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    • 93. 发明授权
    • Gas delivery apparatus and method for atomic layer deposition
    • 用于原子层沉积的气体输送装置和方法
    • US06916398B2
    • 2005-07-12
    • US10032284
    • 2001-12-21
    • Ling ChenVincent KuDien-Yeh WuHua ChungAlan OuyeNorman Nakashima
    • Ling ChenVincent KuDien-Yeh WuHua ChungAlan OuyeNorman Nakashima
    • C23C16/34C23C16/44C23C16/455H01L21/285H01L21/768C23F1/00C23C16/00H01L21/306
    • H01L21/28562C23C16/34C23C16/4411C23C16/4412C23C16/45504C23C16/45508C23C16/45512C23C16/45525C23C16/45544C23C16/45563C23C16/45582H01L21/76843H01L21/76846H01L21/76871
    • One embodiment of the gas delivery assembly comprises a covering member having an expanding channel at a central portion of the covering member and having a bottom surface extending from the expanding channel to a peripheral portion of the covering member. One or more gas conduits are coupled to the expanding channel in which the one or more gas conduits are positioned at an angle from a center of the expanding channel. One embodiment of a chamber comprises a substrate support having a substrate receiving surface. The chamber further includes a chamber lid having a passageway at a central portion of the chamber lid and a tapered bottom surface extending from the passageway to a peripheral portion of the chamber lid. The bottom surface of the chamber lid is shaped and sized to substantially cover the substrate receiving surface. One or more valves are coupled to the passageway, and one or more gas sources are coupled to each valve. In one aspect, the bottom surface of the chamber lid may be tapered. In another aspect, a reaction zone defined between the chamber lid and the substrate receiving surface may comprise a small volume. In still another aspect, the passageway may comprise a tapered expanding channel extending from the central portion of the chamber lid. Another embodiment of the chamber comprises a substrate support having a substrate receiving surface. The chamber further comprises a chamber lid having an expanding channel extending from a central portion of the chamber lid and having a tapered bottom surface extending from the expanding channel to a peripheral portion of the chamber lid. One or more gas conduits are disposed around an upper portion of the expanding channel in which the one or more gas conduits are disposed at an angle from a center of the expanding channel. A choke is disposed on the chamber lid adjacent a perimeter of the tapered bottom surface.
    • 气体输送组件的一个实施例包括覆盖构件,该覆盖构件在覆盖构件的中心部分处具有扩张通道,并且具有从膨胀通道延伸到覆盖构件的周边部分的底面。 一个或多个气体导管联接到膨胀通道,在该扩张通道中,一个或多个气体导管与扩张通道的中心成一角度定位。 室的一个实施例包括具有基板接收表面的基板支撑件。 该腔室还包括腔室盖,该室盖具有在腔室盖的中心部分处的通道和从通道延伸到腔室盖的周边部分的锥形底面。 室盖的底表面的形状和尺寸基本上覆盖基板接收表面。 一个或多个阀联接到通道,并且一个或多个气体源联接到每个阀。 在一个方面,室盖的底表面可以是锥形的。 在另一方面,限定在室盖和基板接收表面之间的反应区域可以包括小体积。 在另一方面,通道可以包括从腔室盖的中心部分延伸的锥形扩张通道。 腔室的另一实施例包括具有基底接收表面的基底支撑件。 腔室还包括腔室盖,其具有从腔室盖的中心部分延伸的膨胀通道,并且具有从膨胀通道延伸到腔室盖的周边部分的锥形底面。 一个或多个气体管道设置在扩张通道的上部周围,其中一个或多个气体管道以与扩张通道的中心成一定角度设置。 扼流圈设置在邻近锥形底面的周边的腔室盖上。