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11. 发明授权

US07515282B2 Modeling and measuring structures with spatially varying properties in optical metrology 有权
标题翻译：光学计量学中具有空间变化特性的建模和测量结构
公开(公告)号：US07515282B2
公开(公告)日：2009-04-07
申请号：US11173198
申请日：2005-07-01
申请人： Shifang Li , Vi Vuong , Alan Nolet , Junwei Bao
发明人： Shifang Li , Vi Vuong , Alan Nolet , Junwei Bao
IPC分类号： G01B11/14
CPC分类号： G01B11/24 , G03F7/70625
摘要： The profile of a structure having a region with a spatially varying property is modeled using an optical metrology model. A set of profile parameters is defined for the optical metrology model to characterize the profile of the structure. A set of layers is defined for a portion the optical metrology model that corresponds to the region of the structure with the spatially varying property, each layer having a defined height and width. For each layer, a mathematic function that varies across at least a portion of the width of the layer is defined to characterize the spatially varying property within a corresponding layer in the region of the structure.
摘要翻译：使用光学测量模型对具有空间变化特性的区域的结构的轮廓进行建模。为光学测量模型定义了一组轮廓参数，以表征结构轮廓。对于与具有空间变化性质的结构区域对应的光学计量学模型的一部分定义了一组层，每层具有限定的高度和宽度。对于每个层，在层的宽度的至少一部分上变化的数学函数被定义为表征结构区域中相应层内的空间变化特性。

12. 发明申请

US20080027565A1 Allocating processing units to generate simulated diffraction signals used in optical metrology 失效
$Allocating processing units to generate simulated diffraction signals used in optical metrology$
标题翻译：分配处理单元以产生光学计量学中使用的模拟衍射信号
公开(公告)号：US20080027565A1
公开(公告)日：2008-01-31
申请号：US11493290
申请日：2006-07-25
申请人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
发明人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
IPC分类号： G05B15/00
CPC分类号： G01B11/24 , G01N21/4788
摘要： In allocating processing units of a computer system to generate simulated diffraction signals used in optical metrology, a request for a job to generate simulated diffraction signals using multiple processing units is obtained. A number of processing units requested for the job to generate simulated diffraction signals is then determined. A number of available processing units is determined. When the number of processing units requested is greater than the number of available processing units, a number of processing units is assigned to generate the simulated diffraction signals that is less than the number of processing units requested.
摘要翻译：在分配计算机系统的处理单元以产生光学测量中使用的模拟衍射信号时，获得使用多个处理单元产生模拟衍射信号的工作请求。然后确定要求工作产生模拟衍射信号的多个处理单元。确定了许多可用的处理单元。当所请求的处理单元的数量大于可用处理单元的数量时，分配多个处理单元以产生小于所请求的处理单元的数量的模拟衍射信号。

13. 发明申请

US20080013107A1 Generating a profile model to characterize a structure to be examined using optical metrology 审中-公开
标题翻译：使用光学计量产生轮廓模型来表征要检查的结构
公开(公告)号：US20080013107A1
公开(公告)日：2008-01-17
申请号：US11484974
申请日：2006-07-11
申请人： Jeffrey A. Chard , Junwei Bao , Joerg Bischoff , Shifang Li , Wei Liu , Hong Qiu , Sylvio Rabello , Vi Vuong
发明人： Jeffrey A. Chard , Junwei Bao , Joerg Bischoff , Shifang Li , Wei Liu , Hong Qiu , Sylvio Rabello , Vi Vuong
IPC分类号： G01B11/14
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/8883 , G01N2021/95615
摘要： In generating a profile model to characterize a structure to be examined using optical metrology, a view canvas is displayed, with the profile model being generated displayed in the view canvas. A profile shape palette is displayed adjacent to the view canvas. A plurality of different profile shape primitives is displayed in the profile shape palette. Each profile shape primitive in the profile shape palette is defined by a set of profile parameters. When a user selects a profile shape primitive from the profile shape palette, drags the selected profile shape primitive from the profile shape palette, and drops the selected profile shape primitive into the view canvas, the selected profile shape primitive is incorporated into the profile model being generated and displayed in the view canvas.
摘要翻译：在生成轮廓模型以使用光学计量学来表征要检查的结构时，显示视图画布，其中生成的轮廓模型显示在视图画布中。在视图画布附近显示一个轮廓形状调色板。在轮廓形状调色板中显示多个不同的轮廓形状基元。轮廓形状调色板中的每个轮廓形状基元由一组轮廓参数定义。当用户从轮廓形状调色板中选择轮廓形状基元时，从轮廓形状调色板中拖动所选择的轮廓形状基元，并将所选择的轮廓形状基元拖放到视图画布中，将所选择的轮廓形状原语合并到轮廓模型中生成并显示在视图画布中。

14. 发明申请

US20080007739A1 Optimizing selected variables of an optical metrology system 失效
标题翻译：优化光学测量系统的选定变量
公开(公告)号：US20080007739A1
公开(公告)日：2008-01-10
申请号：US11484460
申请日：2006-07-10
申请人： Vi Vuong , Junwei Bao
发明人： Vi Vuong , Junwei Bao
IPC分类号： G01B11/14
CPC分类号： G01B11/24 , G03F7/70625
摘要： A system for examining a patterned structure formed on a semiconductor wafer using an optical metrology model includes a first fabrication cluster, a metrology cluster, an optical metrology model optimizer, and a real time profile estimator. The first fabrication cluster configured to process a wafer, the wafer having a first patterned and a first unpatterned structure. The first patterned structure has underlying film thicknesses, critical dimension, and profile. The metrology cluster including one or more optical metrology devices coupled to the first fabrication cluster. The metrology cluster is configured to measure diffraction signals off the first patterned and the first unpatterned structure. The metrology model optimizer is configured to optimize an optical metrology model of the first patterned structure using one or more measured diffraction signals off the first patterned structure and with floating profile parameters, material refraction parameters, and metrology device parameters. The real time profile estimator is configured to use the optimized optical metrology model from the optical metrology model optimizer, the measured diffraction signals off the first patterned structure, and a fixed value within the range of values for at least one parameter from amongst the material refraction parameters and the metrology device parameters. The real time profile estimator is configured to create an output comprising underlying film thickness, critical dimension, and profile of the first patterned structure.
摘要翻译：使用光学测量模型检查在半导体晶片上形成的图案化结构的系统包括第一制造集群，度量集群，光学计量模型优化器和实时分布估计器。第一制造集群被配置为处理晶片，晶片具有第一图案化和第一未图案化结构。第一图案结构具有底层膜厚度，临界尺寸和轮廓。测量集群包括耦合到第一制造集群的一个或多个光学测量装置。测量簇被配置为测量离开第一图案和第一未图案化结构的衍射信号。计量模型优化器被配置为使用离开第一图案化结构的一个或多个测量的衍射信号以及浮动轮廓参数，材料折射参数和度量设备参数来优化第一图案化结构的光学测量模型。实时轮廓估计器被配置为使用来自光学计量学模型优化器的优化的光学测量模型，离开第一图案化结构的测量的衍射信号，以及在材料折射之间的至少一个参数的值范围内的固定值参数和计量装置参数。实时轮廓估计器被配置为创建包括第一图案化结构的底层膜厚度，临界尺寸和轮廓的输出。

15. 发明申请

US20070229855A1 In-die optical metrology 失效
标题翻译：模内光学计量学
公开(公告)号：US20070229855A1
公开(公告)日：2007-10-04
申请号：US11396164
申请日：2006-03-30
申请人： Shifang Li , Junwei Bao , Vi Vuong
发明人： Shifang Li , Junwei Bao , Vi Vuong
IPC分类号： G01B11/14
CPC分类号： G01B11/24
摘要： To determine one or more features of an in-die structure on a semiconductor wafer, a correlation is determined between one or more features of a test structure to be formed on a test pad and one or more features of a corresponding in-die structure. A measured diffraction signal measured off the test structure is obtained. One or more features of the test structure are determined using the measured diffraction signal. The one or more features of the in-die structure are determined based on the one or more determined features of the test structure and the determined correlation.
摘要翻译：为了确定半导体晶片上的管芯内结构的一个或多个特征，在要形成在测试焊盘上的测试结构的一个或多个特征与相应的管芯内结构的一个或多个特征之间确定相关性。获得测量结果测得的衍射信号。使用测量的衍射信号确定测试结构的一个或多个特征。基于测试结构的一个或多个确定的特征和确定的相关性来确定管芯内结构的一个或多个特征。

16. 发明申请

US20070211260A1 Weighting function to enhance measured diffraction signals in optical metrology 有权
$Weighting function to enhance measured diffraction signals in optical metrology$
标题翻译：加权功能来增强光学测量中的测量衍射信号
公开(公告)号：US20070211260A1
公开(公告)日：2007-09-13
申请号：US11371752
申请日：2006-03-08
申请人： Vi Vuong , Junwei Bao , Shifang Li , Yan Chen
发明人： Vi Vuong , Junwei Bao , Shifang Li , Yan Chen
IPC分类号： G01B11/14
CPC分类号： G01B11/24
摘要： A weighting function is obtained to enhance measured diffraction signals used in optical metrology. To obtain the weighting function, a measured diffraction signal is obtained. The measured diffraction signal was measured from a site on a wafer using a photometric device. A first weighting function is defined based on noise that exists in the measured diffraction signal. A second weighting function is defined based on accuracy of the measured diffraction signal. A third weighting function is defined based on sensitivity of the measured diffraction signal. A fourth weighting function is defined based on one or more of the first, second, and third weighting functions.
摘要翻译：获得加权函数以增强在光学计量学中使用的测量的衍射信号。为了获得加权函数，获得测量的衍射信号。使用光度测量装置从晶片上的位置测量测量的衍射信号。基于存在于测量的衍射信号中的噪声来定义第一加权函数。基于测量的衍射信号的精度来定义第二加权函数。基于测量的衍射信号的灵敏度来定义第三加权函数。基于第一，第二和第三加权函数中的一个或多个来定义第四加权函数。

17. 发明申请

US20070198211A1 Selection of wavelengths for integrated circuit optical metrology 有权
公开(公告)号：US20070198211A1
公开(公告)日：2007-08-23
申请号：US11788735
申请日：2007-04-20
申请人： Srinivas Doddi , Lawrence Lane , Vi Vuong , Michael Laughery , Junwei Bao , Kelly Barry , Nickhil Jakatdar , Emmanuel Drege
发明人： Srinivas Doddi , Lawrence Lane , Vi Vuong , Michael Laughery , Junwei Bao , Kelly Barry , Nickhil Jakatdar , Emmanuel Drege
IPC分类号： G01B11/02
CPC分类号： G01B11/00
摘要： Specific wavelengths to use in optical metrology of an integrated circuit can be selected using one or more selection criteria and termination criteria. Wavelengths are selected using the selection criteria, and the selection of wavelengths is iterated until the termination criteria are met.

18. 发明授权

US07171284B2 Optical metrology model optimization based on goals 有权
公开(公告)号：US07171284B2
公开(公告)日：2007-01-30
申请号：US10946729
申请日：2004-09-21
申请人： Vi Vuong , Emmanuel Drege , Shifang Ll , Junwei Bao
发明人： Vi Vuong , Emmanuel Drege , Shifang Ll , Junwei Bao
IPC分类号： G06F19/00 , H01L21/00
CPC分类号： G03F7/70625 , G03F7/705
摘要： The optimization of an optical metrology model for use in measuring a wafer structure is evaluated. An optical metrology model having metrology model variables, which includes profile model parameters of a profile model, is developed. One or more goals for metrology model optimization are selected. One or more profile model parameters to be used in evaluating the one or more selected goals are selected. One or more metrology model variables to be set to fixed values are selected. One or more selected metrology model variables are set to fixed values. One or more termination criteria for the one or more selected goals are set. The optical metrology model is optimized using the fixed values for the one or more selected metrology model variables. Measurements for the one or more selected profile model parameters are obtained using the optimized optical metrology model. A determination is then made as to whether the one or more termination criteria are met by the obtained measurements.

19. 发明授权

US06609086B1 Profile refinement for integrated circuit metrology 有权
标题翻译：集成电路测量的轮廓细化
公开(公告)号：US06609086B1
公开(公告)日：2003-08-19
申请号：US10075904
申请日：2002-02-12
申请人： Junwei Bao , Srinivas Doddi , Nickhil Jakatdar , Vi Vuong
发明人： Junwei Bao , Srinivas Doddi , Nickhil Jakatdar , Vi Vuong
IPC分类号： G06F1900
CPC分类号： G01B11/24 , G01N21/4788 , G03F7/70625
摘要： The present invention includes a method and system for determining the profile of a structure in an integrated circuit from a measured signal, the signal measured off the structure with a metrology device, selecting a best match of the measured signal in a profile data space, the profile data space having data points with a specified extent of non-linearity, and performing a refinement procedure to determine refined profile parameters. One embodiment includes a refinement procedure comprising finding a polyhedron in a function domain of cost functions of the profile library signals and profile parameters and minimizing the total cost function using the weighted average method. Other embodiments include profile parameter refinement procedures using sensitivity analysis, a clustering approach, regression-based methods, localized fine-resolution refinement library method, iterative library refinement method, and other cost optimization or refinement algorithms, procedures, and methods. Refinement of profile parameters may be invoked automatically or invoked based on predetermined criteria such as exceeding an error metric between the measured signal versus the best match profile library.
摘要翻译：本发明包括一种用于从测量信号确定集成电路中的结构的轮廓的方法和系统，使用测量装置测量结构的信号，在轮廓数据空间中选择测量信号的最佳匹配，具有指定非线性范围的数据点的简档数据空间，以及执行细化过程以确定精确的简档参数。一个实施例包括细化程序，包括在简档库信号和简档参数的成本函数的功能域中找到多面体，并且使用加权平均方法最小化总成本函数。其他实施例包括使用灵敏度分析的简档参数细化程序，聚类方法，基于回归的方法，局部精细分辨率细化库方法，迭代库细化方法以及其他成本优化或细化算法，程序和方法。简档参数的细化可以基于预定标准自动调用或调用，例如超过测量信号与最佳匹配简档库之间的误差度量。

20. 发明授权

US08346506B2 Transforming metrology data from a semiconductor treatment system using multivariate analysis 有权
标题翻译：使用多变量分析从半导体处理系统转换计量学数据
公开(公告)号：US08346506B2
公开(公告)日：2013-01-01
申请号：US13444746
申请日：2012-04-11
申请人： Vi Vuong , Junwei Bao , Yan Chen , Heiko Weichert , Sebastien Egret
发明人： Vi Vuong , Junwei Bao , Yan Chen , Heiko Weichert , Sebastien Egret
IPC分类号： G06F17/18
CPC分类号： G01N21/4788 , G01N21/211 , G01N2021/215
摘要： Metrology data from a semiconductor treatment system is transformed using multivariate analysis. In particular, a set of metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. One or more essential variables for the obtained set of metrology data is determined using multivariate analysis. A first metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. The first obtained metrology data is not one of the metrology data in the set of metrology data earlier obtained. The first metrology data is transformed into a second metrology data using the one or more of the determined essential variables.
摘要翻译：来自半导体处理系统的测量数据使用多变量分析进行转换。特别地，获得了对使用该处理系统处理的一个或多个基底测量或模拟的一组度量数据。使用多变量分析确定获得的度量数据集的一个或多个基本变量。获得用于使用处理系统处理的一个或多个基底测量或模拟的第一测量数据。获得的第一个测量数据不是之前获得的测量数据集中的度量数据之一。使用所确定的一个或多个基本变量将第一计量数据转换成第二计量数据。

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