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    • 141. 发明授权
    • Angiogenesis inhibitor
    • 血管生成抑制剂
    • US06214800B1
    • 2001-04-10
    • US09282501
    • 1999-04-09
    • Chiho FukiageMitsuyoshi AzumaJun InoueMasayuki NakamuraYuka Yoshida
    • Chiho FukiageMitsuyoshi AzumaJun InoueMasayuki NakamuraYuka Yoshida
    • A61K3800
    • A61K38/55C07C311/19C07D303/48
    • An angiogenesis inhibitor comprising a cysteine protease inhibitory compound. As the preferable cysteine protease inhibitory compound, epoxysuccinic acid compounds, peptide halohydrazide compounds, calpain inhibitory compounds, compounds of the formula (I) and compounds of the formula (VI) can be used. The angiogenesis inhibitor of the present invention suppresses new formation of blood vessels in the living tissues, so that it can be used as a superior therapeutic or prophylactic agent of angiogenesis associated with wound healing, inflammation, growth of tumor and the like; and angiogenesis as seen in diabetic retinopathy, prematurity retinopathy, retinal venous occlusion, senile discoid macular degeneration and the like, as well as for prevention of metastasis of tumors.
    • 一种包含半胱氨酸蛋白酶抑制化合物的血管生成抑制剂。 作为优选的半胱氨酸蛋白酶抑制化合物,可以使用环氧琥珀酸化合物,肽卤代酰肼化合物,钙蛋白酶抑制化合物,式(I)的化合物和式(VI)的化合物。 本发明的血管发生抑制剂抑制活组织中血管的新形成,可以用作与伤口愈合,炎症,肿瘤生长等有关的血管生成的优异治疗或预防剂。 和血管生成,如糖尿病视网膜病变,早产儿视网膜病变,视网膜静脉闭塞,老年性盘状黄斑变性等,以及用于预防肿瘤转移。
    • 143. 发明授权
    • Method of manufacturing a semiconductor integrated circuit device having
a capacitor
    • 具有电容器的半导体集成电路器件的制造方法
    • US5976929A
    • 1999-11-02
    • US962878
    • 1997-11-03
    • Kazuhiko KajigayaMasayuki NakamuraToshikazu TachibanaGoro Kitsukawa
    • Kazuhiko KajigayaMasayuki NakamuraToshikazu TachibanaGoro Kitsukawa
    • H01L27/105H01L27/108H01L21/8242
    • H01L27/105H01L27/10805
    • A semiconductor integrated circuit device having a DRAM consisting of memory cells, comprises; a first conductive film deposited over the main surface of a semiconductor substrate and used to form a gate electrode of a memory cell selection MISFET; a second conductive film deposited over the first conductive film and used to form bit lines to transfer data of a memory cell to a sense amplifier; a third conductive film deposited over the second conductive film and used to form a storage node of a capacitor; a fourth conductive film deposited over the third conductive film and used to form a plate electrode of the capacitor; and a fifth conductive film deposited over the fourth conductive film and used to form an interconnect, wherein a transistor in a direct peripheral circuit arranged close to a memory array is electrically connected, through a pad layer formed of the third conductive film, to the interconnection of the fifth conductive film deposited over the fourth conductive film, thereby allowing the aspect ratio of the contact hole formed over the pad layer to be reduced.
    • 一种具有由存储单元组成的DRAM的半导体集成电路器件,包括: 沉积在半导体衬底的主表面上并用于形成存储器单元选择MISFET的栅电极的第一导电膜; 沉积在第一导电膜上并用于形成位线以将存储器单元的数据传送到读出放大器的第二导电膜; 沉积在所述第二导电膜上并用于形成电容器的存储节点的第三导电膜; 沉积在所述第三导电膜上并用于形成所述电容器的平板电极的第四导电膜; 以及沉积在第四导电膜上并用于形成互连的第五导电膜,其中布置在存储器阵列附近的直接外围电路中的晶体管通过由第三导电膜形成的焊盘层电连接到互连 所述第五导电膜沉积在所述第四导电膜上,从而允许形成在所述焊盘层上的所述接触孔的纵横比减小。
    • 147. 发明授权
    • Semiconductor integrated circuit device
    • 半导体集成电路器件
    • US5654577A
    • 1997-08-05
    • US476761
    • 1995-06-07
    • Masayuki NakamuraKazuyuki MiyazawaHidetoshi Iwai
    • Masayuki NakamuraKazuyuki MiyazawaHidetoshi Iwai
    • H01L27/04G11C11/408H01L21/822H01L21/8238H01L27/092H01L27/10H01L27/105H01L27/108H01L29/76
    • H01L27/105
    • A semiconductor integrated circuit device includes in a substrate a P-type well region containing a memory array section in which dynamic memory cells are arranged in a matrix. The P-type well region is fed with a back bias voltage whose absolute value is reduced so as to be the most suitable for the refresh characteristics. Also included is a P-well region wherein there are formed N-channel MOSFETs of a peripheral circuit this P-well region is fed with a back bias voltage whose absolute value is smaller than that of the potential fed to the P-type well of the memory array section, considering the high-speed operation. A P-type well section, wherein there is formed are N-channel MOSFETs of an input circuit or an output circuit connected with external terminals, is fed with a back bias voltage whose absolute value is made large considering an undershoot voltage. The P-type well region provided with the memory array section is fed with a requisite minimum back bias voltage. Accordingly, the P-type well region provided with the input circuit or the output circuit corresponding to the external terminals is fed with the back bias voltage to provide a measure of protection against undershoot, while the refresh characteristics are improved by reducing the leakage current between the source/drain region connected with a capacitor and the P-type well, to thereby raise the operation speed of the peripheral circuit can be raised.
    • 半导体集成电路器件在衬底中包括含有存储器阵列部分的P型阱区域,其中动态存储器单元被布置成矩阵。 P型阱区域馈送有绝对值减小的背偏置电压,以便最适合刷新特性。 还包括P阱区,其中形成外围电路的N沟道MOSFET,该P阱区被馈送反馈偏压,其绝对值小于馈送到P型阱的电位的绝对值 存储器阵列部分,考虑高速运行。 其中形成有输入电路的N沟道MOSFET或与外部端子连接的输出电路的P型阱区,考虑到下冲电压,馈送绝对值较大的反向偏置电压。 设置有存储器阵列部分的P型阱区域被馈送必需的最小反向偏置电压。 因此,设置有与外部端子相对应的输入电路或输出电路的P型阱区域被馈送有反向偏置电压,以提供对下冲的保护措施,同时通过减小刷新特性来减小 可以提高与电容器和P型阱连接的源极/漏极区域,从而提高外围电路的操作速度。