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    • 95. 发明授权
    • Polarization analyzer
    • 极化分析仪
    • US07265834B2
    • 2007-09-04
    • US10537314
    • 2003-07-14
    • Shojiro KawakamiTakashi SatoTakayuki KawashimaWataru Ishikawa
    • Shojiro KawakamiTakashi SatoTakayuki KawashimaWataru Ishikawa
    • G01J4/00
    • G02B5/3041G02B5/3033G02B27/288
    • A thin polarizer array and a wavelength plate array that are composed of micro regions having different optical axis directions and wavelength characteristics and having a high extinction ratio and a low insertion loss, and a polarization analyzer using them. An array of micro periodic grooves is formed on a substrate, with the directions changed from one region to another. An alternating multilayer film formed by bias sputtering alternating a layer of high refractive index material such as Si or Ta2O5 and a layer of low refractive index material such as SiO2. By selecting a condition that each layer maintains its periodic projecting/recessed shape, an array of photonic crystal polarizer is formed. By mounting this array of photonic crystal polarizer in a photodetector array, a polarization analyzer that is small, has no movable part, has a small number of components, and enables high-precision measurement is constituted.
    • 由具有不同的光轴方向和波长特性的微区域构成的具有高消光比和低插入损耗的微偏振器阵列和波长板阵列以及使用它们的偏振分析器。 在基板上形成微周期槽的阵列,其方向从一个区域改变到另一个区域。 通过偏置溅射交替形成的交替多层膜,其交替使用诸如Si或Ta 2 O 5的高折射率材料层和低折射率材料层,例如SiO 2, SUB> 2 。 通过选择每层保持其周期性突出/凹陷形状的条件,形成光子晶体偏振器的阵列。 通过将该光子晶体偏振片阵列安装在光电检测器阵列中,小型的不具有可动部分的偏振分析器具有少量的部件,并且能够构成高精度测量。
    • 96. 发明授权
    • Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device
    • 用于校正焦点的曝光方法,以及半导体装置的制造方法
    • US07248349B2
    • 2007-07-24
    • US11220701
    • 2005-09-08
    • Takashi SatoShoji MimotogiTakahiro IkedaSoichi Inoue
    • Takashi SatoShoji MimotogiTakahiro IkedaSoichi Inoue
    • G01B9/00G01B11/00G03F9/00G03C5/00
    • G03F7/70516
    • There is disclosed an exposure method for correcting a focal point, comprising: illuminating a mask, in which a mask-pattern including at least a set of a first mask-pattern and a second mask-pattern mutually different in shape is formed, from a direction in which a point located off an optical axis of an exposure apparatus is a center of illumination, and exposing and projecting an image of said mask-pattern toward an image-receiving element; measuring a mutual relative distance between images of said first and second mask-patterns exposed and projected on said image-receiving element, thereby measuring a focal point of a projecting optical system of said exposure apparatus; and moving said image-receiving element along a direction of said optical axis of said exposure apparatus on a basis of a result of said measurement, and disposing said image-receiving element at an appropriate focal point of said projecting optical system.
    • 公开了一种用于校正焦点的曝光方法,包括:照射掩模,其中形成包括至少一组第一掩模图案和形成相互不同形状的第二掩模图案的掩模图案 使曝光装置的光轴离开的点为照明中心的方向,向图像接收元件曝光和投影所述掩模图案的图像; 测量曝光和投影在所述图像接收元件上的所述第一和第二掩模图案的图像之间的相对相对距离,从而测量所述曝光设备的投影光学系统的焦点; 并且基于所述测量的结果沿所述曝光装置的所述光轴的方向移动所述图像接收元件,并将所述图像接收元件设置在所述投影光学系统的适当焦点处。