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11. 发明申请

US20060214133A1 Metal polishing solution and polishing method 审中-公开
标题翻译：金属抛光液和抛光方法
公开(公告)号：US20060214133A1
公开(公告)日：2006-09-28
申请号：US11377675
申请日：2006-03-17
申请人： Katsuhiro Yamashita
发明人： Katsuhiro Yamashita
IPC分类号： C11D3/39
CPC分类号： H01L21/3212 , C09G1/02
摘要： A metal polishing solution comprising an oxidizing agent, wherein assuming that an oxidation reaction rate immediately after an oxidation of a metal to be polished starts at its surface is E1 and an oxidation reaction rate when an oxidation reaction reaches a stationary state is E2, E1/E2 is 1.5 or more and a time required for reaching an oxidation reaction rate of (E1+E2)/2 is from 1 to 50 seconds.
摘要翻译：一种包含氧化剂的金属抛光溶液，其中假设待抛光金属氧化后的氧化反应速率在其表面开始为E1，当氧化反应达到稳定状态时，氧化反应速率为E1，E1 / E2为1.5以上，达到（E1 + E2）/ 2的氧化反应速度所需的时间为1〜50秒。

12. 发明申请

US20050271987A1 Silver halide photographic emulsion and photographic light-sensitive material using the same 审中-公开
标题翻译：卤化银照相乳剂和摄影感光材料
公开(公告)号：US20050271987A1
公开(公告)日：2005-12-08
申请号：US11187870
申请日：2005-07-25
申请人： Katsuhiro Yamashita , Katsumi Kobayashi , Takanori Hioki
发明人： Katsuhiro Yamashita , Katsumi Kobayashi , Takanori Hioki
IPC分类号： G03C1/005 , G03C1/035 , G03C1/09 , G03C1/12 , G03C1/16 , G03C1/18 , G03C1/20 , G03C1/22 , G03C1/29 , G03C1/34 , G03C7/30
CPC分类号： G03C7/3041 , G03C1/0051 , G03C1/09 , G03C1/12 , G03C1/127 , G03C1/16 , G03C1/18 , G03C1/20 , G03C1/22 , G03C1/29 , G03C2001/097
摘要： An object of the present invention is to provide a silver halide photographic light-sensitive material which is reduced in the various problems ascribable to the multilayer adsorption of a sensitizing dye. A silver halide photographic emulsion comprising a silver halide grain having adsorbed on the surface thereof a sensitizing dye in multiple layers is described, wherein the variation coefficient of the light absorption strength distribution among the grains is 100% or less.
摘要翻译：本发明的目的是提供一种卤化银摄影感光材料，其减少了由致敏染料的多层吸附引起的各种问题。描述了包含在其表面上吸附有多层感光染料的卤化银颗粒的卤化银照相乳剂，其中颗粒之间的光吸收强度分布的变化系数为100％以下。

13. 发明授权

US6080227A Gas treating apparatus 有权
标题翻译：气体处理装置
公开(公告)号：US6080227A
公开(公告)日：2000-06-27
申请号：US185688
申请日：1998-11-04
申请人： Masaji Kurosawa , Katsuhiro Yamashita , Takeya Kobayashi
发明人： Masaji Kurosawa , Katsuhiro Yamashita , Takeya Kobayashi
IPC分类号： B01D53/06
CPC分类号： B01D53/06 , B01D2253/108 , B01D2253/3425 , B01D2257/708 , B01D2259/40009 , B01D2259/4009
摘要： A VOC concentrating apparatus includes a honeycomb rotor. In order to lower concentration at an exit of adsorption and at the same time to be able to regulate the amount of air flow introduced into a desorbing zone, independently from the amount of cooling air, there are disposed a cooling zone, desorbing zone and an adsorbing zone in the honeycomb rotor. The honeycomb rotor rotates and thus passes through the zones one after another. After gas to be treated has passed through the adsorbing zone, concentration of VOC in the gas is measured on the exit side by a concentration detector. The cooling air is divided by a damper for regulating the amount of air flow, after having entered the cooling zone, and a part thereof enters the desorbing zone through a heater. Further air coming out therefrom is heated again by a heater to enter the desorbing zone and concentrated gas is removed.
摘要翻译： VOC浓缩装置包括蜂窝转子。为了降低吸附出口处的浓度，同时能够调节导入解吸区域的气流量，独立于冷却空气量，设置有冷却区，解吸区和蜂窝转子中的吸附区。蜂窝转子旋转，从而一个接一个地穿过这些区域。在待处理气体通过吸附区后，通过浓度检测器在出口侧测量气体中VOC的浓度。冷却空气由进入冷却区之后用于调节空气流量的阻尼器分开，其一部分通过加热器进入解吸区域。再次通过加热器再次加热出来的空气进入解吸区域，并且除去浓缩气体。

14. 发明授权

US5348816A Alkaline battery 失效
标题翻译：碱性电池
公开(公告)号：US5348816A
公开(公告)日：1994-09-20
申请号：US896969
申请日：1992-06-11
申请人： Kenichi Shinoda , Akihide Izumi , Kiyohide Tsutsui , Katsuhiro Yamashita , Hidenori Tsuzuki , Takashi Matsuo
发明人： Kenichi Shinoda , Akihide Izumi , Kiyohide Tsutsui , Katsuhiro Yamashita , Hidenori Tsuzuki , Takashi Matsuo
IPC分类号： H01M4/02 , H01M4/12 , H01M4/62 , H01M6/06 , H01M10/26 , H01M4/58
CPC分类号： H01M6/06 , H01M4/12 , H01M4/62 , H01M2004/027 , H01M4/02
摘要： A method for producing a gel form negative electrode of an alkaline battery while avoiding use of mercury enables uniform dispersion of zinc or zinc alloy powder and an effective metal which can be one or more of an oxide or hydroxide of indium, lead, gallium, bismuth, by stirring for a substantially reduced period. The method employs dry mixing of the zinc or zinc alloy powder and the effective metal in advance of mixing with a gel form alkaline electrolyte. Also, in order to obtain satisfactorily high vibration strength and impact resistance, fiber material can be added to the gel form negative electrode. The fiber material may be selected among rayon, vinylon, acryl, vinyon, polyamide, polypropylene, polyethylene, mercerized pulp, linter pulp.
摘要翻译：在避免使用汞的情况下制造碱性电池的凝胶形式的负极的方法能够均匀分散锌或锌合金粉末和可以是铟，铅，镓，铋的氧化物或氢氧化物中的一种或多种的有效金属，通过搅拌显着减少的时间。该方法在与凝胶形式的碱性电解质混合之前，先将锌或锌合金粉末和有效金属干混。此外，为了获得令人满意的高振动强度和抗冲击性，可以将纤维材料添加到凝胶中形成负极。纤维材料可以选自人造纤维，维尼纶，丙烯酸，乙烯，聚酰胺，聚丙烯，聚乙烯，丝光纸浆，棉绒纸浆。

15. 发明授权

US08563668B2 Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, and process for making relief printing plate 失效
标题翻译：用于激光雕刻的树脂组合物，用于激光雕刻的凸版印刷版前体及其制造方法，以及用于制造凸版印刷版的工艺
公开(公告)号：US08563668B2
公开(公告)日：2013-10-22
申请号：US13169636
申请日：2011-06-27
申请人： Katsuhiro Yamashita
发明人： Katsuhiro Yamashita
IPC分类号： C08F285/00 , C08K5/24 , G03C1/00
CPC分类号： B41C1/05 , B41N1/12
摘要： A resin composition is provided that includes two or more types of compounds selected from the group consisting of (Component A) a compound comprising a silicon atom having a total of one or two alkoxy and hydroxy groups, (Component B) a compound comprising a silicon atom having a total of three alkoxy and hydroxy groups, and (Component C) a compound comprising a silicon atom having a total of four alkoxy and hydroxy groups. There are also provided a relief printing plate precursor that includes a relief-forming layer formed from the resin composition, a process for producing a relief printing plate precursor that includes a layer formation step of forming a relief-forming layer from the resin composition and a crosslinking step of thermally crosslinking the relief-forming layer so as to form a crosslinked relief-forming layer.
摘要翻译：提供一种树脂组合物，其包含两种或更多种选自（组分A）包含总共一个或两个烷氧基和羟基的硅原子的化合物的组分（组分B）包含硅的化合物具有总共三个烷氧基和羟基的原子，和（组分C）包含总共四个烷氧基和羟基的硅原子的化合物。还提供了一种凸版印刷版原版，其包括由该树脂组合物形成的凸版形成层，一种凸版印刷版原版的制造方法，其包括从该树脂组合物形成凸版形成层的层形成步骤和交联步骤，使交联形成层交联形成交联的浮雕形成层。

16. 发明授权

US08402415B2 Layout device and layout method of semiconductor integrated circuit 失效
标题翻译：半导体集成电路的布局装置和布局方法
公开(公告)号：US08402415B2
公开(公告)日：2013-03-19
申请号：US13039955
申请日：2011-03-03
申请人： Sawako Fukunaga , Yuuki Takahashi , Katsuhiro Yamashita
发明人： Sawako Fukunaga , Yuuki Takahashi , Katsuhiro Yamashita
IPC分类号： G06F17/50
CPC分类号： G06F17/50
摘要： A layout method of a semiconductor integrated circuit includes five steps. The first step is of extracting a wiring crowding place where wiring lines are crowded as compared with a predetermined condition, after carrying out a routing in a region where a placement of circuit elements is carried out. The second step is of generating routing prohibition regions where a routing is prohibited in an area including the wiring crowding place. The third step is of carrying out a routing by bypassing the routing prohibition regions. The fourth step is of deleting the routing prohibition regions. The fifth step is of carrying out a re-routing. The generating step includes: calculating a size and an interval of the routing prohibition regions based on a rate for generating a routing prohibition region in the area in each wiring layer, and generating the routing prohibition regions in the area on the basis of the calculating result.
摘要翻译：半导体集成电路的布置方法包括五个步骤。第一步是在执行电路元件放置的区域中进行路由之后，提取与预定条件相比布线线路挤满的地方。第二步是生成路由禁止区域，其中路由被禁止在包括布线拥挤位置的区域中。第三步是绕过路由禁止区域进行路由。第四步是删除路由禁止区域。第五步是进行重路由。所述生成步骤包括：基于在所述布线层的所述区域中生成路由禁止区域的速率来计算所述路由禁止区域的大小和间隔，并且基于所述计算结果生成所述区域中的所述路由禁止区域。

17. 发明申请

US20070209511A1 METHOD FOR PROCESSING ORGANIC SOLVENT-CONTAINING AIR 失效
标题翻译：用于处理含有有机溶剂的空气的方法
公开(公告)号：US20070209511A1
公开(公告)日：2007-09-13
申请号：US11678722
申请日：2007-02-26
申请人： Masaji Kurosawa , Katsuhiro Yamashita , Tomohiro Deguchi
发明人： Masaji Kurosawa , Katsuhiro Yamashita , Tomohiro Deguchi
IPC分类号： B01D53/02
CPC分类号： B01D53/06 , B01D53/8693 , B01D2253/108 , B01D2257/708 , F23G7/07 , Y02A50/2328
摘要： A method for processing an organic solvent-containing air is disclosed. The method can be operated in spite of a rapid fluctuation of the concentration of the organic solvents in the air to be processed, specifically, the method does not increase the organic solvent content in the air to be emitted into the atmosphere after processing, even if the concentration of the organic solvents rapidly changes. The method comprises carrying out simultaneously and continuously an adsorbing-removing step, a regenerating step, and a combustion step, while mixing a purified air produced in the adsorbing-removing step with an exhaust gas from a combustion furnace produced in the combustion step, and decomposing the organic solvents in the mixture by oxidation.
摘要翻译：公开了一种处理含有机溶剂的空气的方法。该方法尽管有待处理的空气中的有机溶剂的浓度波动很快，但是特别地，该方法不会增加处理后排放到大气中的空气中的有机溶剂含量，即使有机溶剂的浓度迅速变化。该方法包括同时且连续地进行吸附去除步骤，再生步骤和燃烧步骤，同时将在吸附去除步骤中产生的净化空气与来自在燃烧步骤中产生的燃烧炉的废气混合，以及通过氧化分解混合物中的有机溶剂。

18. 发明申请

US20070186484A1 Metal-polishing liquid and chemical mechanical polishing method using the same 失效
标题翻译：金属抛光液和化学机械抛光方法使用相同
公开(公告)号：US20070186484A1
公开(公告)日：2007-08-16
申请号：US11699406
申请日：2007-01-30
申请人： Katsuhiro Yamashita , Kenji Takenouchi , Tomoo Katou , Yoshinori Nishiwaki , Mihoko Ishima
发明人： Katsuhiro Yamashita , Kenji Takenouchi , Tomoo Katou , Yoshinori Nishiwaki , Mihoko Ishima
IPC分类号： B24D3/02
CPC分类号： C09G1/02 , C09K3/1445 , C09K3/1463 , H01L21/3212
摘要： The invention provides a metal polishing liquid comprising an oxidizing agent and colloidal silica in which a part of a surface of the colloidal silica is covered with aluminum atoms, and a Chemical Mechanical Polishing method using the same. An amino acid, a compound having an isothiazoline-3-one skeleton, an organic acid, a passivated film forming agent, a cationic surfactant, a nonionic surfactant, and a water-soluble polymer may be contained. A metal polishing liquid which is used in Chemical Mechanical Polishing in manufacturing of a semiconductor device, attains low dishing of a subject to be polished, and can perform polishing excellent in in-plane uniformity of a surface to be polished.
摘要翻译：本发明提供了一种金属抛光液，其包含氧化剂和胶体二氧化硅，其中胶体二氧化硅的一部分表面被铝原子覆盖，并使用化学机械抛光方法。可以包含氨基酸，具有异噻唑啉-3-酮骨架的化合物，有机酸，钝化成膜剂，阳离子表面活性剂，非离子表面活性剂和水溶性聚合物。在半导体装置的制造中使用的化学机械抛光中使用的金属研磨液，能够使被研磨对象的低凹陷，能够进行抛光面的面内均匀性优异的抛光。

19. 发明申请

US20070167016A1 Metal-polishing liquid and chemical-mechanical polishing method using the same 失效
标题翻译：金属抛光液和化学机械抛光方法使用相同
公开(公告)号：US20070167016A1
公开(公告)日：2007-07-19
申请号：US11701403
申请日：2007-02-02
申请人： Katsuhiro Yamashita
发明人： Katsuhiro Yamashita
IPC分类号： H01L21/461
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463 , C23F3/06
摘要： A metal-polishing liquid includes colloidal silica and a compound represented by Formula (I) or a compound represented by Formula (II). The colloidal silica is substituted by aluminum atoms at least one portion of the silicon atoms on the surfaces thereof. In Formula (I), R1 represents an alkyl group, alkynyl group, alkenyl group, allyl group or aryl group; R2 represents hydrogen atom, an alkyl group, alkynyl group, alkenyl group, allyl group or aryl group; m represents an integer from 0 to 6. In Formula (II), R3 represents an alkyl group or aryl group; n represents an integer from 1 to 30. R1—OOC—(CH2)m—COO—R2 Formula (I) R3—O—(CH2CH2O)n—SO3H Formula (II)
摘要翻译：金属抛光液包括胶体二氧化硅和由式（I）表示的化合物或由式（II）表示的化合物。胶体二氧化硅被铝原子的至少一部分硅表面的硅原子取代。在式（I）中，R 1表示烷基，炔基，烯基，烯丙基或芳基; R 2表示氢原子，烷基，炔基，烯基，烯丙基或芳基; m表示0至6的整数。在式（II）中，R 3表示烷基或芳基; n表示1至30的整数。<？in-line-formula description =“In-line Formulas”end =“lead”？> R 1 -OOC-（CH 2）式（I）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line formula”end =“lead”？> R 3 -O-（CH 2 CH 2）（II）<？在线公式描述=“在线公式”end =“tail”？>

20. 发明授权

US07217313B2 Dehumidification system and dehumidification method 失效
标题翻译：除湿系统和除湿方法
公开(公告)号：US07217313B2
公开(公告)日：2007-05-15
申请号：US10513754
申请日：2003-05-26
申请人： Hiroshi Motono , Takashi Tanahashi , Masaji Kurosawa , Katsuhiro Yamashita
发明人： Hiroshi Motono , Takashi Tanahashi , Masaji Kurosawa , Katsuhiro Yamashita
IPC分类号： B01D53/06 , B01D53/28
CPC分类号： F24F3/1423 , B01D53/06 , B01D53/261 , B01D2253/108 , B01D2253/25 , B01D2253/3425 , B01D2256/12 , B01D2257/70 , B01D2257/80 , B01D2258/0216 , B01D2259/4009 , F24F2203/1032 , F24F2203/1056 , F24F2203/1072 , F24F2203/108 , F24F2203/1084 , F24F2203/1088
摘要： A dehumidifying system supplies a gas free of organic substances. The dehumidifying system includes a holding case, and a rotor rotatably held in the holding case and bearing an adsorbent. The interior of the holding case is divided into an adsorbing zone and a regenerating zone by partition plates attached to the holding case. A process gas is supplied into the adsorbing zone. The process gas processed in the adsorbing zone is supplied into an objective space. A regenerating gas is supplied into the regenerating zone to eliminate moisture and organic substances adsorbed by the adsorbent in the adsorbing zone from the adsorbent.
摘要翻译：除湿系统提供无有机物质的气体。除湿系统包括保持壳体和可旋转地保持在保持壳体中并承载吸附剂的转子。保持壳体的内部通过附接到保持壳体上的分隔板分成吸附区域和再生区域。工艺气体被供应到吸附区。在吸附区域中处理的工艺气体被供应到目标空间中。将再生气体供给再生区，以从吸附剂中除去吸附区中的吸附剂吸附的水分和有机物质。

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