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    • 11. 发明授权
    • Method of forming a metal silicide film
    • 形成金属硅化物膜的方法
    • US5047111A
    • 1991-09-10
    • US110580
    • 1987-10-16
    • Akitoshi IshizakaYasuhiro ShirakiTakashi Ohshima
    • Akitoshi IshizakaYasuhiro ShirakiTakashi Ohshima
    • C30B1/02H01L21/285
    • H01L21/28518C30B1/023C30B29/10
    • Films of desired metal, e.g., Ni or Co, and of Si are laminated alternatelyn a single crystal silicon substrate to form a multi-layered structure, and thereafter the substrate is heated to grow an epitaxial NiSi.sub.2 or CoSi.sub.2 film in solid phase with less diffusion of Ni or Co atoms into the silicon substrate. Each layer in the multi-layered structure has a thickness selected in the range of 30-300 A with the overall composition ratio Si/Ni (or Si/Co) in the range of 1.8-2.0. The lamination process is done at a substrate temperature which does not cause the laminated films to react with the substrate and does not cause the multi-layered structure to become polycrystalline, e.g. below 350.degree. C. for the formation of an NiSi.sub.2 film or below 450.degree. C. for the formation of a CoSi.sub.2 film. The solid phase epitaxy is achieved at a substrate heating temperature in a range of 350.degree.-750.degree. C. for the formation of an epitaxial NiSi.sub.2 film or 450.degree.-1000.degree. C. for the formation of a CoSi.sub.2 film.
    • 将期望的金属(例如Ni或Co)和Si的膜交替层叠在单晶硅衬底上以形成多层结构,然后将衬底加热以生长外延NiSi 2或CoSi 2膜,固相少 Ni或Co原子扩散到硅衬底中。 多层结构中的每个层具有在30-300A范围内选择的厚度,Si / Ni(或Si / Co)的总组成比在1.8-2.0的范围内。 层压方法是在不使层压膜与基板反应而不会使多层结构变得多晶的基板温度下进行的。 低于350℃以形成NiSi2膜或低于450℃以形成CoSi 2膜。 在350〜-750℃的衬底加热温度下实现固相外延,用于形成外延NiSi2膜或450-1000℃以形成CoSi 2膜。
    • 12. 发明申请
    • SCANNING ELECTRON MICROSCOPE
    • 扫描电子显微镜
    • US20140361167A1
    • 2014-12-11
    • US14241121
    • 2012-05-28
    • Hideo MorishitaTakashi OhshimaMicho HatanoSukehiro Ito
    • Hideo MorishitaTakashi OhshimaMicho HatanoSukehiro Ito
    • H01J37/28H01J37/04H01J37/244
    • H01J37/28H01J37/04H01J37/244H01J2237/2443H01J2237/2444H01J2237/24475H01J2237/2448H01J2237/2804H01J2237/2806
    • To provide a low acceleration scanning electron microscope that can discriminate and detect reflected electrons and secondary electrons even with a low probe current, this scanning electron microscope is provided with an electron gun (29), an aperture (26), a sample table (3), an electron optical system (4-1) for making an electron beam (31) converge on a sample (2), a deflection means (10), a secondary electron detector (8), a reflected electron detector (9), and a cylindrical electron transport means (5) in a position between the electron gun (29) and sample (2). The reflected electron detector (9) is provided within the electron transport means (5) and on a side further away from the electron gun (29) than the secondary electron detector (8) and the deflection means (10). The reception surface (9-1) of the reflected electron detector (9) is electrically wired so as to have the same potential as the electron transport means (5).
    • 为了提供即使在低探针电流下能够区分和检测反射电子和二次电子的低加速度扫描电子显微镜,该扫描电子显微镜设置有电子枪(29),孔(26),样品台(3 ),用于使电子束(31)会聚在样品(2)上的电子光学系统(4-1),偏转装置(10),二次电子检测器(8),反射电子检测器(9) 以及在电子枪(29)和样品(2)之间的位置的圆柱形电子传输装置(5)。 反射电子检测器(9)设置在电子传输装置(5)内并且比二次电子检测器(8)和偏转装置(10)更远离电子枪(29)的一侧。 反射电子检测器(9)的接收表面(9-1)被电连接以具有与电子传输装置(5)相同的电位。
    • 13. 发明申请
    • Charged Particle Beam Apparatus
    • 带电粒子束装置
    • US20120298864A1
    • 2012-11-29
    • US13521273
    • 2011-01-12
    • Hideo MorishitaMichio HatanoTakashi OhshimaMitsugu SatoTetsuya SawahataSukehiro ItoYasuko Aoki
    • Hideo MorishitaMichio HatanoTakashi OhshimaMitsugu SatoTetsuya SawahataSukehiro ItoYasuko Aoki
    • H01J37/26
    • H01J49/067H01J37/244H01J2237/2441H01J2237/24465H01J2237/2448H01J2237/28
    • In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).
    • 为了提供一种带电粒子束装置,其能够将鉴别中的带电粒子束信号检测为多个能带,并且使用该信号获得每个能带的高分辨率图像,带电粒子束装置具有带电粒子 来源(12-1); 限制带电粒子束(4)的直径的孔(16); 用于带电粒子束的光学器件(14,17,19) 样品架(21); 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器(40) 以及处理来自带电粒子检测器的输出信号的信号计算单元。 带电粒子检测器(40)具有第一检测灵敏度的第一小检测器(51)和具有第二检测灵敏度的第二小检测器(52),并从检体上的位置观察检测立体角, 对于第一小型检测器(51)和第二小型检测器(52),带电粒子束(4)将被照射到其上。
    • 15. 发明授权
    • Scanning electron microscope
    • 扫描电子显微镜
    • US08217363B2
    • 2012-07-10
    • US12073948
    • 2008-03-12
    • Michio HatanoTakashi OhshimaMitsugu Sato
    • Michio HatanoTakashi OhshimaMitsugu Sato
    • H01J1/50
    • G01N23/225H01J37/244H01J2237/2446H01J2237/24485H01J2237/28
    • A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens 23 is disposed on an electron source side of an objective lens 18, and a primary electron beam forms any optical system on the electron gun side of the lens, the lens operates the primary electron beam to be converged to a convergent point 24 that is a specific position. A detection ExB 16 that supplies a field that affects the locus of the secondary particles that are generated from a specimen 2 is disposed at the convergent point 24 of the primary electron beam so as to lead only the secondary particles in a specific energy range to a detection unit 13. Because a position to which the field that affects the locus of the secondary particles is supplied is the convergent point of the primary electron beam 19, it is possible to lead only the secondary particles of the desired energy to the detection unit without enlarging the aberration of the primary electron beam 19 and also to effectively conduct the band-pass discrimination of the energy. As a result, the signal electrons according to an observation object can be discriminated and detected.
    • 扫描电子显微镜可以通过带通来区分所需能量区域中的二次粒子,并以高屈服点检测二次粒子。 即使当透镜23设置在物镜18的电子源侧,并且一次电子束在透镜的电子枪侧形成任何光学系统时,该透镜操作一次电子束以收敛到会聚点 24这是一个具体的位置。 提供影响从样本2产生的二次粒子的轨迹的场的检测ExB 16设置在一次电子束的会聚点24处,以便仅将二次粒子在特定能量范围内引导到 因为提供影响二次粒子的轨迹的场的位置是一次电子束19的会聚点,所以只能将具有所需能量的二次粒子仅引导到检测单元而没有 扩大一次电子束19的像差,并且有效地进行能量的通带鉴别。 结果,可以区分和检测根据观察对象的信号电子。
    • 17. 发明申请
    • CHARGED PARTICLE BEAM SYSTEM AND METHOD FOR EVACUATION OF THE SYSTEM
    • 充电颗粒光束系统及其系统的消除方法
    • US20080315122A1
    • 2008-12-25
    • US12127030
    • 2008-05-27
    • Souichi KatagiriTakashi Ohshima
    • Souichi KatagiriTakashi Ohshima
    • H01J37/02
    • H01J37/28H01J37/18H01J37/3056H01J2237/182H01J2237/1825
    • The present invention provides a charged particle beam system which can perform evacuation on an electron gun chamber or an ion-gun chamber having a non-evaporable getter pump in a short time and can maintain the ultra-high vacuum for a long time, and a technology of evacuation therefor. Provided is a charged particle beam system equipped with a charged particle optics which makes the charged particle beam emitted from a charged particle source incident on a sample and means of evacuation for evacuating the charged particle optics, characterized in that the evaporation means has: a vacuum vessel with a charged particle source disposed in the vessel; a non-evaporable getter pump which connects with the vacuum vessel through a vacuum pipe and evacuates the interior of the vacuum vessel as a subsidiary vacuum pump; a valve interposed in the vacuum pipe connecting between the vacuum vessel and the non-evaporable getter pump; a rough pumping port which is provided closer to the non-evaporable getter pump than the valve and performs rough pumping; an open and shut valve for opening and shutting the rough pumping port; and a main vacuum pump which is provided closer to the vacuum vessel than the valve and evacuates the interior of the vacuum vessel.
    • 本发明提供了一种带电粒子束系统,其能够在短时间内在具有不可蒸发的吸气泵的电子枪室或离子枪室上进行排气并且能够长时间保持超高真空, 撤离技术。 提供了一种装有带电粒子光学器件的带电粒子束系统,其使从入射到样品上的带电粒子源发射的带电粒子束和抽空装置用于抽空带电粒子光学器件,其特征在于,蒸发装置具有:真空 具有设置在容器中的带电粒子源的容器; 一个不可蒸发的吸气泵,通过一个真空管与真空容器相连,抽真空真空容器的内部作为辅助真空泵; 插入在真空容器和不可蒸发的吸气剂泵之间的真空管中的阀; 一个粗略的抽气口,比阀门更靠近不可蒸发的吸气泵,进行粗抽; 用于打开和关闭粗抽泵口的打开和关闭阀; 以及主真空泵,其设置成比阀更靠近真空容器并排空真空容器的内部。