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    • 131. 发明申请
    • RESIST TREATMENT UNIT, RESIST COATING AND DEVELOPING APPARATUS, AND RESIST TREATMENT METHOD
    • 电阻治疗单元,电阻涂层和发展装置和电阻治疗方法
    • US20110091821A1
    • 2011-04-21
    • US13000234
    • 2009-06-10
    • Shinji Kobayashi
    • Shinji Kobayashi
    • G03F7/26B05C9/12G03B27/52
    • G03F7/26G03F7/168
    • A resist treatment unit for performing treatment on a resist film which has been formed on a substrate is disclosed. This resist treatment unit includes: a treatment container capable of maintaining a vacuum therein; a mounting table provided in the treatment container for mounting the substrate on which the resist film has been formed thereon; a gas supply part for jetting a mixture gas containing a first gas and a second gas which are chemically inert toward the mounting table at a predetermined flow rate; and an exhaust part capable of exhausting the treatment container to a degree of vacuum at which the mixture gas jetted from the gas supply part at the predetermined flow rate is able to be a molecular beam in the treatment container.
    • 公开了一种用于对形成在基板上的抗蚀剂膜进行处理的抗蚀剂处理单元。 该抗蚀剂处理单元包括:能够保持真空的处理容器; 设置在处理容器中的安装台,用于安装其上形成有抗蚀剂膜的基板; 气体供给部,用于以预定的流量向装载台喷射含有第一气体和第二气体的化学惰性的混合气体; 以及能够将处理容器排出到以规定流量从气体供给部喷射的混合气体能够成为处理容器内的分子束的真空度的排气部。
    • 132. 发明授权
    • Thin film removing device and thin film removing method
    • 薄膜去除装置和薄膜去除方法
    • US07879251B2
    • 2011-02-01
    • US11925467
    • 2007-10-26
    • Shinji KobayashiNorihisa Koga
    • Shinji KobayashiNorihisa Koga
    • H01L21/302
    • H01L21/6708Y10S134/902Y10T156/1111Y10T156/1928Y10T156/1989
    • A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage plates 23 capable of being disposed substantially flush with the surface of a substrate M mounted on a support table 22 is positioned close to the substrate M mounted on the support table 22. Removing nozzles 30 jet a solvent toward edge parts of the substrate M and suck a solution produced by dissolving part of the resist in the solvent while the removing nozzles 30 are moved along side edges of the substrate M and the approach stage 20 disposed close to the substrate M. Thus, the removing nozzles 30 jet the solvent uniformly over the edge parts and corners of the substrate M and suck the solution without changing modes of jetting the solvent and sucking the solution. Consequently, straight parts of a thin film formed on the square substrate M can be removed from the corners of the substrate M, and the formation of mists can be suppressed.
    • 薄膜去除装置和薄膜去除方法能够从基板的角部去除在正方形基板上形成的薄膜的直线部分,并且抑制雾的形成。 具有能够与安装在支撑台22上的基板M的表面基本齐平的平台台23的接近台20靠近安装在支撑台22上的基板M定位。去除喷嘴30向边缘喷射溶剂 将基板M的一部分吸附并且将去除喷嘴30沿着基板M和接近台20的侧边缘移动而将抗蚀剂的一部分溶解在溶剂中而产生的溶液。因此,除去喷嘴 30将溶剂均匀地喷射在基板M的边缘部分和拐角上,并吸取溶液,而不改变喷射溶剂并吸取溶液的模式。 因此,可以从基板M的角部去除在正方形基板M上形成的薄膜的直线部分,并且可以抑制雾的形成。
    • 133. 发明申请
    • WATER-SOLUBLE ACRYLIC ACID SALT POLYMER AND GELLING BASE
    • 水溶性丙烯酸盐聚合物和凝胶基
    • US20110021642A1
    • 2011-01-27
    • US12934150
    • 2009-06-05
    • Kazuyuki MiuraShinji Kobayashi
    • Kazuyuki MiuraShinji Kobayashi
    • A61K9/10C08F120/18
    • C09K5/08A61F7/10C08F220/06
    • An object of the present invention is to provide a water-soluble acrylate polymer that can form a gelling base. When used in forming a poultice or cooling sheet, the gelling base not only imparts desirable stretchability, but also has an appropriate reaction rate with a polyvalent metal. The gelling base is free from gel penetration to the back side of a support or gel seeping from the support while the gel is being cured, and is easily applied to the support. When the gelling base is gelated by being allowed to stand under the conditions of 25° C. and a relative humidity of 60%, the gel strength is 3,200 to 7,000 dyn/cm2 after standing for 7.5 hours and 5,000 to 9,000 dyn/cm2 after standing for 200 hours, and satisfies the following relationship: Gel strength after standing for 7.5 hours]≦Gel strength after standing for 200 hours.
    • 本发明的目的是提供可以形成胶凝基质的水溶性丙烯酸酯聚合物。 当用于形成泥敷剂或冷却片时,胶凝剂不仅赋予所需的拉伸性,而且与多价金属具有适当的反应速率。 当凝胶固化时,胶凝基体不会凝胶渗透到支撑体或凝胶从支持体渗出的背面,并且容易地施加到载体上。 凝胶化凝胶化后,在25℃,相对湿度60%的条件下凝胶化,静置7.5小时后的凝胶强度为3200〜7000dyn / cm2,后处理为5000〜9000dyn / cm 2 静置200小时,静置7.5小时后的凝胶强度为>静置200小时后的凝胶强度。
    • 138. 发明授权
    • Apparatus and method for removing coating film
    • 去除涂膜的设备和方法
    • US07641763B2
    • 2010-01-05
    • US10920407
    • 2004-08-18
    • Shinji KobayashiNorihisa Koga
    • Shinji KobayashiNorihisa Koga
    • C23C16/00B08B7/00
    • C03C17/002C03C2218/328C03C2218/355G03F7/168Y10S134/902
    • An apparatus and a method for removing a coating film capable of stable treatment for removing unnecessary coating film at a substrate edge are provided. A substrate is clamped by approach stages from front and rear directions on a chuck, and fixed when accurate registration thereof is achieved. Then, the substrate edge is moved back and forth together with the chuck and the approach stage, so that the edge of the substrate is introduced in a space between an upper piece and a lower piece of a fixed arm portion. While the substrate is being moved, a solvent is fed from a nozzle portion onto a surface thereof and a purge gas is fed through a purge gas feeding pipe, so as to remove the coating film from the surface of the substrate by sucking and discharging the solvent and dissolved coating film through a discharge pipe.
    • 提供了一种用于去除能够在基板边缘去除不需要的涂膜的稳定处理的涂膜的设备和方法。 基板通过卡盘上的前后方向的夹持夹紧,并且在实现精确对准时固定。 然后,基板边缘与卡盘和接近台一起前后移动,使得基板的边缘被引入到固定臂部分的上部件和下部件之间的空间中。 在基板移动的同时,将溶剂从喷嘴部分供给到其表面,并且净化气体通过吹扫气体供给管进给,从而通过吸附和排出基板从基板的表面除去涂膜 溶剂和溶解的涂膜通过排放管。