai , Jun Semboshi
IPC分类号： G01B11/02
CPC分类号： G01N29/46 , B23K31/125 , G01N29/2418 , G01N2291/267
摘要： A welding inspection method has steps of: generating transmission laser light for generating an ultrasonic wave and transmitting the transmission laser light to an object to be inspected during or after welding operation for irradiation; generating reception laser light for detecting an ultrasonic wave and transmitting the reception laser light to the object to be inspected for irradiation; collecting laser light scattered and reflected at surface of the object to be inspected; performing interference measurement of the laser light and obtaining an ultrasonic signal; and analyzing the ultrasonic signal obtained by the interference measurement. At least one of the transmission laser light generated in the transmission laser light irradiation step and the reception laser light generated in the reception laser light irradiation step is irradiated onto a welded metal part or a groove side surface.
摘要翻译：焊接检查方法具有以下步骤：产生用于产生超声波的发射激光，并且在用于照射的焊接操作期间或之后将发送激光发射到待检查对象; 产生用于检测超声波的接收激光并将接收激光发送到待检查对象进行照射; 收集被检测物体的表面散射并反射的激光; 执行激光的干涉测量并获得超声波信号; 并分析通过干涉测量得到的超声波信号。在发射激光照射步骤中产生的发射激光中的至少一个和在接收激光照射步骤中产生的接收激光照射到焊接的金属部分或槽侧表面上。

12. 发明申请

US20060111025A1 Large part polishing apparatus and polishing method 失效
标题翻译：大型抛光装置和抛光方法
公开(公告)号：US20060111025A1
公开(公告)日：2006-05-25
申请号：US11313696
申请日：2005-12-22
申请人： Satoru Yanaka , Satoru Asai , Ryusuke Tsuboi , Kenji Kamimura , Tadashi Tanuma , Masataka Kikuchi
发明人： Satoru Yanaka , Satoru Asai , Ryusuke Tsuboi , Kenji Kamimura , Tadashi Tanuma , Masataka Kikuchi
IPC分类号： B24C3/00
CPC分类号： B24C1/08 , B24C3/24 , B24C9/003 , B24C9/006 , B24C11/00 , F01D5/005 , F01D25/002 , F05D2230/10 , F05D2230/14 , F05D2230/90 , Y02P70/179
摘要： The present invention comprises a turntable which holds a turbine part at a predetermined position, the turn table being rotatably supported by a support member, and rotated and driven by a driving motor, an abrasive feeding unit which feeds an abrasive particle having an elastic material as a core to a predetermined position as an abrasive, and a polishing head including an impeller which is rotated and driven by an impeller driving motor at high speed and applies rotary energy to the abrasive particle to be supplied from the abrasive feeding unit, the polishing head injecting the abrasive particle flying from the tangential direction of the impeller at a predetermined speed toward a surface to be polished of the turbine part held on the turntable, and an abrasive recovery unit which recovers the abrasive particle provided for polishing of the turbine part from the polishing head, and feeding into the abrasive feeding unit.
摘要翻译：本发明包括将涡轮部分保持在预定位置的转台，转台由支撑构件可旋转地支撑，并由驱动电机旋转驱动;磨料供给单元，其将具有弹性材料的磨料颗粒作为将作为研磨剂的预定位置的芯体，以及包括叶轮的研磨头，所述叶轮由叶轮驱动马达高速旋转驱动，并向从研磨给料单元供给的磨料颗粒施加旋转能量，抛光头将磨粒从叶轮的切线方向以预定的速度喷射到被保持在转台上的涡轮部分的待抛光表面;以及研磨回收单元，其从所述涡轮机部件的磨抛光头，并送入研磨给料单元。

13. 发明申请

US20050233226A1 Apparatus and method for correcting pattern dimension and photo mask and test photo mask 有权
标题翻译：用于校正图案尺寸和光掩模和测试光罩的装置和方法
公开(公告)号：US20050233226A1
公开(公告)日：2005-10-20
申请号：US11156592
申请日：2005-06-21
申请人： Morimi Osawa , Teruyoshi Yao , Hiroshi Arimoto , Satoru Asai
发明人： Morimi Osawa , Teruyoshi Yao , Hiroshi Arimoto , Satoru Asai
IPC分类号： G03F1/36 , G03F1/68 , G03F7/20 , H01L21/027 , G03F9/00 , G03B27/00 , G03C5/00 , G06F17/50 , G06K9/00
CPC分类号： G03F7/70941 , G03F1/44 , G03F1/70 , G03F7/70591 , G03F7/70625
摘要： The width values of transferred patterns of respective evaluation patterns transferred using a test photo mask (11) are calculated by first calculation unit (12) based on the relationship with the opening ratio of flare generation patterns. The distribution of the calculated width values of the respective transferred patterns is linearly approximated by second calculation unit (13) and the inclination thereof is calculated. On the basis of a table defining the inclination of the width values of the respective transferred patterns (the ratio of dimension fluctuation), the amount of correction is changed for each pattern by correction unit (14). Consequently, the amount of dimension fluctuation caused by local flares can be accurately calculated. This enables accurately performing pattern-dimension corrections against local flares.
摘要翻译：使用测试光掩模（11）转印的各个评估图案的转印图案的宽度值基于与闪光发生图案的开口率的关系由第一计算单元（12）计算。所计算的各个转移图案的宽度值的分布由第二计算单元（13）线性近似，并且计算其倾斜度。基于定义各个转印图案的宽度值的倾斜度（尺寸波动的比例）的表格，通过校正单元（14）对每个图案改变校正量。因此，可以精确地计算由局部耀斑引起的尺寸波动量。这使得能够对局部耀斑进行精确的模式维度校正。

14. 发明申请

US20050050490A1 Method and equipment for simulation 有权
标题翻译：模拟方法和设备
公开(公告)号：US20050050490A1
公开(公告)日：2005-03-03
申请号：US10782821
申请日：2004-02-23
申请人： Hiroki Futatsuya , Satoru Asai
发明人： Hiroki Futatsuya , Satoru Asai
IPC分类号： G03F1/36 , G03F1/68 , G06F17/50 , G06G7/62 , G06K9/00 , H01L21/027
CPC分类号： G03F1/70
摘要： The simulation equipment has division unit for dividing a layout of a photo mask (mask layout) into a plurality of areas, average light intensity value calculation unit for calculating an average value of light intensity in each of the areas, smoothing unit for subjecting the calculated average value to smoothing processing, and multiplication unit for multiplying the smoothed average value by a predetermined multiplier.
摘要翻译：模拟设备具有用于将光掩模（掩模布局）的布局分割成多个区域的分割单元，用于计算每个区域中的光强度的平均值的平均光强度值计算单元，平滑处理的平均值，以及将平滑后的平均值乘以预定乘数的乘法单元。

15. 发明授权

US5465220A Optical exposure method 失效
公开(公告)号：US5465220A
公开(公告)日：1995-11-07
申请号：US69853
申请日：1993-06-01
申请人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
发明人： Tamae Haruki , Kenji Nakagawa , Masao Taguchi , Hiroyuki Tanaka , Satoru Asai , Isamu Hanyu
IPC分类号： G03F7/20 , G03F7/207 , G06F9/00
CPC分类号： G03F7/70566 , G03F7/201 , G03F7/70091 , G03F7/701 , G03F7/70125 , G03F7/70241 , G03F7/70283 , G03F7/70583
摘要： An optical exposure method in photolithography applied for precise processing when semiconductor devices are produced. A pattern on a photomask is projected and exposed on a register on a base plate with an exposure device including a deformation illumination system, a photomask and a projection lens. The deformation illumination system is composed of a light source, a diaphragm and a condenser lens, and the diaphragm is provided with a linear through-hole. The optical exposure method uses a ray of linear light for illumination or two rays of linear light for illumination that are parallel with the pattern. The two rays of linear light are symmetrical with respect to an optical axis. These rays are parallel with the pattern in a position separate from the optical axis of the exposure device when the photomask pattern is a line and space pattern.

16. 发明授权

US5428478A Optical mask and exposure method using the optical mask 失效
标题翻译：光学掩模和使用光学掩模的曝光方法
公开(公告)号：US5428478A
公开(公告)日：1995-06-27
申请号：US118173
申请日：1993-09-09
申请人： Isamu Hanyu , Satoru Asai
发明人： Isamu Hanyu , Satoru Asai
IPC分类号： G02B27/44 , G03F1/30 , G03F1/68 , G03F1/80 , H01L21/027
CPC分类号： G03F1/30
摘要： An optical mask including a 2.pi.n phase shifter pattern, a .pi.(2n+1) phase shifter pattern, an intermediate phase shifter pattern which shifts the phase of an incident light by an angle between 2.pi.n and .pi.(2n+1), and a reversed intermediate phase shifter pattern which shifts the phase of an incident light by an angle being reversed by .pi. for the phase shift angle of the intermediate phase shifter pattern. The intermediate phase shifter patterns are formed in the vicinity of the reversed intermediate phase shifter patterns having light shielding films in between.
摘要翻译：包括2πn移相器图案，pi（2n + 1）移相器图案的光学掩模，将入射光的相位偏移2πn和pi（2n + 1）之间的角度的中间移相器图案，以及反转的中间移相器图案，其将入射光的相位以相对于中间移相器图案的相移角反转角度为π。中间移相器图案形成在其间具有遮光膜的反向中间移相器图案附近。

17. 发明授权

US5424153A Optical mask using phase shift and method of producing the same 失效
标题翻译：使用相移的光学掩模及其制造方法
公开(公告)号：US5424153A
公开(公告)日：1995-06-13
申请号：US139782
申请日：1993-10-22
申请人： Satoru Asai
发明人： Satoru Asai
IPC分类号： G03F1/00 , G03F9/00
CPC分类号： G03F1/29 , G03F1/80
摘要： A phase shift optical mask is used for exposing a pattern using an exposure light. The phase shift optical mask includes a substrate which is transparent with respect to the exposure light, a light blocking layer which is non-transparent with respect to the exposure light and is provided on the substrate, where the light blocking layer has an opening having a predetermined shape and size and being defined by a side wall of the light blocking layer, and a phase shift layer which is transparent with respect to the exposure light and is provided on the light blocking layer and the substrate which is exposed within the opening. The phase shift layer has a uniform thickness, and the light blocking layer has a predetermined thickness so that a phase of the exposure light transmitted through the phase shift layer provided on the side wall of the light blocking layer is shifted by approximately 180.degree. relative to a phase of the exposure light transmitted through the phase shift layer provided on the substrate.
摘要翻译：使用相移光学掩模来曝光使用曝光光的图案。相移光学掩模包括相对于曝光光透明的基板，相对于曝光光不透明的遮光层，并设置在基板上，其中遮光层具有开口具有预定的形状和尺寸，并且由遮光层的侧壁限定，相对于曝光光透明的相移层，并设置在曝光在开口内的遮光层和基板上。相移层具有均匀的厚度，并且遮光层具有预定的厚度，使得透过通过设置在遮光层的侧壁上的相移层的曝光光的相位相对于通过设置在基板上的相移层透过的曝光光的相位。

18. 发明授权

US5368963A Photomask and method of fabricating the same 失效
标题翻译：光掩模及其制造方法
公开(公告)号：US5368963A
公开(公告)日：1994-11-29
申请号：US916262
申请日：1992-07-21
申请人： Isamu Hanyu , Satoru Asai
发明人： Isamu Hanyu , Satoru Asai
IPC分类号： G03F1/28 , G03F1/68 , H01L21/027 , G03F9/00
CPC分类号： G03F1/30 , G03F1/28
摘要： A photomask comprises light shielding areas with a light shielding layer formed on a mask substrate, and a light transmitting area defined on the mask substrate by the light shielding areas, the light transmitting area being divided in a first area with a 90.degree. phase shifter formed thereon for shifting phase of transmitted light by 90.degree., a second area with a 270.degree. phase shifter formed thereon for shifting phase of transmitted light by 270.degree., and a third area with neither the 90.degree. phase shifter nor the 270.degree. phase shifter formed thereon, the first and the second areas being arranged without being overlapped on each other and with the light shielding areas or the third area located therebetween.
摘要翻译：光掩模包括在掩模基板上形成有遮光层的遮光区域和由遮光区域在掩模基板上限定的透光区域，透光区域被形成为在第一区域中形成90°移相器将透射光的相位移动90度，在其上形成270度移相器的第二区域，将透射光的相位移动270度，并且形成不具有90°移相器和270°移相器的第三区域第一和第二区域被布置成彼此不重叠，并且与遮光区域或位于它们之间的第三区域布置。

19. 发明申请

US20120094144A1 BUILD-UP WELDING METHOD AND STRUCTURAL MATERIAL 审中-公开
标题翻译：建筑焊接方法和结构材料
公开(公告)号：US20120094144A1
公开(公告)日：2012-04-19
申请号：US13272536
申请日：2011-10-13
申请人： Kenji Kamimura , Satoru Asai , Tadashi Kondo , Tsuguhisa Tashima
发明人： Kenji Kamimura , Satoru Asai , Tadashi Kondo , Tsuguhisa Tashima
IPC分类号： B32B15/01 , B23K9/04
CPC分类号： B23K9/04 , B23K9/042 , B23K2101/001 , B23P6/007 , F01D5/286 , F01D5/288 , F05D2220/31 , F05D2230/232 , F05D2300/506 , Y10T428/12493
摘要： Capabilities of suppressing erosion caused by liquid droplets and achieving a short operation period and cost reduction are provided. A build-up welding method for a structural material used in an erosive environment includes: removing a portion exposed to the erosive environment from the structural material; and forming a hard layer in a portion of the structural material, from which the portion exposed to the erosive environment is removed, the hard layer being formed by short circuiting transfer gas metal arc welding using a solid wire with a hardness of HV 400 or more.
摘要翻译：提供了抑制由液滴引起的侵蚀并实现短操作时间和成本降低的能力。在侵蚀环境中使用的结构材料的堆积焊接方法包括：从结构材料中去除暴露于侵蚀环境的部分; 在结构材料的一部分中形成硬质层，去除暴露于侵蚀环境的部分，通过使用硬度为HV400以上的实心线短路转移气体金属电弧焊而形成硬质层。

20. 发明授权

US07732107B2 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure 有权
标题翻译：掩模图案校正装置，掩模图案的校正方法，曝光修正装置以及曝光校正方法
公开(公告)号：US07732107B2
公开(公告)日：2010-06-08
申请号：US10995215
申请日：2004-11-24
申请人： Teruyoshi Yao , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
发明人： Teruyoshi Yao , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
IPC分类号： G03C5/00 , G03F1/00 , G06F17/50
CPC分类号： G03F7/70941 , G03F7/70433 , G03F7/705
摘要： In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in width, over the entire portion not only of a single shot region, but also of a single chip region, a mask pattern correction device of the present invention has a numerical aperture calculation unit calculating, for every single shot region, flare energy for a mask pattern corresponding to a transferred pattern, based on an exposure layout of a plurality of shot regions, or more specifically, while considering flare from a plurality of shot regions located around every single shot region.
摘要翻译：鉴于实现能够以极高的精度估计和校正火炬的平版印刷工艺，并且在整个部分上不仅在单一拍摄区域上，而且在单个区域的整个部分上仅产生非常小的尺寸变化芯片区域，本发明的掩模图案校正装置具有数值孔径计算单元，对于每个单个拍摄区域，基于多个拍摄区域的曝光布局来计算对应于被转印图案的掩模图案的闪光能量，或者更具体地，同时考虑来自位于每个单个拍摄区域周围的多个拍摄区域的闪光。

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