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11. 发明申请

US20050219680A1 Optical multilayer structure, optical switching device, and image display 失效
公开(公告)号：US20050219680A1
公开(公告)日：2005-10-06
申请号：US11136069
申请日：2005-05-24
申请人： Hiroichi Ishikawa
发明人： Hiroichi Ishikawa
IPC分类号： G02F1/01 , G02B5/28 , G02B6/28 , G02B6/35 , G02B26/00
CPC分类号： G02B6/3524 , G02B5/284 , G02B5/285 , G02B5/286 , G02B6/3512 , G02B6/3544 , G02B6/355 , G02B6/3572 , G02B6/3584 , G02B6/3594 , G02B26/001
摘要： An optical multilayer structure has a substrate, a light-absorbing first layer in contact with the substrate, a gap portion having a changeable size capable of causing an optical interference phenomenon, and a second layer. By changing the size of the gap portion, an amount of reflection, transmission, or absorption of incident light can be changed. For example, the substrate is made of carbon (C), the first layer is made of tantalum (Ta), and the second layer is made of silicon nitride (Si3N4). Also in a visible light area, high response is realized. Consequently, the optical multilayer structure can be suitably used for an image display. The optical multilayer structure may be obtained by stacking, on a substrate made of a metal such as chromium (Cr), a first transparent layer made of a material having a high refractive index such as TiO2 (n=2.40), a second transparent layer made of a material having a low refractive index such as MgF2 (n=1.38), a gap portion having a changeable size capable of causing an optical interference phenomenon, and a third transparent layer made of a material having a high refractive index such as TiO2.

12. 发明授权

US06319371B2 Film forming apparatus 失效
标题翻译：成膜装置
公开(公告)号：US06319371B2
公开(公告)日：2001-11-20
申请号：US09339849
申请日：1999-06-25
申请人： Hiroichi Ishikawa , Masayasu Kakinuma
发明人： Hiroichi Ishikawa , Masayasu Kakinuma
IPC分类号： C23C1434
CPC分类号： C23C14/562 , C23C14/10
摘要： A film forming apparatus comprises a sputtering chamber, a cooling drum disposed at an central portion thereof for cooling a roll film in contact with the surface thereof, a roll chamber, an SiOx film forming chamber and a monitor room disposed to the periphery of the drum, a sputter cathode disposed to the SiOx film forming chamber, and a moisture pump such as a cryogenic panel disposed in the film forming chamber for effectively discharging the moisture by which the partial pressure of the moisture in the film forming chamber is kept roll, in which the light absorption of the SiOx film after formation is monitored by an InSitu transmission light monitor, the value x for the SiOx is judged by the transmittance of light of the SiOx film to control the oxygen flow rate by an MFC such that the value x reaches an aimed value, thereby enabling to form an adhesion layer having sufficient adhesion and good permeability on the substrate.
摘要翻译：成膜装置包括溅射室，设置在其中央部分的用于冷却与其表面接触的辊膜的冷却鼓，辊室，SiOx膜形成室和设置在鼓周边的监视室设置在SiOx膜形成室上的溅射阴极，以及设置在成膜室中的湿气泵，例如低温面板，用于有效地排出成膜室内的水分分压保持滚动的水分，通过InSitu透射光监视器监测形成后的SiOx膜的光吸收，通过SiO x膜的光的透射率判断SiO x的值x，以通过MFC控制氧气流量，使得值x 达到目标值，从而能够形成在基板上具有足够的粘附性和良好的渗透性的粘合层。

13. 发明授权

US06284382B1 Antireflection film and manufacturing method thereof 失效
标题翻译：防反射膜及其制造方法
公开(公告)号：US06284382B1
公开(公告)日：2001-09-04
申请号：US09200149
申请日：1998-11-25
申请人： Hiroichi Ishikawa , Barret Lippey , Tomio Kobayashi , Yoshihiro Oshima , Shinobu Mitsuhashi , Masataka Yamashita , Yoshiharu Honjo , Koichi Kaneko
发明人： Hiroichi Ishikawa , Barret Lippey , Tomio Kobayashi , Yoshihiro Oshima , Shinobu Mitsuhashi , Masataka Yamashita , Yoshiharu Honjo , Koichi Kaneko
IPC分类号： B32B900
CPC分类号： C23C14/562 , C03C17/3417 , C03C17/42 , C03C2217/734 , C23C14/086 , C23C14/10 , Y10T428/24942 , Y10T428/24975 , Y10T428/265 , Y10T428/28 , Y10T428/2804
摘要： Disclosed is an antireflection film used to be stuck on the surface of a glass panel of a CRT, which can be inexpensively manufactured at a high productivity while satisfying all of requirements regarding its adhesive strength, reflectance characteristic, electric resistance and total light transmittance. The antireflection film is formed by stacking silicon oxide films and indium tin oxide films on a base film in multilevels, wherein the thickness of the uppermost silicon oxide film of the antireflection film is thicker than the indium tin oxide film directly under the uppermost silicon oxide film, and the lowermost silicon oxide film, positioned at the interface with the base film, of the antireflection film is a SiOx film where the value x is in a range of 0.5 to 1.9.
摘要翻译：公开了一种抗反射膜，其用于粘贴在CRT的玻璃面板的表面上，其可以以高生产率廉价地制造，同时满足关于其粘合强度，反射特性，电阻和总透光率的所有要求。防反射膜通过在多层次的基膜上层叠氧化硅膜和氧化铟锡膜而形成，其中防反射膜的最上面的氧化硅膜的厚度比直接在最上面的氧化硅膜下面的氧化铟锡膜厚位于防反射膜的与基膜的界面的最下面的氧化硅膜是值x为0.5〜1.9的SiOx膜。

14. 发明申请

US20060245614A1 VIBRATING DEVICE, JET FLOW GENERATING APPARATUS, AND ELECTRONIC APPARATUS 审中-公开
标题翻译：振动装置，喷射流产生装置和电子装置
公开(公告)号：US20060245614A1
公开(公告)日：2006-11-02
申请号：US11380219
申请日：2006-04-26
申请人： Hiroichi Ishikawa
发明人： Hiroichi Ishikawa
IPC分类号： H04R1/00
CPC分类号： H02K33/18
摘要： A vibrating device configured to vibrate a gas inside a chassis to discharge the gas in a pulsating flow through an opening formed in the chassis includes a frame, a vibrating plate, a supporting member that is attached to the frame and that is configured to support the vibrating plate in a manner such that the vibrating plate is vibratable, and a driving mechanism that is configured to drive the vibrating plate and that includes a magnetic circuit member attached to the frame and a voice coil body attached to the vibrating plate. The voice coil body is configured to prevent the voice coil body from contacting the magnetic circuit member when the vibrating plate is vibrating and is movable by means of a magnetic field generated by the magnetic circuit member.
摘要翻译：一种振动装置，其构造成使底盘内的气体振动，通过形成在所述底架上的开口的脉动流中排出气体，所述振动装置包括框架，振动板，支撑构件，所述支撑构件安装在所述框架上，振动板可振动板的振动板;以及驱动机构，其构造成驱动振动板，并且包括安装在框架上的磁路部件和安装在振动板上的音圈体。音圈体被构造成当振动板振动时防止音圈体与磁路部件接触，并且借助于由磁路部件产生的磁场可移动。

15. 发明授权

US07027208B2 Optical multilayer structure, optical switching device, and image display 失效
标题翻译：光学多层结构，光学开关器件和图像显示
公开(公告)号：US07027208B2
公开(公告)日：2006-04-11
申请号：US11135829
申请日：2005-05-24
申请人： Hiroichi Ishikawa
发明人： Hiroichi Ishikawa
IPC分类号： G02F1/03 , G02B6/26
CPC分类号： G02B6/3524 , G02B5/284 , G02B5/285 , G02B5/286 , G02B6/3512 , G02B6/3544 , G02B6/355 , G02B6/3572 , G02B6/3584 , G02B6/3594 , G02B26/001
摘要： An optical multilayer structure has a substrate, a light-absorbing first layer in contact with the substrate, a gap portion having a changeable size capable of causing an optical interference phenomenon, and a second layer. By changing the size of the gap portion, an amount of reflection, transmission, or absorption of incident light can be changed. For example, the substrate is made of carbon (C), the first layer is made of tantalum (Ta), and the second layer is made of silicon nitride (Si3N4). Also in a visible light area, high response is realized. Consequently, the optical multilayer structure can be suitably used for an image display. The optical multilayer structure may be obtained by stacking, on a substrate made of a metal such as chromium (Cr), a first transparent layer made of a material having a high refractive index such as TiO2 (n=2.40), a second transparent layer made of a material having a low refractive index such as MgF2 (n=1.38), a gap portion having a changeable size capable of causing an optical interference phenomenon, and a third transparent layer made of a material having a high refractive index such as TiO2.
摘要翻译：光学多层结构具有基板，与基板接触的光吸收第一层，具有能够引起光学干涉现象的可变尺寸的间隙部分和第二层。通过改变间隙部分的尺寸，可以改变入射光的反射，透射或吸收的量。例如，基板由碳（C）制成，第一层由钽（Ta）制成，第二层由氮化硅（Si 3 N 4 N 4）制成， SUB>）。同样在可见光区域，实现了高响应。因此，光学多层结构可以适用于图像显示。光学多层结构可以通过在由诸如铬（Cr）的金属制成的衬底上堆叠由具有高折射率的材料（例如TiO 2）（n）形成的第一透明层， = 2.40），由具有低折射率的材料如MgF 2（n = 1.38）制成的第二透明层，具有能够引起光学干涉现象的可变尺寸的间隙部分，以及由具有高折射率的材料（例如TiO 2）制成的第三透明层。

16. 发明申请

US20050219679A1 Optical multilayer structure, optical switching device, and image display 失效
公开(公告)号：US20050219679A1
公开(公告)日：2005-10-06
申请号：US11135829
申请日：2005-05-24
申请人： Hiroichi Ishikawa
发明人： Hiroichi Ishikawa
IPC分类号： G02F1/01 , G02B5/28 , G02B6/28 , G02B6/35 , G02B26/00 , G02B6/04
CPC分类号： G02B6/3524 , G02B5/284 , G02B5/285 , G02B5/286 , G02B6/3512 , G02B6/3544 , G02B6/355 , G02B6/3572 , G02B6/3584 , G02B6/3594 , G02B26/001
摘要： An optical multilayer structure has a substrate, a light-absorbing first layer in contact with the substrate, a gap portion having a changeable size capable of causing an optical interference phenomenon, and a second layer. By changing the size of the gap portion, an amount of reflection, transmission, or absorption of incident light can be changed. For example, the substrate is made of carbon (C), the first layer is made of tantalum (Ta), and the second layer is made of silicon nitride (Si3N4). Also in a visible light area, high response is realized. Consequently, the optical multilayer structure can be suitably used for an image display. The optical multilayer structure may be obtained by stacking, on a substrate made of a metal such as chromium (Cr), a first transparent layer made of a material having a high refractive index such as TiO2 (n=2.40), a second transparent layer made of a material having a low refractive index such as MgF2 (n=1.38), a gap portion having a changeable size capable of causing an optical interference phenomenon, and a third transparent layer made of a material having a high refractive index such as TiO2.

17. 发明授权

US06611090B1 Anti-reflective coating for a CRT having first and second optical thin films in combination with an adhesion layer 失效
标题翻译：用于CRT的抗反射涂层，其具有与粘合层组合的第一和第二光学薄膜
公开(公告)号：US06611090B1
公开(公告)日：2003-08-26
申请号：US09360625
申请日：1999-07-26
申请人： Hiroichi Ishikawa , Kazuo Watanabe
发明人： Hiroichi Ishikawa , Kazuo Watanabe
IPC分类号： H01J2910
CPC分类号： G02B1/116 , H01J29/896 , H01J2211/44
摘要： An anti-reflection film having superior anti-reflection properties and which is suited for practical application is to be manufactured easily and simply with high productivity and a reduced manufacturing cost. To this end, there are sequentially formed by layering, an adhesive layer 4, a first optical thin film 5, containing one or more of titanium nitride, hafnium nitride and zirconium nitride, and a second optical thin film 6 having a refractive index of 1.35 to 1.7. The adhesive layer 4 is represented by the chemical formula of SiOx, where x
摘要翻译：具有优异的抗反射性能并且适用于实际应用的抗反射膜能够以高生产率和降低的制造成本容易且简单地制造。为此，通过层叠粘合剂层4，包含氮化钛，氮化铪和氮化锆中的一种或多种的第一光学薄膜5和折射率为1.35的第二光学薄膜6，依次形成到1.7。粘合剂层4由化学式SiO x表示，其中x <2。如果第一光学薄膜5主要包含氮化钛，则第一光学薄膜5优选是导电的。第二光学薄膜6优选由SiO 2形成。可以通过将支撑各层的树脂基板3布置在显示部分的面板侧上，其中防反射膜的其余构造与上述相同，可以提供阴极射线管。

18. 发明授权

US5804042A Wafer support structure for a wafer backplane with a curved surface 失效
标题翻译：具有弯曲表面的晶片背板的晶片支撑结构
公开(公告)号：US5804042A
公开(公告)日：1998-09-08
申请号：US488063
申请日：1995-06-07
申请人： John Ferreira , Tatsuo Onozaki , Hiroichi Ishikawa
发明人： John Ferreira , Tatsuo Onozaki , Hiroichi Ishikawa
IPC分类号： C23C14/50 , C23C16/458 , C30B25/12 , C30B31/14 , H01L21/687 , C23C14/34
CPC分类号： H01L21/68721 , C23C14/50 , C23C16/4585 , C30B25/12 , C30B31/14 , H01L21/68728 , H01L21/6875
摘要： The wafer support structure is used with a movable backplane having a curved upper surface which is moved between a wafer access position and a wafer process position to clamp a wafer against a clamping structure during processing. A guide ring surrounds the backplane and a floating ring is spring-mounted on the guide ring by flat, elongated lift springs. RF bias springs are positioned on top of the floating ring along with wafer support pins which support a wafer above the curved backplane surface. When the backplane is moved toward the clamping structure to clamp the wafer, the RF bias springs make electrical contact with a portion of the clamping structure, and the clamping structure acts against the floating ring to flex the lift springs and lower the floating ring such that the wafer is transferred to the backplane surface to be clamped against the clamping structure. When the wafer is clamped, the support pins are out of contact with the wafer. The wafer is stably supported by the support pins over the backplane surface during access of the wafer and is securely clamped between the backplane and clamping structure away from the wafer support during processing of the wafer. A filler ring around the backplane reduces formation of a secondary plasma.
摘要翻译：晶片支撑结构与具有弯曲上表面的可移动背板一起使用，其可在晶片访问位置和晶片工艺位置之间移动，以在处理期间将晶片夹紧在夹持结构上。引导环围绕背板，并且浮动环通过平坦的细长提升弹簧弹簧安装在引导环上。 RF偏置弹簧与支撑在弯曲背板表面上方的晶片的晶片支撑销一起位于浮动环的顶部。当背板朝向夹持结构移动以夹紧晶片时，RF偏置弹簧与夹持结构的一部分电接触，并且夹紧结构抵抗浮环以弹性升降弹簧并降低浮环，使得将晶片转移到背板表面以夹紧夹紧结构。当晶片被夹紧时，支撑销与晶片脱离接触。在晶片访问期间，晶片被支撑销稳定地支撑在背板表面上，并且在晶片的处理期间被牢固地夹紧在背板和夹紧结构之间远离晶片支撑。背板周围的填充环减少二次等离子体的形成。

19. 发明授权

US5520002A High speed pump for a processing vacuum chamber 失效
标题翻译：用于加工真空室的高速泵
公开(公告)号：US5520002A
公开(公告)日：1996-05-28
申请号：US382386
申请日：1995-02-01
申请人： Hiroichi Ishikawa
发明人： Hiroichi Ishikawa
IPC分类号： C23C14/56 , F04B37/08 , H01J37/18 , B01D8/00
CPC分类号： F04B37/08 , C23C14/564 , H01J37/18 , H01J2237/1825 , Y10S417/901
摘要： A high speed pumping apparatus for efficiently and rapidly evacuating a processing chamber to a desired vacuum pressure includes a pump chamber for coupling to the processing chamber and a cryogenic element in the pump chamber to absorb gas particles. The cryogenic element is movable within the pump chamber and has a first position inside the pump chamber and removed from the processing chamber. When the cryogenic element is in the first position, a sealing structure seals the aperture between the pump chamber and the processing chamber. The cryogenic element is movable, through the aperture, to a second position at least partially out of the pump chamber and inside the processing chamber. When in the second position inside of a processing chamber, the cryogenic element absorbs gas particles within the processing chamber and evacuates the chamber to a vacuum pressure. Thereby, the cryogenic element may be exposed to the processing chamber to evacuate the processing chamber and may subsequently be withdrawn into the pump chamber and sealed therein to be protected when the processing chamber is opened to atmospheric pressure.
摘要翻译：用于有效且快速地将处理室排空到期望的真空压力的高速泵送装置包括用于联接到处理室的泵室和泵室中的低温元件以吸收气体颗粒。低温元件可以在泵室内移动并且具有在泵室内的第一位置并从处理室移除。当低温元件处于第一位置时，密封结构密封泵室和处理室之间的孔。低温元件可以通过孔径至少部分地移动到泵室内部和处理室内部的第二位置。当在处理室内部的第二位置时，低温元件吸收处理室内的气体颗粒并将室抽空至真空压力。由此，低温元件可以暴露于处理室以抽空处理室，并且随后可以将处理室打开至大气压力时将其引入泵室并密封在其中以被保护。

20. 发明授权

US5380682A Wafer processing cluster tool batch preheating and degassing method 失效
标题翻译：晶圆处理集群工具批量预热和脱气方法
公开(公告)号：US5380682A
公开(公告)日：1995-01-10
申请号：US147666
申请日：1993-11-03
申请人： Richard C. Edwards , Michael S. Kolesa , Hiroichi Ishikawa
发明人： Richard C. Edwards , Michael S. Kolesa , Hiroichi Ishikawa
IPC分类号： H01L21/205 , G01J5/00 , G01J5/04 , G01J5/08 , H01L21/00 , H01L21/02 , H01L21/302 , H01L21/3065 , H01L21/677 , H01L21/463
CPC分类号： H01L21/67115 , G01J5/0003 , G01J5/0007 , G01J5/02 , G01J5/0275 , G01J5/08 , G01J5/089 , H01L21/67167 , H01L21/67184 , H01L21/6719 , H01L21/67248 , Y10S414/139 , Y10S438/908 , Y10T29/41
摘要： A wafer processing cluster tool, having one or more load-locks, is provided with one or more batch preheating modules that receive wafers only from the cluster tool transport module at the internal vacuum pressure of the machine. The loading, unloading, handling and processing of wafers in the machine can occur while other wafers are being preheated. The preheat module has a vertically moveable rack and is loaded with various sized batches of wafers with no vacant positions between them. Wafer shaped shields may occupy positions adjacent top and bottom wafers to cause them to heat the same as other wafers in the rack. Infrared lamps positioned outside of quartz windows heat wafers in the preheat module. The rack may rotate to improve heating uniformity. Temperature sensors, such as pyrometers, that do not contact the wafers being preheated, measure temperature for control of the heating of the lamps.
摘要翻译：具有一个或多个负载锁定的晶片处理集群工具设置有一个或多个批量预热模块，其仅在机器的内部真空压力下从集群工具传送模块接收晶片。当其他晶片被预热时，可能会发生机器中晶片的装载，卸载，处理和处理。预热模块具有可垂直移动的支架，并且装载有各种尺寸的批量的晶片，它们之间没有空置位置。晶圆形屏蔽件可能占据与顶部和底部晶片相邻的位置，以使它们与机架中的其它晶片相同。位于石英窗外部的红外灯在预热模块中加热晶片。机架可旋转以提高加热均匀性。温度传感器，例如高温计，不接触被预热的晶片，测量温度以控制灯的加热。

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