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11. 发明授权

US5284919A Resin compositions and a method of curing the same 失效
标题翻译：树脂组合物及其固化方法
公开(公告)号：US5284919A
公开(公告)日：1994-02-08
申请号：US672792
申请日：1991-03-21
申请人： Noboru Nakai , Osamu Isozaki , Naozumi Iwasawa
发明人： Noboru Nakai , Osamu Isozaki , Naozumi Iwasawa
IPC分类号： C08G59/40 , C07F7/08 , C07F7/18 , C08G59/00 , C08G59/02 , C08G59/04 , C08G59/30 , C08G59/32 , C08G59/70 , C08K5/00 , C08K5/07 , C08K5/1515 , C08K5/5415 , C08L33/06 , C08L43/04 , C08L63/00 , C08L75/04 , C08L101/06 , C09D133/06 , C09D133/14 , C09D143/04 , C09D163/00 , C08G77/04
CPC分类号： C08L63/00 , C07F7/0836 , C07F7/0858 , C07F7/0859 , C07F7/182 , C07F7/1836 , C07F7/1844 , C07F7/1896 , C08G59/02 , C08G59/04 , C08G59/306 , C08G59/3254 , C08G59/70 , C08K5/00 , C08K5/0091 , C08K5/07 , C08K5/1515 , C08K5/5415 , C08L101/06 , C08L75/04 , C09D133/064 , C09D133/068 , C09D143/04 , C09D163/00 , C08L33/068 , C08L43/04
摘要： A resin composition comprising two different compounds, A and B, with a number average molecular weight of 3,000 to 200,000 and a chelate compound. Compound A has two or more hydroxyl groups. Compound B has two or more epoxy groups and one or more of the following silane groups silanol, alkoxy silane and acyloxy silane.
摘要翻译：包含数均分子量为3,000〜200,000的两种不同化合物A和B的树脂组合物和螯合物。化合物A具有两个或多个羟基。化合物B具有两个或更多个环氧基团和一个或多个以下硅烷基团硅烷醇，烷氧基硅烷和酰氧基硅烷。

12. 发明授权

US5281449A Method of forming pattern coatings based on a radiation curable composition which contains a resin having both thioether and carboxyl groups 失效
标题翻译：基于含有具有硫醚和羧基的树脂的可辐射固化组合物形成图案涂层的方法
公开(公告)号：US5281449A
公开(公告)日：1994-01-25
申请号：US742232
申请日：1991-08-08
申请人： Naozumi Iwasawa , Hideo Kogure , Heihachi Murase
发明人： Naozumi Iwasawa , Hideo Kogure , Heihachi Murase
IPC分类号： G03F7/027 , G03F7/028 , G03F7/031 , G03F7/038 , G03F7/075 , H01L21/027 , H05K3/00 , B05D3/06 , G03C1/705
CPC分类号： G03F7/038 , H05K3/0076
摘要： The invention provides a method for forming a pattern coating, the method including the steps of:applying to a substrate a radiation curable composition containing a resin (a) which contains, per kilogram of said resin (a) about 1.5 to about 4.5 moles of a polyermizable unsaturated group, about 0.4 to about 2.5 moles of a carboxyl group and 0.2 to about 3.5 moles of a thioether group, the resin having a number average molecular weight of about 500 to about 50,000; selectively irradiating a portion of the applied coating with actinic rays; and subjecting the coating to development with an alkali aqueous solution.
摘要翻译：本发明提供一种形成图案涂层的方法，该方法包括以下步骤：向基材施加含有树脂（a）的可辐射固化组合物，该树脂（a）每千克所述树脂（a）含有约1.5至约4.5摩尔约0.4至约2.5摩尔的羧基和0.2至约3.5摩尔的硫醚基团，所述树脂的数均分子量为约500至约50,000; 用光化射线选择性地照射所涂敷的涂层的一部分; 并用碱性水溶液对涂层进行显影。

13. 发明授权

US5236810A Process for preparing printed-circuit board 失效
标题翻译：制备印刷电路板的工艺
公开(公告)号：US5236810A
公开(公告)日：1993-08-17
申请号：US592245
申请日：1990-10-03
申请人： Toshio Kondo , Shinsuke Onishi , Naozumi Iwasawa , Sadaaki Hashimoto
发明人： Toshio Kondo , Shinsuke Onishi , Naozumi Iwasawa , Sadaaki Hashimoto
IPC分类号： G03F7/26 , H05K3/06
CPC分类号： G03F7/265 , H05K3/064 , H05K2203/0793 , H05K2203/135
摘要： An improved process for preparing a printed-circuit board, which successively comprises (I) a step of forming a positive photo-sensitive resist film onto a circuit board having a conductive film according to the electrodeposition coating process, (II) a step of irradiating a full dose of an actinic ray onto the positive photo-sensitive resist film through a photomask with which the actinic ray is cut off over a conductive circuit-forming area, (III) a step of developing the resulting resist film, (IV) a step of etching away a deposited copper-clad area, and (V) removing a remaining resist film on the conductive circuit-forming area, the improvement further comprising a step of imparting the resist film in the conductive circuit-forming area an increased alkali resistance prior to development so as to obtain the printed-circuit board having high resolution with good reproductivity without being affected by variations of the developing conditions.
摘要翻译：一种制备印刷电路板的改进方法，其依次包括（I）根据电沉积涂布工艺在具有导电膜的电路板上形成正光敏抗蚀剂膜的步骤，（II）照射步骤通过在导电电路形成区域上切割光化射线的光掩模，将正光敏抗蚀剂膜上的全剂量的光化射线，（III）显影所得抗蚀剂膜的步骤，（IV）蚀刻掉沉积的铜包层区域的步骤，以及（V）去除导电电路形成区域上的剩余抗蚀剂膜，该改进还包括将导电电路形成区域中的抗蚀剂膜赋予增加的耐碱性的步骤在开发之前，以获得具有高分辨率的印刷电路板，具有良好的再现性，而不受显影条件的变化的影响。

14. 发明授权

US5591562A Water and acid developable photoresist composition exhibiting improved adhesion 失效
标题翻译：水和酸显影的光致抗蚀剂组合物显示出改进的附着力
公开(公告)号：US5591562A
公开(公告)日：1997-01-07
申请号：US322415
申请日：1994-10-13
申请人： Nobuo Komatsu , Ikuyo Kai , Nami Konishi , Naozumi Iwasawa , Satoru Furusawa
发明人： Nobuo Komatsu , Ikuyo Kai , Nami Konishi , Naozumi Iwasawa , Satoru Furusawa
IPC分类号： G03F7/004 , C08F290/00 , C08F290/06 , G03F7/029 , G03F7/032 , G03F7/038 , H05K3/28 , G03C1/725
CPC分类号： G03F7/032 , G03F7/0388 , H05K3/287
摘要： A photopolymerizable composition suitable as a solder resist and capable of forming a resist film having characteristics in no way inferior to those of the conventional heat-curable type or organic solvent developed type solder resist, with the use of water or a dilute aqueous solution which is completely innocuous and higher in safety than the aqueous alkaline solution, and a method for producing a cured coated film pattern using the photopolymerizable composition.
摘要翻译：适合作为阻焊剂的光聚合性组合物，其能够形成抗蚀剂膜，该抗蚀剂膜的特性不比常规的可热固化型或有机溶剂显影型阻焊剂的性能差，使用水或稀水溶液与碱性水溶液完全无害且更高的安全性，以及使用该光聚合性组合物制造固化的涂膜图案的方法。

15. 发明授权

US5216094A Resins with unsaturated carbonyl and hydroxyl groups 失效
标题翻译：具有不饱和羰基和羟基的树脂
公开(公告)号：US5216094A
公开(公告)日：1993-06-01
申请号：US884881
申请日：1992-05-18
申请人： Osamu Isozaki , Naozumi Iwasawa
发明人： Osamu Isozaki , Naozumi Iwasawa
IPC分类号： C08F8/44
CPC分类号： C08F8/44
摘要： The present invention provides a curable resin coating composition consisting essentially of:(i) a resin (A) containing .alpha.,.beta.-unsaturated carbonyl group and primary and/or secondary hydroxyl group, or(ii) a mixture of a resin (B) containing .alpha.,.beta.-unsaturated carbonyl group and a resin (C) containing primary and/or secondary hydroxyl group, and(iii) at least one curing catalyst selected from the group consisting of alkali metal alkoxides, metal hydroxides, organic acid salts of metals, quaternary ammonium hydroxides, quaternary phosphonium hydroxides, tertiary sulfonium hydroxides and organic acid salts of these onium hydroxides.
摘要翻译：本发明提供一种可固化树脂涂料组合物，其基本上由以下组成：（i）含有α，β-不饱和羰基和伯和/或仲羟基的树脂（A），或（ii）树脂（B）含有α，β-不饱和羰基和含有伯和/或仲羟基的树脂（C），和（iii）至少一种选自碱金属醇盐，金属氢氧化物，金属有机酸盐的固化催化剂，季铵氢氧化物，季铵氢氧化物，叔锍氢氧化物和这些氢氧化镧的有机酸盐。

16. 发明授权

US5015472A Coating compositions and methods for preventing adhesion of organisms 失效
标题翻译：用于防止生物粘附的涂料组合物和方法
公开(公告)号：US5015472A
公开(公告)日：1991-05-14
申请号：US527465
申请日：1990-05-23
申请人： Osamu Isozaki , Naozumi Iwasawa , Toshiro Hirama , Hiroshi Iwai
发明人： Osamu Isozaki , Naozumi Iwasawa , Toshiro Hirama , Hiroshi Iwai
IPC分类号： C09D5/16
CPC分类号： C09D5/1668
摘要： Disclosed are a coating composition (A) for preventing adhesion of organisms which comprises as its vehicle component a homopolymer or a copolymer, the homopolymer being one prepared by homopolymerizing a phenol-modified unsaturated monomer obtained by reacting (a) an unsaturated monomer containing epoxy group and/or hydroxyl group with (b) an addition reaction product of a phenolic compound with a compound having one carboxylic anhydride group per molecule, and the copolymer being one prepared by copolymerizing said phenol-modified unsaturated monomer and a radically polymerizable unsaturated monomer, and also a coating composition (B) for preventing adhesion of organisms which comprises as its vehicle component a phenol-modified resin prepared by reacting (c) a resin containing epoxy group and/or hydroxyl group with (b) and addition reaction product of a phenolic compound with a compound having one carboxylic anhyhdride group per molecule.Also disclosed is a method for preventing adhesion of organisms, characterized by coating a substrate with the coating composition (A) or (B).

17. 发明授权

US4973477A Coating compositions for preventing adhesion of organisms 失效
标题翻译：用于防止生物附着的涂料组合物
公开(公告)号：US4973477A
公开(公告)日：1990-11-27
申请号：US317501
申请日：1989-03-01
申请人： Osamu Isozaki , Naozumi Iwasawa , Toshiro Hirama , Hiroshi Iwai
发明人： Osamu Isozaki , Naozumi Iwasawa , Toshiro Hirama , Hiroshi Iwai
IPC分类号： C09D5/16
CPC分类号： C09D5/1668
摘要： Disclosed are a coating composition (A) for preventing adhesion of organisms which comprises as its vehicle component a homopolymer or a copolymer, the homopolymer being one prepared by homopolymerizing a phenol-modified unsaturated monomer obtained by reacting (a) an unsaturated monomer containing epoxy group and/or hydroxyl group with (b) an addition reaction product of a phenolic compound with a compound having one carboxylic anhydride group per molecule, and the copolymer being one prepared by copolymerizing said phenol-modified unsaturated monomer and a radically polymerizable unsaturated monomer, and also a coating composition (B) for preventing adhesion of organisms which comprises as its vehicle component a phenol-modified resin prepared by reacting (c) a resin containing epoxy group and/or hydroxyl group with (b) an addition reaction product of a phenolic compound with a compound having one carboxylic anhydride group per molecule.Also disclosed is a method for preventing adhesion of organisms, characterized by coating a substrate with the coating composition (A) or (B).

18. 发明授权

US4011381A Process for preparing thermosetting powder coating composition 失效
标题翻译：制备热成型粉末涂料组合物的方法
公开(公告)号：US4011381A
公开(公告)日：1977-03-08
申请号：US581430
申请日：1975-05-28
申请人： Naozumi Iwasawa , Nobuo Sugiyama , Ichiro Yoshihara , Tadashi Watanabe , Taizo Kondo
发明人： Naozumi Iwasawa , Nobuo Sugiyama , Ichiro Yoshihara , Tadashi Watanabe , Taizo Kondo
IPC分类号： C09D5/03 , C08G59/32 , C08G59/42 , C08J3/20 , C09D5/46 , C09D157/04 , C08F220/14
CPC分类号： C08G59/42 , C08G59/3209 , C08K3/0033 , C08K5/0041 , C08K5/09 , C09D157/04 , Y10T428/31855
摘要： A process for preparing a thermosetting powder coating composition comprising the steps of copolymerizing 5 to 25 wt.% of at least one of glycidyl acrylate and glycidyl methacrylate with 95 to 75 wt.% of an ethylenically unsaturated compound in a solvent having a boiling point of up to 170.degree. C to obtain a solution of copolymer, the copolymer having a number average molecular weight of 2,000 to 30,000 and a melt viscosity of 100 to 500 poises at 160.degree. C, uniformly dispersing a pigment into the copolymer solution, removing the solvent from the resulting mixture at a temperature of 170.degree. to 220.degree. C and reduced pressure, thereafter admixing a di- or tri-carboxylic acid cross-linking agent with the mixture with heating at a temperature of up to 120.degree. C, and pulverizing the solid mixture obtained.

19. 发明授权

US5650259A Processes for pattern formation using photosensitive compositions and liquid development 失效
标题翻译：使用光敏组合物和液体显影的图案形成方法
公开(公告)号：US5650259A
公开(公告)日：1997-07-22
申请号：US553978
申请日：1995-11-06
申请人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
发明人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
IPC分类号： G03F7/004 , G03F7/027 , G03F7/30 , G03F7/38 , G03F7/40
CPC分类号： G03F7/0045 , G03F7/027
摘要： A photosensitive composition which comprises, as essential components:(A) a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxy group(s) and (A") a polymer having hydroxyphenyl group(s),(B) a compound having at least two vinyl ether groups in the molecule, and(C) a compound which generates an acid when irradiated with am actinic ray, and which is useful as a positive type photoresist having high resolution and excellent formability of fine image pattern, a material for printing, etc.; and a process for pattern formation using said composition.
摘要翻译：作为必要成分的感光性组合物：（A）具有羧基和羟基苯基的聚合物，或（A'）具有羧基的聚合物和（A“）具有羟基苯基，（B）分子中具有至少两个乙烯基醚基的化合物，（C）当用光激光照射时产生酸的化合物，并且可用作具有高分子量的正型光致抗蚀剂精细图像图案的分辨率和优异的成形性，印刷材料等; 以及使用所述组合物的图案形成方法。

20. 发明授权

US5455116A Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method 失效
标题翻译：电磁波防反射材料和电磁波反射防止方法
公开(公告)号：US5455116A
公开(公告)日：1995-10-03
申请号：US140556
申请日：1993-10-25
申请人： Toshiaki Nagano , Hideo Kogure , Tetsu Maki , Naozumi Iwasawa
发明人： Toshiaki Nagano , Hideo Kogure , Tetsu Maki , Naozumi Iwasawa
IPC分类号： G21F1/12 , H05K9/00 , B32B9/00
CPC分类号： H05K9/0086 , G21F1/125 , G21Y2002/301 , G21Y2004/10 , G21Y2004/30 , Y10T428/12007 , Y10T428/12014 , Y10T428/12035
摘要： An electromagnetic wave reflection-preventing material having a structure formed by successively laminating (A) an electromagnetic wave reflecting material layer, if needed, (B) a supporting layer, (C) a resin layer, if needed, (D) a supporting layer, and (E) a metallic pattern layer prepared by arranging at least one of a pattern unit comprising a geometrical pattern formed by use of a continuous metallic band, or comprising a multi-figured structure formed by combining a plurality of band-shaped metallic figures so as not to contact with each other; and an electromagnetic wave reflection-preventing method by use of the electromagnetic wave reflection-preventing material.
摘要翻译：一种电磁波反射防止材料，具有如下需要，依次层叠（A）电磁波反射材料层，（B）支撑层，（C）树脂层，（D）支撑层和（E）通过布置包括通过使用连续金属带形成的几何图案的图案单元中的至少一个而制备的金属图案层，或者包括通过组合多个带状金属图形而形成的多构造结构以免彼此接触; 以及使用电磁波防反射材料的电磁波反射防止方法。

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