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    • 12. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 半导体发光器件及其制造方法
    • US20100019257A1
    • 2010-01-28
    • US11815759
    • 2006-02-07
    • Mitsuhiko SakaiAtsushi YamaguchiKen NakaharaMasayuki SonobeTsuyoshi Tsutsui
    • Mitsuhiko SakaiAtsushi YamaguchiKen NakaharaMasayuki SonobeTsuyoshi Tsutsui
    • H01L33/00
    • H01L33/20H01L33/0079H01L33/60
    • There are provided a nitride semiconductor light emitting device having a structure enabling enhanced external quantum efficiency by effectively taking out light which is apt to repeat total reflection within a semiconductor lamination portion and a substrate and attenuate, and a method for manufacturing the same. A semiconductor lamination portion (6) including a first conductivity type layer and a second conductivity type layer, made of nitride semiconductor, is provided on a surface of the substrate (1) made of, for example, sapphire or the like. A first electrode (for example, p-side electrode (8)) is provided electrically connected to the first conductivity type layer (for example, p-type layer (5)) on a surface side of the semiconductor lamination portion (6), and a second electrode (for example, n-side electrode (9)) is provided electrically connected to the second conductivity type layer (for example, n-type layer (3)). A part of the semiconductor lamination portion (6) is removed at a surrounding region of a chip of the semiconductor lamination portion (6) by etching so that column portions (6a) stand side by side by leaving the semiconductor lamination portion without etching, and the n-type layer (3) expose around the column portions (6a).
    • 提供了具有通过有效地取出在半导体层叠部分和衬底内易于重复全反射的光而衰减的能够提高外部量子效率的结构的氮化物半导体发光器件及其制造方法。 在由例如蓝宝石等制成的基板(1)的表面上设置包括由氮化物半导体构成的第一导电型层和第二导电型层的半导体层叠部(6)。 第一电极(例如,p侧电极(8))在半导体层叠部分(6)的表面侧电连接到第一导电类型层(例如,p型层(5)), 并且第二电极(例如,n侧电极(9))被设置为电连接到第二导电类型层(例如,n型层(3))。 通过蚀刻在半导体层叠部(6)的芯片的周围区域去除半导体层叠部(6)的一部分,使得柱部(6a)不经蚀刻而离开半导体层叠部而并排放置,并且 n型层(3)围绕柱部(6a)露出。
    • 13. 发明授权
    • Method of manufacturing semiconductor device and mask for forming thin film pattern
    • 制造半导体器件的方法和用于形成薄膜图案的掩模
    • US06265324B1
    • 2001-07-24
    • US09315234
    • 1999-05-20
    • Tsuyoshi TsutsuiShunji NakataYasuo MiyanoKoutarou Ogura
    • Tsuyoshi TsutsuiShunji NakataYasuo MiyanoKoutarou Ogura
    • H01L2131
    • C23C14/042
    • A mask 11 for vapor deposition is made of glass. Through-holes 15 are formed in the glass mask 11 so that they make a prescribed pattern on the surface of a semiconductor substrate 4. The peripheral wall of the through-hole is tapered so that the opening face 15b from which evaporated atoms are introduced is larger than the opening face 15a facing the deposition surface of the semiconductor substrate. The evaporated metal atoms having flied aslant toward the opening face 15b from which the evaporated atoms are introduced can pass through the through-hole 14 so that the evaporated metal atoms are deposited on the deposition surface of the semiconductor substrate. A desired thin film pattern inclusive of an electrode pattern can be easily formed on the surface of a semiconductor substrate, thereby improving the production yield of a semiconductor device.
    • 用于气相沉积的掩模11由玻璃制成。 在玻璃掩模11中形成通孔15,使得它们在半导体衬底4的表面上形成规定的图案。通孔的周壁是锥形的,使得引入蒸发原子的开口面15b为 大于面向半导体衬底的沉积表面的开口面15a。 向被引入蒸发原子的开口面15b倾斜倾斜的蒸发金属原子可以通过通孔14,使得蒸发的金属原子沉积在半导体衬底的沉积表面上。 可以容易地在半导体衬底的表面上形成包括电极图案的期望的薄膜图案,从而提高半导体器件的制造成品率。
    • 15. 发明授权
    • Method for manufacturing semiconductor light emitting device
    • 半导体发光元件的制造方法
    • US06197609B1
    • 2001-03-06
    • US09391625
    • 1999-09-07
    • Tsuyoshi TsutsuiMasayuki SonobeNorikazu Ito
    • Tsuyoshi TsutsuiMasayuki SonobeNorikazu Ito
    • H01L2100
    • H01L33/0095
    • Semiconductor layers forming a light emitting layer and including an n-type layer and p-type layer are formed onto a substrate, then the n-type layer is exposed by removing a part of the laminated semiconductor layers. p-side electrode and n-side electrode are then respectively formed on the p-type layer on the surface of the laminated semiconductor layers and the exposed n-type layer, respectively in an electrically connected manner, followed by dicing of the substrate from the exposed n-type layer to the substrate at portions at which breaking of the substrate is performed. Then a protection film is provided on the entire surface of the laminated semiconductor layers as to expose the p-side and n-side electrodes, and breaking of the substrate is performed at dicing portions into individual chips. Consequently, semiconductor light emitting devices can be obtained by breaking the wafer into individual chips without etching the protection film and without damaging the protection film at the time of breaking. Also, the light emitting devices can be improved.
    • 形成发光层并且包括n型层和p型层的半导体层形成在衬底上,然后通过去除一部分层叠半导体层而露出n型层。 p侧电极和n侧电极分别以电连接的方式分别形成在层叠半导体层的表面上的p型层和暴露的n型层上,接着从基板 在进行基板断裂的部分,将裸露的n型层涂覆在基板上。 然后在层叠半导体层的整个表面上设置保护膜,以露出p侧和n侧电极,并且在切割部分将基板的断裂进行到单独的芯片。 因此,半导体发光器件可以通过将晶片分解为单独的芯片而不蚀刻保护膜并且在破坏时不损坏保护膜来获得。 而且,可以改善发光器件。
    • 17. 发明授权
    • Semiconductor light emitting device and method of manufacturing the same
    • 半导体发光器件及其制造方法
    • US06191437B1
    • 2001-02-20
    • US09381285
    • 1999-09-21
    • Masayuki SonobeShunji NakataTsuyoshi TsutsuiNorikazu Itoh
    • Masayuki SonobeShunji NakataTsuyoshi TsutsuiNorikazu Itoh
    • H01L3300
    • H01L33/32H01L33/007
    • An n-type layer (3) and a p-type layer (5) which are made of a gallium nitride based compound semiconductor are provided on a substrate (1) so that a light emitting layer forming portion (10) for forming a light emitting layer is provided. A gallium nitride based compound semiconductor layer containing oxygen is used for at least one layer of the light emitting layer forming portion (10). In the case where a buffer layer (2) made of the gallium nitride based compound semiconductor or aluminum nitride is provided between the substrate (1) and the light emitting layer forming portion (10), the buffer layer (2) and/or at least one layer of the light emitting layer forming portion (10) may contain oxygen. By such a structure, crystal defects of the semiconductor layer of the light emitting layer forming portion (10) can be decreased and a luminance can highly be enhanced. Thus, it is possible to obtain a blue color type semiconductor light emitting device having a high luminance.
    • 在基板(1)上设置由氮化镓类化合物半导体构成的n型层(3)和p型层(5),使得形成光的发光层形成部(10) 提供发光层。 含有氧的氮化镓系化合物半导体层用于至少一层发光层形成部(10)。 在基板(1)和发光层形成部分(10)之间设置由氮化镓基化合物半导体或氮化铝制成的缓冲层(2)的情况下,缓冲层(2)和/或在 发光层形成部(10)的至少一层可以含有氧。 通过这样的结构,可以减少发光层形成部分(10)的半导体层的晶体缺陷,并且可以高度提高亮度。 因此,可以获得具有高亮度的蓝色型半导体发光器件。
    • 18. 发明授权
    • Semiconductor light emitting device
    • 半导体发光器件
    • US6060730A
    • 2000-05-09
    • US110940
    • 1998-07-07
    • Tsuyoshi Tsutsui
    • Tsuyoshi Tsutsui
    • H01L21/28H01L33/32H01L33/40H01L29/78
    • H01L33/32H01L33/025
    • There is provided a semiconductor laminated portion in which gallium nitride based compound semiconductor layers including an n-type layer and a p-type layer are laminated for forming an emitting layer on a substrate. Then, an n-side electrode and a p-side electrode are provided so as to be electrically connected to the n-type layer and p-type layer of the semiconductor laminated portion, respectively. The n-type layer includes at least an n-type first layer and an n.sup.+ -type second layer so that the carrier concentration of the portion to be provided with the n-side electrode is higher than the carrier concentration of the portion in contact with the emitting layer. Consequently, the ohmic contact characteristics of the n-type layer and n-side electrode are improved to reduce a forward voltage, resulting in a semiconductor light emitting device with high light emitting efficiency.
    • 提供了一种半导体层叠部分,其中层叠有包括n型层和p型层的氮化镓基化合物半导体层,以在衬底上形成发光层。 然后,分别设置n侧电极和p侧电极,以与半导体层叠部分的n型层和p型层电连接。 n型层至少包括n型第一层和n +型第二层,使得设置有n侧电极的部分的载流子浓度高于与接触的部分的载流子浓度 发光层。 因此,提高了n型层和n侧电极的欧姆接触特性以减小正向电压,从而导致发光效率高的半导体发光器件。