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101. 发明授权

US07595087B2 Process of forming platinum coating catalyst layer in moisture-generating reactor 失效
标题翻译：在产水反应堆中形成铂涂层催化剂层的工艺
公开(公告)号：US07595087B2
公开(公告)日：2009-09-29
申请号：US10510758
申请日：2003-10-14
申请人： Tadahiro Ohmi , Nobukazu Ikeda , Akihiro Morimoto , Masafumi Kitano , Yukio Minami , Koji Kawada
发明人： Tadahiro Ohmi , Nobukazu Ikeda , Akihiro Morimoto , Masafumi Kitano , Yukio Minami , Koji Kawada
IPC分类号： G21C9/00
CPC分类号： B01J12/007 , B01J21/04 , B01J23/42 , B01J37/0225 , B01J37/0226 , B01J37/08 , C01B5/00
摘要： A barrier film which has uniform thickness and excellent adhesiveness to the base material and superbly functions to protect a platinum film can be formed on the inner wall surface of a moisture-generating reactor at ease and at a low cost. The moisture-generating reactor in which hydrogen and oxygen are reacted to generate moisture without high temperature combustion is made of an alloy containing aluminum. A principally aluminum oxide (Al2O3)-composed barrier film is formed by applying an aluminum selective oxidation treatment on the inner wall surface of the moisture-generating reactor, and thereafter a platinum film is stacked on and stuck to the barrier film so that a platinum coating catalyst layer is formed.
摘要翻译：能够容易地且成本低廉地在发湿反应堆的内壁面上形成具有均匀厚度和对基材的粘合性优异的保护铂膜的保护膜的阻挡膜。其中氢和氧反应产生水分而不进行高温燃烧的发湿反应器由含铝的合金制成。通过在产生水分的反应器的内壁表面上进行铝选择性氧化处理，形成主要为氧化铝（Al 2 O 3）的阻挡膜，然后将铂膜层叠并粘贴在阻挡膜上，使铂形成涂层催化剂层。

102. 发明授权

US07553459B2 Apparatus and reactor for generating and feeding high purity moisture 有权
公开(公告)号：US07553459B2
公开(公告)日：2009-06-30
申请号：US11460087
申请日：2006-07-26
申请人： Tadahiro Ohmi , Nobukazu Ikeda , Yukio Minami , Kouji Kawada , Katunori Komehana , Teruo Honiden , Touru Hirai , Akihiro Morimoto , Toshirou Nariai , Keiji Hirao , Masaharu Taguchi , Osamu Nakamura
发明人： Tadahiro Ohmi , Nobukazu Ikeda , Yukio Minami , Kouji Kawada , Katunori Komehana , Teruo Honiden , Touru Hirai , Akihiro Morimoto , Toshirou Nariai , Keiji Hirao , Masaharu Taguchi , Osamu Nakamura
IPC分类号： B01J10/00 , B01J8/00 , C01B5/00
CPC分类号： B01J3/006 , B01J7/00 , B01J12/007 , C01B5/00
摘要： A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.

103. 发明申请

US20090032115A1 VACUUM THERMAL INSULATING VALVE 失效
标题翻译：真空绝热阀
公开(公告)号：US20090032115A1
公开(公告)日：2009-02-05
申请号：US10597303
申请日：2005-01-13
申请人： Tadahiro Ohmi , Yukio Minami , Kenji Tubota , Tsutomu Shinohara , Michio Yamaji , Nobukazu Ikeda , Akihiro Morimoto , Koji Kawada , Toshio Nariai
发明人： Tadahiro Ohmi , Yukio Minami , Kenji Tubota , Tsutomu Shinohara , Michio Yamaji , Nobukazu Ikeda , Akihiro Morimoto , Koji Kawada , Toshio Nariai
IPC分类号： F16K51/02 , F16K27/00
CPC分类号： F16K51/02 , Y10T137/6606 , Y10T137/7043 , Y10T137/7062
摘要： The present invention provides a vacuum thermal insulating valve that may be used at high temperature in gas supply systems or gas exhaust systems, and also may be made substantially small and compact in size owing to its excellent thermal insulating performance. With a vacuum thermal insulating valve comprising a valve equipped with a valve body and an actuator, and a vacuum thermal insulating box that houses the valve, the afore-mentioned vacuum thermal insulating box S is formed by a square-shaped lower vacuum jacket S5 having a cylinder-shaped vacuum thermal insulating pipe receiving part J on a side and with its upper face made open, and the square-shaped upper vacuum jackets S4, which is hermetically fitted to the lower vacuum jacket S5 and with its lower face made open.
摘要翻译：本发明提供一种真空绝热阀，其可以在气体供给系统或排气系统中在高温下使用，并且由于其绝热性能优异，也可以制成大小小型的真空绝热阀。使用包括阀体和致动器的阀的真空隔热阀和容纳阀的真空保温箱，上述真空保温箱S由方形的下部真空夹套S5形成，圆筒形真空绝热管接收部分J的侧面并且其上表面打开，方形的上部真空夹套S4气密地装配到下部真空套筒S5上并且其下表面打开。

104. 发明申请

US20070252243A1 Semiconductor Device and Manufacturing Method Thereof 失效
标题翻译：半导体器件及其制造方法
公开(公告)号：US20070252243A1
公开(公告)日：2007-11-01
申请号：US11664279
申请日：2004-10-10
申请人： Tadahiro Ohmi , Akihiro Morimoto
发明人： Tadahiro Ohmi , Akihiro Morimoto
IPC分类号： H01L29/04 , H01L21/00 , H01L21/44
CPC分类号： H01L29/7813 , H01L21/84 , H01L27/12 , H01L29/045 , H01L29/41741 , H01L29/456 , H01L29/66734 , H01L29/732 , H01L29/7397 , H01L29/74 , H01L29/744 , H01L29/78603 , H01L2924/0002 , H05K1/053 , H01L2924/00
摘要： As a substrate for a semiconductor device, a metal substrate is used, and the metal substrate is composed of a metal base body made of a first metal and a connecting metal layer made of a second metal for covering the metal base body. The substrate has a structure wherein a diffusion preventing layer for preventing diffusion of the first metal is provided on the connecting metal layer.
摘要翻译：作为半导体装置的基板，使用金属基板，金属基板由第一金属制的金属基体和由覆盖金属基体的第二金属构成的连接金属层构成。基板具有其中在连接金属层上设置防止第一金属扩散的扩散防止层的结构。

105. 发明申请

US20070181965A1 Chip element, manufacturing method thereof, and electronic device or equipment using same 审中-公开
标题翻译：芯片元件及其制造方法以及使用其的电子设备或设备
公开(公告)号：US20070181965A1
公开(公告)日：2007-08-09
申请号：US11702195
申请日：2007-02-05
申请人： Tadahiro Ohmi , Akihiro Morimoto
发明人： Tadahiro Ohmi , Akihiro Morimoto
IPC分类号： H01L29/00
CPC分类号： H01F17/0013 , H01F41/046
摘要： In a chip element having a substrate, an impedance element formed on the substrate, and a plurality of electrodes formed on the substrate to be connected to the impedance element, the substrate is formed of a low-permittivity material having a permittivity low enough to decrease the parasitic capacitance in a GHz range. The substrate further includes at least a synthetic resin and an inorganic compound.
摘要翻译：在具有衬底的芯片元件中，形成在衬底上的阻抗元件和形成在衬底上的多个电极以连接到阻抗元件，衬底由介电常数低的材料形成，其电容率低到足以降低在GHz范围内的寄生电容。基板还包括至少一种合成树脂和无机化合物。

106. 发明授权

US07008598B2 Reactor for generating moisture 有权
标题翻译：反应器产生水分
公开(公告)号：US07008598B2
公开(公告)日：2006-03-07
申请号：US10884917
申请日：2004-07-07
申请人： Tadahiro Ohmi , Kouji Kawada , Nobukazu Ikeda , Akihiro Morimoto , Yukio Minami , Kenji Tubota , Teruo Honiden , Touru Hirai , Katunori Komehana , Keiji Hirao
发明人： Tadahiro Ohmi , Kouji Kawada , Nobukazu Ikeda , Akihiro Morimoto , Yukio Minami , Kenji Tubota , Teruo Honiden , Touru Hirai , Katunori Komehana , Keiji Hirao
IPC分类号： B01J8/02
CPC分类号： B01J12/007 , B01J2219/00058 , B01J2219/00087 , B01J2219/00096 , C01B5/00
摘要： A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell. The reactor comprises: a reactor shell A with an interior space formed with a reactor structural component on the inlet side and a reactor structural component on the outlet side opposed to and united with each other by welding, the reactor structural component 1 on the inlet side provided with a gas feed port 1a and the reactor structural component 2 on the outlet side provided with a moisture gas take-out port 2a; a reflector on the inlet side facing the gas feed port in the interior space of the reactor; a reflector on the outlet side facing the moisture gas take-out port in the interior space; and a platinum coat catalyst layer 8 formed on the inside wall of the reactor structural component on the outlet side, wherein hydrogen and oxygen fed into the interior space of the reactor through the gas feed port are brought into contact with the platinum coat 8b to activate the reactivity, thereby reacting hydrogen and oxygen into water in a non-combustion state.
摘要翻译：一种用于产生水分的反应器，其中更加完全地防止了氢气的点燃，气体供应源侧的反应，内部的铂涂层催化剂层的剥离，从而进一步提高了产生水分的反应器的安全性，减少内部空间以进一步减小反应器壳体的尺寸。反应器包括：反应器壳体A，内部空间形成有入口侧的反应器结构部件，出口侧的反应器结构部件通过焊接彼此相对并且彼此结合，反应器结构部件1在入口侧设置有气体供给口1a和在排气侧设置有湿气取出口2a的反应器结构部件2; 入口侧的反射器，其面对反应器内部空间中的气体供给口; 出口侧的反射器面向内部空间中的湿气取出口; 以及形成在出口侧的反应器结构部件的内壁上的铂涂层催化剂层8，其中通过气体供给口供给到反应器的内部空间中的氢和氧与铂涂层8b相接触，激活反应性，从而使氢和氧在非燃烧状态下反应成水。

107. 发明申请

US20050157834A1 Method for forming platinum coating catalyst layer in reaction furnace ofr generating water gas 失效
标题翻译：在产生水煤气的反应炉中形成铂涂层催化剂层的方法
公开(公告)号：US20050157834A1
公开(公告)日：2005-07-21
申请号：US10510758
申请日：2003-10-14
申请人： Tadahiro Ohmi , Nobukazu Ikeda , Akihiro Morimoto , Masafumi Kitano , Yukio Minami , Koji Kawada
发明人： Tadahiro Ohmi , Nobukazu Ikeda , Akihiro Morimoto , Masafumi Kitano , Yukio Minami , Koji Kawada
IPC分类号： B01J21/04 , B01J23/42 , B01J32/00 , B01J37/02 , B01J37/08 , B01J37/10 , C01B5/00 , G21C9/00
CPC分类号： B01J12/007 , B01J21/04 , B01J23/42 , B01J37/0225 , B01J37/0226 , B01J37/08 , C01B5/00
摘要： A barrier film which has uniform thickness and excellent adhesiveness to the base material and superbly functions to protect a platinum film can be formed on the inner wall surface of a moisture-generating reactor at ease and at a low cost. The moisture-generating reactor in which hydrogen and oxygen are reacted to generate moisture without high temperature combustion is made of an alloy containing aluminum. A principally aluminum oxide (Al2O3)-composed barrier film is formed by applying an aluminum selective oxidation treatment on the inner wall surface of the moisture-generating reactor, and thereafter a platinum film is stacked on and stuck to the barrier film so that a platinum coating catalyst layer is formed.
摘要翻译：能够容易地且成本低廉地在发湿反应堆的内壁面上形成具有均匀厚度和对基材的粘合性优异的保护铂膜的保护膜的阻挡膜。其中氢和氧反应产生水分而不进行高温燃烧的发湿反应器由含铝的合金制成。主要由氧化铝（Al 2 O 3 O 3）组成的阻挡膜是通过在产生水分的反应器的内壁表面上进行铝选择性氧化处理而形成的，然后将铂膜层叠并粘贴到阻挡膜上，从而形成铂涂层催化剂层。

108. 发明申请

US20050126030A1 Rotary silicon wafer cleaning apparatus 有权
标题翻译：旋转硅片清洗装置
公开(公告)号：US20050126030A1
公开(公告)日：2005-06-16
申请号：US10498800
申请日：2003-09-11
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Takumi Fujita , Yukio Minami , Nobukazu Ikeda , Akihiro Morimoto , Koji Kawada
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Takumi Fujita , Yukio Minami , Nobukazu Ikeda , Akihiro Morimoto , Koji Kawada
IPC分类号： H01L21/304 , F26B17/24 , F26B17/30 , H01L20060101 , H01L21/00 , H01L21/02 , H01L21/30 , H01L21/302
CPC分类号： H01L21/67034 , H01L21/02052
摘要： It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments. According to the present invention, a rotation type silicon wafer cleaning device has a silicon wafer support/rotation driving mechanism inside the case body for cleaning the silicon wafer at the post chemical cleaning with pure water, drying and hydrogen termination treatments on the outer surface of a silicon wafer is performed by means of installing a silicon wafer drying device comprising a gas supply panel attached to a case body to supply a mixed gas of the hydrogen gas and inactive gas containing a hydrogen gas of more than 0.05%, a mixed gas supply pipe coupled to a gas mixer of the afore-mentioned gas supply panel at one end, a mixed gas heating device to heat the mixed gas in the afore-mentioned gas supply pipe, and a hydrogen radical formation apparatus equipped with a platinum coating film to form hydrogen radical at the gas contacting part where to a high temperature gas heated with the afore-mentioned mixed gas heating device touches, thus to gush out the mixed gas containing hydrogen radical formed with the afore-mentioned radical formation apparatus onto the rotating silicon wafer after cleaning is completed.
摘要翻译：本发明的目的是提供一种旋转型硅晶片清洁装置，以在化学和纯净水清洗处理完成之后通过在硅晶片上提供更好的氢终止来进一步提高硅晶片的稳定性。根据本发明，旋转型硅晶片清洗装置在壳体内部具有硅晶片支撑/旋转驱动机构，用于在后期化学清洗时用纯水清洗硅晶片，在外表面上进行干燥和氢终止处理通过安装硅晶片干燥装置来执行硅晶片，所述硅晶片干燥装置包括附接到壳体的气体供应板，以供应氢气和含有大于0.05％的氢气的惰性气体的混合气体，混合气体供应一端连接上述气体供给面板的气体混合器的管道，将上述气体供给管内的混合气体加热的混合气体加热装置以及配备有铂镀膜的氢自由基形成装置，在与上述混合气体加热装置加热的高温气体接触的气体接触部分处形成氢自由基，从而喷出混合气体在完成清洁之后，将上述自由基形成装置形成的氢基团固定在旋转的硅晶片上。

109. 发明授权

US06848470B2 Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus 有权
标题翻译：平行分流式流体供给装置和流体切换式压力式流量控制方法以及用于同一流体供给装置的流体切换型压力式流量控制系统
公开(公告)号：US06848470B2
公开(公告)日：2005-02-01
申请号：US10775104
申请日：2004-02-11
申请人： Tadahiro Ohmi , Satoshi Kagatsume , Kazuhiko Sugiyama , Yukio Minami , Kouji Nishino , Ryousuke Dohi , Katsunori Yonehana , Nobukazu Ikeda , Michio Yamaji , Jun Hirose , Kazuo Fukazawa , Hiroshi Koizumi , Hideki Nagaoka , Akihiro Morimoto , Tomio Uno , Eiji Ideta , Atsushi Matsumoto , Toyomi Uenoyama , Takashi Hirose
发明人： Tadahiro Ohmi , Satoshi Kagatsume , Kazuhiko Sugiyama , Yukio Minami , Kouji Nishino , Ryousuke Dohi , Katsunori Yonehana , Nobukazu Ikeda , Michio Yamaji , Jun Hirose , Kazuo Fukazawa , Hiroshi Koizumi , Hideki Nagaoka , Akihiro Morimoto , Tomio Uno , Eiji Ideta , Atsushi Matsumoto , Toyomi Uenoyama , Takashi Hirose
IPC分类号： G05D7/06
CPC分类号： G05D7/0658 , G05D7/0664 , Y10S438/935 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/86389 , Y10T137/87877 , Y10T137/87917
摘要： A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time Δt from the starting point.The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.
摘要翻译：一种流体供给装置，具有从一个压力调节器分支出的多个流动管线，流动线平行布置并构造成使得打开或关闭一个流动通道对其它流动通道的稳定流动将没有暂时的影响。每个流路设置有时间延迟型质量流量控制器MFC，使得当一个封闭流体通道打开时，该流路上的质量流量控制器在起始点处以特定延迟时间Deltat达到设定流量Qs。本发明包括通过一个压力式流量控制系统以高精度控制多种气体类型的方法和装置。

110. 发明授权

US06820632B2 Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus 有权
标题翻译：平行分流式流体供给装置和流体切换式压力式流量控制方法以及用于同一流体供给装置的流体切换型压力式流量控制系统
公开(公告)号：US06820632B2
公开(公告)日：2004-11-23
申请号：US10162552
申请日：2002-06-06
申请人： Tadahiro Ohmi , Satoshi Kagatsume , Kazuhiko Sugiyama , Yukio Minami , Kouji Nishino , Ryousuke Dohi , Katsunori Yonehana , Nobukazu Ikeda , Michio Yamaji , Jun Hirose , Kazuo Fukazawa , Hiroshi Koizumi , Hideki Nagaoka , Akihiro Morimoto , Tomio Uno , Eiji Ideta , Atsushi Matsumoto , Toyomi Uenoyama , Takashi Hirose
发明人： Tadahiro Ohmi , Satoshi Kagatsume , Kazuhiko Sugiyama , Yukio Minami , Kouji Nishino , Ryousuke Dohi , Katsunori Yonehana , Nobukazu Ikeda , Michio Yamaji , Jun Hirose , Kazuo Fukazawa , Hiroshi Koizumi , Hideki Nagaoka , Akihiro Morimoto , Tomio Uno , Eiji Ideta , Atsushi Matsumoto , Toyomi Uenoyama , Takashi Hirose
IPC分类号： G05D706
CPC分类号： G05D7/0658 , G05D7/0664 , Y10S438/935 , Y10T137/0396 , Y10T137/7759 , Y10T137/7761 , Y10T137/86389 , Y10T137/87877 , Y10T137/87917
摘要： A fluid supply apparatus with a plurality of flow lines branching out from one pressure regulator with the flow lines arranged in parallel and constructed so that opening or closing one flow passage will have no transient effect on the steady flow of the other flow passages. Each flow passage is provided with a time delay-type mass flow controller MFC so that when one closed fluid passage is opened, the mass flow controller on that flow passage reaches a set flow rate Qs in a specific delay time At from the starting point. The invention includes a method and an apparatus in which a plurality of gas types can be controlled in flow rate with high precision by one pressure-type flow control system.
摘要翻译：一种流体供给装置，具有从一个压力调节器分支出的多个流动管线，流动线平行布置并构造成使得打开或关闭一个流动通道对其它流动通道的稳定流动将没有暂时的影响。每个流路设置有时间延迟型质量流量控制器MFC，使得当一个封闭流体通道打开时，该流路上的质量流量控制器在起始点处达到特定延迟时间At的设定流量Qs。本发明包括通过一个压力式流量控制系统以高精度控制多种气体类型的方法和装置。

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