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1. 发明申请

US20180247797A1 Reactors For Plasma-Assisted Processes And Associated Methods 审中-公开
公开(公告)号：US20180247797A1
公开(公告)日：2018-08-30
申请号：US15047284
申请日：2016-02-18
申请人： Vladimir Gorokhovsky
发明人： Vladimir Gorokhovsky
IPC分类号： H01J37/32 , C23C16/27 , C23C16/34 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/442 , C23C14/32 , C23C14/50
CPC分类号： H01J37/32633 , C23C14/0605 , C23C14/0641 , C23C14/22 , C23C14/223 , C23C14/325 , C23C14/35 , C23C14/50 , C23C14/564 , C23C16/029 , C23C16/045 , C23C16/26 , C23C16/27 , C23C16/342 , C23C16/442 , C23C16/45591 , C23C16/458 , C23C16/50 , H01J37/32055 , H01J37/32357 , H01J37/3244 , H01J37/32467 , H01J37/32522 , H01J37/32532 , H01J37/32614 , H01J37/3266 , H01J37/32715 , H01J37/32816 , H01J37/3402 , H01J37/3405 , H01J37/3447 , H01J37/3458 , H01J2237/332
摘要： A reactor for plasma-assisted chemical vapor deposition includes a plasma duct for containing one or more substrates to be coated by ions; an arc discharge generation system for generating a flow of electrons through the plasma duct from a proximal end toward a distal end of the plasma duct; a gas inlet coupled to the distal end for receiving a reactive gas; a gas outlet coupled to the proximal end for removing at least a portion of the reactive gas to generate a flow of the reactive gas through the plasma duct from the distal end toward the proximal end, to generate the ions from collisions between the electrons and the reactive gas; and a separating baffle positioned for restricting flow of the reactive gas out of the plasma duct to maintain a high pressure in the plasma duct to increase rate of deposition of the ions onto the substrates.

2. 发明申请

US20170030204A1 Erosion And Corrosion Resistant Protective Coatings For Turbomachinery 有权
标题翻译：用于涡轮机械的侵蚀和耐腐蚀保护涂层
公开(公告)号：US20170030204A1
公开(公告)日：2017-02-02
申请号：US15234210
申请日：2016-08-11
申请人： Vladimir Gorokhovsky
发明人： Vladimir Gorokhovsky
IPC分类号： F01D5/28 , F01D25/00 , C23C14/32 , C23C14/35 , C23C14/02 , C23C14/06
CPC分类号： F01D5/288 , C23C14/028 , C23C14/0688 , C23C14/325 , C23C14/35 , C23C24/04 , C23C28/321 , C23C28/3215 , C23C28/322 , C23C28/34 , C23C28/341 , C23C28/343 , C23C28/345 , C23C28/3455 , C23C28/36 , C23C28/44 , F05D2230/312 , F05D2250/28 , F05D2300/22 , F05D2300/2284 , Y02T50/672
摘要： An erosion and corrosion resistant protective coating for turbomachinery application includes at least one ceramic or metal-ceramic coating segment deposited on surface of a conductive metal substrate subjected to a pre-deposition treatment by at least blasting to provide the surface with texture. The erosion and corrosion resistant coating has a plurality of dome-like structures with dome width between in range from about 0.01 μm to about 30 μm. The at least one coating segment is formed by condensation of ion bombardment from a metal-gaseous plasma flow, wherein, at least during deposition of first micron of the coating segment, deposition rate of metal ions is at least 3 μm/hr and kinetic energy of deposited metal ions exceeds 5 eV.
摘要翻译：用于涡轮机械应用的耐侵蚀和耐腐蚀的保护涂层包括至少一个陶瓷或金属陶瓷涂层段，其沉积在通过至少喷砂进行预沉积处理以提供表面纹理的导电金属基板的表面上。耐腐蚀和耐腐蚀涂层具有多个穹顶状结构，穹顶宽度介于约0.01μm至约30μm的范围内。所述至少一个涂层段是通过从金属 - 气体等离子体流中的离子轰击的冷凝形成的，其中，至少在沉积涂层段的第一微米期间，金属离子的沉积速率为至少3微米/小时，动能的沉积金属离子超过5eV。

3. 发明申请

US20140076718A1 Remote Arc Discharge Plasma Assisted Processes 有权
标题翻译：远程放电等离子体辅助工艺
公开(公告)号：US20140076718A1
公开(公告)日：2014-03-20
申请号：US13617005
申请日：2012-09-14
申请人： Vladimir Gorokhovsky , William Grant , Edward W. Taylor , David Humenik , Klaus Brondum
发明人： Vladimir Gorokhovsky , William Grant , Edward W. Taylor , David Humenik , Klaus Brondum
IPC分类号： C23C14/32 , C23C14/35
CPC分类号： H01J37/3438 , C23C14/0641 , C23C14/22 , C23C14/32 , C23C14/325 , C23C14/3471 , C23C14/3478 , C23C14/35 , C23C14/354 , C23C14/355 , H01J37/32055 , H01J37/32614 , H01J37/32917 , H01J37/32935 , H01J37/3405 , H01J37/3408 , H01J37/3417 , H01J49/12
摘要： A coating system includes a vacuum chamber and a coating assembly positioned within the vacuum chamber. The coating assembly includes a vapor source that provides material to be coated onto a substrate, a substrate holder to hold substrates to be coated such that the substrates are positioned in front of the vapor source, a cathode chamber assembly, and a remote anode. The cathode chamber assembly includes a cathode, an optional primary anode and a shield which isolates the cathode from the vacuum chamber. The shield defines openings for transmitting an electron emission current from the cathode into the vacuum chamber. The vapor source is positioned between the cathode and the remote anode while the remote anode is coupled to the cathode.
摘要翻译：涂覆系统包括真空室和位于真空室内的涂层组件。涂层组件包括提供要涂覆到基底上的材料的蒸汽源，用于保持待涂覆的基底的基底保持器，使得基底位于蒸气源的前面，阴极室组件和远程阳极。阴极室组件包括阴极，可选的主阳极和隔离真空室的阴极。屏蔽件限定用于将电子发射电流从阴极传输到真空室中的开口。蒸气源位于阴极和远程阳极之间，而远程阳极耦合到阴极。

4. 发明申请

US20120006785A1 Wear Resistant Vapor Deposited Coating, Method of Coating Deposition and Applications Therefor 审中-公开
标题翻译：耐磨性气相沉积涂层，涂层沉积方法及其应用
公开(公告)号：US20120006785A1
公开(公告)日：2012-01-12
申请号：US13103871
申请日：2011-05-09
申请人： Vladimir Gorokhovsky , Brad B. Heckerman , Yuhang Cheng
发明人： Vladimir Gorokhovsky , Brad B. Heckerman , Yuhang Cheng
IPC分类号： C23F1/00 , C23C16/22 , C23C16/02 , C23C16/56 , C23C16/52 , C23C16/50 , C23C14/48 , C23C8/36 , C23C8/00 , C22F1/00 , C23C8/02 , C23C8/80 , C23C14/02 , C23C14/58 , C23C16/06
CPC分类号： C23C14/0641 , A61B17/1615 , A61B2017/1602 , A61C3/02 , A61C5/42 , C21D6/004 , C21D6/005 , C21D6/008 , C22C14/00 , C22C19/03 , C22C38/001 , C22C38/002 , C22C38/02 , C22C38/04 , C22C38/06 , C22C38/20 , C22C38/22 , C22C38/42 , C22C38/44 , C22C38/50 , C22F1/10 , C22F1/183 , C23C8/02 , C23C8/20 , C23C8/24 , C23C8/36 , C23C14/021 , C23C14/022 , C23C14/024 , C23C14/025 , C23C14/0605 , C23C14/0611 , C23C14/0635 , C23C14/067 , C23C14/0676 , C23C14/0682 , C23C14/14 , C23C14/5806 , C23C14/5826 , C23C14/586 , C23C14/588 , C23C16/0227 , C23C16/0236 , C23C16/0272 , C23C16/0281 , C23C16/06 , C23C16/24 , C23C16/26 , C23C16/28 , C23C16/32 , C23C16/34 , C23C16/38 , C23C16/42 , C23C16/56 , Y10T428/24975 , Y10T428/252 , Y10T428/265 , Y10T428/30
摘要： A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The high compressive stress provided by the top coat protects against degradation of the tool due to abrasion and torsional and cyclic fatigue. Substrate temperature is strictly controlled during the coating process to preserve the bulk properties of the substrate and the coating. The described coating process is particularly useful when applied to shape memory alloys.
摘要翻译：在多层金属/陶瓷粘合剂涂层上的低摩擦面涂层提供具有耐磨性和耐腐蚀性的导电基底，例如旋转工具。顶涂层进一步提供低摩擦和抗粘性以及高压缩应力。由顶部涂层提供的高压缩应力防止由于磨损和扭转和循环疲劳导致的刀具劣化。在涂覆过程中严格控制基材温度以保持基材和涂层的本体特性。当应用于形状记忆合金时，所述的涂覆方法特别有用。

5. 发明申请

US20100170787A1 Filtered Cathodic Arc Deposition Method and Apparatus 有权
公开(公告)号：US20100170787A1
公开(公告)日：2010-07-08
申请号：US12695818
申请日：2010-01-28
申请人： Vladimir Gorokhovsky
发明人： Vladimir Gorokhovsky
IPC分类号： C23C14/28
CPC分类号： C23C14/0605 , C23C14/022 , C23C14/0641 , C23C14/0647 , C23C14/16 , C23C14/325 , C23C14/355 , C23C14/48 , C23C16/36 , H01J37/32055 , H01J37/3266
摘要： An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow. In a further embodiment a second arc source is activated to coat the substrates while a first arc source is activated, and the magnetic deflecting system for the first arc source is deactivated to confine plasma to the cathode chamber but permit electrons to flow into the coating chamber for plasma immersed treatment of the substrates. A load lock shutter may be provided between the plasma duct and the coating chamber further confine the plasma from the first arc source.

6. 发明申请

US20080116058A1 Filtered cathodic arc deposition method and apparatus 审中-公开
标题翻译：过滤阴极电弧沉积方法和装置
公开(公告)号：US20080116058A1
公开(公告)日：2008-05-22
申请号：US11890736
申请日：2007-08-06
申请人： Vladimir Gorokhovsky
发明人： Vladimir Gorokhovsky
IPC分类号： C23C14/00
CPC分类号： C23C14/0605 , C23C14/022 , C23C14/0641 , C23C14/0647 , C23C14/16 , C23C14/325 , C23C14/355 , C23C14/48 , C23C16/36 , H01J37/32055 , H01J37/3266
摘要： An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow. In a further embodiment a second arc source is activated to coat the substrates while a first arc source is activated, and the magnetic deflecting system for the first arc source is deactivated to confine plasma to the cathode chamber but permit electrons to flow into the coating chamber for plasma immersed treatment of the substrates. A load lock shutter may be provided between the plasma duct and the coating chamber further confine the plasma from the first arc source.
摘要翻译：一种用于在真空中施加涂层的装置，包括由与第一等离子体源连通的磁偏转系统所围绕的等离子体管道和其中衬底保持器布置在等离子体源的光轴之外的涂覆室，至少具有一个偏转电极安装在等离子体管道的一个或多个壁上。在一个实施例中，隔离的排斥或排斥电极位于偏转电极下游的等离子体管道中，其中偏转磁场的切向分量最强，连接到电流源的正极，其允许隔离电极电流变化独立地增加到高于阳极电流的水平。偏转电极可以用作吸气泵，以提高泵送效率并从金属离子流中转移金属离子。在另一实施例中，激活第二电弧源以在第一电弧源被激活时涂覆基板，并且用于第一电弧源的磁偏转系统被去激活以将等离子体限制到阴极室，但允许电子流入涂覆室用于等离子体浸渍处理的基板。可以在等离子体管道和涂覆室之间设置负载锁定闸门，进一步限制来自第一电弧源的等离子体。

7. 发明授权

US06722883B2 Protective coating for abrasive dental tools and burs 有权
标题翻译：磨蚀性牙科工具和毛刺的保护涂层
公开(公告)号：US06722883B2
公开(公告)日：2004-04-20
申请号：US10007773
申请日：2001-11-08
申请人： Vladimir Gorokhovsky
发明人： Vladimir Gorokhovsky
IPC分类号： A61C306
CPC分类号： A61B17/1615 , A61B50/00 , A61C3/02 , A61C3/06
摘要： A protective coating applied to abrasive layers of polycrystalline diamond located at the tip of abrasive dental tools is described. The protective coating is provided to protect the polycrystalline diamond layers in the course of storage, packaging, handling and sterilization. The protective coating is removable by abrasive forces when the cutting surfaces come into contact with porcelain and hard ceramic dental materials, teeth, bone or similar hard materials, and subsequently, the broken protective coating is rolled back and collected in the crevices and gaps of the polycrystalline diamond layer. The protective encapsulating coating can be made of a tough high melting point polymer layer, or a layer of a tough polymer also containing fine ceramic particles, or of a relatively soft, oxidation resistant metal or alloy.
摘要翻译：描述了一种保护涂层，其应用于位于研磨性牙科工具尖端的多晶金刚石研磨层。提供保护涂层以在储存，包装，处理和灭菌过程中保护多晶金刚石层。当切割表面与瓷和硬陶瓷牙科材料，牙齿，骨头或类似的硬质材料接触时，保护涂层可以通过磨蚀力去除，随后，破损的保护涂层被卷回并收集在缝隙和间隙中多晶金刚石层。保护性封装涂层可以由坚韧的高熔点聚合物层或还含有细陶瓷颗粒的韧性聚合物层或相对柔软的抗氧化金属或合金制成。

8. 发明授权

US08895115B2 Method for producing an ionized vapor deposition coating 有权
标题翻译：电离气相沉积涂层的制造方法
公开(公告)号：US08895115B2
公开(公告)日：2014-11-25
申请号：US12942786
申请日：2010-11-09
申请人： Vladimir Gorokhovsky
发明人： Vladimir Gorokhovsky
IPC分类号： H05H1/24 , C23C14/35 , C23C14/06 , C23C14/16
CPC分类号： C23C14/355 , C23C14/0641 , C23C14/165
摘要： A method of depositing a coating by vapor deposition. The method including ionizing a process gas, generating a metal vapor and creating a metal flow having a metal atom flow density in the range of 1E14 m−3 to 1E24 m−3. The method also includes providing a thermionic emission from a thermionic ionizing grid including thermionic filaments, wherein said ionizing filament grid is at least partially located within said region having a metal atom flow density in the range of 1E14 m−3 to 1E24 m−3, and coating a substrate with the metal vapor.
摘要翻译：通过蒸镀沉积涂层的方法。该方法包括电离处理气体，产生金属蒸气并产生金属原子流动密度范围为1E14m-3至1E24m-3的金属流。该方法还包括提供包括热离子丝的热离子电离网格的热离子发射，其中所述电离丝网格至少部分地位于所述区域内，所述区域具有1E14m-3至1E24m-3范围内的金属原子流动密度，并用金属蒸气涂覆基材。

9. 发明授权

US08658010B2 Filtered cathodic arc deposition method and apparatus 有权
标题翻译：过滤阴极电弧沉积方法和装置
公开(公告)号：US08658010B2
公开(公告)日：2014-02-25
申请号：US12695818
申请日：2010-01-28
申请人： Vladimir Gorokhovsky
发明人： Vladimir Gorokhovsky
IPC分类号： C23C14/34
CPC分类号： C23C14/0605 , C23C14/022 , C23C14/0641 , C23C14/0647 , C23C14/16 , C23C14/325 , C23C14/355 , C23C14/48 , C23C16/36 , H01J37/32055 , H01J37/3266
摘要： An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow. In a further embodiment a second arc source is activated to coat the substrates while a first arc source is activated, and the magnetic deflecting system for the first arc source is deactivated to confine plasma to the cathode chamber but permit electrons to flow into the coating chamber for plasma immersed treatment of the substrates. A load lock shutter may be provided between the plasma duct and the coating chamber further confine the plasma from the first arc source.
摘要翻译：一种用于在真空中施加涂层的装置，包括由与第一等离子体源连通的磁偏转系统所围绕的等离子体管道和其中衬底保持器布置在等离子体源的光轴之外的涂覆室，至少具有一个偏转电极安装在等离子体管道的一个或多个壁上。在一个实施例中，隔离的排斥或排斥电极位于偏转电极下游的等离子体管道中，其中偏转磁场的切向分量最强，连接到电流源的正极，其允许隔离电极电流变化独立地增加到高于阳极电流的水平。偏转电极可以用作吸气泵，以提高泵送效率并从金属离子流中转移金属离子。在另一实施例中，激活第二电弧源以在第一电弧源被激活时涂覆基板，并且用于第一电弧源的磁偏转系统被去激活以将等离子体限制到阴极室，但允许电子流入涂覆室用于等离子体浸渍处理的基板。可以在等离子体管道和涂覆室之间设置负载锁定闸门，进一步限制来自第一电弧源的等离子体。

10. 发明授权

US07939172B2 Wear resistant vapor deposited coating, method of coating deposition and applications therefor 有权
标题翻译：耐磨气相沉积涂层，涂层沉积方法及其应用
公开(公告)号：US07939172B2
公开(公告)日：2011-05-10
申请号：US11804433
申请日：2007-05-17
申请人： Vladimir Gorokhovsky , Brad B. Heckerman , Yuhang Cheng
发明人： Vladimir Gorokhovsky , Brad B. Heckerman , Yuhang Cheng
IPC分类号： B32B9/00
CPC分类号： C23C14/0641 , A61B17/1615 , A61B2017/1602 , A61C3/02 , A61C5/42 , C21D6/004 , C21D6/005 , C21D6/008 , C22C14/00 , C22C19/03 , C22C38/001 , C22C38/002 , C22C38/02 , C22C38/04 , C22C38/06 , C22C38/20 , C22C38/22 , C22C38/42 , C22C38/44 , C22C38/50 , C22F1/10 , C22F1/183 , C23C8/02 , C23C8/20 , C23C8/24 , C23C8/36 , C23C14/021 , C23C14/022 , C23C14/024 , C23C14/025 , C23C14/0605 , C23C14/0611 , C23C14/0635 , C23C14/067 , C23C14/0676 , C23C14/0682 , C23C14/14 , C23C14/5806 , C23C14/5826 , C23C14/586 , C23C14/588 , C23C16/0227 , C23C16/0236 , C23C16/0272 , C23C16/0281 , C23C16/06 , C23C16/24 , C23C16/26 , C23C16/28 , C23C16/32 , C23C16/34 , C23C16/38 , C23C16/42 , C23C16/56 , Y10T428/24975 , Y10T428/252 , Y10T428/265 , Y10T428/30
摘要： A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The high compressive stress provided by the top coat protects against degradation of the tool due to abrasion and torsional and cyclic fatigue. Substrate temperature is strictly controlled during the coating process to preserve the bulk properties of the substrate and the coating. The described coating process is particularly useful when applied to shape memory alloys.
摘要翻译：在多层金属/陶瓷粘合剂涂层上的低摩擦面涂层提供具有耐磨性和耐腐蚀性的导电基底，例如旋转工具。顶涂层进一步提供低摩擦和抗粘性以及高压缩应力。由顶部涂层提供的高压缩应力防止由于磨损和扭转和循环疲劳导致的刀具劣化。在涂覆过程中严格控制基材温度以保持基材和涂层的本体特性。当应用于形状记忆合金时，所述的涂覆方法特别有用。

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