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91. 发明申请

US20110129219A1 LIGHT MULTIPLEXER 有权
标题翻译：光复合器
公开(公告)号：US20110129219A1
公开(公告)日：2011-06-02
申请号：US13055212
申请日：2009-07-31
申请人： Yuji Mitsuhashi , Toshiki Nishizawa , Hiroshi Tomita , Yuzo Ishii , koichi Hadama
发明人： Yuji Mitsuhashi , Toshiki Nishizawa , Hiroshi Tomita , Yuzo Ishii , koichi Hadama
IPC分类号： H04J14/00
CPC分类号： G02B6/2931 , G02B6/29311 , G02B7/006 , G02B7/008 , G02B27/1006 , G02B27/1086
摘要： One side surface of a diffraction grating is securely held by a holder, and further, the holder is securely supported on a substrate by a supporter in such a manner that the diffraction grating held by the holder is not brought into contact with the substrate. In this manner, the diffraction grating is fixed only onto one side surface to the supporter via the holder, and further, the diffraction grating is not brought into contact with the substrate. Therefore, the lower portion of the supporter is displaced by heat generated in the substrate, however, the displacement of the supporter cannot adversely influence directly on the diffraction grating since the holder is interposed between the displaced portion and the diffraction grating.
摘要翻译：衍射光栅的一个侧表面由保持器牢固地保持，此外，保持器以保持器所保持的衍射光栅不与基板接触的方式由支撑件牢固地支撑在基板上。以这种方式，衍射光栅仅通过保持器固定在支撑体的一个侧表面上，此外，衍射光栅不与基板接触。因此，支撑体的下部由于在基板中产生的热量而发生位移，但是由于保持器插入位移部和衍射光栅之间，所以支撑体的位移不会对衍射光栅直接产生不利影响。

92. 发明授权

US07896970B2 Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process 有权
标题翻译：半导体衬底清洗液和半导体衬底清洗工艺
公开(公告)号：US07896970B2
公开(公告)日：2011-03-01
申请号：US11893752
申请日：2007-08-16
申请人： Hiroshi Tomita , Yuji Yamada , Hiroaki Yamada , Norio Ishikawa , Yumiko Abe
发明人： Hiroshi Tomita , Yuji Yamada , Hiroaki Yamada , Norio Ishikawa , Yumiko Abe
IPC分类号： H01L21/02
CPC分类号： H01L21/02052 , C11D7/08 , C11D7/34 , C11D7/36 , C11D11/0047
摘要： A semiconductor substrate cleaning liquid composition is provided that includes one or more types selected from the group consisting of a compound having at least two sulfonic acid groups per molecule, phytic acid, and a condensed phosphoric acid compound; an inorganic acid; and water. There is also provided a process for cleaning a semiconductor substrate that includes a first step of cleaning the semiconductor substrate using the semiconductor substrate cleaning liquid composition and, subsequent to the first step, a second step of cleaning the semiconductor substrate with pure water, ozone water formed by dissolving ozone gas in pure water, or aqueous hydrogen peroxide.
摘要翻译：提供一种半导体衬底清洗液组合物，其包含一种或多种选自每分子具有至少两个磺酸基的化合物，植酸和缩合磷酸化合物的类型; 无机酸; 和水。还提供了一种清洗半导体衬底的方法，该方法包括使用半导体衬底清洗液组合物清洗半导体衬底的第一步骤，在第一步骤之后，用纯水，臭氧水清洗半导体衬底的第二步骤通过将臭氧气体溶解在纯水或过氧化氢水溶液中形成。

93. 发明申请

US20100210110A1 ETCHING APPARATUS, A METHOD OF CONTROLLING AN ETCHING SOLUTION, AND A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE 有权
标题翻译：蚀刻装置，控制蚀刻溶液的方法和制造半导体器件的方法
公开(公告)号：US20100210110A1
公开(公告)日：2010-08-19
申请号：US11878965
申请日：2007-07-30
申请人： Hisashi Okuchi , Hiroyasu Iimori , Mami Saito , Yoshihiro Ogawa , Hiroshi Tomita , Soichi Nadahara
发明人： Hisashi Okuchi , Hiroyasu Iimori , Mami Saito , Yoshihiro Ogawa , Hiroshi Tomita , Soichi Nadahara
IPC分类号： H01L21/311
CPC分类号： H01L21/67253 , H01L21/31111 , H01L21/67086
摘要： An etching apparatus includes a chamber containing an etching solution including first and second components and water, a concentration of the water in the etching solution is at a specified level or lower; a circulation path circulating the etching solution; a concentration controller sampling the etching liquid from the circulation path and controls concentrations of the etching solution respectively; and a refilling chemical liquid feeder feeding a refilling chemical liquid including the first component having a concentration higher than the first component in the etching solution.
摘要翻译：蚀刻装置包括：包含第一和第二成分和水的蚀刻液的室，蚀刻液中的水的浓度在规定的水平以下; 使蚀刻溶液循环的循环路径; 浓度控制器对来自循环路径的蚀刻液进行采样，并分别控制蚀刻液的浓度; 以及再填充化学液体给料器，其在所述蚀刻溶液中供给包含浓度高于所述第一成分的所述第一成分的再填充药液。

94. 发明申请

US20090311874A1 METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE 有权
标题翻译：处理半导体衬底表面的方法
公开(公告)号：US20090311874A1
公开(公告)日：2009-12-17
申请号：US12257493
申请日：2008-10-24
申请人： Hiroshi Tomita , Hiroyasu Iimori , Hisashi Okuchi , Tatsuhiko Koide , Linan Ji
发明人： Hiroshi Tomita , Hiroyasu Iimori , Hisashi Okuchi , Tatsuhiko Koide , Linan Ji
IPC分类号： H01L21/31
CPC分类号： H01L21/02057 , H01L21/0206 , H01L21/02071 , H01L21/02101 , H01L21/3086 , H01L21/31133 , H01L21/32139 , Y10S134/902 , Y10S438/906 , Y10S438/964
摘要： A method of treating the surface of a semiconductor substrate has cleaning the semiconductor substrate having a pattern formed thereon by using a chemical solution, removing the chemical solution by using pure water, forming a water repellent protective film on the surface of the semiconductor substrate, rinsing the semiconductor substrate by using pure water, and drying the semiconductor substrate.
摘要翻译：处理半导体基板的表面的方法通过使用化学溶液清洗具有形成在其上的图案的半导体基板，通过使用纯水去除化学溶液，在半导体基板的表面上形成防水保护膜，冲洗通过使用纯水对半导体衬底进行干燥，并干燥半导体衬底。

95. 发明授权

US07631899B2 Seat belt apparatus 有权
标题翻译：安全带装置
公开(公告)号：US07631899B2
公开(公告)日：2009-12-15
申请号：US11034889
申请日：2005-01-14
申请人： Tadahiro Nakayama , Hiroshi Tomita , Yoshiyuki Nakano
发明人： Tadahiro Nakayama , Hiroshi Tomita , Yoshiyuki Nakano
IPC分类号： B60R22/28
CPC分类号： B60R22/1952
摘要： A kinetic-energy absorbing member absorbs the kinetic energy of a pull-in member such as a buckle or a lap anchor when reaching a bottom position. The kinetic-energy absorbing member, which includes a thin-walled tubular member that may be made of metal such as iron or aluminum, is arranged between a bracket and buckle. As the pretensioner is actuated, the buckle is pulled by a wire, thereby depressing the kinetic-energy absorbing member against the bracket so that the kinetic-energy absorbing member collapses and the kinetic energy of the buckle is absorbed when reaching the bottom position.
摘要翻译：当达到底部位置时，动能吸收构件吸收诸如带扣或搭扣锚固件的拉入构件的动能。动能吸收构件包括可由铁或铝等金属制成的薄壁管状构件，其布置在支架和带扣之间。当预紧器被致动时，带扣被线拉动，从而将动能吸收构件压靠在支架上，使得动能吸收构件塌陷，并且当到达底部位置时扣环的动能被吸收。

96. 发明授权

US07628330B2 Barcode and decreased-resolution reproduction of a document image 有权
标题翻译：条形码和文件图像的分辨率降低
公开(公告)号：US07628330B2
公开(公告)日：2009-12-08
申请号：US11724535
申请日：2007-03-14
申请人： Hiroshi Tomita
发明人： Hiroshi Tomita
IPC分类号： G06K9/18 , G06K19/06
CPC分类号： H04N1/32133 , H04N2201/3225 , H04N2201/325 , H04N2201/3269 , H04N2201/3271
摘要： Systems, methods and storage mediums are disclosed for processing image data and associated two-dimensional barcodes for decreased data storage requirements and increased data transfer capabilities. Image data of a document may be obtained, processed, and rendered into a barcode including image data from which the document may be substantially reproduced. The barcode may be incorporated into a reproduction of the document. The amount of data associated with the reproduction of the document may be decreased by reducing the resolution of the reproduction, thereby allowing for decreased data storage requirements and increased data transfer capabilities. The amount of data may also be decreased by reducing the area of the reproduction.
摘要翻译：公开了用于处理图像数据和相关联的二维条形码的系统，方法和存储介质，用于降低数据存储需求和增加的数据传输能力。文档的图像数据可以被获得，处理和呈现为包括可以基本上再现文档的图像数据的条形码。条形码可以并入到文档的再现中。可以通过降低再现的分辨率来减少与文档的再现相关联的数据量，从而允许减少的数据存储要求和增加的数据传输能力。也可以通过减少再现的面积来减少数据量。

97. 发明申请

US20090255558A1 CLEANING APPARATUS FOR SEMICONDUCTOR WAFER AND CLEANING METHOD FOR SEMICONDUCTOR WAFER 有权
标题翻译：半导体滤波器的清洗装置和半导体滤波器的清洁方法
公开(公告)号：US20090255558A1
公开(公告)日：2009-10-15
申请号：US12412638
申请日：2009-03-27
申请人： Minako Inukai , Hiroshi Tomita , Kaori Umezawa , Yasuhito Yoshimizu , Linan Ji
发明人： Minako Inukai , Hiroshi Tomita , Kaori Umezawa , Yasuhito Yoshimizu , Linan Ji
IPC分类号： B08B3/00
CPC分类号： H01L21/02052 , H01L21/67051
摘要： A cleaning apparatus for a semiconductor wafer includes: a gas jet device including a gas nozzle which jets a first gas onto the surface of a semiconductor wafer to thin the thickness of a stagnant layer on the surface of the semiconductor wafer; and a two-fluid jet device including a two-fluid nozzle which jets droplet mist onto a region where thickness of the stagnant layer of the semiconductor wafer is thinned, the droplet mist being mixed two-fluid of a liquid and a second gas.
摘要翻译：一种用于半导体晶片的清洁装置包括：气体喷射装置，其包括将第一气体喷射到半导体晶片的表面上的气体喷嘴，以使半导体晶片的表面上的停滞层的厚度减薄; 以及双液体喷射装置，其包括将液滴雾喷射到半导体晶片的停滞层的厚度变薄的区域上的双流体喷嘴，所述液滴雾混合液体的二液体和第二气体。

98. 发明申请

US20090194592A1 Color Barcode Producing Method and Apparatus, Color Barcode Reading Method and Apparatus and Color Barcode Reproducing Method and Apparatus 有权
标题翻译：彩色条形码生成方法和装置，彩色条形码读取方法和装置以及彩色条形码再现方法和装置
公开(公告)号：US20090194592A1
公开(公告)日：2009-08-06
申请号：US12419202
申请日：2009-04-06
申请人： Wei Ming , Hiroshi Tomita
发明人： Wei Ming , Hiroshi Tomita
IPC分类号： G06K7/00 , G06K19/06
CPC分类号： G06K19/06037 , G06K2019/06225
摘要： A color barcode can record much more amount of information than black white barcode. However, the problem of the color barcode is that it is easy to lose integrity or authenticity in printing and copy generation. This invention provides an apparatus and a method to keep the integrity or authenticity of the color barcode. Such is accomplished by the color reference portion of the color barcode including reference color tiles filled with colors which are used in a data portion of the color barcode and an apparatus and a method for producing, reproducing and reading such color barcode.
摘要翻译：彩色条形码可以记录比黑色条形码更多的信息量。然而，彩色条形码的问题在于，在打印和拷贝生成中容易失去完整性或真实性。本发明提供了一种保持彩色条形码的完整性或真实性的装置和方法。这是通过彩色条形码的颜色参考部分实现的，该颜色条形码包括用于彩色条形码的数据部分中使用的颜色的参考彩色图像，以及用于制作，再现和读取这些彩色条形码的装置和方法。

99. 发明授权

US07490857B2 Seat belt apparatus and pretensioner 有权
标题翻译：安全带装置和预紧器
公开(公告)号：US07490857B2
公开(公告)日：2009-02-17
申请号：US11496572
申请日：2006-08-01
申请人： Hiroshi Tomita
发明人： Hiroshi Tomita
IPC分类号： B60R22/46
CPC分类号： B60R22/1952 , B60R22/1955
摘要： A pretensioner with a wire-holding groove is formed in a housing at a bent portion, so that a wire, which holds a seat belt buckle at an upper end protruding from the wire-holding groove, is slidably held by the wire-holding groove. The wire slides and is displaced in a draw-in direction of the seat belt buckle when a gas generator is actuated and acted on a part of the wire closer to an end thereof, which extends in a front-to-back direction of a vehicle. The tongue piece bulging into the wire-holding groove restrains the wire from being pushed in due to a push-in load of the wire from the seat belt buckle. Conversely, the wire is allowed to be drawn in upon the actuation of the gas generator such that the pretension can enhance the reliability of a restraining function of a push-in displacement of a wire.
摘要翻译：具有线保持槽的预紧器在弯曲部分的壳体中形成，使得在从电线保持槽突出的上端保持安全带扣环的线被电线保持槽可滑动地保持。当气体发生器被致动时，线滑动并沿着安全带扣的拉入方向移位，并且作用在靠近其一端的电线的一部分上，该端部沿着车辆的前后方向延伸。凸出到电线保持槽中的舌片限制了电线从安全带带扣中的推入负载而被推入。相反，允许电线在气体发生器的致动时被拉入，使得预张力可以提高线的推入位移的约束功能的可靠性。

100. 外观设计

USD585343S1 Rear bumper for an automobile 有权
公开(公告)号：USD585343S1
公开(公告)日：2009-01-27
申请号：US29305159
申请日：2008-03-14
申请人： Yutaka Kubota , Hiroshi Tomita
设计人： Yutaka Kubota , Hiroshi Tomita

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