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11. 发明授权

US08567756B2 Slit valve door able to compensate for chamber deflection 有权
标题翻译：狭缝阀门能够补偿室偏转
公开(公告)号：US08567756B2
公开(公告)日：2013-10-29
申请号：US12548553
申请日：2009-08-27
申请人： Mehran Behdjat , Shinichi Kurita , John M. White , Suhail Anwar , Makoto Inagawa
发明人： Mehran Behdjat , Shinichi Kurita , John M. White , Suhail Anwar , Makoto Inagawa
IPC分类号： F16K25/00
CPC分类号： H01L21/67201 , F16K15/147 , F16K51/02 , H01L21/67126
摘要： Embodiments disclosed herein generally relate to a slit valve door assembly for sealing an opening in a chamber. A slit valve door that is pressed against the chamber to seal the slit valve opening moves with the chamber as the slit valve opening shrinks so that an o-ring pressed between the slit valve door and the chamber may move with the slit valve door and the chamber. Thus, less rubbing of the o-ring against the chamber may occur. With less rubbing, fewer particles may be generated and the o-ring lifetime may be extended. With a longer lifetime for the o-ring, substrate throughput may be increased.
摘要翻译：本文公开的实施例通常涉及用于密封腔室中的开口的狭缝阀门组件。当狭缝阀开口收缩时，被压靠在腔室上以密封狭缝阀开口的狭缝阀门随着腔室移动，使得压紧在狭缝阀门和腔室之间的O形环可以与狭缝阀门一起移动，并且房间。因此，可能会发生O形环相对于室的摩擦较少。随着摩擦的减少，可能产生更少的颗粒，并且可以延长O形环的寿命。随着O形圈的寿命更长，衬底产量可能会增加。

12. 发明授权

US08097133B2 Evacuable magnetron chamber 有权
标题翻译：可抽出的磁控管室
公开(公告)号：US08097133B2
公开(公告)日：2012-01-17
申请号：US11184679
申请日：2005-07-19
申请人： Makoto Inagawa
发明人： Makoto Inagawa
IPC分类号： C23C14/54
CPC分类号： C23C14/35 , C23C14/56 , H01J37/32449 , H01J37/3408
摘要： A vacuum pumping system and method in conjunction with a sputter reactor having a vacuum-pumped magnetron chamber sealed to the target backing plate. A main sputter chamber is vacuum sealed to the target front and cryo pumped. A bypass conduit and valve connect the magnetron and main chambers. A mechanical roughing pump connected to the magnetron chamber pumps the main chamber through the bypass conduit to less than 1 Torr before the bypass valve is closed and the cryo pump is opened and thereafter continues to pump the magnetron chamber to reduce the pressure differential across the target. A pressure differential switch connected across the bypass valve immediately open it whenever the pressure differential exceeds a limit, such as 20 Torr, for example when there is a leak or an electrical failure. The bypass conduit is also used in a venting procedure.
摘要翻译：真空抽吸系统和与溅射反应器结合的方法，其具有密封到目标背板的真空泵送的磁控管腔。主溅射室被真空密封到目标前部并且被低温泵送。旁路管道和阀门连接磁控管和主室。连接到磁控管室的机械粗抽泵在旁通阀关闭之前通过旁路管道将主室泵送到小于1乇，并且冷冻泵打开，然后继续泵送磁控管室以减小目标上的压力差。当差压超过限制（例如20 Torr）时，例如当发生泄漏或电气故障时，连接在旁通阀上的压差开关立即打开。旁路管道也用于排气过程。

13. 发明申请

US20120000424A1 COOLED DARK SPACE SHIELD FOR MULTI-CATHODE DESIGN 审中-公开
标题翻译：冷藏深色空间屏蔽多阴极设计
公开(公告)号：US20120000424A1
公开(公告)日：2012-01-05
申请号：US13230684
申请日：2011-09-12
申请人： MAKOTO INAGAWA
发明人： MAKOTO INAGAWA
IPC分类号： C23C16/50
CPC分类号： C23C14/3407 , H01J37/34 , H01J37/3408 , H01J37/3435 , H01J37/3441 , H01J37/3497
摘要： A cooled dark space shield for a multi-cathode, large area PVD apparatus is disclosed. For multi-cathode systems, a dark space shield between adjacent cathodes/targets may be beneficial. The shields may be grounded and provide a path to ground for electrons present within a sputtering plasma. Because the shields are between adjacent targets, the grounded shields may contribute to the formation of a uniform plasma within the processing space by acting as anodes. As the temperatures in the chamber fluxuate between a processing temperature and a downtime temperature, the shields may expand and contract. Cooling the shields reduces the likelihood of expansion and contraction and thus, reduces the amount of flaking that may occur. Embossing the surface of the shields may reduce the amount of material deposited onto the shields and control the expansion and contraction of the shields.
摘要翻译：公开了一种用于多阴极，大面积PVD装置的冷却的暗空间屏蔽。对于多阴极系统，相邻阴极/靶之间的暗空间屏蔽可能是有益的。屏蔽层可以接地，并为溅射等离子体中存在的电子提供到地面的路径。由于屏蔽层位于相邻的目标之间，所以接地的屏蔽件可能通过作为阳极而有助于在处理空间内形成均匀的等离子体。当室内的温度在加工温度和停机温度之间流动时，屏蔽件可能膨胀和收缩。冷却屏蔽减少膨胀和收缩的可能性，从而减少可能发生的剥落量。压印屏蔽表面可能会减少沉积在屏蔽上的材料的数量并控制屏蔽层的膨胀和收缩。

14. 发明申请

US20100196626A1 GROUND RETURN FOR PLASMA PROCESSES 有权
标题翻译：等离子体工艺的接地返回
公开(公告)号：US20100196626A1
公开(公告)日：2010-08-05
申请号：US12700484
申请日：2010-02-04
申请人： Soo Young Choi , Robin L. Tiner , Shinichi Kurita , John M. White , Carl A. Sorensen , Jeffrey A. Kho , Suhail Anwar , Makoto Inagawa , Gaku Furuta
发明人： Soo Young Choi , Robin L. Tiner , Shinichi Kurita , John M. White , Carl A. Sorensen , Jeffrey A. Kho , Suhail Anwar , Makoto Inagawa , Gaku Furuta
IPC分类号： C23C16/509
CPC分类号： C23C16/5096 , C23C16/4585 , H01J37/32091 , H01J37/32174 , H01J37/32568 , H01L21/67069
摘要： A method and apparatus for providing an electrically symmetrical ground or return path for electrical current between two electrodes is described. The apparatus includes at least on radio frequency (RF) device coupled to one of the electrodes and between a sidewall and/or a bottom of a processing chamber. The method includes moving one electrode relative to another and realizing a ground return path based on the position of the displaced electrode using one or both of a RF device coupled to a sidewall and the electrode, a RF device coupled to a bottom of the chamber and the electrode, or a combination thereof.
摘要翻译：描述了一种用于提供用于两个电极之间的电流的电对称接地或返回路径的方法和装置。该装置至少包括耦合到电极之一和处理室的侧壁和/或底部之间的射频（RF）装置。该方法包括相对于另一个电极移动一个电极，并且基于使用耦合到侧壁和电极的RF器件中的一个或两个的位移电极实现接地返回路径，耦合到腔室的底部的RF器件和电极或其组合。

15. 发明授权

US07652227B2 Heating and cooling plate for a vacuum chamber 有权
标题翻译：用于真空室的加热和冷却板
公开(公告)号：US07652227B2
公开(公告)日：2010-01-26
申请号：US11419185
申请日：2006-05-18
申请人： Makoto Inagawa
发明人： Makoto Inagawa
IPC分类号： H05B3/68 , F27B5/06 , F27B5/14 , F27D9/00 , C23C16/00 , F28D7/10 , F25B29/00
CPC分类号： H01L21/67201 , H01L21/67109
摘要： A thin plate thermally coupled to a cooling tube is positioned between a heating plate and a substrate and is adapted to serve as a heating plate or a cooling plate for the substrate. The thin plate and heating plate may be positioned in a load lock for the expeditious heating and cooling of large-area substrates. The cooling tube may include a first conduit, a second conduit disposed inside the first conduit having substantially no contact with the first conduit and containing a working fluid, and an isolation region disposed between the first conduit and the second conduit. The working fluid may be thermally decoupled from the thin plate by evacuating the isolation region and thermally coupled to the thin plate by filling the isolation region with a heat-conducting gas.
摘要翻译：热耦合到冷却管的薄板位于加热板和基板之间，并且适于用作用于基板的加热板或冷却板。薄板和加热板可以定位在负载锁定中，以便快速加热和冷却大面积基板。冷却管可以包括第一管道，第二管道，其设置在第一管道内部，基本上不与第一管道接触并且包含工作流体，以及设置在第一管道和第二管道之间的隔离区域。工作流体可以通过排出隔离区域而与薄板热分离，并通过用导热气体填充隔离区域而与薄板热耦合。

16. 发明授权

US07442900B2 Chamber for uniform heating of large area substrates 失效
标题翻译：用于均匀加热大面积基材的室
公开(公告)号：US07442900B2
公开(公告)日：2008-10-28
申请号：US11396477
申请日：2006-04-03
申请人： Makoto Inagawa , Akihiro Hosokawa
发明人： Makoto Inagawa , Akihiro Hosokawa
IPC分类号： F27B5/14 , C23C16/00 , C23C16/54 , H01L21/324
CPC分类号： H01L21/67109 , C23C16/54 , F27B17/0025
摘要： Embodiments of the present invention generally provide an apparatus for providing a uniform thermal profile to a plurality of large area substrates during thermal processing. In one embodiment, an apparatus for thermal processing large area substrates includes a chamber having a plurality of processing zones disposed therein that are coupled to a lift mechanism. The lift mechanism is adapted to vertically position the plurality of processing zones within the chamber. Each processing zone further includes an upper heated plate, a lower heated plate adapted to support a first substrate thereon and an unheated plate adapted to support a second substrate thereon, wherein the unheated plate is disposed between the upper and lower heated plates.
摘要翻译：本发明的实施例通常提供一种用于在热处理期间向多个大面积基板提供均匀热分布的装置。在一个实施例中，用于热处理大面积基板的装置包括具有设置在其中的多个处理区域的室，其联接到升降机构。提升机构适于将多个处理区域垂直地定位在室内。每个处理区还包括上加热板，适于在其上支撑第一基板的下加热板和适于在其上支撑第二基板的未加热板，其中未加热板设置在上加热板和下加热板之间。

17. 发明申请

US20080006523A1 COOLED PVD SHIELD 审中-公开
标题翻译：冷却PVD膜
公开(公告)号：US20080006523A1
公开(公告)日：2008-01-10
申请号：US11764217
申请日：2007-06-17
申请人： Akihiro Hosokawa , Bradley O. Stimson , Hienminh Huu Le , Makoto Inagawa
发明人： Akihiro Hosokawa , Bradley O. Stimson , Hienminh Huu Le , Makoto Inagawa
IPC分类号： C23C16/00 , C23C14/32
CPC分类号： C23C14/042 , C23C14/50 , C23C14/564 , H01J37/32458 , H01J37/32623 , H01J37/32651 , H01J37/32715
摘要： The present invention generally comprises a top shield for shielding a shadow frame within a PVD chamber. The top shield may remain in a stationary position and at least partially shield the shadow frame to reduce the amount of material that may deposit on the shadow frame during processing. The top shield may be cooled to reduce the amount of fluxuation in temperature of the top shield and shadow frame during processing and/or during down time.
摘要翻译：本发明通常包括用于屏蔽PVD室内的阴影框架的顶部屏蔽件。顶部屏蔽可以保持在静止位置，并且至少部分地遮蔽阴影框架以减少在处理期间可能沉积在阴影框架上的材料的量。顶部屏蔽可以被冷却以减少处理期间和/或在停机期间顶部屏蔽和阴影框架的温度的变化量。

18. 发明申请

US20080000768A1 Electrically Coupled Target Panels 审中-公开
标题翻译：电耦合目标板
公开(公告)号：US20080000768A1
公开(公告)日：2008-01-03
申请号：US11428226
申请日：2006-06-30
申请人： Bradley O. Stimson , Makoto Inagawa , Hienminh Huu Le , John M. White
发明人： Bradley O. Stimson , Makoto Inagawa , Hienminh Huu Le , John M. White
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3407 , H01J37/3408 , H01J37/3423 , H01J37/3429 , H01J37/3435 , H01J37/3444
摘要： A method and apparatus for electrically coupling a plurality of target together is disclosed. Individually powered targets allow greater control over depositing during a sputtering process. By individually powering the targets, different power levels may be applied to different targets. The targets may additionally be coupled together with a resistor. The resistor allows the targets to have a more controlled power level.
摘要翻译：公开了一种用于将多个目标物电耦合在一起的方法和装置。单独供电的目标允许在溅射过程中更好地控制沉积。通过单独为目标供电，不同的功率水平可能适用于不同的目标。靶可以另外与电阻器耦合在一起。电阻允许目标具有更多的受控功率水平。

19. 发明申请

US20070261951A1 REACTIVE SPUTTERING ZINC OXIDE TRANSPARENT CONDUCTIVE OXIDES ONTO LARGE AREA SUBSTRATES 审中-公开
标题翻译：氧化锌氧化物透明导电氧化物在大面积基材上的反应性溅射
公开(公告)号：US20070261951A1
公开(公告)日：2007-11-15
申请号：US11697476
申请日：2007-04-06
申请人： Yan Ye , Ankur Kadam , Yanping Li , Allen Lau , Makoto Inagawa , Bradley Stimson , Akihiro Hosokawa
发明人： Yan Ye , Ankur Kadam , Yanping Li , Allen Lau , Makoto Inagawa , Bradley Stimson , Akihiro Hosokawa
IPC分类号： C23C14/00
CPC分类号： C23C14/564 , C23C14/0063 , C23C14/35 , H01J37/3244 , H01J37/34 , H01J37/3438
摘要： The present invention generally comprises one or more cooled anodes shadowing one or more gas introduction tubes where both the cooled anodes and the gas introduction tubes span a processing space defined between one or more sputtering targets and one or more substrates within a sputtering chamber. The gas introduction tubes may have gas outlets that direct the gas introduced away from the one or more substrates. The gas introduction tubes may introduce reactive gas, such as oxygen, into the sputtering chamber for depositing TCO films by reactive sputtering. During a multiple step sputtering process, the gas flows (i.e., the amount of gas and the type of gas), the spacing between the target and the substrate, and the DC power may be changed to achieve a desired result.
摘要翻译：本发明通常包括一个或多个冷却的阳极，其遮蔽一个或多个气体导入管，其中冷却的阳极和气体引入管都跨越在溅射室内的一个或多个溅射靶和一个或多个衬底之间限定的处理空间。气体导入管可以具有引导从一个或多个基底引入的气体的气体出口。气体引入管可以将诸如氧的反应性气体引入到用于通过反应溅射沉积TCO膜的溅射室中。在多步骤溅射处理中，可以改变气体流动（即，气体的量和气体的类型），靶和基板之间的间隔以及DC功率以实现期望的结果。

20. 发明申请

US20070193881A1 Partially suspended rolling magnetron 有权
标题翻译：部分悬浮磁控管
公开(公告)号：US20070193881A1
公开(公告)日：2007-08-23
申请号：US11347667
申请日：2006-02-03
申请人： Makoto Inagawa , Akihiro Hosokawa , John White
发明人： Makoto Inagawa , Akihiro Hosokawa , John White
IPC分类号： C23C14/00
CPC分类号： H01J37/3408 , H01J37/3435 , H01J37/3455
摘要： A magnetron scanning and support mechanism in which the magnetron is partially supported from an overhead scanning mechanism through multiple springs coupled to different horizontal locations on the magnetron and partially supported from below at multiple locations on the target, on which it slides or rolls. In one embodiment, the yoke plate is continuous and uniform. In another embodiment, the magnetron's magnetic yoke is divided into two flexible yokes, for example, of complementary serpentine shape and each supporting magnets of respective polarity. The yokes separated by a gap sufficiently small that the two yokes are magnetically coupled. Each yoke has its own set of spring supports from above and rolling/sliding supports from below to allow the magnetron shape to conform to that of the target. Alternatively, narrow slots are formed in a unitary yoke.
摘要翻译：一种磁控管扫描和支撑机构，其中磁控管通过耦合到磁控管上的不同水平位置的多个弹簧部分地从顶部扫描机构支撑，并且在其上滑动或滚动的靶上的多个位置处从下方部分支撑。在一个实施例中，轭板是连续且均匀的。在另一个实施例中，磁控管的磁轭被分成两个柔性轭，例如互补的蛇形形状和各个极性的每个支撑磁体。磁轭分开足够小的间隙，使得两个磁轭磁耦合。每个轭具有其自己的一组弹簧支撑件，从上方起滚动/滑动支撑件，从而允许磁控管形状与靶材的形状一致。或者，窄槽形成为单一轭。

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