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    • 114. 发明申请
    • Perpendicular magnetic write pole formation using an aluminum oxide wrap around mask
    • 使用氧化铝缠绕掩模的垂直磁性写入磁极形成
    • US20080072417A1
    • 2008-03-27
    • US11525788
    • 2006-09-21
    • Yimin HsuVladimir NikitinAron Pentek
    • Yimin HsuVladimir NikitinAron Pentek
    • G11B5/127
    • G11B5/1278G11B5/3146G11B5/315G11B5/3163Y10T29/49041Y10T29/49043Y10T29/49044Y10T29/49046Y10T29/49048Y10T29/49052
    • A method for manufacturing a write pole for a perpendicular magnetic write head. The method includes forming a mask structure over a full film layer of magnetic write pole material. A layer of hard mask material such as conformally deposited alumina is then deposited full film over the mask and write pole material. An ion mill, such as in an Ar or CHF3 chemistry is then used to preferentially remove horizontally disposed portions of the alumina layer (hard mask layer), thereby forming vertical hard mask walls at the sides of the mask structure. An ion mill is then used to form the write pole, with the alumna side walls providing excellent masking for forming well defined write pole edges. A relatively gentle clean up process can then be performed to remove the remaining mask material and side walls. The use of the alumina side walls eliminated the need to use an alumina hard mask that extends over the entire top of the write pole, Because of this, after forming the write pole, a relatively gentle clean up such as TMAH etch and NMP can be used to remove the remaining mask and alumina walls from the write pole.
    • 一种用于制造用于垂直磁写头的写极的方法。 该方法包括在磁性写入磁极材料的全部薄膜层上形成掩模结构。 然后将诸如保形沉积氧化铝的硬掩模材料层沉积在掩模上并写入极材料。 然后使用诸如Ar或CHF 3化学中的离子磨机来优先除去氧化铝层(硬掩模层)的水平设置的部分,从而在掩模结构的侧面形成垂直的硬掩模壁。 然后使用离子磨机形成写柱,校准侧壁为形成良好定义的写极边缘提供了优​​异的掩模。 然后可以执行相对温和的清理过程以除去剩余的掩模材料和侧壁。 使用氧化铝侧壁消除了使用在写入极的整个顶部上延伸的氧化铝硬掩模的需要。因此,在形成写入极之后,可以进行相对温和的清洁,例如TMAH蚀刻和NMP可以 用于从写入极上去除剩余的掩模和氧化铝壁。
    • 115. 发明申请
    • Recessed SiO2 or Si3N4 overcoat for GMR head in magnetic disk drive
    • 用于磁盘驱动器中的GMR磁头的嵌入式SiO2或Si3N4外涂层
    • US20070242393A1
    • 2007-10-18
    • US11809184
    • 2007-05-31
    • Yunxiao GaoAron PentekAlan TamSue Zhang
    • Yunxiao GaoAron PentekAlan TamSue Zhang
    • G11B5/127
    • G11B5/3136G11B5/3106G11B5/3133G11B5/3163Y10T29/49043Y10T29/49044Y10T29/49046Y10T29/49048Y10T29/49052
    • A giant magnetoresistive (GMR) head contains an overcoat layer consisting of silicon dioxide or silicon nitride. These materials have a coefficient of thermal expansion (CTE) that is less than alumina, which is conventionally used for the overcoat layer. As a result, the overcoat layer exhibits a smaller temperature-induced protrusion when the head heats up from friction with the passing air stream. The process of forming the head includes forming a recess in the overcoat layer that reduces the stress on the poles and improves the performance of the head. The process includes depositing a seed layer over the overcoat layer in preparation to plating a metal mask layer with an opening where the recess is to be formed, wet chemical etching the seed layer through the opening in the mask layer and performing an ion milling process to remove any remaining traces of the seed layer. With the seed layer completely removed, a trench having smooth sidewalls and bottom can be etched in the overcoat layer by a reactive ion etch (RIE) process. The saw that is used to separate the head elements in the wafer can be passed through the clean trench without contacting the overcoat layer, thereby avoiding the chipping and cracking that might otherwise result from the use of a silicon dioxide or silicon nitride overcoat layer.
    • 巨磁阻(GMR)磁头包含由二氧化硅或氮化硅组成的外涂层。 这些材料的热膨胀系数(CTE)小于通常用于外涂层的氧化铝。 结果,当头部与通过的空气流的摩擦加热时,外涂层表现出较小的温度引起的突起。 形成头部的过程包括在外涂层中形成凹陷,其减小了磁极上的应力并提高了磁头的性能。 该方法包括在外涂层上沉积种子层,以准备对具有要形成凹部的开口镀金属掩模层,通过掩模层中的开口湿化学蚀刻晶种层并执行离子铣削加工 去除种子层的剩余痕迹。 随着种子层完全去除,可以通过反应离子蚀刻(RIE)工艺在覆盖层中蚀刻具有平滑侧壁和底部的沟槽。 用于分离晶片中的头元件的锯可以通过干净的沟槽而不与外涂层接触,从而避免由于使用二氧化硅或氮化硅外涂层而导致的切屑和裂纹。
    • 120. 发明授权
    • Magnetic write head having a shield that extends below the leading edge of the write pole
    • 磁写头具有在写柱的前缘下方延伸的屏蔽
    • US07715147B2
    • 2010-05-11
    • US11588961
    • 2006-10-27
    • Michael FeldbaumQuang LeAron PentekSue Siyang Zhang
    • Michael FeldbaumQuang LeAron PentekSue Siyang Zhang
    • G11B5/187G11B5/11
    • G11B5/11G11B5/315
    • A magnetic write head for perpendicular magnetic recording that has a write pole and a trailing or side shield that has a leading edge that extends to or beyond the leading edge of write pole, thereby ensuring complete side magnetic shielding. The write head can be formed by forming the write pole on a non-magnetic substrate that is constructed of a material that can be readily removed by reactive ion etching (RIE). The write pole can be formed by depositing a layer of magnetic write pole material over the substrate and then forming a mask over the magnetic write pole material. An ion mill can be performed to define the write pole, and then a reactive ion etch can be performed to notch the substrate, so that when a non-magnetic shield gap material is deposited it will be below or at the bottom of the write pole. Then a magnetic shield material can be deposited to form a shield having a leading edge that extends beyond the leading edge of the write pole.
    • 一种用于垂直磁记录的磁写头,具有写磁极和后屏蔽或侧屏蔽,其具有延伸到或超过写极的前沿的前沿,从而确保完全的侧磁屏蔽。 写头可以通过在由可以通过反应离子蚀刻(RIE)容易地去除的材料构成的非磁性衬底上形成写极来形成。 可以通过在衬底上沉积一层磁性写入磁极材料,然后在磁性写入磁极材料上形成掩模来形成写入极。 可以执行离子磨以限定写入极,然后可以执行反应离子蚀刻以蚀刻衬底,使得当非磁性屏蔽间隙材料沉积时,它将在写入极的下方或底部 。 然后,可以沉积磁屏蔽材料以形成具有延伸超过写柱的前缘的前缘的屏蔽。