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121. 发明申请

US20100231883A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20100231883A1
公开(公告)日：2010-09-16
申请号：US12727482
申请日：2010-03-19
申请人： Aurelian Dodoc , Sascha Bleidistel , Olaf Conradi , Arif Kazi
发明人： Aurelian Dodoc , Sascha Bleidistel , Olaf Conradi , Arif Kazi
IPC分类号： G03B27/54
CPC分类号： G03F7/70891 , G03F7/70308
摘要： A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.
摘要翻译：微光刻投影曝光装置包括产生投影光的一次照明系统，投射物镜和校正光学系统。校正光学系统包括二次照明系统，其产生参考表面中的校正光的强度分布;以及校正元件，其包括加热材料，并且被布置在与参考表面至少基本上光学共轭的平面中，校正光和投射光在撞击在校正元件上之前通过包含在投影物镜中的至少一个透镜。校正光和投影光通过的所有透镜由透镜材料制成，该透镜材料与校正元件中包含的加热材料相比具有较低的校正光吸收系数。

122. 发明授权

US07712905B2 Imaging system with mirror group 有权
标题翻译：镜像组成像系统
公开(公告)号：US07712905B2
公开(公告)日：2010-05-11
申请号：US11578098
申请日：2005-03-22
申请人： David Shafer , Aurelian Dodoc , Alexander Epple , Hans-Juergen Mann
发明人： David Shafer , Aurelian Dodoc , Alexander Epple , Hans-Juergen Mann
IPC分类号： G02B5/08
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： An imaging system for imaging an off-axis object field arranged in an object surface of the imaging system onto an off-axis image field arranged in an image surface of the imaging system while creating at least one intermediate image has: an optical axis; an in-line mirror group having an object side mirror group entry, an image side mirror group exit and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit, the mirror group including: a first mirror having a first mirror surface for receiving radiation coming from the object surface in a first reflecting area asymmetric to the optical axis; at least one second mirror having a second mirror surface facing the first mirror surface for receiving radiation coming from the first mirror in a second reflecting area asymmetric to the optical axis; at least one of the first and second mirrors being a concave mirror having a concave mirror surface defining a mirror axis on the optical axis; wherein the mirrors of the mirror group are arranged such that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. A strong overcorrection of image field curvature can be effected in an axially compact design.
摘要翻译：用于将布置在成像系统的物体表面中的离轴对象场成像到设置在成像系统的图像表面中的离轴图像场同时创建至少一个中间图像的成像系统具有：光轴; 具有对象侧反射镜组入口的直列式反射镜组，横向于所述光轴排列的像侧反射镜组出射和反射镜组平面，并且几何地布置在所述反射镜组入口和所述镜子组出口之间，所述镜组包括：第一反射镜，具有第一反射镜表面，用于在与光轴不对称的第一反射区域中接收来自物体表面的辐射; 至少一个第二反射镜，具有面向第一镜面的第二镜面，用于在不对称于光轴的第二反射区域中接收来自第一反射镜的辐射; 所述第一和第二反射镜中的至少一个是凹面镜，所述凹面镜具有在光轴上限定反射镜轴的凹面镜面; 其中反射镜组的反射镜被布置成使得来自反射镜组入口的辐射通过镜组平面至少四次，并且在离开镜组之前在镜组的凹面镜表面上反射至少两次镜组退出。可以在轴向紧凑的设计中实现图像场曲率的强过度校正。

123. 发明申请

US20100020390A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH PUPIL CORRECTION 审中-公开
标题翻译：具有校正的目标投影目标
公开(公告)号：US20100020390A1
公开(公告)日：2010-01-28
申请号：US12511515
申请日：2009-07-29
申请人： Aurelian Dodoc
发明人： Aurelian Dodoc
IPC分类号： G02B17/08
CPC分类号： G02B17/08 , G02B17/00 , G02B17/0804 , G02B17/0812 , G02B17/0816 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective includes a plurality of optical elements arranged to image an off-axis object field arranged in an object surface onto an off-axis image field arranged in an image surface of the projection objective. The optical elements form: a first, refractive objective part that can generate a first intermediate image from radiation coming from the object surface and including a first pupil surface; a second objective part including at least one concave mirror that can image the first intermediate image into a second intermediate image and including a second pupil surface optically conjugated to the first pupil surface; and a third objective part that can image the second intermediate image onto the image surface and including a third pupil surface optically conjugated to the first and second pupil surface. The optical elements are arranged between the object surface and the first pupil surface form a Fourier lens group which includes a negative lens group arranged optically close to the first pupil surface.
摘要翻译：反射折射投射物镜包括多个光学元件，其布置成将布置在物体表面中的离轴物体场成像到布置在投影物镜的图像表面中的离轴图像场。光学元件形成：第一折射目标部分，其可以从来自物体表面的辐射产生第一中间图像并且包括第一光瞳表面; 第二目标部分，其包括至少一个凹面镜，该凹面镜可将第一中间图像成像为第二中间图像，并且包括与第一光瞳表面光学共轭的第二光瞳表面; 以及第三目标部分，其可以将第二中间图像成像到图像表面上，并且包括与第一和第二光瞳表面光学共轭的第三光瞳表面。光学元件布置在物体表面和第一光瞳表面之间，形成傅里叶透镜组，其包括光学上靠近第一光瞳表面布置的负透镜组。

124. 发明授权

US07557996B2 Projection objective 有权
标题翻译：投影目标
公开(公告)号：US07557996B2
公开(公告)日：2009-07-07
申请号：US11412925
申请日：2006-04-28
申请人： Aurelian Dodoc
发明人： Aurelian Dodoc
IPC分类号： G02B9/00 , G02B17/00
CPC分类号： G02B3/12 , G02B13/143 , G02B17/0812 , G02B17/0844 , G02B17/0892 , G03F7/70341 , G03F7/70958
摘要： A projection objective for imaging a pattern arranged in an object surface of the projection objective onto an image surface of the projection objective using ultraviolet radiation has a plurality of optical elements including transparent optical elements transparent for radiation at an operating wavelength λ, where 260 nm>λ>150 nm, an image-side pupil surface arranged between the object surface and the image surface, and an aperture-defining lens group arranged between the image-side pupil surface and the image surface for converging radiation coming from the image-side pupil surface towards the image surface to define an image-side numerical aperture NA, where 0.7≦NA≦1.4. The aperture-defining lens group includes at least one high-index lens made from a transparent high-index material having a refractive index nHI, where nHI>nSIO2 and where nSIO2 is the refractive index of silicon dioxide (SiO2) at the operating wavelength.
摘要翻译：用于使用紫外线辐射将布置在投影物镜的物体表面中的图案成像到投影物镜的图像表面上的图案的投影物镜具有多个光学元件，包括透明的用于工作波长λ的辐射的透明光学元件，其中260nm> λ= 150nm，布置在物体表面和图像表面之间的图像侧光瞳表面，以及布置在图像侧瞳孔表面和图像表面之间的孔径限定透镜组，用于会聚来自图像侧瞳孔的辐射表面朝向图像表面以限定图像侧数值孔径NA，其中0.7 <= NA <= 1.4。孔径限定透镜组包括至少一个由具有折射率nHI的透明高折射率材料制成的至少一个高折射率透镜，其中nHI> nSIO2，其中nSIO2是工作波长处的二氧化硅（SiO 2）的折射率。

125. 发明申请

US20050207029A1 Catadioptric projection objective 失效
标题翻译：反射折射投影物镜
公开(公告)号：US20050207029A1
公开(公告)日：2005-09-22
申请号：US11036155
申请日：2005-01-18
申请人： Alexander Epple , Aurelian Dodoc
发明人： Alexander Epple , Aurelian Dodoc
IPC分类号： G02B5/00 , G02B17/00 , G02B17/08 , G03F7/20 , H01L21/027
CPC分类号： G02B17/0892 , G02B5/005 , G02B13/22 , G02B17/08 , G03F7/70225 , G03F7/7025 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective which images a pattern arranged in an object plane of the projection objective into the image plane of the projection objective while generating a real intermediate image has a catadioptric objective part having at least one concave mirror and a beam deflecting device and also a dioptric objective part. The imaging system has a system diaphragm having a variable diaphragm diameter for variably limiting the cross section of the radiation passing through the projection objective. This system diaphragm is arranged in the catadioptric objective part, preferably in direct proximity to the concave mirror. The invention enables a projection objective with a simple construction.
摘要翻译：将产生真实中间图像的布置在投影物镜的物平面中的图案成像到投影物镜的像平面内的反射折射投影物镜具有反射折射物镜部分，其具有至少一个凹面镜和光束偏转装置，并且还具有屈光客观部分。成像系统具有可变光阑直径的系统隔膜，用于可变地限制通过投影物镜的辐射的横截面。该系统隔膜布置在反折射物镜部分中，优选地直接靠近凹面镜。本发明能够实现具有简单结构的投影物镜。

126. 发明授权

US09494718B2 Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective 有权
标题翻译： EUV波长范围的镜面，这种反射镜的基板，包括这种反射镜或这种基板的微光刻的投影物镜，以及用于微光刻的投影曝光装置，包括这种投射物镜
公开(公告)号：US09494718B2
公开(公告)日：2016-11-15
申请号：US13525233
申请日：2012-06-15
申请人： Stephan Muellender , Joern Weber , Wilfried Clauss , Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek , Gisela Von Blanckenhagen , Roland Loercher
发明人： Stephan Muellender , Joern Weber , Wilfried Clauss , Hans-Jochen Paul , Gerhard Braun , Sascha Migura , Aurelian Dodoc , Christoph Zaczek , Gisela Von Blanckenhagen , Roland Loercher
IPC分类号： G02B5/08 , G02B1/10 , G03F7/20 , B82Y30/00
CPC分类号： G02B5/0891 , B82Y30/00 , G02B1/10 , G02B1/105 , G02B1/14 , G02B5/0816 , G03F7/70233 , G03F7/70316 , G03F7/70958
摘要： A mirror (1a; 1a′; 1b; 1b′; 1c; 1c′) for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P′″) consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include two individual layers composed of different materials for a high refractive index layer (H′″) and a low refractive index layer (L′″), wherein the layer arrangement includes at least one surface protecting layer (SPL, Lp) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.
摘要翻译：用于EUV波长范围的反射镜（1a; 1a'; 1b; 1b'; 1c; 1c'），并具有衬底（S）和层布置，其中层布置包括至少一个表层系统（P' ）由各层的至少两个周期（P3）的周期性序列组成，其中周期（P3）包括由用于高折射率层（H“”）和低折射率层（H“”）的不同材料组成的两个单独层 L“），其中所述层布置包括至少一个表面保护层（SPL，Lp）或至少一个具有大于20nm，优选大于50nm的厚度的表面保护层系统（SPLS）。

127. 发明授权

US09188771B2 Reflective optical imaging system 有权
标题翻译：反光光学成像系统
公开(公告)号：US09188771B2
公开(公告)日：2015-11-17
申请号：US13313641
申请日：2011-12-07
申请人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
发明人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
IPC分类号： G03B27/68 , G02B17/06
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.
摘要翻译：借助于来自主波长λ0附近的波长范围的电磁辐射，用于将配置在成像系统的物体平面中的图案成像成像系统的图像平面的光学成像系统具有多个反射镜。每个反射镜具有镜面，反射层布置具有单个层序列。

128. 发明授权

US08780441B2 Catadioptric projection objective with pupil correction 有权
标题翻译：反射折射投影物镜与瞳孔校正
公开(公告)号：US08780441B2
公开(公告)日：2014-07-15
申请号：US13226615
申请日：2011-09-07
申请人： Aurelian Dodoc
发明人： Aurelian Dodoc
IPC分类号： G02B17/00 , G02B17/08
CPC分类号： G02B17/08 , G02B17/00 , G02B17/0804 , G02B17/0812 , G02B17/0816 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： The disclosure provides a catadioptric projection objective which includes a plurality of optical elements, including first, second and third refractive objection parts. Optical elements arranged between an object surface and a first pupil surface form a Fourier lens group that includes a negative lens group arranged optically close to the first pupil surface. The Fourier lens group is configured such that a Petzval radius RP at the first pupil surface satisfies the condition: |RP|>150 mm.
摘要翻译：本公开提供了一种反射折射投影物镜，其包括多个光学元件，包括第一，第二和第三折射反射部分。布置在物体表面和第一光瞳表面之间的光学元件形成傅里叶透镜组，其包括光学上靠近第一光瞳表面布置的负透镜组。傅立叶透镜组被配置为使得第一光瞳表面处的彼得兹瓦尔半径RP满足条件：| RP |> 150mm。

129. 发明授权

US08773638B2 Microlithographic projection exposure apparatus with correction optical system that heats projection objective element 有权
标题翻译：具有校正光学系统的微光刻投影曝光装置，其加热投影物镜元件
公开(公告)号：US08773638B2
公开(公告)日：2014-07-08
申请号：US12727482
申请日：2010-03-19
申请人： Aurelian Dodoc , Sascha Bleidistel , Olaf Conradi , Arif Kazi
发明人： Aurelian Dodoc , Sascha Bleidistel , Olaf Conradi , Arif Kazi
IPC分类号： G03B27/54
CPC分类号： G03F7/70891 , G03F7/70308
摘要： A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.
摘要翻译：微光刻投影曝光装置包括产生投影光的一次照明系统，投射物镜和校正光学系统。校正光学系统包括二次照明系统，其产生参考表面中的校正光的强度分布;以及校正元件，其包括加热材料，并且被布置在与参考表面至少基本上光学共轭的平面中，校正光和投射光在撞击在校正元件上之前通过包含在投影物镜中的至少一个透镜。校正光和投影光通过的所有透镜由透镜材料制成，该透镜材料与校正元件中包含的加热材料相比具有较低的校正光吸收系数。

130. 发明申请

US20090128896A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH INTERMEDIATE IMAGE 审中-公开
标题翻译：具有中间图像的CATADIOPTRIC投影目标
公开(公告)号：US20090128896A1
公开(公告)日：2009-05-21
申请号：US11815522
申请日：2006-01-28
申请人： Aurelian Dodoc
发明人： Aurelian Dodoc
IPC分类号： G02B17/08
CPC分类号： G03F7/70225 , G02B17/026 , G02B17/08 , G02B17/0892 , G03F7/70275 , G03F7/70341
摘要： In a catadioptric projection objective for imaging a pattern of a mask arranged in an object surface (as) of the projection objective into an image field arranged in the image surface (IS) of the projection objective, with a demagnifying imaging scale, having at least one concave mirror (CM) and at least one intermediate image, the object plane and the image plane are originated parallel to one another. A deflection system (DS) for deflecting bundles of rays from one part of the projection objective into another part of the projection objective is arranged between the object plane and the image plane. The deflection system contains an image rotating reflection device which is designed to effect an image rotation through 180° by multiple reflection at planar reflection surfaces situated at an angle with respect to one anther, whereby the imaging scale has the same sign in two planes perpendicular to an optical axis and perpendicular to one another.
摘要翻译：在用于将布置在投影物镜的物体表面（as）中的掩模的图案成像成布置在投影物镜的图像表面（IS）中的图像场的反射折射投射物镜中，具有至少具有缩小成像刻度尺一个凹面镜（CM）和至少一个中间图像，物平面和像平面彼此平行地起始。用于将投影物镜的一部分的射线束偏转到投影物镜的另一部分的偏转系统（DS）布置在物平面和像平面之间。偏转系统包含图像旋转反射装置，其被设计成通过相对于一个花药成一定角度的平面反射面处的多次反射来实现180°的图像旋转，由此成像刻度在垂直于光轴并且彼此垂直。

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