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91. 发明授权

US08318609B2 Method of depositing materials on a non-planar surface 失效
标题翻译：在非平面表面上沉积材料的方法
公开(公告)号：US08318609B2
公开(公告)日：2012-11-27
申请号：US12633589
申请日：2009-12-08
申请人： Dan Marohl , Timothy J. Franklin , Ratson Morad
发明人： Dan Marohl , Timothy J. Franklin , Ratson Morad
IPC分类号： H01L21/31
CPC分类号： H01L21/67706 , C23C14/505 , H01L21/6776
摘要： A carrier for effectuating semiconductor processing on a non-planar substrate is disclosed. The carrier is configured for holding at least one non-planar substrate throughout a semiconductor processing step and concurrently rotating non-planar substrates as they travel down a translational path of a processing chamber. As the non-planar substrates simultaneously rotate and translate down a processing chamber, the rotation exposes the whole or any desired portion of the surface area of the non-planar substrates to the deposition process, allowing for uniform deposition as desired. Alternatively, any predetermined pattern is able to be exposed on the surface of the non-planar substrates. Such a carrier effectuates manufacture of non-planar semiconductor devices, including, but not limited to, non-planar light emitting diodes, non-planar photovoltaic cells, and the like.
摘要翻译：公开了一种用于在非平面基板上实现半导体处理的载体。载体构造成用于在整个半导体处理步骤中保持至少一个非平面基底，并且当它们沿着处理室的平移路径行进时同时旋转非平面基底。随着非平面基板同时旋转并且向下平移处理室，旋转将非平面基板的表面积的整个或任何所需部分暴露于沉积工艺，从而允许根据需要均匀沉积。或者，任何预定图案能够暴露在非平面基板的表面上。这种载体实现非平面半导体器件的制造，包括但不限于非平面发光二极管，非平面光伏电池等。

92. 发明授权

US08268080B2 Apparatus and method for preparing composite particulates using vapor deposition 有权
标题翻译：使用气相沉积制备复合颗粒的装置和方法
公开(公告)号：US08268080B2
公开(公告)日：2012-09-18
申请号：US12395958
申请日：2009-03-02
申请人： Go Sudo , Kenji Katori , Hayato Hommura , Hiroshi Matsuki , Akio Kayanuma
发明人： Go Sudo , Kenji Katori , Hayato Hommura , Hiroshi Matsuki , Akio Kayanuma
IPC分类号： C23C16/00 , B05C15/00 , B05C11/02 , B05D3/12
CPC分类号： C23C14/24 , C23C14/22 , C23C14/505 , C23C14/545
摘要： Disclosed herein is an apparatus for preparing composite particulates, including a rotary body having a bottom surface and a side wall and operative to contain particulates to which an adhering material is to be made to adhere; a centrifugal machine for rotating the rotary body so as to apply centrifugal forces to the particulates in the rotary body; and an inclination varying device operative to vary the inclination of the rotary body to an arbitrary inclination angle in the range from an angle at which the bottom surface of the rotary body forms a horizontal surface perpendicular to the direction of gravity to an angle at which the bottom surface forms a vertical surface parallel to the direction of gravity, and operative to support the rotary body at the arbitrary inclination angle.
摘要翻译：本文公开了一种制备复合颗粒的装置，包括具有底表面和侧壁的旋转体，并且可操作地容纳要使粘附材料粘附的微粒; 离心机，用于使旋转体旋转，从而向旋转体内的微粒施加离心力; 以及倾斜变化装置，其可操作以将旋转体的倾斜度在从旋转体的底面形成与重力方向垂直的水平面的角度到任意倾斜角的范围内变化到底面形成平行于重力方向的垂直表面，并以可任意倾斜的角度支撑旋转体。

93. 发明申请

US20120223048A1 System for Fabricating a Pattern on Magnetic Recording Media 审中-公开
标题翻译：在磁记录介质上制作图案的系统
公开(公告)号：US20120223048A1
公开(公告)日：2012-09-06
申请号：US13392246
申请日：2010-08-26
申请人： Ajit Paranjpe , Todd A. Luse , Roger P. Fremgen , Narasimhan Srinivasan , Boris L. Druz , Katrina Rook , Adrian Celaru
发明人： Ajit Paranjpe , Todd A. Luse , Roger P. Fremgen , Narasimhan Srinivasan , Boris L. Druz , Katrina Rook , Adrian Celaru
IPC分类号： G11B5/84 , B44C1/22 , B05C13/02
CPC分类号： G11B5/855 , C23C14/042 , C23C14/046 , C23C14/505 , H01L21/67173 , H01L21/67709 , H01L21/67712 , H01L21/67718 , H01L21/67742 , H01L21/67754
摘要： An inline processing system for patterning magnetic recording layers on hard discs for use in a hard disc drive. Discs are processed on both sides simultaneously in a vertical orientation, in round plate-like holders called MDCs. A plurality (as many as 10) discs are held in a dial carrier of the MDC, and transferred from one process station to another. The dial carrier of the MDC may be rotated and/or angled at up to 70° from normal in each process station, so that one or a plurality of process sources may treat the discs simultaneously. This configuration provides time savings and a reduction in the number and size of process sources needed. A mask enhancement process for patterning of magnetic media, and a filling and planarizing process used therewith, are also disclosed.
摘要翻译：一种用于在用于硬盘驱动器的硬盘上图案化磁记录层的在线处理系统。光盘在垂直方向同时处理，在称为MDC的圆盘状支架中。多个（多达10个）盘被保存在MDC的拨号载体中，并从一个处理站传送到另一个处理站。 MDC的拨号盘可以在每个处理站中与正常旋转和/或成角度高达70°，使得一个或多个处理源可以同时处理盘。此配置可节省时间并减少所需的进程源的数量和大小。还公开了用于磁性介质图案化的掩模增强工艺，以及与其一起使用的填充和平坦化工艺。

94. 发明申请

US20120199919A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：半导体器件及其制造方法
公开(公告)号：US20120199919A1
公开(公告)日：2012-08-09
申请号：US13386259
申请日：2010-07-29
申请人： Takashi Nakagawa , Naomu Kitano , Kazuaki Matsuo , Motomu Kosuda , Toru Tatsumi
发明人： Takashi Nakagawa , Naomu Kitano , Kazuaki Matsuo , Motomu Kosuda , Toru Tatsumi
IPC分类号： H01L29/772 , C23C16/503 , C23C16/52 , H01L21/336
CPC分类号： C23C14/0641 , C23C14/0042 , C23C14/0068 , C23C14/225 , C23C14/35 , C23C14/505 , H01L21/28088 , H01L21/28194 , H01L29/4966 , H01L29/517 , H01L29/6659 , H01L29/7833
摘要： A gate electrode achieves a desired work function in a semiconductor device including a field-effect transistor equipped with a gate electrode composed of a metal nitride layer.The semiconductor device includes a silicon substrate and a field-effect transistor provided on the silicon substrate and having a gate insulating film and a gate electrode provided on the gate insulating film. The gate insulating film includes a high-permittivity insulating film formed of a metal oxide, a metal silicate, a metal oxide introduced with nitrogen, or a metal silicate introduced with nitrogen, and the gate electrode includes at least a metal nitride layer containing Ti and N. At least a part which is in contact with the gate insulating film of the metal nitride layer has a molar ratio between Ti and N (N/Ti ratio) of not less than 1.15 and a film density of not less than 4.7 g/cc.
摘要翻译：栅电极在包括具有由金属氮化物层构成的栅电极的场效应晶体管的半导体器件中实现期望的功函数。半导体器件包括硅衬底和设置在硅衬底上并具有栅极绝缘膜和设置在栅极绝缘膜上的栅电极的场效应晶体管。栅极绝缘膜包括由金属氧化物，金属硅酸盐，被引入氮的金属氧化物或引入氮的金属硅酸盐形成的高电容率绝缘膜，并且所述栅电极至少包括含有Ti的金属氮化物层和与金属氮化物层的栅极绝缘膜接触的至少一部分具有Ti和N（N / Ti比）之间的摩尔比不小于1.15，膜密度不小于4.7g / cc。

95. 发明申请

US20120164354A1 SPUTTERING APPARATUS AND MANUFACTURING METHOD OF ELECTRONIC DEVICE 审中-公开
标题翻译：电子设备的溅射装置和制造方法
公开(公告)号：US20120164354A1
公开(公告)日：2012-06-28
申请号：US13315576
申请日：2011-12-09
申请人： Yuichi Otani , Nobuo Yamaguchi
发明人： Yuichi Otani , Nobuo Yamaguchi
IPC分类号： C23C14/34
CPC分类号： C23C14/352 , C23C14/185 , C23C14/505 , H01J37/3417 , H01J37/3435 , H01J37/3447
摘要： The present invention provides a sputtering apparatus that can efficiently laminate thin films in a short time without lowering throughputs, and a manufacturing method of an electronic device. The sputtering apparatus according to an embodiment of the present invention includes a rotatable substrate holder, four target holders obliquely arranged with respect to the substrate holder, and a first shutter and a second shutter that each are provided between the target holders and the substrate holder and have two holes arranged two-fold symmetrical with respect to a rotational axis X. Two of the four target holders are first group target holders arranged two-fold symmetrical with respect to the rotational axis X, and the other two target holders are second group target holders arranged between the first group target holders and two-fold symmetrical with respect to the rotational axis X.
摘要翻译：本发明提供一种可以在短时间内有效地层叠薄膜而不降低生产率的溅射装置，以及电子装置的制造方法。根据本发明的实施例的溅射装置包括可旋转的基板保持器，相对于基板保持器倾斜布置的四个目标保持器，以及分别设置在目标保持器和基板保持器之间的第一闸板和第二闸板，具有相对于旋转轴线X对称布置的两个孔。四个目标支架中的两个是相对于旋转轴线X布置成双重对称的第一组目标支架，另外两个目标支架是第二组目标保持器布置在第一组目标保持器之间并且相对于旋转轴线X对称的两折。

96. 发明申请

US20120164326A1 COATING DEPOSITION APPARATUS AND METHOD THEREFOR 有权
标题翻译：涂层沉积装置及其方法
公开(公告)号：US20120164326A1
公开(公告)日：2012-06-28
申请号：US12977298
申请日：2010-12-23
申请人： James W. Neal
发明人： James W. Neal
IPC分类号： C23C16/448 , C23C16/48 , B05C13/00
CPC分类号： C23C14/228 , C23C14/30 , C23C14/505
摘要： A coating deposition apparatus includes a plurality of mounts that are adapted to mount work pieces at respective work piece locations. A crucible is located adjacent the plurality of mounts for emitting a source coating material. A plurality of gas nozzles are respectively directed at the work piece locations to scatter the emitted source coating material at surfaces of the work pieces that are otherwise difficult to coat.
摘要翻译：涂层沉积设备包括多个安装件，其适于在相应的工件位置安装工件。坩埚位于多个安装座附近，用于发射源涂层材料。多个气体喷嘴分别指向工件位置，以将发射的源涂层材料散布在其它难以涂覆的工件的表面处。

97. 发明申请

US20120160675A1 LOADING DEVICE AND SPUTTERING DEVICE USING SAME 失效
标题翻译：使用相同的装载装置和喷射装置
公开(公告)号：US20120160675A1
公开(公告)日：2012-06-28
申请号：US13091136
申请日：2011-04-21
申请人： CHUNG-PEI WANG
发明人： CHUNG-PEI WANG
IPC分类号： C23C14/34
CPC分类号： B65G29/00 , C23C14/505 , C23C14/56
摘要： A sputtering device includes a main body and a loading device received in the main body. The main body includes a top portion, a bottom portion, and a sidewall connected between the top portion and the bottom portion, an upper bearing mounted on the top portion, and a lower bearing mounted on the bottom portion. The loading device includes an outer frame, an inner frame received in the outer frame, and a gear device arranged between the outer frame and the in inner frame. The outer frame is rotatably connected to the upper bearing and includes a plurality of first rods arranged in a first circle. The inner frame is rotatably connected to the lower bearing and includes a plurality of second rods arranged in a second circle. The gear device is configured for bringing the outer frame and the inner frame to rotate in opposite directions.
摘要翻译：溅射装置包括容纳在主体中的主体和装载装置。主体包括顶部，底部和连接在顶部和底部之间的侧壁，安装在顶部上的上轴承和安装在底部上的下轴承。装载装置包括外框架，容纳在外框架中的内框架和布置在外框架和内框架之间的齿轮装置。外框架可旋转地连接到上轴承并且包括布置在第一圆中的多个第一杆。内框架可旋转地连接到下轴承并且包括布置在第二圆圈中的多个第二杆。齿轮装置构造成使外框架和内框架沿相反方向旋转。

98. 发明申请

US20120160670A1 Target Cooling Device 审中-公开
标题翻译：目标冷却装置
公开(公告)号：US20120160670A1
公开(公告)日：2012-06-28
申请号：US13380203
申请日：2010-06-23
申请人： Joska Johannes Broekmaat , Jan Arnaud Janssens , Jan Matthijn Dekkers
发明人： Joska Johannes Broekmaat , Jan Arnaud Janssens , Jan Matthijn Dekkers
IPC分类号： C23C14/34
CPC分类号： C23C14/28 , C23C14/505 , C23C14/54 , H01L21/67109
摘要： The invention relates to a laser deposition device, comprising at least one target, a substrate arranged opposite of the at least one target and a laser for generating a laser beam, which beam is directed on the target, such that a plasma plume of target material is generated and is deposited onto the substrate, further comprising a base frame, a rotatable target frame with at least two target holders arranged in the base frame and at least one cooling device arranged to the base frame, which cooling device can be moved relative to the target frame to bring the cooling device in heat exchanging contact with the target frame.
摘要翻译：本发明涉及一种激光沉积装置，其包括至少一个靶，与至少一个靶相对布置的基底和用于产生激光束的激光束，该激光束被引导到靶上，使得靶材料的等离子体羽流并且被沉积到基底上，还包括基架，可旋转的目标框架，其中至少两个目标夹持器布置在基座框架中，以及至少一个冷却装置，布置在基座框架上，该冷却装置可以相对于目标框架使冷却装置与目标框架热交换接触。

99. 发明授权

US08206507B2 Evaporation method, evaporation device and method of fabricating light emitting device 有权
标题翻译：蒸发方法，蒸发装置和制造发光装置的方法
公开(公告)号：US08206507B2
公开(公告)日：2012-06-26
申请号：US12487843
申请日：2009-06-19
申请人： Shunpei Yamazaki , Masakazu Murakami
发明人： Shunpei Yamazaki , Masakazu Murakami
IPC分类号： C23C16/00
CPC分类号： C23C14/00 , C23C14/042 , C23C14/12 , C23C14/24 , C23C14/243 , C23C14/246 , C23C14/505 , C23C14/564 , C23C14/568 , H01L51/001 , H05B33/10
摘要： The invention provides an evaporation apparatus, which is able to improve an efficiency of evaporation materials, uniformity of deposited films, and throughput of the evaporation process. Disclosed is an evaporation source holder, which is installed in an evaporation chamber and configured to hold an evaporation material, and a moving mechanism, which is configured to move the evaporation source holder during evaporation of the evaporation material. The evaporation apparatus is further characterized by a shutter over the evaporation source holder, a filter over the shutter, and a heater surrounding the filter.
摘要翻译：本发明提供一种蒸发装置，其能够提高蒸发材料的效率，沉积膜的均匀性和蒸发过程的通过量。公开了一种蒸发源保持器，其安装在蒸发室中并构造成保持蒸发材料，以及移动机构，其构造成在蒸发材料蒸发期间移动蒸发源保持器。蒸发装置的特征还在于蒸发源支架上的快门，快门上的过滤器和围绕过滤器的加热器。

100. 发明授权

US08182861B2 Methods and devices for monitoring and controlling thin film processing 有权
标题翻译：用于监控和控制薄膜加工的方法和装置
公开(公告)号：US08182861B2
公开(公告)日：2012-05-22
申请号：US12902476
申请日：2010-10-12
申请人： William David Lee , Dale C. Ness , Alan D. Streater
发明人： William David Lee , Dale C. Ness , Alan D. Streater
IPC分类号： C23C16/52
CPC分类号： C23C14/505 , C23C14/546 , C23C14/547 , C23C16/4584 , C23C16/52
摘要： Thin film processing systems and methods are provided having a moving deposition sensor capable of translation and/or rotation in a manner that exposes the sensor to thin film deposition environments in a flux region substantially the same as the deposition environments experienced by one or more moveable substrates during a selected deposition period. In one embodiment, a thin film monitoring and control system is provided wherein one or more moveable substrates and a moveable deposition sensor are moved along substantially coincident trajectories in a flux region of a thin film deposition system for a selected deposition period. Systems and methods of the present invention may include SC-cut quartz crystal microbalance sensors capable of excitation of at least two different resonant modes.
摘要翻译：提供薄膜处理系统和方法，其具有移动的沉积传感器，该移动沉积传感器能够以与由一个或多个可移动基板经历的沉积环境基本相同的通量区域中将传感器暴露于薄膜沉积环境的方式进行平移和/或旋转在选定的沉积期间。在一个实施例中，提供了一种薄膜监视和控制系统，其中一个或多个可移动基板和可移动沉积传感器在选定的沉积周期的薄膜沉积系统的通量区域中沿着基本上重合的轨迹移动。本发明的系统和方法可以包括能够激发至少两种不同谐振模式的SC切割石英晶体微量天平传感器。

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