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11. 发明申请

US20090021830A1 PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM 审中-公开
标题翻译：微波曝光系统的投影镜头
公开(公告)号：US20090021830A1
公开(公告)日：2009-01-22
申请号：US12132796
申请日：2008-06-04
申请人： Michael Totzeck , Susanne Beder , Wilfried Clauss , Heiko Feldmann , Daniel Kraehmer , Aurelian Dodoc
发明人： Michael Totzeck , Susanne Beder , Wilfried Clauss , Heiko Feldmann , Daniel Kraehmer , Aurelian Dodoc
IPC分类号： G02B17/08 , G02B27/28 , G02B27/18
CPC分类号： G02B5/3083 , G02B27/286 , G03F7/70308 , G03F7/70566 , G03F7/70966
摘要： In some embodiments, the disclosure provides a projection lens configured to configured to image radiation from an object plane of the projection lens to an image plane of the projection lens. The projection lens can, for example, be used in a microlithographic projection exposure apparatus. The projection lens includes a last lens on the image plane side. The last lens includes at least one intrinsically birefringent material. The material can be, for example, magnesium oxide, a garnet, lithium barium fluoride and/or a spinel. The last lens can have a thickness d which satisfies the condition 0.8*y0, max
摘要翻译：在一些实施例中，本公开提供一种投影透镜，其被配置为被配置为将来自投影透镜的物平面的辐射成像到投影透镜的像平面。投影透镜例如可以用在微光刻投影曝光装置中。投影透镜在图像平面侧包括最后一个透镜。最后一个透镜包括至少一个本质上双折射材料。该材料可以是例如氧化镁，石榴石，氟化锂钡和/或尖晶石。最后一个透镜可以具有满足条件0.8 * y0，max

12. 发明申请

US20080204877A1 ILLUMINATION SYSTEM OR PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM 有权
标题翻译：微观曝光系统的照明系统或投影镜头
公开(公告)号：US20080204877A1
公开(公告)日：2008-08-28
申请号：US12042621
申请日：2008-03-05
申请人： Michael Totzeck , Susanne Beder , Wilfried Clauss , Heiko Feldmann , Daniel Kraehmer , Aurelian Dodoc
发明人： Michael Totzeck , Susanne Beder , Wilfried Clauss , Heiko Feldmann , Daniel Kraehmer , Aurelian Dodoc
IPC分类号： G02B27/28
CPC分类号： G02B5/3083 , G02B27/286 , G03F7/70566 , G03F7/70966
摘要： In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.
摘要翻译：在一些实施例中，本公开提供了一种光学系统，特别是微光刻曝光系统的照明系统或投影透镜，其具有光学系统轴线和包括三个双折射元件的至少一个元件组，每个元件组包括光学单轴材料并具有非球面表面，其中该组的第一双折射元件具有其光学晶体轴的第一取向，该组的第二双折射元件具有其光学晶轴的第二取向，其中第二取向可被描述为从第一取向的旋转，旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍，并且该组的第三双折射元件具有其光学晶轴的第三取向，其中，可以将第三取向描述为从第二取向旋转而出现，旋转不对准以围绕光学系统轴旋转90°的角度或其整数倍。

13. 发明授权

US07697211B2 Symmetrical objective having four lens groups for microlithography 有权
标题翻译：具有用于微光刻的四个透镜组的对称物镜
公开(公告)号：US07697211B2
公开(公告)日：2010-04-13
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/30
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译：本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位到所述透镜系统的光轴。

14. 发明授权

US08068276B2 Projection objective for lithography 有权
标题翻译：光刻投影目标
公开(公告)号：US08068276B2
公开(公告)日：2011-11-29
申请号：US12899297
申请日：2010-10-06
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B17/08
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

15. 发明授权

US07835073B2 Projection objective for lithography 有权
标题翻译：光刻投影目标
公开(公告)号：US07835073B2
公开(公告)日：2010-11-16
申请号：US12014496
申请日：2008-01-15
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B17/08
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

16. 发明申请

US20080174858A1 PROJECTION OBJECTIVE FOR LITHOGRAPHY 有权
标题翻译：投影目标的图像
公开(公告)号：US20080174858A1
公开(公告)日：2008-07-24
申请号：US12014496
申请日：2008-01-15
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B27/18
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

17. 发明申请

US20110026110A1 PROJECTION OBJECTIVE FOR LITHOGRAPHY 有权
标题翻译：投影目标的图像
公开(公告)号：US20110026110A1
公开(公告)日：2011-02-03
申请号：US12899297
申请日：2010-10-06
申请人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
发明人： Heiko Feldmann , Susanne Beder , Aurelian Dodoc , Alexander Epple , Hans-Juergen Rostalski
IPC分类号： G02B3/00
CPC分类号： G02B17/0844 , G02B13/143 , G03F7/70225 , G03F7/70308
摘要： In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.
摘要翻译：在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在在光瞳平面或场平面上不光学的区域。

18. 发明授权

US08031326B2 Illumination system or projection lens of a microlithographic exposure system 有权
标题翻译：微光曝光系统的照明系统或投影透镜
公开(公告)号：US08031326B2
公开(公告)日：2011-10-04
申请号：US12042621
申请日：2008-03-05
申请人： Michael Totzeck , Susanne Beder , Wilfried Clauss , Heiko Feldmann , Daniel Kraehmer , Aurelian Dodoc
发明人： Michael Totzeck , Susanne Beder , Wilfried Clauss , Heiko Feldmann , Daniel Kraehmer , Aurelian Dodoc
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G02B5/3083 , G02B27/286 , G03F7/70566 , G03F7/70966
摘要： In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.
摘要翻译：在一些实施例中，本公开提供了一种光学系统，特别是微光刻曝光系统的照明系统或投影透镜，其具有光学系统轴线和包括三个双折射元件的至少一个元件组，每个元件组包括光学单轴材料并具有非球面表面，其中该组的第一双折射元件具有其光学晶体轴的第一取向，该组的第二双折射元件具有其光学晶轴的第二取向，其中第二取向可被描述为从第一取向的旋转，旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍，并且该组的第三双折射元件具有其光学晶轴的第三取向，其中，可以将第三取向描述为从第二取向旋转而出现，旋转不对准以围绕光学系统轴旋转90°的角度或其整数倍。

19. 发明申请

US20090080086A1 SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY 有权
标题翻译：具有四个用于微结构的镜片组的对称目标
公开(公告)号：US20090080086A1
公开(公告)日：2009-03-26
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/18 , G02B11/28 , G02B11/04
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译：本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位到所述透镜系统的光轴。

20. 发明申请

US20090073392A1 Illumination System Including Grazing Incidence Mirror For Microlithography Exposure System 审中-公开
标题翻译：包括用于微光刻曝光系统的放映入射镜的照明系统
公开(公告)号：US20090073392A1
公开(公告)日：2009-03-19
申请号：US11855359
申请日：2007-09-14
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Daniel Kraemer , Toralf Gruner , Aurelian Dodoc
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Daniel Kraemer , Toralf Gruner , Aurelian Dodoc
IPC分类号： G03B21/28 , G03B21/06
CPC分类号： G03F7/70233 , G03F7/702
摘要： In general, in one aspect, the invention features a system that includes a catoptric projection objective having an optical axis and including a plurality of projection objective elements positioned between an object plane and an image plane, the object and image planes being orthogonal to the optical axis, the projection objective being configured so that during operation the projection objective directs radiation reflected at the object plane to the image plane to form an image at the image plane of an object positioned in a field at the object plane, the field having a first dimension of 8 mm or more and a second dimension of 8 mm or more, the first and second dimensions being along orthogonal directions. The system also includes an illumination system including a plurality of illumination system elements, the illumination system being configured so that during operation the illumination system directs the radiation to the field at the object plane, where a chief ray of the radiation has an angle of incidence of 10° or less at the object plane.
摘要翻译：通常，在一个方面，本发明的特征在于一种系统，其包括具有光轴并且包括位于物平面和图像平面之间的多个投影物镜元件的反射投影物镜，物体和像平面正交于光学所述投影物镜被配置为使得在操作期间，投影物镜将在物平面处反射的辐射引导到像平面以在位于物平面处的场中的物体的像平面处形成图像，该场具有第一尺寸为8mm以上，第二尺寸为8mm以上，第一尺寸和第二尺寸沿正交方向。该系统还包括包括多个照明系统元件的照明系统，照明系统被配置为使得在操作期间照明系统将辐射引导到物平面处的场，其中辐射的主射线具有入射角在物平面上为10°以下。

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