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    • 12. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 半导体发光器件及其制造方法
    • US20100019257A1
    • 2010-01-28
    • US11815759
    • 2006-02-07
    • Mitsuhiko SakaiAtsushi YamaguchiKen NakaharaMasayuki SonobeTsuyoshi Tsutsui
    • Mitsuhiko SakaiAtsushi YamaguchiKen NakaharaMasayuki SonobeTsuyoshi Tsutsui
    • H01L33/00
    • H01L33/20H01L33/0079H01L33/60
    • There are provided a nitride semiconductor light emitting device having a structure enabling enhanced external quantum efficiency by effectively taking out light which is apt to repeat total reflection within a semiconductor lamination portion and a substrate and attenuate, and a method for manufacturing the same. A semiconductor lamination portion (6) including a first conductivity type layer and a second conductivity type layer, made of nitride semiconductor, is provided on a surface of the substrate (1) made of, for example, sapphire or the like. A first electrode (for example, p-side electrode (8)) is provided electrically connected to the first conductivity type layer (for example, p-type layer (5)) on a surface side of the semiconductor lamination portion (6), and a second electrode (for example, n-side electrode (9)) is provided electrically connected to the second conductivity type layer (for example, n-type layer (3)). A part of the semiconductor lamination portion (6) is removed at a surrounding region of a chip of the semiconductor lamination portion (6) by etching so that column portions (6a) stand side by side by leaving the semiconductor lamination portion without etching, and the n-type layer (3) expose around the column portions (6a).
    • 提供了具有通过有效地取出在半导体层叠部分和衬底内易于重复全反射的光而衰减的能够提高外部量子效率的结构的氮化物半导体发光器件及其制造方法。 在由例如蓝宝石等制成的基板(1)的表面上设置包括由氮化物半导体构成的第一导电型层和第二导电型层的半导体层叠部(6)。 第一电极(例如,p侧电极(8))在半导体层叠部分(6)的表面侧电连接到第一导电类型层(例如,p型层(5)), 并且第二电极(例如,n侧电极(9))被设置为电连接到第二导电类型层(例如,n型层(3))。 通过蚀刻在半导体层叠部(6)的芯片的周围区域去除半导体层叠部(6)的一部分,使得柱部(6a)不经蚀刻而离开半导体层叠部而并排放置,并且 n型层(3)围绕柱部(6a)露出。
    • 13. 发明授权
    • Method of manufacturing semiconductor device and mask for forming thin film pattern
    • 制造半导体器件的方法和用于形成薄膜图案的掩模
    • US06265324B1
    • 2001-07-24
    • US09315234
    • 1999-05-20
    • Tsuyoshi TsutsuiShunji NakataYasuo MiyanoKoutarou Ogura
    • Tsuyoshi TsutsuiShunji NakataYasuo MiyanoKoutarou Ogura
    • H01L2131
    • C23C14/042
    • A mask 11 for vapor deposition is made of glass. Through-holes 15 are formed in the glass mask 11 so that they make a prescribed pattern on the surface of a semiconductor substrate 4. The peripheral wall of the through-hole is tapered so that the opening face 15b from which evaporated atoms are introduced is larger than the opening face 15a facing the deposition surface of the semiconductor substrate. The evaporated metal atoms having flied aslant toward the opening face 15b from which the evaporated atoms are introduced can pass through the through-hole 14 so that the evaporated metal atoms are deposited on the deposition surface of the semiconductor substrate. A desired thin film pattern inclusive of an electrode pattern can be easily formed on the surface of a semiconductor substrate, thereby improving the production yield of a semiconductor device.
    • 用于气相沉积的掩模11由玻璃制成。 在玻璃掩模11中形成通孔15,使得它们在半导体衬底4的表面上形成规定的图案。通孔的周壁是锥形的,使得引入蒸发原子的开口面15b为 大于面向半导体衬底的沉积表面的开口面15a。 向被引入蒸发原子的开口面15b倾斜倾斜的蒸发金属原子可以通过通孔14,使得蒸发的金属原子沉积在半导体衬底的沉积表面上。 可以容易地在半导体衬底的表面上形成包括电极图案的期望的薄膜图案,从而提高半导体器件的制造成品率。
    • 19. 发明授权
    • Method of producing semiconductor light-emitting element
    • 半导体发光元件的制造方法
    • US06395572B1
    • 2002-05-28
    • US09518504
    • 2000-03-03
    • Tsuyoshi TsutsuiKotaro Ogura
    • Tsuyoshi TsutsuiKotaro Ogura
    • H01L2100
    • H01L33/22
    • Semiconductor light-emitting elements are produced by providing a wafer substrate of GaP, epitaxially growing on this substrate a semiconductor layered structure including an n-type layer and a p-type layer of GaP for providing a light-emitting layer, forming top electrodes on the semiconductor layered structure each over a portion of the area corresponding to one of the chips into which the substrate is to be later divided, forming a bottom electrode on the bottom surface of the substrate, dicing the wafer substrate into the individual chips, and thereafter carrying out a surface-roughening process on externally exposed portions of the semiconductor structure by means of hydrochloric acid. Each of the top electrodes is of a three-layer structure with a contact metal layer which may be of an alloy of Au and makes an ohmic contact with the GaP of the semiconductor layered structure, a Mo layer on the contact metal layer and an Au layer on the Mo layer.
    • 半导体发光元件是通过提供GaP晶片衬底,在该衬底上外延生长的半导体层状结构,包括n型层和用于提供发光层的GaP的p型层,形成顶部电极 将半导体分层结构分别与对应于要分离基板的芯片之一对应的区域的一部分上,在基板的底面上形成底部电极,将晶片基板切割成各个芯片,之后 通过盐酸对半导体结构的外露部分进行表面粗糙化处理。 每个顶电极具有三层结构,其接触金属层可以是Au的合金,并与半导体层状结构的GaP,欧姆接触,接触金属层上的Mo层和Au Mo层上。
    • 20. 发明授权
    • Method for manufacturing semiconductor light emitting device
    • 半导体发光元件的制造方法
    • US06248607B1
    • 2001-06-19
    • US09391624
    • 1999-09-07
    • Tsuyoshi Tsutsui
    • Tsuyoshi Tsutsui
    • H01L2100
    • H01L33/0095H01L33/007Y10S438/906Y10S438/909
    • In a method for manufacturing semiconductor light emitting device, when a gallium nitride based compound semiconductor layers which include at least an n-type layer and p-type layer and which form a light emitting layer, are laminated on a substrate and heat treatment is performed for activation of the p-type layer of the laminated semiconductor layers, the heat treatment is performed under an atmosphere including oxygen. With this arrangement, the heat treatment for activating the p-type layer of the laminated semiconductor layers comprising gallium nitride based compound semiconductor can be performed in a short time and moreover to reliably perform activation.
    • 在制造半导体发光器件的方法中,当将至少包含n型层和p型层并形成发光层的氮化镓基化合物半导体层层叠在基板上并进行热处理时 为了激活层叠半导体层的p型层,在包括氧的气氛下进行热处理。 通过这种布置,可以在短时间内执行用于激活包含氮化镓基化合物半导体的层叠半导体层的p型层的热处理,而且可靠地进行激活。