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    • 92. 发明授权
    • Manufacturing process of electrodes for electrolysis
    • 电解电极的制造工艺
    • US08337958B2
    • 2012-12-25
    • US12381962
    • 2009-03-18
    • Yi CaoMasashi Hosonuma
    • Yi CaoMasashi Hosonuma
    • C23C14/30C23C14/58B05D3/02B05D5/12
    • C25B11/0426C23C14/16C23C14/325C23C14/5806C23C14/5853C25C7/02
    • A process for manufacturing electrodes for electrolysis, including the steps of forming an arc ion plating undercoating layer comprising valve metal or valve metal alloy including a crystalline tantalum component and a crystalline titanium component on the surface of the electrode substrate comprising valve metal or valve metal alloy, by an arc ion plating method; heat sintering the electrode substrate to transform only the tantalum component of the arc ion plating undercoating layer into an amorphous substance; and forming an electrode catalyst layer on the surface of the arc ion plating undercoating layer including the valve metal or valve metal alloy including the tantalum component transformed to the amorphous substance and the crystalline titanium component.
    • 一种制造电解电极的方法,包括以下步骤:在电极基材的表面上形成包括结晶钽组分和结晶钛组分的阀金属或阀金属合金的电弧离子镀底涂层,其包括阀金属或阀金属合金 ,通过电弧离子镀法; 对电极基板进行加热烧结,仅将电弧离子电镀底涂层的钽成分变形为无定形物质; 以及在包括转换成非晶体的钽成分和结晶钛成分的阀金属或阀金属合金的电弧离子电镀底涂层的表面上形成电极催化剂层。
    • 93. 发明授权
    • Metal separator for fuel cell and manufacturing method thereof
    • 燃料电池用金属隔板及其制造方法
    • US08298723B2
    • 2012-10-30
    • US12594825
    • 2008-03-05
    • Shinichi TanifujiHirotaka ItoToshiki SatoJun SuzukiYoshinori ItoJun Hisamoto
    • Shinichi TanifujiHirotaka ItoToshiki SatoJun SuzukiYoshinori ItoJun Hisamoto
    • H01M8/04
    • C23C14/22C22C5/02C22C5/04C22C14/00C22C16/00C22C27/02C23C14/16C23C14/165C23C14/345H01M8/0206H01M8/0208H01M8/021H01M8/0228Y02P70/56
    • A metal separator 1 for a fuel cell according to the invention is a metal separator for a fuel cell manufactured by using a metal substrate 2 with a flat surface, or with concave gas flow paths formed on at least a part of the surface. The metal separator 1 includes an acid-resistant metal film 3 formed over the surface of the metal substrate 2, and containing one or more kinds of non-noble metals selected from the group comprised of Zr, Nb, and Ta, and a conductive alloy film 4 formed over the acid-resistant metal film 3, and containing one or more kinds of noble metals selected from the group comprised of Au and Pt, and one or more kinds of non-noble metals selected from the group comprised of Zr, Nb, and Ta. A method for manufacturing the metal separator for a fuel cell according to the invention includes a step S1 of depositing an acid-resistant metal film, and a step S2 of depositing a conductive alloy film. With this structure, the invention provides the metal separator for a fuel cell with an excellent acid resistance and a low contact resistance, and a manufacturing method thereof.
    • 根据本发明的用于燃料电池的金属隔板1是通过使用具有平坦表面的金属基板2或者形成在表面的至少一部分上的凹入气体流路而制造的用于燃料电池的金属隔板。 金属隔板1包括在金属基板2的表面上形成的耐酸金属膜3,并且含有选自Zr,Nb,Ta中的一种以上的非贵金属和导电性合金 在耐酸金属膜3上形成的含有选自Au和Pt的一种或多种贵金属的一种或多种选自Zr,Nb ,和Ta。 根据本发明的燃料电池用金属隔板的制造方法包括沉积耐酸金属膜的工序S1和沉积导电性合金膜的工序S2。 利用该结构,本发明提供了具有优异的耐酸性和低接触电阻的燃料电池用金属隔板及其制造方法。
    • 94. 发明授权
    • Filtered cathodic arc deposition method and apparatus
    • 过滤阴极电弧沉积方法和装置
    • US08282794B2
    • 2012-10-09
    • US12695764
    • 2010-01-28
    • Vladimir Gorokhovsky
    • Vladimir Gorokhovsky
    • C23C14/35C23C14/00
    • C23C14/0605C23C14/022C23C14/0641C23C14/0647C23C14/16C23C14/325C23C14/355C23C14/48C23C16/36H01J37/32055H01J37/3266
    • An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow. In a further embodiment a second arc source is activated to coat the substrates while a first arc source is activated, and the magnetic deflecting system for the first arc source is deactivated to confine plasma to the cathode chamber but permit electrons to flow into the coating chamber for plasma immersed treatment of the substrates. A load lock shutter may be provided between the plasma duct and the coating chamber further confine the plasma from the first arc source.
    • 一种用于在真空中施加涂层的装置,包括由与第一等离子体源连通的磁偏转系统所围绕的等离子体管道和其中衬底保持器布置在等离子体源的光轴之外的涂覆室,至少具有 一个偏转电极安装在等离子体管道的一个或多个壁上。 在一个实施例中,隔离的排斥或排斥电极位于偏转电极下游的等离子体管道中,其中偏转磁场的切向分量最强,连接到电流源的正极,其允许隔离电极电流变化 独立地增加到高于阳极电流的水平。 偏转电极可以用作吸气泵,以提高泵送效率并从金属离子流中转移金属离子。 在另一实施例中,激活第二电弧源以在第一电弧源被激活时涂覆基板,并且用于第一电弧源的磁偏转系统被去激活以将等离子体限制到阴极室,但允许电子流入涂覆室 用于等离子体浸渍处理的基板。 可以在等离子体管道和涂覆室之间设置负载锁定闸门,进一步限制来自第一电弧源的等离子体。
    • 95. 发明申请
    • PISTON RING
    • 活塞环
    • US20120248711A1
    • 2012-10-04
    • US13429934
    • 2012-03-26
    • Takatsugu IWASHITATomoyuki SATO
    • Takatsugu IWASHITATomoyuki SATO
    • F16J9/26
    • F16J9/26C23C14/0605C23C14/16C23C28/044C23C28/44
    • A piston ring which is provided with a carbon-based coating which has a low friction property and wear resistance, that is, a piston ring which has a carbon-based coating formed over its sliding surface, in which piston ring, the coating is a multilayer coating comprised of two types of layers having different hardnesses laminated in at least two layers, a hardness difference between the two types of layers is 500 to 1700 HV, a high hardness layer has the same or greater thickness than a low hardness layer, and the coating as a whole has a thickness of 5.0 μm or more. The high hardness layer has a thickness of 5 to 90 nm. The surface on which the coating is formed has a base material roughness of 1.0 μmRz or less.
    • 一种具有低摩擦性和耐磨性的碳基涂层的活塞环,即在其滑动面上形成有碳基涂层的活塞环,其中活塞环,涂层为 由具有不同硬度的两种类型的层压至少两层的多层涂层,两种类型的层之间的硬度差为500至1700HV,高硬度层具有与低硬度层相同或更大的厚度,以及 涂层整体的厚度为5.0μm以上。 高硬度层的厚度为5〜90nm。 形成涂层的表面的基材粗糙度为1.0μmRz以下。
    • 96. 发明申请
    • METHOD AND APPARATUS FOR PLASMA ION IMPLANTATION OF SOLID ELEMENT
    • 固体元素等离子体植入的方法与装置
    • US20120228123A1
    • 2012-09-13
    • US13044621
    • 2011-03-10
    • Seung-Hee HANJi-Young ByunHyun-Kwang SeokJun-Hyun HanYu-Chan KimSung-Bai LeeJin-Young Choi
    • Seung-Hee HANJi-Young ByunHyun-Kwang SeokJun-Hyun HanYu-Chan KimSung-Bai LeeJin-Young Choi
    • C23C14/48C23C14/35
    • C23C14/35C23C14/16C23C14/48H01J37/32532H01J37/3438H01J37/3467
    • Disclosed are an apparatus and a method for plasma ion implantation of a solid element, which enable plasma ion implantation of a solid element.According to the apparatus and method, a sample is placed on a sample stage in a vacuum chamber, and the inside of the vacuum chamber is maintained as a vacuum state. And, gas is supplied in the vacuum chamber, a first pulsed DC power is applied to a magnetron sputtering source so as to generate plasma ions of a solid element. The plasma ions of a solid element sputtered from the source are implanted on the surface of the sample. The first power is a pulse DC power capable of applying a high power the moment a pulse is applied while maintaining low average power. And, simultaneously with the applying of the first pulse power, a second power may be supplied to the sample stage, which is a high negative voltage pulse accelerating plasma ions of a solid element to the sample and synchronized to the pulse DC power for magnetron sputtering source. And, inductively coupled plasma may be generated in the vacuum chamber via antenna so as to increase ionization rate of a solid element and lower operation pressure of magnetron sputtering source.
    • 公开了固体元素的等离子体离子注入的装置和方法,其能够实现固体元素的等离子体离子注入。 根据该装置和方法,将样品放置在真空室中的样品台上,并将真空室的内部保持为真空状态。 并且,在真空室中供应气体,将第一脉冲DC功率施加到磁控溅射源,以产生固体元素的等离子体离子。 从源极溅射的固体元素的等离子体离子注入到样品的表面上。 第一功率是脉冲直流电力,能够在维持低平均功率的同时施加脉冲施加高功率。 并且,与施加第一脉冲功率同时,可以将第二功率提供给样品台,该样品台是将固体元素的等离子体离子加速至样品的高负电压脉冲,并与用于磁控溅射的脉冲直流电力同步 资源。 并且,可以通过天线在真空室中产生电感耦合等离子体,以增加固体元素的电离速率和降低磁控管溅射源的操作压力。