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91. 发明授权

US07871667B2 Method of operating vacuum deposition apparatus and vacuum deposition apparatus 有权
标题翻译：操作真空沉积设备和真空沉积设备的方法
公开(公告)号：US07871667B2
公开(公告)日：2011-01-18
申请号：US11593619
申请日：2006-11-07
申请人： Hideaki Awata , Katsuji Emura , Kentaro Yoshida
发明人： Hideaki Awata , Katsuji Emura , Kentaro Yoshida
IPC分类号： C23C16/00 , C23C16/52
CPC分类号： C23C14/30 , C23C14/16 , C23C14/20 , C23C14/546 , C23C14/562
摘要： In a previous experiment of a deposition work of depositing a film with a uniform thickness on a long strip base material in the longitudinal direction thereof, an elapsed time from the start of the deposition work and an output of a power supply at the elapsed time are measured. The resulting relation between the elapsed time and the output is stored in a storage device. Subsequent deposition on a long strip base material is performed by a method in which first, the output of the power supply is controlled to be stabilized at a desired value using a crystal oscillator thickness gauge in a pre-heating step before the start of the deposition work, and then, a base material transport device is driven to start the deposition work on the long strip base material after a desired deposition rate is obtained. After the start of the deposition work, the output of the power supply is controlled to coincide with the output at the elapsed time stored in the storage device.
摘要翻译：在上述的长条状基材长度方向上沉积厚度均匀的膜的沉积工作的实验中，从开始沉积工作起的经过时间和经过时间的电源的输出为止测量。经过时间与输出之间的关系存储在存储装置中。在长条状基材上的后续沉积是通过以下方法进行的：首先，在开始沉积之前，使用晶体振荡器厚度计在预热步骤中将电源的输出控制为稳定在期望值然后，在获得期望的沉积速率之后，驱动基材输送装置在长条状基材上开始沉积工作。在开始沉积工作之后，电源的输出被控制成与存储在存储装置中的经过时间的输出一致。

92. 发明申请

US20100297472A1 OXIDATION-CORROSION RESISTANT COATING 有权
标题翻译：氧化 - 耐腐蚀涂料
公开(公告)号：US20100297472A1
公开(公告)日：2010-11-25
申请号：US12470993
申请日：2009-05-22
申请人： Michael Minor , Paul M. Pellet , Michael L. Miller , Brian S. Tryon
发明人： Michael Minor , Paul M. Pellet , Michael L. Miller , Brian S. Tryon
IPC分类号： B32B15/01 , C23C16/44 , C22C19/05
CPC分类号： C23C30/00 , C23C4/073 , C23C14/16 , Y10T428/12778 , Y10T428/12944
摘要： A metallic coating for protecting a substrate from high temperature oxidation and hot corrosion environments comprising about 2.5 to about 13.5 wt. % cobalt, about 12 to about 27 wt. % chromium, about 5 to about 7 wt. % aluminum, about 0.0 to about 1.0 wt. % yttrium, about 0.0 to about 1.0 wt. % hafnium, about 1.0 to about 3.0 wt. % silicon, about 0.0 to about 4.5 wt. % tantalum, about 0.0 to about 6.5 wt. % tungsten, about 0.0 to about 2.0 wt. % rhenium, about 0.0 to about 1.0 wt. % molybdenum and the balance nickel.
摘要翻译：用于保护基材免受高温氧化和热腐蚀环境的金属涂层，其包含约2.5至约13.5wt。％钴，约12至约27wt。约5至约7wt。％的铬。％铝，约0.0至约1.0wt。％钇，约0.0至约1.0wt。％铪，约1.0至约3.0wt。％硅，约0.0-约4.5wt。％钽，约0.0-约6.5wt。％钨，约0.0至约2.0重量％％铼，约0.0至约1.0wt。钼和余量为镍。

93. 发明申请

US20100285333A1 ZINC ALLOY COATED STEEL SHEET HAVING GOOD SEALER ADHESION AND CORROSION RESISTANCE AND PROCESS OF MANUFACTURING THE SAME 有权
标题翻译：锌合金涂层钢板，具有良好的密封剂粘合和耐腐蚀性及其制造方法
公开(公告)号：US20100285333A1
公开(公告)日：2010-11-11
申请号：US12810853
申请日：2008-12-23
申请人： Young-Jin Kwak , Dong-Yoeul Lee , Kyung-Hoon Nam , Sang-Cheol Lee , Yong-Hwa Jung , Woo-Sung Jung , Sang-Hoon Park , Tae-Yeob Kim , Gwang-Seok Kim
发明人： Young-Jin Kwak , Dong-Yoeul Lee , Kyung-Hoon Nam , Sang-Cheol Lee , Yong-Hwa Jung , Woo-Sung Jung , Sang-Hoon Park , Tae-Yeob Kim , Gwang-Seok Kim
IPC分类号： B32B15/01 , B05D3/02 , B05D3/06
CPC分类号： C23C28/025 , C23C2/06 , C23C2/26 , C23C2/28 , C23C14/025 , C23C14/027 , C23C14/16 , C23C14/548 , C23C14/5806 , C23C28/021 , C23C28/028 , Y10T428/12799
摘要： There is provided a zinc alloy coated steel sheet including a vacuum deposited layer capable of improving corrosion resistance and sealer adhesion that are suitable for the use in automobiles, and a process of manufacturing the same. The zinc alloy coated steel sheet includes a zinc coating layer formed on a steel sheet; and a zinc/metal alloy deposited layer formed on the zinc coating layer, wherein the zinc coating layer, and a metal diffusion layer is present in the zinc coating layer.
摘要翻译：提供一种包含能够改善适用于汽车的耐腐蚀性和密封剂附着力的真空沉积层的锌合金涂层钢板及其制造方法。锌合金涂层钢板包括形成在钢板上的锌涂层; 以及形成在锌被膜上的锌/金属合金沉积层，其中锌涂层和金属扩散层存在于锌涂层中。

94. 发明申请

US20100272918A1 METHOD AND SYSTEM FOR GALVANIZING BY PLASMA EVAPORATION 有权
标题翻译：通过等离子体蒸发进行加压的方法和系统
公开(公告)号：US20100272918A1
公开(公告)日：2010-10-28
申请号：US12743627
申请日：2008-11-07
申请人： Pierre VANDENBRANDE
发明人： Pierre VANDENBRANDE
IPC分类号： C23C14/54 , C23C14/32 , C23C14/56
CPC分类号： C23C14/16 , C23C2/003 , C23C2/36 , C23C14/28 , C23C14/32 , C23C14/54 , C23C14/542 , C23C14/562 , H01J37/321 , H01J37/32513 , H01J37/32743 , H01J37/32788 , H01J37/32889 , H01J2237/327 , H01J2237/332 , H01J2237/334
摘要： The invention relates to a method and a system for the plasma treatment of successive substrates comprising one or more steel products in which the substrates are transported, one after another, through at least one plasma treatment zone, characterized in that the electric power for generating the plasma in the treatment zone is varied according to the area of the substrate is present in this treatment zone when the substrate is running through this zone.
摘要翻译：本发明涉及一种用于等离子体处理连续基片的方法和系统，包括一个或多个钢制品，其中基片通过至少一个等离子体处理区一个接一个地输送，其特征在于，用于产生处理区域中的等离子体在衬底运行通过该区域时，根据衬底存在于该处理区域中的面积而变化。

95. 发明申请

US20100240214A1 METHOD OF FORMING MULTI METAL LAYERS THIN FILM ON WAFER 审中-公开
标题翻译：在薄膜上形成多层金属层的方法
公开(公告)号：US20100240214A1
公开(公告)日：2010-09-23
申请号：US12501125
申请日：2009-07-10
申请人： YuShan Chiu , Yi-Jen Lo
发明人： YuShan Chiu , Yi-Jen Lo
IPC分类号： H01L21/3205 , C23C16/44
CPC分类号： H01L21/76846 , C23C14/16 , C23C14/586 , C23C16/34 , H01L21/2855 , H01L21/28556 , H01L21/76856 , H01L21/76862 , H01L21/76864
摘要： A method of forming the multi metal layers thin film has Ti sputtered on top surface of a substrate by PVD first. Then, Ti is transformed into TiN via CVD. Thus, by skipping the extra process steps of wafer cleaning and surface treating, the method not only solves the stress problems between two different metal layers but also improves the cycle time and particle performance for the production without any yield impact.
摘要翻译：形成多金属层薄膜的方法首先通过PVD溅射在基板的顶表面上。然后，通过CVD将Ti转变成TiN。因此，通过跳过晶片清洗和表面处理的额外工艺步骤，该方法不仅解决了两种不同金属层之间的应力问题，而且改善了生产中的循环时间和颗粒性能，而没有任何产量影响。

96. 发明授权

US07790216B2 Method for producing a zirconia-layered orthopedic implant component 有权
标题翻译：氧化锆层骨科植入物组分的制备方法
公开(公告)号：US07790216B2
公开(公告)日：2010-09-07
申请号：US11109426
申请日：2005-04-19
申请人： Oludele Popoola , Jeffrey P. Anderson , Michael E. Hawkins , Todd S. Johnson , H. Ravindranath Shetty
发明人： Oludele Popoola , Jeffrey P. Anderson , Michael E. Hawkins , Todd S. Johnson , H. Ravindranath Shetty
IPC分类号： A61L27/04 , B05D3/02 , C23C14/14 , A61F2/28
CPC分类号： A61L27/306 , C23C8/02 , C23C14/083 , C23C14/16 , C23C14/5806 , C23C14/5853
摘要： A method for producing a zirconia-layered orthopedic implant component includes depositing zirconium onto the orthopedic implant component, thereby forming a zirconium-layered component, and converting at least a portion of the zirconium into a substantially monoclinic zirconia surface layer unaccompanied by a substantial underlying α-phase. A method for producing a zirconia-layered orthopedic implant component includes depositing zirconium onto the orthopedic implant component by ion bombardment and deposition in a vacuum to form a zirconium-layered component including an intermix zone at least 1000 Å thick and a zirconium layer about 3-5 μm thick, and heat treating the zirconium-layered component at a temperature of about 500-600° C. in an atmosphere containing oxygen.
摘要翻译：一种生产氧化锆层状骨科植入物组分的方法包括将锆沉积到矫形植入物组分上，从而形成锆层状组分，并将至少一部分锆转化为基本上单斜晶氧化锆表面层，而不伴随着基本上的α -相。一种生产氧化锆层状整形外科植入物组件的方法包括：通过在真空中离子轰击和沉积将锆沉积到矫形外科植入物组件上，以形成包含至少1000埃的混合区和锆层的锆层组分， 5μm厚，在含氧气氛下，在约500-600℃的温度下对锆层组分进行热处理。

97. 发明申请

US20100221611A1 Electrode Compositions and Processes 有权
标题翻译：电极组成和工艺
公开(公告)号：US20100221611A1
公开(公告)日：2010-09-02
申请号：US12395488
申请日：2009-02-27
申请人： Erik Menke , Grant Umeda , Brittnee Veldman , Bruce Dunn , Fred Wudl , Monique Nathalie Richard , Kimber Lee Stamm
发明人： Erik Menke , Grant Umeda , Brittnee Veldman , Bruce Dunn , Fred Wudl , Monique Nathalie Richard , Kimber Lee Stamm
IPC分类号： H01M4/40 , H01M4/02 , H01M4/46 , H01M4/38 , B05D5/12
CPC分类号： C23C14/16 , C23C14/165 , C23C14/564 , H01M2/145 , H01M2/164 , H01M2/1646 , H01M2/1653 , H01M2/166 , H01M4/0421 , H01M6/14 , H01M10/05 , H01M10/058
摘要： A composition for use in an electrochemical cell is disclosed wherein the composition includes a clean metal substantially free of impurities and a layer of protective material in contact with the clean metal. Further disclosed is an electrochemical cell including a metal film comprising a clean metal substantially free of impurities. The electrochemical cell may further include an electrolyte and a layer of protective material disposed between the electrolyte and the metal film. A process for manufacturing an electrode is further disclosed including preparing a metal film comprising a clean metal substantially free of impurities and depositing a layer of protective material on to the metal film.
摘要翻译：公开了一种用于电化学电池的组合物，其中组合物包括基本上不含杂质的清洁金属和与清洁金属接触的保护材料层。还公开了一种电化学电池，其包括金属膜，其包含基本上不含杂质的清洁金属。电化学电池还可以包括电解质和设置在电解质和金属膜之间的保护材料层。还公开了一种用于制造电极的方法，包括制备包含基本上不含杂质的清洁金属的金属膜，并将一层保护材料沉积在金属膜上。

98. 发明申请

US20100159129A1 COATING METHOD AND APPARATUS, A PERMANENT MAGNET, AND MANUFACTURING METHOD THEREOF 有权
标题翻译：涂料方法和设备，永磁体及其制造方法
公开(公告)号：US20100159129A1
公开(公告)日：2010-06-24
申请号：US12710949
申请日：2010-02-23
申请人： Hiroshi Nagata , Yoshinori Shingaki
发明人： Hiroshi Nagata , Yoshinori Shingaki
IPC分类号： B05D3/02 , B05D5/00 , B05D7/14
CPC分类号： C23C14/16 , C23C14/243 , C23C14/541 , H01F1/0571 , H01F10/126 , H01F41/0293 , H01F41/20
摘要： The object of the present invention is to improve the productivity of a permanent magnet and to manufacture it at a low cost by effectively coating Dy and Tb on a surface of the magnet of Fe—B-rare earth elements having a predetermined configuration. The permanent magnet of the present invention is manufactured by a coating step for coating Dy on the surface of the magnet of Fe—B-rare earth elements having a predetermined configuration and a diffusing step for diffusing Dy coated on the surface of the magnet into crystal grain boundary phases of the magnet with being heat treated at a predetermined temperature. In this case, the coating step comprises a first step for heating a process chamber used for carrying out the coating step and generating metallic vapor atmosphere within the process chamber by vaporizing vaporizable metallic material previously arranged within the process chamber, and a second step for introducing into the process chamber the magnet held at a temperature lower than that within the process chamber and then selectively depositing the vaporizable metallic material on a surface of the magnet by an effect of temperature difference between the temperature within the process chamber and that of the magnet by the magnet reaches a predetermined temperature.
摘要翻译：本发明的目的是通过在具有预定构造的Fe-B-稀土元素的磁体的表面上有效地涂覆Dy和Tb来提高永磁体的生产率并以低成本制造。本发明的永磁体通过涂布步骤制造，该涂覆步骤用于在具有预定结构的Fe-B-稀土元素的磁体的表面上涂覆Dy，并将用于将涂覆在磁体表面上的Dy扩散到晶体的扩散步骤在预定温度下进行热处理的磁体的晶界相。在这种情况下，涂覆步骤包括：第一步骤，用于加热用于进行涂覆步骤的处理室，并通过蒸发预先设置在处理室内的可蒸发金属材料，在处理室内产生金属蒸汽气氛;以及第二步骤，用于引入进入处理室，磁体保持在低于处理室内的温度，然后通过处理室内的温度与磁体的温度之间的温度差的选择性地将可蒸发的金属材料沉积在磁体的表面上磁体达到预定温度。

99. 发明申请

US20100130006A1 METHOD AND STRUCTURE OF A THICK METAL LAYER USING MULTIPLE DEPOSITION CHAMBERS 有权
标题翻译：使用多个沉积室的厚金属层的方法和结构
公开(公告)号：US20100130006A1
公开(公告)日：2010-05-27
申请号：US12698006
申请日：2010-02-01
申请人： Ardeshir J. Sidhwa
发明人： Ardeshir J. Sidhwa
IPC分类号： H01L21/768
CPC分类号： C23C14/16 , C23C14/568 , C23C16/06 , C23C16/54 , H01L21/32051
摘要： A thick metal layer is formed on a semiconductor integrated circuit in multiple different deposition chambers. A first portion of the metal layer is formed in a first deposition chamber, the first thickness being approximately half the target thickness. The substrate is then removed from the first chamber and transported to a second chamber. The deposition of the same metal layer continues in a second chamber, having the same grain structure and orientation. The second portion of the metal layer is grown to achieve the final thickness. By using two different deposition chambers to form the single metal layer, layers in excess of 25,000 angstroms in thickness can be obtained.
摘要翻译：在多个不同的沉积室中的半导体集成电路上形成厚金属层。金属层的第一部分形成在第一沉积室中，第一厚度大约是目标厚度的一半。然后将基板从第一室移除并输送到第二室。相同金属层的沉积在具有相同晶粒结构和取向的第二腔中继续。生长金属层的第二部分以达到最终的厚度。通过使用两个不同的沉积室来形成单个金属层，可以获得超过25,000埃厚度的层。

100. 发明申请

US20100066346A1 Fabrication of microstructures integrated with nanopillars along with their applications as electrodes in sensors 审中-公开
标题翻译：与纳米柱集成的微结构以及其在传感器中的电极的应用
公开(公告)号：US20100066346A1
公开(公告)日：2010-03-18
申请号：US12382860
申请日：2009-03-25
申请人： Guigen Zhang , Venkataramani Anandan , Yeswanth L. Rao , Rajan Gangadharan
发明人： Guigen Zhang , Venkataramani Anandan , Yeswanth L. Rao , Rajan Gangadharan
IPC分类号： G01R19/15 , G01H13/00 , C25D5/02 , C25D7/00 , B32B3/30
CPC分类号： C25D1/04 , B81B2201/0214 , B81B2203/04 , B81C1/00166 , B81C1/00206 , B82Y15/00 , C23C14/16 , C23C14/5873 , C23C28/00 , C23C28/321 , C23C28/322 , C23C28/345 , C25D1/006 , C25D1/02 , C25D1/20 , C25D3/48 , C25D11/045 , C25D11/12 , Y10T428/2457
摘要： This invention presents microstructures enhanced with nanopillars. The invention also provides ways for manufacturing nanopillar-enhanced microstructures. In some embodiments, the invention also provides methods of use for the nanopillar-enhanced microstructures.
摘要翻译：本发明提出了用纳米柱增强的微结构。本发明还提供了制造纳米柱增强微结构的方法。在一些实施方案中，本发明还提供了用于纳米柱增强微结构的方法。

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