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    • 92. 发明申请
    • CLEANING METHOD
    • 清洁方法
    • US20120325927A1
    • 2012-12-27
    • US13518583
    • 2010-12-21
    • Hiroto TokoshimaHiroshi Morita
    • Hiroto TokoshimaHiroshi Morita
    • B08B3/02
    • H01L21/0206H01L21/02052H01L21/67051
    • Disclosed is a low-cost and resource-saving cleaning method wherein high cleaning effects are obtained by high-pressure jet cleaning or two-fluid cleaning using a gas-dissolved water. In the high-pressure jet cleaning method or the two-fluid cleaning method, a cleaning liquid or a mixed fluid of the cleaning liquid and a gas is jetted from a cleaning fluid jetting nozzle toward a subject to be cleaned, and the subject is cleaned. The cleaning liquid introduced into the cleaning fluid jetting nozzle contains the dissolved gas in a quantity equal to or more than the saturation solubility at the liquid temperature of the cleaning liquid.
    • 公开了一种低成本且节省资源的清洗方法,其中通过高压喷射清洗或使用溶解气体的水进行双流体清洗获得高清洗效果。 在高压喷射清洗方法或双液清洗方法中,将清洗液和气体的清洗液或清洗液喷射到被清洗对象物上,从而清洗被检体 。 引入清洗流体喷射喷嘴的清洗液含有等于或大于在清洗液体的液体温度下的饱和溶解度的溶解气体。
    • 93. 发明授权
    • Process for producing gas-containing cleaning water, apparatus for producing the cleaning water and cleaning apparatus
    • 用于生产含气清洗水的方法,用于生产清洗水的设备和清洁设备
    • US08123833B2
    • 2012-02-28
    • US12225038
    • 2007-03-12
    • Hiroshi MoritaHiroto Tokoshima
    • Hiroshi MoritaHiroto Tokoshima
    • B01D53/22B01D19/00B08B3/10C02F1/20
    • C02F1/70B01D19/0036B01F3/04269B01F2003/04404B01F2003/04914B08B3/12B08B9/0321C01B3/501C01B2203/0405C01B2203/0495C02F1/444C11D3/0052H01L21/67057
    • A process for producing a gas-containing cleaning water which contains a specific gas dissolved in water, which process comprises dissolving the specific gas into water under an increased pressure exceeding an atmospheric pressure to prepare a gas-containing water having a concentration of the gas exceeding solubility of the gas under an atmospheric pressure and, then, removing a portion of the dissolved gas by decreasing pressure on the gas-containing water; an apparatus for producing a gas-containing cleaning water which comprises an apparatus for dissolving a gas (14) in which a specific gas is dissolved into water under a pressure exceeding the atmospheric pressure and an apparatus for removing a portion of a dissolved gas (15) in which the pressure on the gas-containing water obtained from the apparatus for dissolving a gas is decreased to a pressure lower than the pressure under which the gas has been dissolved so that a portion of the dissolved gas is removed; and a cleaning apparatus using the gas-containing cleaning water. A gas-containing cleaning water having a desired concentration of the gas can be produced safely without using a mechanism for decreasing the pressure such as a vacuum pump. Water and the specific gas in the gas-containing cleaning water after being used can be reused. The process and the apparatuses can be advantageously applied to cleaning electronic members requiring a great degree of cleanliness.
    • 一种生产含有溶解在水中的特定气体的含气清洗水的方法,该方法包括在超过大气压的压力下将特定气体溶解在水中,以制备浓度超过气体的含气体水 气体在大气压下的溶解度,然后通过降低含气水的压力来除去一部分溶解的气体; 一种用于生产含气体清洗水的装置,包括一种在超过大气压力的压力下将特定气体溶解在水中的气体(14)的装置和用于除去溶解气体的一部分的装置(15 ),其中从用于溶解气体的装置获得的含气体水的压力降低到低于已经溶解气体的压力的压力,从而去除部分溶解气体; 以及使用含气体清洗水的清洗装置。 可以安全地制造具有期望浓度的气体的含气体清洁水,而不使用用于降低诸如真空泵的压力的机构。 使用后的含水清洗水中的水和比气体可以重复使用。 该方法和装置可以有利地应用于需要很高清洁度的清洁电子部件。
    • 94. 发明申请
    • METHOD FOR CLEANING ELECTRONIC MATERIAL AND DEVICE FOR CLEANING ELECTRONIC MATERIAL
    • 用于清洁电子材料的方法和用于清洁电子材料的装置
    • US20120012134A1
    • 2012-01-19
    • US13138697
    • 2010-03-04
    • Kazumi TsukamotoHiroshi Morita
    • Kazumi TsukamotoHiroshi Morita
    • B08B3/08B08B7/00
    • G03F7/423H01L21/02057H01L21/31133
    • A resist on an electronic material is surely separated and removed in a short time. The electronic material is cleaned with a sulfuric acid solution containing persulfuric acid to separate and clean the resist, and thereafter wet cleaning is performed with gas dissolved water. By using gas dissolved water for performing wet cleaning after the resist separation with the sulfuric acid solution containing persulfuric acid, the time required for cleaning can be sharply reduced as compared with that of a former method. The sulfuric acid solution containing persulfuric acid is preferably one produced by electrolyzing a sulfuric acid solution. A sulfuric acid solution which is discharged from a resist separation and cleaning device and in which the persulfuric acid concentration has decreased is supplied to an electrolytic reactor for regeneration, and then the sulfuric acid solution, in which the persulfuric acid concentration has been sufficiently increased, is circulated to the cleaning device, whereby the resist can be efficiently separated and removed with the high-concentration persulfuric acid and the repeated use of the sulfuric acid can be achieved.
    • 电子材料上的抗蚀剂在短时间内可靠地分离和去除。 电子材料用含有硫酸的硫酸溶液进行清洗以分离和清洁抗蚀剂,然后用气体溶解的水进行湿法清洗。 在使用含有过硫酸的硫酸溶液进行抗蚀剂分离后,通过使用气体溶解水进行湿式清洗,与前一方法相比,清洗所需的时间可以大大降低。 含有过硫酸的硫酸溶液优选通过电解硫酸溶液而制备的硫酸溶液。 将从抗蚀剂分离清洗装置排出的硫酸浓度降低的硫酸溶液供给到再生用电解反应器中,然后将过硫酸浓度充分提高的硫酸溶液, 循环到清洁装置,由此可以用高浓度过硫酸有效地分离和去除抗蚀剂,并且可以重复使用硫酸。
    • 95. 发明申请
    • GAS-DISSOLVED WATER SUPPLY SYSTEM
    • 气体溶解水供应系统
    • US20110042281A1
    • 2011-02-24
    • US12735657
    • 2009-03-13
    • Hiroto TokoshimaHiroshi MoritaShigeji Kametani
    • Hiroto TokoshimaHiroshi MoritaShigeji Kametani
    • C02F1/74B01D61/00B01D65/00
    • C02F1/68C02F1/66C02F1/685C02F1/727C02F1/74
    • Provided is a gas-dissolved water supply system that can efficiently produce highly concentrated gas-dissolved water and can circulate and supply the water to a use point. To a storage tank 1, waste water (cleaning waste water) that is water containing dissolved gas (oxygen) used for cleaning an object to be cleaned is reserved through piping 15, and feeding water is supplied through feeding water piping 1a. The water in the storage tank 1 is sent to a purification device 4 via a pressure feeding pump 2 and a heat exchanger 3 for keeping the water temperature constant. The water from which foreign substances are removed by the purification device 4 is sent to a degasser 6 via a flowmeter 5. Then, a gas is dissolved in the water by a gas-dissolving apparatus 7, a chemical is added to the water, and the water is supplied to a use point.
    • 提供了一种能够有效地产生高浓度的溶解水的水,并且可以将水循环并供给到使用点的气体溶解的供水系统。 向贮存罐1中通过配管15预留含有用于清洗被清洗物的溶解气体(氧气)的水的废水(清洗废水),通过给水管道1a供给给水。 储存罐1中的水通过加压泵2和用于保持水温恒定的热交换器3被送至净化装置4。 由净化装置4除去异物的水通过流量计5送到脱气装置6.然后,通过气体溶解装置7将气体溶解在水中,向水中添加化学物质, 水被供应到使用点。
    • 97. 发明申请
    • AIR-FUEL RATIO CONTROL APPARATUS AND AIR-FUEL RATIO CONTROL METHOD
    • 空气燃料比控制装置和空燃比控制方法
    • US20100180874A1
    • 2010-07-22
    • US12664766
    • 2008-06-13
    • Kazuhiro IwahashiHiroshi Morita
    • Kazuhiro IwahashiHiroshi Morita
    • F02D41/00F01N3/10
    • F02D13/023F01L13/0021F02D41/2416F02D41/2445F02D41/2454F02D2041/001Y02T10/18
    • An air-fuel ratio control apparatus includes a learning unit learning amounts of divergence of a correction amount from a reference value thereof respectively as to a plurality of set lift amount regions as divergence amount learning values, a correction unit calculating a divergence amount correction value and correcting a fuel injection amount command value, and a reflection unit reflecting a learning result of the divergence amount learning value of a specific one of the plurality of the set lift amount regions on the divergence amount learning value of another one of the lift amount regions when there is a history indicating that the divergence amount learning value of the specific one of the lift amount regions has been learned and there is no history indicating that the divergence amount learning value of that another one of the lift amount regions has been learned.
    • 空燃比控制装置包括:学习单元,将修正量的发散量的学习量分别从作为发散量学习值的多个设定提升量区域的参考值学习,校正单元计算发散量校正值,以及 校正燃料喷射量指令值,以及反射单元,其将所述多个所述提升量区域中的特定一个的所述提升量区域的所述散度量学习值的学习结果反映在所述提升量区域中的另一个提升量区域的发散量学习值上 存在表示特定的提升量区域的发散量学习值已经被学习的历史,并且没有指示已经学习了另一个提升量区域的分歧量学习值的历史。