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11. 发明授权

US06252712B1 Optical system with polarization compensator 有权
标题翻译：带偏振补偿器的光学系统
公开(公告)号：US06252712B1
公开(公告)日：2001-06-26
申请号：US09252636
申请日：1999-02-19
申请人： Gerhard Fürter , Winfried Kaiser , Christian Wagner , Michael Gerhard , Karl-Heinz Schuster
发明人： Gerhard Fürter , Winfried Kaiser , Christian Wagner , Michael Gerhard , Karl-Heinz Schuster
IPC分类号： G02B530
CPC分类号： G03F7/70566 , G02B5/3083 , G02B13/143 , G02B27/0025 , G02B27/28 , G03F7/70225 , Y10S359/90
摘要： An optical system with at least one optical element that causes a disturbance of the distribution of polarization over the cross section of a light beam wherein at least one birefringent optical element is provided, with a thickness which varies irregularly over the cross section, such that the disturbance of the distribution of polarization is at least partially compensated.
摘要翻译：一种具有至少一个光学元件的光学系统，其在光束的横截面上引起偏振分布的干扰，其中提供至少一个双折射光学元件，其厚度在横截面上不规则地变化，使得至少部分地补偿了极化分布的干扰。

12. 发明授权

US07079331B2 Device for holding a beam splitter element 失效
标题翻译：用于保持分束器元件的装置
公开(公告)号：US07079331B2
公开(公告)日：2006-07-18
申请号：US11109316
申请日：2005-04-19
申请人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
发明人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
IPC分类号： G02B7/02 , G02B27/10 , G02B27/14 , G02B7/18 , G02F1/01
CPC分类号： G03F7/70825 , G02B7/008 , G02B7/1805 , G03F7/70891
摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
摘要翻译：本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的外壳中的至少一个支撑元件。分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在分束器元件

13. 发明申请

US20050248858A1 Device for holding a beam splitter element 失效
标题翻译：用于固定分束器元件的装置
公开(公告)号：US20050248858A1
公开(公告)日：2005-11-10
申请号：US11109316
申请日：2005-04-19
申请人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
发明人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
IPC分类号： G02B7/00 , G02B7/18 , G03F7/20 , G02B5/30 , G02B7/02 , G02B27/28
CPC分类号： G03F7/70825 , G02B7/008 , G02B7/1805 , G03F7/70891
摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
摘要翻译：本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的壳体中的至少一个支撑元件。分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在分束器元件

14. 发明授权

US07310187B2 Projection objective, especially for microlithography, and method for adjusting a projection objective 有权
公开(公告)号：US07310187B2
公开(公告)日：2007-12-18
申请号：US11783966
申请日：2007-04-13
申请人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
发明人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
IPC分类号： G02B3/00 , G02B15/02
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70341
摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature. The method comprises varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and preferably axial displacement of the last optical element in order to set a suitable working distance.

15. 发明申请

US20070188881A1 Projection objective, especially for microlithography, and method for adjusting a projection objective 有权
标题翻译：投影目标，特别是微光刻法，以及调整投影物镜的方法
公开(公告)号：US20070188881A1
公开(公告)日：2007-08-16
申请号：US11783966
申请日：2007-04-13
申请人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
发明人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
IPC分类号： G02B3/00
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70341
摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature. The method comprises varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and preferably axial displacement of the last optical element in order to set a suitable working distance.
摘要翻译：调整投影物镜的方法允许投影物镜在浸没配置和干燥配置之间进行调节，而在系统中几乎没有干预，因此可任选地用作浸没物镜或干物镜。投影物镜具有沿着投影物镜的光轴布置的多个光学元件，光学元件包括跟随物平面的第一组光学元件和紧邻第一组的最后一个光学元件，邻近于图像并且限定投影物镜的离开像面的工作距离处的出射表面。最后一个光学元件基本上没有屈光力并且没有曲率或仅有轻微的曲率。该方法包括改变最后一个光学元件的厚度，通过引入或移除浸没介质来改变出射表面和图像平面之间的空间的折射率，优选地最后一个光学元件的轴向位移，以便设定合适的工作距离

16. 发明申请

US20080151211A1 MULTIPLE-USE PROJECTION SYSTEM 审中-公开
标题翻译：多用途投影系统
公开(公告)号：US20080151211A1
公开(公告)日：2008-06-26
申请号：US11951746
申请日：2007-12-06
申请人： Winfried Kaiser , Wilhelm Ulrich , Heiko Feldmann , Aurelian Dodoc
发明人： Winfried Kaiser , Wilhelm Ulrich , Heiko Feldmann , Aurelian Dodoc
IPC分类号： G03B27/72
CPC分类号： G03F7/70341 , G03F7/70066 , G03F7/7025
摘要： Projection exposure methods and systems for exposing substrates are disclosed. The methods and systems feature projection objectives capable of multiple exposure configurations having different image side numerical apertures and different image field sizes.
摘要翻译：公开了用于曝光衬底的投影曝光方法和系统。该方法和系统具有能够具有不同图像侧数值孔径和不同图像场尺寸的多种曝光配置的投影物镜。

17. 发明授权

US07209292B2 Projection objective, especially for microlithography, and method for adjusting a projection objective 有权
标题翻译：投影目标，特别是微光刻法，以及调整投影物镜的方法
公开(公告)号：US07209292B2
公开(公告)日：2007-04-24
申请号：US10448339
申请日：2003-05-30
申请人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
发明人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
IPC分类号： G02B3/00 , G02B15/02 , G02B27/02
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70341
摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration. The projection objective includes optical elements arranged along an optical axis thereof, which include a first group of elements following the object plane and a last optical element following the first group, which is arranged near the image plane. The last optical element defines an exit surface of the projection objective, which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no or only slight curvature. The method includes varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and axially displacing the last optical element to set a working distance.
摘要翻译：调整投影物镜的方法允许在浸入构型和干构型之间调节投影物镜。投影物镜包括沿其光轴布置的光学元件，其包括在物平面之后的第一组元件和位于第一组之后的最后一个光学元件，其位于图像平面附近。最后一个光学元件限定投影物镜的出射表面，该出射表面设置在距离像平面的工作距离处。最后的光学元件基本上没有屈光力并且没有或仅有微小的曲率。该方法包括通过引入或去除浸没介质来改变最后一个光学元件的厚度，改变出射表面和图像平面之间的空间的折射率，以及轴向移动最后一个光学元件以设定工作距离。

18. 发明授权

US06453005B2 SiO2-coated mirror substrate for EUV 有权
标题翻译：用于EUV的SiO2涂层镜面基板
公开(公告)号：US06453005B2
公开(公告)日：2002-09-17
申请号：US09756018
申请日：2001-01-05
申请人： Winfried Kaiser
发明人： Winfried Kaiser
IPC分类号： G21K102
CPC分类号： B82Y10/00 , G21K1/062 , G21K2201/061 , G21K2201/062 , G21K2201/067
摘要： Mirror substrate consisting of crystal, especially silicon crystal, on which an amorphous layer, especially a quartz glass layer, is applied.
摘要翻译：由晶体特别是硅晶体组成的镜面衬底，其上施加有非晶层，特别是石英玻璃层。

19. 发明授权

US5155908A Method for assembling a one-piece rotor system and a pump ring for a two-stage vacuum pump 失效
标题翻译：用于组装双级真空泵的单级转子系统和泵环的方法
公开(公告)号：US5155908A
公开(公告)日：1992-10-20
申请号：US692130
申请日：1991-04-26
申请人： Lutz Arndt , Winfried Kaiser , Peter Muller
发明人： Lutz Arndt , Winfried Kaiser , Peter Muller
IPC分类号： F01C21/10 , F04C23/00 , F04C25/02
CPC分类号： F01C21/10 , F04C23/001 , Y10T29/49236 , Y10T29/49245
摘要： The invention relates to a method of making a pump ring for a two-stage vacuum pump (1) with a one-piece rotor system (14) having three sections (14a, b, c), whose end sections (14a and 14c form the two pumping stages and whose middle section (14b) forms an intermediate bearing, the diameters of the bearing section (14band of the rotor section (14a) forming the forepumping stage being equal. To reduce the tolerances that occur it is proposed that two bores be made in a single set-up from one end of a substantially cylindrical workpiece, the one forming the anchor contact (51) of the forepumping stage as well as the bearing bore (12) and the other forming the anchor contact (52) of the high-vacuum stage, and that before or after these bores aremade, additional bores (11, 13) are made in order to form the pump chambers (21, 17).
摘要翻译：本发明涉及一种制造两级真空泵（1）的泵环的方法，该泵环具有一个具有三个部分（14a，b，c）的转子系统（14），其末端部分（14a和14c形成两个泵送阶段，其中间部分（14b）形成中间轴承，轴承部分的直径（形成前提段的转子部分的14带）相等，为了减少发生的公差，提出两个孔从一个基本上圆柱形的工件的一端制成一个装置，一个形成前进台的锚定接触件（51）以及轴承孔（12），另一个形成锚定接触件（52）高真空级，并且在这些孔之前或之后，制成附加的孔（11,13）以形成泵室（21,17）。

20. 发明授权

US4963076A Radial blower with resiliently mounted bearing holders 失效
标题翻译：径向鼓风机带有弹性安装的轴承座
公开(公告)号：US4963076A
公开(公告)日：1990-10-16
申请号：US332867
申请日：1989-04-03
申请人： Frank Fleischmann , Hans-Peter Kabelitz , Winfried Kaiser
发明人： Frank Fleischmann , Hans-Peter Kabelitz , Winfried Kaiser
IPC分类号： F04D29/056 , F04D25/06 , F04D29/04 , F04D29/059 , F04D29/62 , F04D29/66
CPC分类号： F04D29/059 , F04D25/06 , F04D29/624 , F04D29/626 , F04D29/668
摘要： Rotating unit including a shaft, a blower rotor, and a motor armature is removable as a unit from the motor housing. The diameter of a first resiliently mounted bearing holder toward the blower rotor is larger than the diameter of the armature, which in turn is larger than the diameter of a second resiliently mounted bearing holder remote from the blower rotor.
摘要翻译：包括轴，鼓风机转子和电动机电枢的旋转单元可作为来自电动机壳体的单元而被移除。第一弹性安装的轴承保持器朝向鼓风机转子的直径大于电枢的直径，该直径大于远离鼓风机转子的第二弹性安装的轴承保持器的直径。

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