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11. 发明授权

US4026004A Method of forming refrigerator liner and shelf supports 失效
标题翻译：形成冰箱内胆和货架支架的方法
公开(公告)号：US4026004A
公开(公告)日：1977-05-31
申请号：US637577
申请日：1975-12-04
申请人： Robert Edward Fields , Charles Walter Haag , Robert Edward Lindenschmidt
发明人： Robert Edward Fields , Charles Walter Haag , Robert Edward Lindenschmidt
IPC分类号： B29C69/00 , F25D23/06 , B23P3/00 , B23P25/00
CPC分类号： F25D23/067 , B29C47/0009 , B29C69/00 , B29C47/0019 , B29K2105/04 , Y10S220/902 , Y10T29/49885
摘要： A method of forming an insulated cabinet wall structure wherein a body of insulation is foamed in situ against an outer face of a liner sheet strip to define a laminate. A plurality of holes are formed in the laminate extending through the liner and into the insulation, and a plurality of supports are installed on the laminate by insertion of a mounting portion thereof in the mounting holes. The laminate with the supports secured thereto is subsequently formed into a preselected cabinet configuration to define a chamber with the supports projecting inwardly from the liner into the chamber. This structure may then be inserted into a formed outer cabinet.
摘要翻译：一种形成绝缘柜壁结构的方法，其中绝缘本体原位发生在衬垫片带的外表面上以限定层压体。在层叠体中形成有多个通过衬垫延伸并进入绝缘体的孔，并且通过将其安装部分插入到安装孔中而将多个支撑件安装在层压板上。随后固定有支撑件的层压板随后形成为预选的机柜结构以限定具有从衬套向内突出到室中的支撑件的室。然后可以将该结构插入形成的外柜中。

12. 发明授权

US4006947A Liner and insulation structure for refrigeration apparatus 失效
标题翻译：制冷设备衬板和绝缘结构
公开(公告)号：US4006947A
公开(公告)日：1977-02-08
申请号：US629874
申请日：1975-11-07
申请人： Charles Walter Haag , Samuel Joseph Pearson
发明人： Charles Walter Haag , Samuel Joseph Pearson
IPC分类号： B65D81/38 , F25D23/06 , F25D17/04 , B65D25/14
CPC分类号： B65D81/3823 , F25D23/063 , F25D23/066 , F25D2400/04 , Y10S220/902
摘要： A liner and insulation structure for a refrigeration apparatus is particularly adapted for use where the bottom wall of the refrigeration apparatus cabinet defines an irregular, nonflat surface. A separate bottom liner and insulating member is formed so as to overlie the irregular cabinet bottom wall and includes an upstanding wall portion about at least a portion of its periphery. The remainder of the liner and insulation structure for the refrigeration apparatus is formed by variously cutting and folding a laminate which includes an inner sheet liner portion and an outer insulation portion so as to define an upright wall having a lower edge portion which rests on the upstanding wall portion of the bottom liner and insulating member.
摘要翻译：用于制冷装置的衬套和绝缘结构特别适用于制冷装置机柜的底壁限定不规则的非平坦表面的场合。形成单独的底衬和绝缘构件，以便覆盖不规则的机柜底壁并且包括围绕其周边的至少一部分的直立的壁部分。用于制冷装置的衬套和绝缘结构的其余部分通过不同地切割和折叠包括内片衬垫部分和外绝缘部分的层压体形成，以便限定具有下边缘部分的直立壁，其保持在直立上底部衬套和绝缘构件的壁部分。

13. 发明授权

US07678239B2 Sliding anode magnetron sputtering source 失效
标题翻译：滑动阳极磁控溅射源
公开(公告)号：US07678239B2
公开(公告)日：2010-03-16
申请号：US10912365
申请日：2004-07-23
申请人： Walter Haag , Pius Gruenenfelder
发明人： Walter Haag , Pius Gruenenfelder
IPC分类号： C23C14/35
CPC分类号： H01J37/3408 , H01J37/3423
摘要： A magnetron sputtering source includes a plurality of electrodes and a switching circuit. The switching circuit sequentially connects each of the plurality of electrodes to a ground reference, making it anodic, while connecting the remaining of the plurality of electrodes as cathodes. A method of operating the magnetron sputtering source includes steps of: providing a plurality of target arrangements; causing each of the plurality of target arrangements to act as a cathode; and sequentially causing each of the plurality of cathodes to temporarily act as an anode.
摘要翻译：磁控溅射源包括多个电极和开关电路。开关电路将多个电极中的每一个顺序地连接到接地基准，使其为阳极，同时将多个电极中的剩余电极连接为阴极。操作磁控溅射源的方法包括以下步骤：提供多个目标装置; 使得所述多个目标装置中的每一个用作阴极; 并顺序地使多个阴极中的每一个临时充当阳极。

14. 发明申请

US20070009670A9 Sputter method or device for the production of natural voltage optimized coatings 审中-公开
标题翻译：用于生产自然电压优化涂层的溅射方法或装置
公开(公告)号：US20070009670A9
公开(公告)日：2007-01-11
申请号：US10515792
申请日：2003-04-30
申请人： Walter Haag
发明人： Walter Haag
IPC分类号： B05D1/04
CPC分类号： C23C14/34 , H01J37/34
摘要： The invention relates to a method or a device for the production of especially natural voltage optimized coatings, especially low tensile stress coatings, by means of sputter processes, wherein a bipolar voltage shape is produced on the target (cathode). The positive voltage pulse is adjusted on the target in such a way that a bias voltage on the substrate is thus replaced.
摘要翻译：本发明涉及通过溅射工艺生产特别是自然电压优化的涂层，特别是低拉伸应力涂层的方法或装置，其中在目标（阴极）上产生双极电压形状。在目标上调整正电压脉冲，使得由此更换衬底上的偏置电压。

15. 发明授权

US06776881B2 Magnetron atomization source and method of use thereof 失效
标题翻译：磁控管雾化源及其使用方法
公开(公告)号：US06776881B2
公开(公告)日：2004-08-17
申请号：US10253429
申请日：2002-09-25
申请人： Pius Gruenenfelder , Hans Hirscher , Urs Schwendener , Walter Haag
发明人： Pius Gruenenfelder , Hans Hirscher , Urs Schwendener , Walter Haag
IPC分类号： C23C1435
CPC分类号： H01J37/3405
摘要： For optimizing the yield of atomized-off material on a magnetron atomization source, a process space, on the source side, is predominantly walled by the atomization surface of the target body. The magnetron atomization source has a target body with a mirror-symmetrical, concavely constructed atomization surface with respect to at least one plane and a magnetic circuit arrangement operable to generate a magnetic field over the atomization surface. The magnetic circuit arrangement includes an anode arrangement, a receiving frame which extends around an edge of the target body and is electrically insulated with respect thereto. The receiving frame has a receiving opening for at least one workpiece to be coated. The magnetron source can be used to provide storage disks, such as CDs, with an atomization coating.
摘要翻译：为了优化磁控管雾化源上的雾化物质的产率，源侧的处理空间主要由靶体的雾化表面壁化。磁控管雾化源具有相对于至少一个平面具有镜对称的，凹入构造的雾化表面的目标体，以及可操作以在雾化表面上产生磁场的磁路布置。磁路装置包括阳极装置，接收框架，其围绕目标主体的边缘延伸并相对于其电绝缘。接收框架具有用于待涂覆的至少一个工件的接收开口。磁控管源可用于提供具有雾化涂层的存储盘，例如CD。

16. 发明授权

US06682637B2 Magnetron sputter source 有权
标题翻译：磁控溅射源
公开(公告)号：US06682637B2
公开(公告)日：2004-01-27
申请号：US10161862
申请日：2002-06-04
申请人： Bernd Heinz , Martin Dubs , Thomas Eisenhammer , Pius Grunenfelder , Walter Haag , Stanislav Kadlec , Siegfried Krassnitzer
发明人： Bernd Heinz , Martin Dubs , Thomas Eisenhammer , Pius Grunenfelder , Walter Haag , Stanislav Kadlec , Siegfried Krassnitzer
IPC分类号： C23C1435
CPC分类号： H01J37/3408
摘要： To optimize the yield of sputtered-off material as well as the service life of the target on a magnetron source, in which simultaneously good attainable distribution values of the layer on the substrate, stable over the entire target service life, a concave sputter face 20 in a configuration with small target-substrate distance d is combined with a magnet system to form the magnetron electron trap in which the outer pole 3 of the magnetron electron trap is disposed stationarily and an eccentrically disposed inner pole 4 with a second outer pole part 11 is developed rotatable about the central source axis 6.
摘要翻译：为了优化溅射材料的产率以及靶在磁控管源上的使用寿命，其中在基板上的层的同时良好的可获得的分布值在整个目标使用寿命上是稳定的，凹形溅射面20 在具有小的目标基板距离d的构造中，与磁体系统组合以形成磁控管电子阱，磁控管电子阱的外极3固定在该磁控管电子阱中，偏心地设置有第二外极部11的内极4 可围绕中心源轴线6旋转。

17. 发明授权

US06540883B1 Magnetron sputtering source and method of use thereof 失效
标题翻译：磁控溅射源及其使用方法
公开(公告)号：US06540883B1
公开(公告)日：2003-04-01
申请号：US09243814
申请日：1999-02-03
申请人： Pius Gruenenfelder , Hans Hirscher , Walter Haag , Walter Albertin
发明人： Pius Gruenenfelder , Hans Hirscher , Walter Haag , Walter Albertin
IPC分类号： C23C1400
CPC分类号： H01J37/3408
摘要： A magnetron sputtering source and a method of use thereof on which the sputtering source has at least two toroidal magnetron electron taps each defining a maximum of a magnetic field strength component in a radial direction along a surface of the sputtering source. Thereby, from each one of a ring zone on a first smaller radius R1F and a second larger radius R2F, a plane of the workpiece in a holder facing the sputtering source has a corresponding distance d1 and d2. A value d assumes all possible values of d1 and d2. In particular, 0.8≦(R2F−R1F)/d≦3.0 and preferably 1.0≦(R2F−R1F)/d≦2.2 The arrangement defines a sputtering geometry with the process space with a defined dual concentric narrow plasma discharge with correspondingly defined concentrated plasma inclusion.
摘要翻译：一种磁控溅射源及其使用方法，溅射源具有至少两个环形磁控管电子抽头，每个限定了沿溅射源的表面沿径向方向的最大磁场强度分量。因此，从第一较小半径R1F和第二较大半径R2F上的环形区域的每一个处，面对溅射源的保持器中的工件的平面具有对应的距离d1和d2。值d假定d1和d2的所有可能值。特别地，该装置定义了具有具有相应限定的浓缩等离子体夹杂物的限定的双同心窄等离子体放电的工艺空间的溅射几何形状。

18. 发明授权

US06454920B1 Magnetron sputtering source 失效
公开(公告)号：US06454920B1
公开(公告)日：2002-09-24
申请号：US09888923
申请日：2001-06-25
申请人： Walter Haag , Pius Grunenfelder , Urs Schwendener , Markus Schlegel , Siegfried Krassnitzer
发明人： Walter Haag , Pius Grunenfelder , Urs Schwendener , Markus Schlegel , Siegfried Krassnitzer
IPC分类号： C23C1434
CPC分类号： H01J37/3408 , C23C14/35 , H01J37/3452 , H01J2237/3325
摘要： A sputter source has at least two electrically mutually isolated stationar bar-shaped target arrangements mounted one alongside the other and separated by respective slits. Each of the target arrangements includes a respective electric pad so that each target arrangement may be operated electrically independently from the other target arrangement. Each target arrangement also has a controlled magnet arrangement for generating a time-varying magnetron field upon the respective target arrangement. The magnet arrangements may be controlled independently from each others. The source further has an anode arrangement with anodes alongside and between the target arrangements and/or along smaller sides of the target arrangements.

19. 发明授权

US06337001B1 Process for sputter coating, a sputter coating source, and sputter coating apparatus with at least one such source 失效
标题翻译：用于溅射涂覆的方法，溅射涂覆源和具有至少一个这样的源的溅射涂覆装置
公开(公告)号：US06337001B1
公开(公告)日：2002-01-08
申请号：US08895451
申请日：1997-07-16
申请人： Walter Haag , Pius Gruenenfelder
发明人： Walter Haag , Pius Gruenenfelder
IPC分类号： C23C1434
CPC分类号： C23C14/345 , C23C14/0036 , C23C14/228 , C23C14/3407 , C23C14/3464 , C23C14/35 , C23C14/352 , H01J37/34 , H01J37/342 , H01J37/3423
摘要： Two mutually opposite sputtering surfaces of at least one target are self-enclosed such that a closed loop gap, and consequently a closed loop plasma discharge space, is formed. A gas flow is created between the sputtering surface and directed against workpieces. No gap ends exist on the closed loop gap so that electrons that move along and within the plasma loop can recirculate until most of their energy has been transferred through impacts to the gas particles.
摘要翻译：至少一个靶的两个相互相对的溅射表面是自封闭的，使得形成闭环间隙，并因此形成闭环等离子体放电空间。在溅射表面和工件之间产生气流。在闭环间隙上不存在间隙，使得沿着等离子体环路内部和内部的电子可以再循环，直到其大部分能量已经通过冲击传递到气体颗粒。

20. 发明授权

US06284106B1 Method of producing flat panels 有权
标题翻译：平板生产方法
公开(公告)号：US06284106B1
公开(公告)日：2001-09-04
申请号：US09587543
申请日：2000-06-05
申请人： Walter Haag , Pius Grunenfelder , Urs Schwendener , Markus Schlegel , Siegfried Krassnitzer
发明人： Walter Haag , Pius Grunenfelder , Urs Schwendener , Markus Schlegel , Siegfried Krassnitzer
IPC分类号： C23C1434
CPC分类号： H01J37/3408 , C23C14/35 , H01J37/3452 , H01J2237/3325
摘要： A method for producing flat panels for TFT or plasma display applications includes forming a sputter source within a sputter coating chamber, the source having at least two electrically mutually isolated stationery bar-shaped target arrangements. A controlled magnet arrangement provided under each target with a time-varying magnetron field.
摘要翻译：用于制造用于TFT或等离子体显示器应用的平板的方法包括在溅射涂覆室内形成溅射源，该源具有至少两个电互相隔离的文具棒形目标布置。在每个目标下设置有时变磁控管场的受控磁体布置。

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