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11. 发明授权

US5184196A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5184196A
公开(公告)日：1993-02-02
申请号：US810130
申请日：1991-12-19
申请人： Masahiro Nakagawa , Hideo Mizutani , Kouichirou Komatsu , Yawara Nojima
发明人： Masahiro Nakagawa , Hideo Mizutani , Kouichirou Komatsu , Yawara Nojima
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066 , G03F9/7049
摘要： A projection exposure apparatus comprises a projection optical system for forming an image of a predetermined pattern on a mask onto a photosensitive substrate under exposure light having a first wavelength, an illumination system for illuminating a mask on the photosensitive substrate with light having a second wavelength different from the first wavelength through the projection optical system so as to attain alignment, and a detection system for detecting light reflected by the mark. The illumination system comprises a light source for emitting the light having the second wavelength, a first field stop for defining an illumination field on the photosensitive substrate and a second field stop for defining an illumination field on the photosensitive substrate. The first field stop has at least two linear edges which extend in a direction substantially perpendicular to a sagittal direction in a visual field of the projection optical system and are juxtaposed in the sagittal direction at a predetermined interval. The second field stop extends in a direction substantially perpendicular to a meridional direction in a visual field of the projection optical system and has at least two linear edges juxtaposed in the meridional direction at a predetermined interval.
摘要翻译：投影曝光装置包括：投影光学系统，用于在具有第一波长的曝光光下将掩模上的预定图案的图像形成在感光基板上;照明系统，用于用具有第二波长的光照射感光基板上的掩模从第一波长通过投影光学系统获得对准;以及检测系统，用于检测由标记反射的光。照明系统包括用于发射具有第二波长的光的光源，用于限定感光基板上的照明场的第一场停止件和用于限定感光基板上的照明场的第二场停止。第一场停止件具有至少两个在投影光学系统的视野中沿垂直于矢状方向的方向延伸的直线边缘，并且以预定的间隔在矢状方向并列。第二场停止件在投影光学系统的视场中沿基本上垂直于子午方向的方向延伸，并且具有至少两个以预定间隔沿子午方向并置的线性边缘。

12. 发明授权

US5171999A Adjustable beam and interference fringe position 失效
标题翻译：可调光束和干涉条纹位置
公开(公告)号：US5171999A
公开(公告)日：1992-12-15
申请号：US762472
申请日：1991-09-19
申请人： Koichiro Komatsu , Hideo Mizutani , Nobutaka Magome , Kazuya Ota
发明人： Koichiro Komatsu , Hideo Mizutani , Nobutaka Magome , Kazuya Ota
IPC分类号： G03F9/00
CPC分类号： G03F9/7049
摘要： A position detection apparatus has a substrate on which a diffraction grating is formed and an alignment optical system for illuminating the diffraction grating with a pair of coherent light beams having different frequencies from each other from different directions. The intensity of interference fringes formed due to the interference of diffracted beams generated in the diffraction grating is detected photo-electrically. The alignment optical system forms the pair of coherent light by using an optical modulator, and two luminous fluxes from the optical modulator pass through independent optical paths positioned symmetrically with the optical axis of the alignment optical system therebetween and reach the diffraction grating from different directions. The alignment optical system has a stop having an opening having an inclined edge with respect to the direction of the grating components of the diffraction grating, the opening being in conjugation with the substrate.
摘要翻译：位置检测装置具有其上形成有衍射光栅的基板和用于用不同方向彼此不同频率的一对相干光束照射衍射光栅的对准光学系统。由于衍射光栅中产生的衍射光束的干涉而形成的干涉条纹的强度被光电检测。对准光学系统通过使用光学调制器形成一对相干光，并且来自光学调制器的两个光束通过独立的光学路径，与对准光学系统的光轴对称地定位并从不同的方向到达衍射光栅。对准光学系统具有具有相对于衍射光栅的光栅部件的方向具有倾斜边缘的开口的开口，该开口与基板共轭。

13. 发明申请

US20130027684A1 EXPOSURE APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置，基板处理装置和装置制造方法
公开(公告)号：US20130027684A1
公开(公告)日：2013-01-31
申请号：US13640875
申请日：2011-04-13
申请人： Tohru Kiuchi , Hideo Mizutani
发明人： Tohru Kiuchi , Hideo Mizutani
IPC分类号： G03B27/54 , G03B27/58
CPC分类号： G03F7/70275 , G03F7/703 , G03F7/70791
摘要： An exposure apparatus that transfers a pattern provided along a predetermined cylindrical surface onto a substrate while rotating the pattern in a circumferential direction of the cylindrical surface is provided, which includes a first projection optical system that projects an image of a first partial pattern of the pattern which is disposed in a first area of the cylindrical surface onto a first projection area, a second projection optical system that projects an image of a second partial pattern of the pattern which is disposed in a second area different from the first area onto a second projection area different from the first projection area, and a guide device that guides the substrate to the first projection area and the second projection area in synchronization with a rotation of the pattern in the circumferential direction.
摘要翻译：提供了一种曝光装置，其将沿着预定圆柱形表面设置的图案转印到基板上同时在圆柱形表面的圆周方向上旋转图案，其包括第一投影光学系统，其将图案的第一部分图案的图像投影其布置在所述圆柱形表面的第一区域中的第一投影区域上;第二投影光学系统，其将布置在不同于所述第一区域的第二区域中的所述图案的第二部分图案的图像投影到第二投影与第一投影区域不同的区域，以及引导装置，其与圆周方向上的图案的旋转同步地将基板引导到第一投影区域和第二投影区域。

14. 发明授权

US07436487B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07436487B2
公开(公告)日：2008-10-14
申请号：US11345392
申请日：2006-02-02
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
IPC分类号： G03B27/32 , G03B27/42
CPC分类号： G03F7/70341
摘要： An exposure apparatus performs an exposure of a substrate by filling at least a portion of the space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate via the projection optical system and the liquid. The apparatus includes a bubble detector that detects air bubble or bubbles in the liquid between the projection optical system and the substrate. Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.
摘要翻译：曝光装置通过用液体填充投影光学系统和基板之间的空间的至少一部分并经由投影光学系统和液体将图案的图像投影到基板上来进行基板的曝光。该装置包括气泡检测器，其检测投影光学系统和基板之间的液体中的气泡或气泡。因此，当用液体填充投影光学系统和基板之间的空间时，曝光装置能够抑制由液体中的气泡引起的图案图像的劣化。

15. 发明申请

US20070247640A1 Exposure Apparatus, Exposure Method and Device Manufacturing Method, and Surface Shape Detection Unit 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法以及表面形状检测装置
公开(公告)号：US20070247640A1
公开(公告)日：2007-10-25
申请号：US10594509
申请日：2005-03-30
申请人： Nobutaka Magome , Hideo Mizutani , Yasuhiro Hidaka
发明人： Nobutaka Magome , Hideo Mizutani , Yasuhiro Hidaka
IPC分类号： G01B11/30
CPC分类号： G03F9/7011 , G03F9/7003 , G03F9/7019 , H04B7/155
摘要： In subroutine 201 and step 205, a best image-forming plane of a projection optical system and an offset component of a multipoint AF system are detected as calibration information. During measurement of a wafer alignment mark by an alignment system in step 215, the multipoint AF system detects information related to a surface shape of a surface subject to exposure of a wafer (Z map). In step 219, a Z position order profile regarding position order (Z, θx, θy) related to autofocus leveling control is made, along with an XY position order profile of a wafer stage during scanning exposure, and in step 221, scanning exposure is performed while performing open control based on the position order.
摘要翻译：在子程序201和步骤205中，检测投影光学系统的最佳图像形成平面和多点AF系统的偏移分量作为校准信息。在步骤215中通过对准系统测量晶片对准标记期间，多点AF系统检测与经过晶片曝光的表面的表面形状有关的信息（Z图）。在步骤219中，与扫描曝光期间的晶片台的XY位置顺序轮廓一起进行与自动聚焦调平控制有关的位置顺序（Z，thetax，thetay）的Z位置阶轮廓，并且在步骤221中，扫描曝光是在基于位置顺序执行打开控制时执行。

16. 再颁专利

USRE36740E Cata-dioptric reduction projection optical system 失效
标题翻译： Cata屈光减光投影光学系统
公开(公告)号：USRE36740E
公开(公告)日：2000-06-20
申请号：US490700
申请日：1995-06-14
申请人： Yutaka Ichihara , Hideo Mizutani , Sumio Hashimoto , Yutaka Suenaga
发明人： Yutaka Ichihara , Hideo Mizutani , Sumio Hashimoto , Yutaka Suenaga
IPC分类号： G02B17/08 , G02B27/00 , G02B27/28 , G03F7/20 , G02B5/30
CPC分类号： G02B17/08 , G02B17/0892 , G02B27/283 , G03F7/70225 , G02B27/0018
摘要： In a cata-dioptric optical system having a combination of a reflection system and a refraction system for reduction-projecting an object on a first plane onto a second plane, a polarization beam splitter and a quarter wavelength plate are provided to split the incident light and the reflected light. The light beam directed to the polarization beam splitter is converted to a substantially collimated light beam by a first group of lenses. A second group of lenses are arranged between the polarization beam splitter and a concave reflection mirror to diverge the light beam. The light reflected by the concave reflection mirror is directed back to the polarization beam splitter with a substantially collimated state by the second group of lenses. The light beam from the second group of lenses transmitted through the polarization beam splitter is focused by a third group of lenses having a positive refraction power to form a reduced image.
摘要翻译：在具有用于将第一平面上的物体还原投影到第二平面上的反射系统和折射系统的组合的数位屈光光学系统中，设置偏振分束器和四分之一波长板以分离入射光，反射光。被引导到偏振分束器的光束被第一组透镜转换成基本准直的光束。第二组透镜被布置在偏振分束器和凹面反射镜之间以使光束发散。由第二组透镜将由凹面反射镜反射的光引导回基本准直状态的偏振分束器。通过偏振分束器透射的第二组透镜的光束被具有正折射光焦度的第三组透镜聚焦以形成缩小图像。

17. 发明授权

US5734478A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5734478A
公开(公告)日：1998-03-31
申请号：US537982
申请日：1995-10-02
申请人： Nobutaka Magome , Hideo Mizutani , Kenji Nishi
发明人： Nobutaka Magome , Hideo Mizutani , Kenji Nishi
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/7049
摘要： A projection exposure apparatus employs light in two different wavelength bands for exposure of a photosensitive substrate and for alignment of the substrate with a mask, respectively. The mask has a window through which alignment light is passed to an alignment mark on the substrate and has a shield for preventing illumination of the alignment mark by exposure light. In one embodiment the position of the shield relative to the window is determined by magnification chromatic aberration of a projection optical system with regard to the alignment light. In another embodiment the path of the alignment light through the window is inclined relative to a line perpendicular to the mask and passes through a pupil of the projection optical system at a point deviated from the center of the pupil. In another embodiment a mark on the mask and a mark on the substrate are illuminated with light beams incident on the marks from different directions and forming interference fringes to provide optical information that is utilized to align the mask and the substrate.
摘要翻译：投影曝光装置采用两个不同波段的光来分别曝光感光基片和基片与掩模的对准。掩模具有窗口，通过该窗口对准光通过基板上的对准标记，并具有用于防止曝光光照射对准标记的屏蔽。在一个实施例中，屏蔽件相对于窗口的位置由投影光学系统相对于对准光的倍率色差确定。在另一个实施例中，通过窗口的对准光的路径相对于垂直于掩模的线倾斜，并且在偏离瞳孔中心的点处穿过投影光学系统的光瞳。在另一个实施例中，掩模上的标记和衬底上的标记被从不同方向入射到标记上的光束照射并形成干涉条纹以提供用于对准掩模和衬底的光学信息。

18. 发明授权

US5689339A Alignment apparatus 失效
标题翻译：校准装置
公开(公告)号：US5689339A
公开(公告)日：1997-11-18
申请号：US506132
申请日：1995-07-24
申请人： Kazuya Ota , Kouichirou Komatsu , Hideo Mizutani , Nobutaka Magome
发明人： Kazuya Ota , Kouichirou Komatsu , Hideo Mizutani , Nobutaka Magome
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/70
摘要： In an alignment apparatus for aligning a mask and a photosensitive substrate (a semiconductor wafer or glass plate applied with a photoresist), and which is suitably used in a projection exposure apparatus (a stepper or aligner), a proximity exposure apparatus, or the like used in a lithography process in the manufacture of a semiconductor element or a liquid crystal display element, two first beams and two second beams differing from the first beams may be radiated on a diffraction grating-like mask mark and a diffraction grating-like substrate mark, respectively, with the two second beams passing through a transparent region adjacent to the mask mark. By detecting diffracted light components of the two first beams and detecting diffracted light components of the two second beams, a relative position shift between the mask and the substrate can be determined. The alignment apparatus advantageously can reduce mixing of alignment light from a mask and alignment light from a wafer (substrate) to a minimum degree, or can sufficiently separate signals corresponding to these light components in a signal processing stage even when mixing inevitably occurs.
摘要翻译：在用于对准掩模和感光基板（涂有光致抗蚀剂的半导体晶片或玻璃板）的对准装置中，适用于投影曝光装置（步进机或对准器）中的接近曝光装置等用于制造半导体元件或液晶显示元件的光刻工艺中，可以将不同于第一光束的两个第一光束和两个第二光束照射在衍射光栅状掩模标记和衍射光栅样基板标记分别与两个第二光束通过与掩模标记相邻的透明区域。通过检测两个第一光束的衍射光分量并检测两个第二光束的衍射光分量，可以确定掩模和基板之间的相对位置偏移。对准装置有利地可以减少来自掩模的对准光和来自晶片（衬底）的对准光到最小程度的混合，或者即使当不可避免地发生混合时，也可以在信号处理阶段中充分地分离与这些光分量对应的信号。

19. 发明授权

US5347356A Substrate aligning device using interference light generated by two beams irradiating diffraction grating 失效
$Substrate aligning device using interference light generated by two beams irradiating diffraction grating$
标题翻译：使用由两束照射衍射光栅产生的干涉光的基板对准装置
公开(公告)号：US5347356A
公开(公告)日：1994-09-13
申请号：US982129
申请日：1992-11-25
申请人： Kazuya Ota , Nobutaka Magome , Hideo Mizutani , Kouichiro Komatsu
发明人： Kazuya Ota , Nobutaka Magome , Hideo Mizutani , Kouichiro Komatsu
IPC分类号： G01B11/00 , G01B9/02 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7049 , G01B9/02002 , G01B9/02003 , G01B9/02097 , G03F7/70633 , G03F7/70691 , G01B2290/30 , G01B2290/60 , G01B2290/70
摘要： An aligning device for aligning a substrate with a predetermined point on the basis of a detection signal from a photoelectric detector uses interference light generated by light diffracted from a diffraction grating. A calculating device calculates at least one of a crossing angle of two coherent beams irradiating the grating and the rotational error of a crossing line between a plane containing principal rays of the beams and the surface of the substrate, with respect to the direction of arrangement of the grating, based on the phase difference between detection signals of the photoelectric detector corresponding to interference light generated from different portions of the crossing area. The output of the calculating device may be used to adjust the crossing angle and/or to correct the rotational error.
摘要翻译：基于来自光电检测器的检测信号将基板与预定点对准的对准装置使用由衍射光栅衍射的光产生的干涉光。计算装置计算照射光栅的两个相干光束的交叉角度与包含光束的主光线和基板表面的平面之间的交叉线的旋转误差中的至少一个相对于基于光电检测器的检测信号之间的相位差对应于由交叉区域的不同部分产生的干涉光的光栅。可以使用计算装置的输出来调整交叉角度和/或校正旋转误差。

20. 发明授权

US5241188A Apparatus for detecting a focussing position 失效
标题翻译：用于检测聚焦位置的装置
公开(公告)号：US5241188A
公开(公告)日：1993-08-31
申请号：US993460
申请日：1992-12-15
申请人： Hideo Mizutani
发明人： Hideo Mizutani
IPC分类号： G03F9/00
CPC分类号： G03F9/7026
摘要： An apparatus for detecting a focussing position in a projection exposure system. The apparatus constitutes a detection system for causing the so-called automatic focussing apparatus to operate more precisely with greater reliability and the focussing height at the respective portions of a mask pattern are separately determined, thereby making the accurate discrimination of the focussing position even in cases where any special mark is not used or the intentity of the exposure light is varied moment by moment. This apparatus includes a reference surface formed with a transparent pattern of a given configuration and provided on a stage, an illuminating system for directing an illuminating light to the transparent pattern, and a detection system whereby the reflected light from the mask pattern surface of the projected image of the transparent pattern formed by the projection optical system under the application of the illuminating light is detected through the projection optical system and the transparent pattern thereby detecting a variation in the light quantity of the reflected light. The position (height) where the light quantity variation of the reflected light attains the maximum or minimum represents the focussing position.
摘要翻译：一种用于检测投影曝光系统中的聚焦位置的装置。该装置构成用于使所谓的自动聚焦装置以更高的可靠性更精确地操作的检测系统，并且分别确定在掩模图案的各个部分处的聚焦高度，从而即使在情况下也能够精确地区分聚焦位置没有使用任何特殊标记或曝光光的意图随时变化。该装置包括：具有给定构造的透明图案并设置在舞台上的参考表面，用于将照明光引导到透明图案的照明系统;以及检测系统，由此来自投影的掩模图案表面的反射光通过投影光学系统和透明图案检测由投影光学系统在照射光的应用下形成的透明图案的图像，从而检测反射光的光量的变化。反射光的光量变化达到最大或最小的位置（高度）表示聚焦位置。

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