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1. 发明授权

US5236810A Process for preparing printed-circuit board 失效
标题翻译：制备印刷电路板的工艺
公开(公告)号：US5236810A
公开(公告)日：1993-08-17
申请号：US592245
申请日：1990-10-03
申请人： Toshio Kondo , Shinsuke Onishi , Naozumi Iwasawa , Sadaaki Hashimoto
发明人： Toshio Kondo , Shinsuke Onishi , Naozumi Iwasawa , Sadaaki Hashimoto
IPC分类号： G03F7/26 , H05K3/06
CPC分类号： G03F7/265 , H05K3/064 , H05K2203/0793 , H05K2203/135
摘要： An improved process for preparing a printed-circuit board, which successively comprises (I) a step of forming a positive photo-sensitive resist film onto a circuit board having a conductive film according to the electrodeposition coating process, (II) a step of irradiating a full dose of an actinic ray onto the positive photo-sensitive resist film through a photomask with which the actinic ray is cut off over a conductive circuit-forming area, (III) a step of developing the resulting resist film, (IV) a step of etching away a deposited copper-clad area, and (V) removing a remaining resist film on the conductive circuit-forming area, the improvement further comprising a step of imparting the resist film in the conductive circuit-forming area an increased alkali resistance prior to development so as to obtain the printed-circuit board having high resolution with good reproductivity without being affected by variations of the developing conditions.
摘要翻译：一种制备印刷电路板的改进方法，其依次包括（I）根据电沉积涂布工艺在具有导电膜的电路板上形成正光敏抗蚀剂膜的步骤，（II）照射步骤通过在导电电路形成区域上切割光化射线的光掩模，将正光敏抗蚀剂膜上的全剂量的光化射线，（III）显影所得抗蚀剂膜的步骤，（IV）蚀刻掉沉积的铜包层区域的步骤，以及（V）去除导电电路形成区域上的剩余抗蚀剂膜，该改进还包括将导电电路形成区域中的抗蚀剂膜赋予增加的耐碱性的步骤在开发之前，以获得具有高分辨率的印刷电路板，具有良好的再现性，而不受显影条件的变化的影响。

2. 发明授权

US5262242A Colored films for use in vacuum forming 失效
标题翻译：彩色薄膜用于真空成型
公开(公告)号：US5262242A
公开(公告)日：1993-11-16
申请号：US745527
申请日：1991-08-15
申请人： Takeshi Tomiyama , Sadaaki Hashimoto , Naozumi Iwasawa , Kazuhisa Koizumi
发明人： Takeshi Tomiyama , Sadaaki Hashimoto , Naozumi Iwasawa , Kazuhisa Koizumi
IPC分类号： B32B38/14 , C08J3/09 , C09D175/04 , B32B27/20 , B32B27/24 , B32B27/40
CPC分类号： B32B38/14 , C08J3/091 , C09D175/04 , C08J2375/06 , Y10T428/1424 , Y10T428/31551 , Y10T428/31554 , Y10T428/31565 , Y10T428/31573 , Y10T428/31591 , Y10T428/31855
摘要： A colored coating composition containing, as essential components,(I) a resin composition comprising at least one selected from a group consisting of a mixture of a polyol resin having a mean molecular weight of 1000 to 30,000 and hydroxyl group on backbone chain terminals with a polyisocyanate compound as a crosslinking agent and having a mean molecular weight of 400 or more, a mixture of acrylic resin with a vinyl chloride/vinyl acetate copolymer resin, and polyurethane resin;(II) a coloring material, and(III) an organic solvent; and a colored film comprising a colored coating layer formed by use of the colored coating composition and suitable for use in vacuum forming.
摘要翻译：作为必要成分的着色涂料组合物含有（I）树脂组合物，该树脂组合物含有选自平均分子量为1000〜30,000的多元醇树脂与主链末端的羟基的混合物中的至少一种，聚异氰酸酯化合物作为交联剂，平均分子量为400以上，丙烯酸树脂与氯乙烯/乙酸乙烯酯共聚物树脂的混合物和聚氨酯树脂; （II）着色材料，和（III）有机溶剂; 以及着色膜，其包含通过使用着色涂料组合物形成并适用于真空成型的着色涂层。

3. 发明授权

US5344740A Positive-type photosensitive electrodeposition coating composition containing quinonediazide resin having an anion-forming group and a nitrogen-containing compound and process for producing circuit plate using same 失效
标题翻译：含有具有阴离子形成基团的醌二叠氮化物树脂和含氮化合物的正型光敏电沉积涂料组合物及其制造方法
公开(公告)号：US5344740A
公开(公告)日：1994-09-06
申请号：US879101
申请日：1992-05-04
申请人： Naozumi Iwasawa , Junichi Higashi , Shinsuke Onishi
发明人： Naozumi Iwasawa , Junichi Higashi , Shinsuke Onishi
IPC分类号： G03F7/023 , C09D5/00 , C09D5/44 , C09D133/04 , C25D13/06 , G03F7/022 , H05K3/06 , G03F7/30
CPC分类号： G03F7/0226 , G03F7/023
摘要： A positive-type photosensitive electrodeposition coating composition comprising(A) a resin component containing in a molecule at least one unit selected from the group consisting of an ortho-benzoquinonediazidesulfone unit represented by the general formula ##STR1## an ortho-naphthoquinonediazidesulfone unit represented by the general formula ##STR2## as a photosensitive group, and an anion-forming group; and (B) at least one of the specified particular nitrogen-containing compounds. The composition is useful for the production of a circuit plate.
摘要翻译：一种正型光敏电沉积涂料组合物，其包含（A）在分子中含有至少一个单元的树脂组分，所述单元选自由以下通式表示的邻苯醌二叠氮化物单元：邻苯并醌醌二叠氮化物单元通式成型组; 和（B）至少一种特定的含氮化合物。该组合物可用于生产电路板。

4. 发明授权

US4898656A Electrodeposition coating process of photoresist for printed circuit board 失效
标题翻译：印刷电路板光刻胶电沉积涂层工艺
公开(公告)号：US4898656A
公开(公告)日：1990-02-06
申请号：US329636
申请日：1989-03-28
申请人： Masahiro Hoshino , Isao Kobayashi , Kenji Seko , Naozumi Iwasawa , Yuu Akaki , Toshio Kondo
发明人： Masahiro Hoshino , Isao Kobayashi , Kenji Seko , Naozumi Iwasawa , Yuu Akaki , Toshio Kondo
IPC分类号： G03F7/09 , G03F7/16 , H05K3/00 , H05K3/06
CPC分类号： H05K3/0079 , G03F7/092 , G03F7/164 , H05K2203/0577 , H05K2203/135 , H05K3/064 , Y10T428/31504
摘要： An electrodeposition coating process of a photoresist for printed circuit board which comprises electrodeposition coating on a conductive surface a photosensitive electrodeposition coating composition (A), and thereafter further electrodeposition coating on the resultant coated plate an electrodeposition coating composition (B) composed chiefly of water-soluble or water-dispersible resin having a glass transition temperature (Tg) not lower than 20.degree. C.

5. 发明授权

US5070000A Electrodeposition coating composition for use in printed circuit board photo resist 失效
标题翻译：用于印刷电路板光刻胶的电沉积涂料组合物
公开(公告)号：US5070000A
公开(公告)日：1991-12-03
申请号：US265770
申请日：1988-11-01
申请人： Kenji Seko , Yuu Akaki , Naozumi Iwasawa , Toshio Kondo
发明人： Kenji Seko , Yuu Akaki , Naozumi Iwasawa , Toshio Kondo
IPC分类号： C09D5/44 , G03C1/74 , G03F7/032 , G03F7/038 , G03F7/16 , H05K3/00 , H05K3/06
CPC分类号： G03F7/0388 , G03F7/164 , H05K3/0076
摘要： Disclosed is an electrodeposition coating composition for use in printed circuit board photo resist, comprising (a) an acrylic resin containing (meth)acryloyl group and obtained by use of diacetone (meth)acrylamide as an essential monomer component, said acrylic resin being a water-soluble or water-dispersible photo-curable unsaturated resin having an acid value of 20 to 300, a degree of unsaturation of 0.2 to 4.5 moles/kg, a number average molecular weight of 1,000 to 100,000 and a glass transition temperature of 0.degree. to 100.degree. C., and (b) a water-insoluble photopolymerization initiator.
摘要翻译：公开了一种用于印刷电路板光致抗蚀剂的电沉积涂料组合物，其包含（a）含有（甲基）丙烯酰基并通过使用双丙酮（甲基）丙烯酰胺作为必需单体成分得到的丙烯酸树脂，所述丙烯酸树脂为水 - 可溶性或水分散性光固化型不饱和树脂，其酸值为20〜300，不饱和度为0.2〜4.5摩尔/千克，数均分子量为1,000〜100,000，玻璃化转变温度为0〜 100℃，（b）水不溶性光聚合引发剂。

6. 发明授权

US4975351A Positive-type photosensitive electrodeposition coating composition with o-quinone diazide sulfonyl amide polymer 失效
标题翻译：正型光敏电沉积涂料组合物与邻醌二叠氮磺酰胺聚合物
公开(公告)号：US4975351A
公开(公告)日：1990-12-04
申请号：US268547
申请日：1988-11-07
申请人： Yuu Akaki , Kenji Seko , Toshio Kondo , Naozumi Iwasawa
发明人： Yuu Akaki , Kenji Seko , Toshio Kondo , Naozumi Iwasawa
IPC分类号： C09D5/44 , C09D201/02 , G03C1/72 , G03C1/74 , G03F7/022 , G03F7/023 , G03F7/16 , H05K3/06
CPC分类号： G03F7/023 , G03F7/164
摘要： A positive-type photosensitive electrodeposition coating composition comprising as a main component a water-soluble or water-dispersible resin containing modified quinonediazidesulfone units represented by the following formula (I) ##STR1## wherein R.sub.1 represents ##STR2## or ##STR3## R.sub.2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, andR.sub.3 represents an alkylene group, a cycloalkylene group or an alkylene ether group, in the molecule.

7. 发明授权

US5702872A Process for resist pattern formation using positive electrodeposition photoresist compositions 失效
标题翻译：使用正电沉积光致抗蚀剂组合物的抗蚀剂图案形成方法
公开(公告)号：US5702872A
公开(公告)日：1997-12-30
申请号：US610237
申请日：1996-03-04
申请人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
发明人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
IPC分类号： G03F7/004 , G03F7/039 , G03F7/16 , G03F7/027
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/164 , G03F7/168 , Y10S430/12 , Y10S430/122
摘要： A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per kg of said polymer and optionally having hydroxyphenyl group(s) in an amount of at least 1 equivalent per kg of the polymer, or (A') a carboxyl group-containing polymer and (A") a hydroxy-phenyl group-containing polymer; (B) 5 to 150 parts by weight of a compound having at least 2 vinyl ether groups in the molecule; and (C) 0.1 to 40 parts by weight per 100 parts by weight of the total of polymer (A), or the polymer (A') and the polymer (A"), and the vinyl ether group-containing compound (B), which generates an acid when irradiated with an actinic ray. The composition is dissolved or dispersed in an aqueous medium by neutralizing the carboxyl group(s) in the polymer (A) or (A') with a basic compound. The positive type electrodeposition photoresist composition allows the forming of a fine image pattern at high resolution. A process for a resist pattern formation using such a composition is also disclosed.
摘要翻译：正型电沉积光致抗蚀剂组合物包括作为必要组分的（A）100重量份的具有羧基的聚合物，其量为每当所述聚合物为0.5至10当量，并且任选地具有羟基苯基至少1当量/ kg聚合物或（A'）含羧基聚合物和（A“）含羟基苯基的聚合物的量; （B）5〜150重量份的分子中具有至少2个乙烯基醚基的化合物; 和（C）每100重量份聚合物（A）或聚合物（A'）和聚合物（A“）和含乙烯基醚基化合物（B）的总量为0.1〜40重量份），当用光化射线照射时产生酸。通过用碱性化合物中和聚合物（A）或（A'）中的羧基，将组合物溶解或分散在水性介质中。正型电沉积光致抗蚀剂组合物允许以高分辨率形成精细图像图案。还公开了使用这种组合物的抗蚀剂图案形成方法。

8. 发明授权

US5527656A Positive type electrodeposition photoresist compositions 失效
标题翻译：正型电沉积光致抗蚀剂组合物
公开(公告)号：US5527656A
公开(公告)日：1996-06-18
申请号：US233443
申请日：1994-04-26
申请人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
发明人： Genji Imai , Naozumi Iwasawa , Tsuguo Yamaoka
IPC分类号： G03F7/004 , G03F7/039 , G03F7/16 , G03C1/73
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/164 , G03F7/168 , Y10S430/12 , Y10S430/122
摘要： A positive type electrodeposition photoresist composition includes, as essential components: (A) 100 parts by weight of a polymer having carboxyl group(s) in an amount of 0.5 to 10 equivalents per kg of said polymer and optionally having hydroxyphenyl group(s) in an amount of at least 1 equivalent per kg of the polymer, or (A') a carboxyl group-containing polymer and (A") a hydroxyphenyl group-containing polymer; (B) 5 to 150 parts by weight of a compound having at least 2 vinyl ether groups in the molecule; and (C) 0.1 to 40 parts by weight per 100 parts by weight of the total of polymer (A), or the polymer (A') and the polymer (A"), and the vinyl ether group-containing compound (B), which generates an acid when irradiated with an actinic ray. The composition is dissolved or dispersed in an aqueous medium by neutralizing the carboxyl group(s) in the polymer (A) or (A') with a basic compound. The positive type electrodeposition photoresist composition allows the forming of a fine image pattern at high resolution. A process for a resist pattern formation using such a composition is also disclosed.
摘要翻译：正型电沉积光致抗蚀剂组合物包括作为必要组分的（A）100重量份的具有羧基的聚合物，其量为每当所述聚合物为0.5至10当量，并且任选地具有羟基苯基或（A'）含有羧基的聚合物和（A“）含羟基苯基的聚合物的量为每千克聚合物至少1当量; （B）5〜150重量份的分子中具有至少2个乙烯基醚基的化合物; 和（C）每100重量份聚合物（A）或聚合物（A'）和聚合物（A“）和含乙烯基醚基化合物（B）的总量为0.1〜40重量份），当用光化射线照射时产生酸。通过用碱性化合物中和聚合物（A）或（A'）中的羧基，将组合物溶解或分散在水性介质中。正型电沉积光致抗蚀剂组合物允许以高分辨率形成精细图像图案。还公开了使用这种组合物的抗蚀剂图案形成方法。

9. 发明授权

US5389727A Resin compositions and a method of curing the same 失效
标题翻译：树脂组合物及其固化方法
公开(公告)号：US5389727A
公开(公告)日：1995-02-14
申请号：US112311
申请日：1993-08-27
申请人： Noboru Nakai , Osamu Isozaki , Naozumi Iwasawa
发明人： Noboru Nakai , Osamu Isozaki , Naozumi Iwasawa
IPC分类号： C08G59/40 , C07F7/08 , C07F7/18 , C08G59/00 , C08G59/02 , C08G59/04 , C08G59/30 , C08G59/32 , C08G59/70 , C08K5/00 , C08K5/07 , C08K5/1515 , C08K5/5415 , C08L33/06 , C08L43/04 , C08L63/00 , C08L75/04 , C08L101/06 , C09D133/06 , C09D133/14 , C09D143/04 , C09D163/00 , C08F8/00
CPC分类号： C08L63/00 , C07F7/0836 , C07F7/0858 , C07F7/0859 , C07F7/182 , C07F7/1836 , C07F7/1844 , C07F7/1896 , C08G59/02 , C08G59/04 , C08G59/306 , C08G59/3254 , C08G59/70 , C08K5/00 , C08K5/0091 , C08K5/07 , C08K5/1515 , C08K5/5415 , C08L101/06 , C08L75/04 , C09D133/064 , C09D133/068 , C09D143/04 , C09D163/00 , C08L33/068 , C08L43/04
摘要： A resin composition comprising a high molecular weight compound containing an average of 2 or more hydroxyl groups and an average of 1 or more functional groups selected from the class consisting of alkoxysilane, silanol and acyloxysilane groups per molecule and having a number average molecular weight of 3,000 to 200,000; a low molecular weight compound containing an average of 2 or more epoxy groups per molecule and having a number average molecular weight of 240 to 5,000; and, as a curing catalyst, a metal chelate compound, is curable at a relatively low temperature to yield a film having excellent resistance to weathering.
摘要翻译：一种树脂组合物，其包含平均分子量为2以上且平均分子量为1以上的官能团的高分子量化合物，每分子含有烷氧基硅烷，硅烷醇和酰氧基硅烷基，数均分子量为3000 到20万; 每分子平均含有2个以上环氧基且数均分子量为240〜5000的低分子量化合物; 作为固化催化剂，作为固化催化剂，金属螯合物在相对较低的温度下可固化，得到耐候性优异的膜。

10. 发明授权

US5284919A Resin compositions and a method of curing the same 失效
标题翻译：树脂组合物及其固化方法
公开(公告)号：US5284919A
公开(公告)日：1994-02-08
申请号：US672792
申请日：1991-03-21
申请人： Noboru Nakai , Osamu Isozaki , Naozumi Iwasawa
发明人： Noboru Nakai , Osamu Isozaki , Naozumi Iwasawa
IPC分类号： C08G59/40 , C07F7/08 , C07F7/18 , C08G59/00 , C08G59/02 , C08G59/04 , C08G59/30 , C08G59/32 , C08G59/70 , C08K5/00 , C08K5/07 , C08K5/1515 , C08K5/5415 , C08L33/06 , C08L43/04 , C08L63/00 , C08L75/04 , C08L101/06 , C09D133/06 , C09D133/14 , C09D143/04 , C09D163/00 , C08G77/04
CPC分类号： C08L63/00 , C07F7/0836 , C07F7/0858 , C07F7/0859 , C07F7/182 , C07F7/1836 , C07F7/1844 , C07F7/1896 , C08G59/02 , C08G59/04 , C08G59/306 , C08G59/3254 , C08G59/70 , C08K5/00 , C08K5/0091 , C08K5/07 , C08K5/1515 , C08K5/5415 , C08L101/06 , C08L75/04 , C09D133/064 , C09D133/068 , C09D143/04 , C09D163/00 , C08L33/068 , C08L43/04
摘要： A resin composition comprising two different compounds, A and B, with a number average molecular weight of 3,000 to 200,000 and a chelate compound. Compound A has two or more hydroxyl groups. Compound B has two or more epoxy groups and one or more of the following silane groups silanol, alkoxy silane and acyloxy silane.
摘要翻译：包含数均分子量为3,000〜200,000的两种不同化合物A和B的树脂组合物和螯合物。化合物A具有两个或多个羟基。化合物B具有两个或更多个环氧基团和一个或多个以下硅烷基团硅烷醇，烷氧基硅烷和酰氧基硅烷。

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