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101. 发明申请

US20160252828A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
标题翻译：曝光装置，曝光方法和生产装置的方法
公开(公告)号：US20160252828A1
公开(公告)日：2016-09-01
申请号：US15094678
申请日：2016-04-08
申请人： NIKON CORPORATION
发明人： Naoyuki KOBAYASHI , Soichi OWA , Shigeru HIRUKAWA , Yasuhiro OMURA
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/7075 , G03F7/70891
摘要： An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.
摘要翻译：曝光装置通过液体将基板上的曝光光照射而曝光基板。曝光装置具有用于保持基板的基板保持件，能够移动由基板保持件保持的基板的基板台和用于调整基板保持器的温度的温度调节系统。控制基板的温度，使得基板和液体之间的温度没有差异，从而防止由液体温度变化引起的曝光精度的降低。

102. 发明申请

US20160243707A1 CONVEYING HAND AND LITHOGRAPHY APPARATUS 有权
标题翻译：输送手术和手术装置
公开(公告)号：US20160243707A1
公开(公告)日：2016-08-25
申请号：US15049445
申请日：2016-02-22
申请人： CANON KABUSHIKI KAISHA
发明人： Yasunao Matsuhira
IPC分类号： B25J15/06 , H01L21/677 , G03F7/20 , H01L21/683
CPC分类号： G03F7/70691 , B25J11/0095 , B25J15/0014 , B25J15/0616 , G03F7/7075 , H01L21/67742 , H01L21/6838
摘要： This conveying hand is used for conveying a conveyed object in an adsorbed state with a negative pressure, and comprises a pad having a contact portion that contacts the conveyed object and a concave portion having an internal space that can be evacuated; a base that moves while loading the pad; a first elastic member that movably supports the pad on the base in the direction of gravity of the conveyed object and restricts a movement of the pad on the base in the direction perpendicular to the direction of gravity; and a second elastic member that seals a space communicating with the internal space of the concave portion and movably supports the pad on the base in the direction of gravity.
摘要翻译：该传送手用于以负压在吸附状态下传送被输送物体，并且包括具有接触被输送物体的接触部分的垫和具有可被抽空的内部空间的凹部; 在加载垫时移动的基座; 第一弹性构件，其在所述基部上沿所述输送物体的重力方向可移动地支撑所述垫，并且限制所述垫在所述基部上沿与所述重力方向垂直的方向的移动; 以及第二弹性构件，其密封与所述凹部的内部空间连通的空间，并且在所述基部上沿所述重力方向可移动地支撑所述垫。

103. 发明申请

US20160139514A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20160139514A1
公开(公告)日：2016-05-19
申请号：US14942679
申请日：2015-11-16
申请人： ASML NETHERLANDS B.V.
发明人： Joost Jeroen OTTENS , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate, A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译：光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构，基板的电平参数（例如基板的厚度）由诸如厚度传感器的传感器。通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

104. 发明申请

US20160004173A1 Apparatus for transferring a substrate in a lithography system 有权
标题翻译：用于在光刻系统中传送衬底的装置
公开(公告)号：US20160004173A1
公开(公告)日：2016-01-07
申请号：US14850997
申请日：2015-09-11
申请人： Mapper Lithography IP B.V.
发明人： Vincent Sylvester KUIPER , Erwin SLOT , Marcel Nicolaas Jacobus VAN KERVINCK , Guido DE BOER , Hendrik Jan DE JONG
IPC分类号： G03F7/20
CPC分类号： G03F7/70733 , G03F7/7075 , H01L21/67178 , H01L21/67225 , H01L21/67745
摘要： An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.
摘要翻译：一种用于将基板或基板支撑结构的目标（例如基板被夹紧到其上的基板）从基板传送系统传送到光刻系统的真空室的装置。该装置包括用于将目标物输入和离开真空室的装载锁定室。所述装载锁定室包括具有第一通道的第一壁，所述第一通道提供机器人空间与所述装载锁定室的内部之间的通路;第二壁，其具有提供在所述负载锁定室的内部与所述真空室之间的通路的第二通道，以及用于传送所述目标的多个处理机器人包括：可在所述机器人空间内移动的第一处理机器人，以接近所述基板传送系统和所述第一通道; 以及第二处理机器人，其能够在所述加载锁定室内移动以接近所述第一通道和所述第二通道。

105. 发明申请

US20150355558A1 LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTURING METHOD 有权
公开(公告)号：US20150355558A1
公开(公告)日：2015-12-10
申请号：US14730568
申请日：2015-06-04
申请人： CANON KABUSHIKI KAISHA
发明人： Yoshikazu Miyajima , Hitoshi Nakano
IPC分类号： G03F7/20
CPC分类号： G03F7/70741 , G03F7/0002 , G03F7/7035 , G03F7/70691 , G03F7/7075 , G03F7/70991
摘要： A lithography apparatus includes an original conveying path, a substrate conveying path, and a plurality of patterning devices each configured to perform patterning on a substrate using an original. The plurality of patterning devices are arranged in two rows. The substrate conveying path is provided between and along the two rows. The original conveying path is provided in each of two rows between and along which the two rows of the patterning devices are arranged.
摘要翻译：光刻设备包括原始传送路径，基底传送路径和多个图案形成装置，每个图案形成装置被配置为使用原件在基板上进行图案化。多个图案形成装置被布置成两排。衬底输送路径设置在两行之间并沿着两排。原始传送路径设置在两列图案形成装置之间并且沿其排列的两行中的每一行中。

106. 发明申请

US20150086923A1 SUBSTRATE PROCESSING METHOD 有权
标题翻译：基板处理方法
公开(公告)号：US20150086923A1
公开(公告)日：2015-03-26
申请号：US14555433
申请日：2014-11-26
申请人： SCREEN Semiconductor Solutions Co., Ltd.
发明人： Koji Kaneyama , Masashi Kanaka , Tadashi Miyagi , Kazuhito Shigemori , Shuichi Yasuda , Tetsuya Hamada
IPC分类号： G03F7/20 , G03F7/16
CPC分类号： G03F7/70925 , G03F7/168 , G03F7/7075 , G03F7/70916 , G03F7/70991 , G11B5/8404 , G11B7/261 , H01L21/67051 , H01L21/67225 , Y10S134/902
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a brush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.
摘要翻译：基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块，清洁/干燥处理块，以及一个接口块。曝光装置被布置成与基板处理装置中的界面块相邻。曝光装置通过浸渍方法使基板进行曝光处理。在清洁/干燥处理块的边缘清洁单元中，刷子抵靠旋转基板的一端，从而清洁曝光处理之前的基板的边缘。此时，校正基板被清洁的位置。

107. 发明授权

US08780322B2 Object with an improved suitability for a plasma cleaning treatment 有权
标题翻译：具有改进的适用于等离子体清洗处理的对象
公开(公告)号：US08780322B2
公开(公告)日：2014-07-15
申请号：US12967891
申请日：2010-12-14
申请人： Johannes Maquiné , Herbert Wituschek
发明人： Johannes Maquiné , Herbert Wituschek
IPC分类号： G03B27/52 , G03F7/20 , H01J37/32
CPC分类号： G03F7/70925 , G03F7/707 , G03F7/70741 , G03F7/7075 , H01J37/32862 , H01J37/32889 , Y10T428/24008
摘要： An object suitable for a plasma cleaning treatment in a plasma cleaning device, the object including a first outer surface area; a second outer surface area, wherein the object is constructed and arranged to cooperate with a removable cover such that the cover is connectable to the object to cover the second outer surface area, and wherein the object connected with the removable cover is adapted to be cleaned in the plasma cleaning device such that the plasma cleaning device is not exposed to particles of the second outer surface area and wherein the first outer surface area is cleaned in the plasma cleaning device.
摘要翻译：适用于等离子体清洗装置中的等离子体清洗处理的物体，所述物体包括第一外表面区域; 第二外表面区域，其中所述物体被构造和布置成与可移除的盖配合，使得所述盖可连接到所述物体以覆盖所述第二外表面区域，并且其中与所述可移除盖连接的物体适于被清洁在等离子体清洁装置中使得等离子体清洁装置不暴露于第二外表面区域的颗粒，并且其中第一外表面区域在等离子体清洁装置中被清洁。

108. 发明授权

US08780320B2 Monitoring apparatus and method particularly useful in photolithographically processing substrates 有权
标题翻译：监控设备和方法特别适用于光刻处理基板
公开(公告)号：US08780320B2
公开(公告)日：2014-07-15
申请号：US13936795
申请日：2013-07-08
申请人： Nova Measuring Instruments Ltd.
发明人： Giora Dishon , Moshe Finarov , Zvi Nirel , Yoel Cohen
IPC分类号： G03B27/32 , G03B27/68 , G03B27/52 , G03F7/30
CPC分类号： G03F7/70058 , G01B11/14 , G01N21/88 , G01N21/9501 , G01N21/956 , G01N2021/8867 , G03F7/3028 , G03F7/70525 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70675 , G03F7/7075 , G03F7/70991 , H01L21/67155
摘要： Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.
摘要翻译：用于根据预定的光刻工艺处理衬底的设备包括其中装载衬底的装载站，其中衬底涂覆有光致抗蚀剂材料的涂覆站，其中光致抗蚀剂涂层通过掩模暴露于光的曝光站具有预定图案以在光致抗蚀剂涂层上产生掩模的潜像，其中潜像显影的显影站，卸载基板的卸载站和用于相对于预定参数监测基板的监控站的光刻工艺。

109. 发明授权

US08755025B2 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method 有权
标题翻译：基板输送装置及方法，曝光装置及曝光方法以及装置的制造方法
公开(公告)号：US08755025B2
公开(公告)日：2014-06-17
申请号：US12929591
申请日：2011-02-02
申请人： Nobuyoshi Tanno , Takashi Horiuchi
发明人： Nobuyoshi Tanno , Takashi Horiuchi
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/7075 , G03F7/70925 , H01L21/67051 , H01L21/68707
摘要： A method for exposing a substrate includes holding the substrate on a substrate holding member, irradiating, via a liquid, a light beam to the substrate on the substrate holding member, and removing, after the exposure of the substrate via the liquid, a liquid remained on the substrate before supporting the substrate by a transferring member. The transferring member transfers the exposed substrate from the substrate holding member to outside of the substrate holding member.
摘要翻译：曝光基板的方法包括将基板保持在基板保持部件上，经由液体将光束照射在基板保持部件上的基板上，在基板经由液体曝光后，除去液体残留在通过转印构件支撑衬底之前在衬底上。转印构件将暴露的基板从基板保持构件转移到基板保持构件的外部。

110. 发明申请

US20140055763A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
标题翻译：曝光装置，曝光方法和生产装置的方法
公开(公告)号：US20140055763A1
公开(公告)日：2014-02-27
申请号：US14070021
申请日：2013-11-01
申请人： NIKON CORPORATION
发明人： Naoyuki KOBAYASHI , Soichi OWA , Shigeru HIRUKAWA , Yasuhiro OMURA
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/2041 , G03F7/70341 , G03F7/7075 , G03F7/70891
摘要： An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.
摘要翻译：曝光装置通过液体将基板上的曝光光照射而曝光基板。曝光装置具有用于保持基板的基板保持件，能够移动由基板保持件保持的基板的基板台和用于调整基板保持器的温度的温度调节系统。控制基板的温度，使得基板和液体之间的温度没有差异，从而防止由液体温度变化引起的曝光精度的降低。

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