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1. 发明申请

US20050260522A1 Permanent resist composition, cured product thereof, and use thereof 审中-公开
标题翻译：永久抗蚀剂组合物，其固化产物及其用途
公开(公告)号：US20050260522A1
公开(公告)日：2005-11-24
申请号：US11054651
申请日：2005-02-09
申请人： William Weber , Satoshi Mori , Nao Honda , Donald Johnson , Manuel DoCanto
发明人： William Weber , Satoshi Mori , Nao Honda , Donald Johnson , Manuel DoCanto
IPC分类号： C08G59/32 , C08G59/68 , G03C1/492 , G03F7/00 , G03F7/038
CPC分类号： G03F7/0385 , B82Y10/00 , B82Y40/00 , C08G59/3218 , C08G59/687 , G03F7/0002 , G03F7/001 , G03F7/038 , H05K3/287
摘要： A permanent photoresist composition comprising: (A) one or more bisphenol A-novolac epoxy resins according to Formula I; wherein each group R in Formula I is individually selected from glycidyl or hydrogen and k in Formula I is a real number ranging from 0 to about 30; (B) one or more epoxy resins selected from the group represented by Formulas BIIa and BIIb; wherein each R1, R2 and R3 in Formula BIIa are independently selected from the group consisting of hydrogen or alkyl groups having 1 to 4 carbon atoms and the value of p in Formula BIIa is a real number ranging from 1 to 30; the values of n and m in Formula BIIb are independently real numbers ranging from 1 to 30 and each R4 and R5 in Formula BIIb are independently selected from hydrogen, alkyl groups having 1 to 4 carbon atoms, or trifluoromethyl; (C) one or more cationic photoinitiators (also known as photoacid generators or PAGs); and (D) one or more solvents.
摘要翻译：一种永久性光致抗蚀剂组合物，其包含：（A）根据式I的一种或多种双酚A-酚醛清漆环氧树脂; 其中式I中的每个基团R各自选自缩水甘油基或氢，式I中的k为0至约30的实数; （B）选自由式BIIa和BIIb表示的基团中的一种或多种环氧树脂; 其中式BIIa中的每个R 1，R 2和R 3各自独立地选自氢或具有1至4个碳原子的烷基碳原子，式BIIa中的p的值为1〜30的实数; 式BIIb中的n和m的值独立地为1至30的实数，并且式BIIb中的每个R 4和R 5独立地选自氢，烷基具有1至4个碳原子，或三氟甲基; （C）一种或多种阳离子光引发剂（也称为光酸产生剂或PAG）; 和（D）一种或多种溶剂。

2. 发明授权

US07282324B2 Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them 有权
标题翻译：光刻胶组合物，其硬化形式，其硬化图案和使用它们形成的金属图案
公开(公告)号：US07282324B2
公开(公告)日：2007-10-16
申请号：US11028455
申请日：2005-01-03
申请人： William Weber , Satoshi Mori , Nao Honda
发明人： William Weber , Satoshi Mori , Nao Honda
IPC分类号： G03F7/40
CPC分类号： G03F7/40 , G03F7/038
摘要： Photoresist compositions that demonstrate superior photolithographic performance and hardened resist films that show superior resistance to solvents, have excellent resistance to under plating during the electrodeposition of metals, and show excellent resist stripping characteristics. These photoresist compositions according to the invention are well-suited as for applications in the manufacture of MEMS and micromachine devices. These photoresist compositions according to the invention comprise one or more epoxide-substituted, polycarboxylic acid Resin Component (A), one or more photoacid generator compounds (B), and one or more solvent (C).
摘要翻译：显示优异的光刻性能的光刻胶组合物和显示出优异的耐溶剂性的硬化抗蚀剂膜，在金属电沉积期间具有优异的耐电镀性，并且显示出优异的抗剥离特性。根据本发明的这些光致抗蚀剂组合物非常适用于制造MEMS和微机械装置的应用。根据本发明的这些光致抗蚀剂组合物包含一种或多种环氧化物取代的多元羧酸树脂组分（A），一种或多种光酸产生剂化合物（B）和一种或多种溶剂（C）。

3. 发明申请

US20050147918A1 Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them 有权
标题翻译：光刻胶组合物，其硬化形式，其硬化图案和使用它们形成的金属图案
公开(公告)号：US20050147918A1
公开(公告)日：2005-07-07
申请号：US11028455
申请日：2005-01-03
申请人： William Weber , Satoshi Mori , Nao Honda
发明人： William Weber , Satoshi Mori , Nao Honda
IPC分类号： G03C1/76 , G03F7/038 , G03F7/40
CPC分类号： G03F7/40 , G03F7/038
摘要： Photoresist compositions that demonstrate superior photolithographic performance and hardened resist films that show superior resistance to solvents, have excellent resistance to under plating during the electrodeposition of metals, and show excellent resist stripping characteristics. These photoresist compositions according to the invention are well-suited as for applications in the manufacture of MEMS and micromachine devices. These photoresist compositions according to the invention comprise one or more epoxide-substituted, polycarboxylic acid Resin Component (A), one or more photoacid generator compounds (B), and one or more solvent (C).
摘要翻译：显示优异的光刻性能的光刻胶组合物和显示出优异的耐溶剂性的硬化抗蚀剂膜，在金属电沉积期间具有优异的耐电镀性，并且显示出优异的抗剥离特性。根据本发明的这些光致抗蚀剂组合物非常适用于制造MEMS和微机械装置的应用。根据本发明的这些光致抗蚀剂组合物包含一种或多种环氧化物取代的多元羧酸树脂组分（A），一种或多种光酸产生剂化合物（B）和一种或多种溶剂（C）。

4. 发明申请

US20090035706A1 Method for Fabricating Micromachine Component of Resin 失效
标题翻译：制造树脂微机械成分的方法
公开(公告)号：US20090035706A1
公开(公告)日：2009-02-05
申请号：US11922529
申请日：2006-06-15
申请人： Nao Honda , Satoshi Mori , Shuji Tanaka , Masayoshi Esashi
发明人： Nao Honda , Satoshi Mori , Shuji Tanaka , Masayoshi Esashi
IPC分类号： G03F7/20
CPC分类号： F04D29/281 , B29C64/106 , B29C64/124 , B29L2031/7496 , B81C99/008 , F04D29/023 , F05D2230/31 , F05D2300/44
摘要： A method for fabricating a micromachine component of resin comprising step (a) of forming a sacrifice layer on a substrate, step (b) of forming at least two photosensitive resin composition layers sequentially on the sacrifice layer, and performing photolithography of each photosensitive resin composition layer to form an air gap portion defining the circumferential edge potion of the micromachine component and an air gap portion where an internal structure of the micromachine component is constituted to form a multilayer structure, step (c) for depositing dry film resist on the multilayer structure of the cured photosensitive resin composition layer, and performing photolithography of the dry film resist layer to form a cured dry film resist layer in which an air gap portion defining the circumferential edge of a shroud layer and an air gap where the structure of the shroud layer is constituted are formed, and step (d) for separating the micromachine component having the multilayer structure of the cured photosensitive resin composition layer and the cured dry film resist layer from the substrate by removing the sacrifice layer.
摘要翻译：一种用于制造树脂微机械部件的方法，包括在基板上形成牺牲层的步骤（a），在牺牲层上依次形成至少两个感光性树脂组合物层的步骤（b），并对各感光性树脂组合物进行光刻以形成限定微机械部件的周向边缘部分的气隙部分和构成微机械部件的内部结构以形成多层结构的气隙部分，用于在多层结构上沉积干膜抗蚀剂的步骤（c）并进行干膜抗蚀剂层的光刻，形成固化的干膜抗蚀剂层，其中限定了护罩层的周缘的气隙部分和护罩层的结构的气隙形成，并且步骤（d）用于分离具有多层st的微机械部件通过除去牺牲层从固化的光敏树脂组合物层和固化的干膜抗蚀剂层的结构。

5. 发明授权

US08481248B2 Method for fabricating micromachine component of resin 失效
标题翻译：制造树脂微机械部件的方法
公开(公告)号：US08481248B2
公开(公告)日：2013-07-09
申请号：US11922529
申请日：2006-06-15
申请人： Nao Honda , Satoshi Mori , Shuji Tanaka , Masayoshi Esashi
发明人： Nao Honda , Satoshi Mori , Shuji Tanaka , Masayoshi Esashi
IPC分类号： G03F7/22
CPC分类号： F04D29/281 , B29C64/106 , B29C64/124 , B29L2031/7496 , B81C99/008 , F04D29/023 , F05D2230/31 , F05D2300/44
摘要： A method for fabricating a micromachine component of resin comprising step (a) of forming a sacrifice layer on a substrate, step (b) of forming at least two photosensitive resin composition layers sequentially on the sacrifice layer, and performing photolithography of each photosensitive resin composition layer to form an air gap portion defining the circumferential edge portion of the micromachine component and an air gap portion where an internal structure of the micromachine component is constituted to form a multilayer structure, step (c) for depositing dry film resist on the multilayer structure of the cured photosensitive resin composition layer, and performing photolithography of the dry film resist layer to form a cured dry film resist layer in which an air gap portion defining the circumferential edge of a shroud layer and an air gap where the structure of the shroud layer is constituted are formed, and step (d) for separating the micromachine component having the multilayer structure of the cured photosensitive resin composition layer and the cured dry film resist layer from the substrate by removing the sacrifice layer.
摘要翻译：一种用于制造树脂微机械部件的方法，包括在基板上形成牺牲层的步骤（a），在牺牲层上依次形成至少两个感光性树脂组合物层的步骤（b），并对各感光性树脂组合物进行光刻形成限定微机械部件的周缘部的气隙部和构成微机械部件的内部结构的气隙部，形成多层结构，在多层结构体上设置干膜抗蚀剂的工序（c）并进行干膜抗蚀剂层的光刻，形成固化的干膜抗蚀剂层，其中限定了护罩层的周缘的气隙部分和护罩层的结构的气隙形成，并且步骤（d）用于分离具有多层的微机械部件通过除去牺牲层从固化的光敏树脂组合物层和固化的干膜抗蚀剂层结构。

6. 发明授权

US09340693B2 Actinic ray curable inkjet ink and image recording method using same 有权
标题翻译：光化学射线固化喷墨油墨和使用其的图像记录方法
公开(公告)号：US09340693B2
公开(公告)日：2016-05-17
申请号：US14004729
申请日：2012-03-27
申请人： Akio Maeda , Satoshi Mori , Masashi Ikeda , Toshiyuki Takabayashi , Takashi Iwata , Hirotaka Iijima
发明人： Akio Maeda , Satoshi Mori , Masashi Ikeda , Toshiyuki Takabayashi , Takashi Iwata , Hirotaka Iijima
IPC分类号： B41J2/01 , C09D11/38 , C09D11/101 , B41J11/00 , C09D11/12 , B41M7/00
CPC分类号： C09D11/38 , B41J11/0015 , B41M7/0081 , C09D11/101 , C09D11/12
摘要： The purpose of the present invention is to provide an actinic ray curable inkjet ink which, in an inkjet printing method, is capable of having both high pinning characteristics and high ejection characteristics. In order to achieve the above purpose, this actinic ray curable inkjet ink includes an actinic ray curable compound, ketone wax, and ester wax, and reversibly goes through a sol-gel phase transition depending on the temperature.
摘要翻译：本发明的目的是提供一种能够具有高钉扎特性和高喷射特性的喷墨印刷方法的光化射线固化型喷墨油墨。为了达到上述目的，该光化射线固化型喷墨油墨包括光化学射线固化性化合物，酮蜡，酯蜡，根据温度可逆地经历溶胶 - 凝胶相变。

7. 发明申请

US20130247049A1 CONTROL APPARATUS AND METHOD OF STARTING CONTROL APPARATUS 审中-公开
标题翻译：控制装置和启动控制装置的方法
公开(公告)号：US20130247049A1
公开(公告)日：2013-09-19
申请号：US13782347
申请日：2013-03-01
申请人： Satoshi Aoki , Naoya Morita , Naoya Ohashi , Tamon Sadasue , Satoshi Mori
发明人： Satoshi Aoki , Naoya Morita , Naoya Ohashi , Tamon Sadasue , Satoshi Mori
IPC分类号： G06F9/44
CPC分类号： G06F9/44 , G06F9/4411 , H04N1/00915 , H04N1/00928
摘要： A control apparatus may include a processor configured to execute one or more programs in order to control a control target, and an accepting unit configured to accept a user input. The processor may start a first program to cause the accepting unit to function at a time of starting the control apparatus, and thereafter start a second program for executing a function selected by the user input accepted by the accepting unit, amongst a plurality of functions executable by the control target, with preference over programs for executing other functions.
摘要翻译：控制装置可以包括被配置为执行一个或多个程序以便控制控制目标的处理器和被配置为接受用户输入的接受单元。处理器可以启动第一程序以使得接受单元在启动控制装置时起作用，然后在多个功能中启动用于执行由接受单元接受的用户输入选择的功能的第二程序通过控制目标，优先于执行其他功能的程序。

8. 发明申请

US20090218506A1 ELECTRON BEAM APPARATUS 有权
标题翻译：电子束设备
公开(公告)号：US20090218506A1
公开(公告)日：2009-09-03
申请号：US11996701
申请日：2006-07-24
申请人： Mamoru Nakasuji , Takeshi Murakami , Tohru Satake , Tsutomu Karimata , Toshifumi Kimba , Matsutaro Miyamoto , Hiroshi Sobukawa , Satoshi Mori
发明人： Mamoru Nakasuji , Takeshi Murakami , Tohru Satake , Tsutomu Karimata , Toshifumi Kimba , Matsutaro Miyamoto , Hiroshi Sobukawa , Satoshi Mori
IPC分类号： H01J1/50 , A61N5/00 , H01J3/14
CPC分类号： H01J37/05 , H01J37/147 , H01J37/153 , H01J37/26 , H01J2237/057
摘要： An electron beam emitted from an electron gun (G) forms a reduced image on a sample (S) through a non-dispersion Wien-filter (5-1), an electromagnetic deflector (11-1), a beam separator (12-1), and a tablet lens (17-1) as an objective lens. The beam separator (12-1) is configured such that a distance by which a secondary electron beam passes through the beam separator is approximately three times longer than a distance by which a primary electron beam passes through the beam separator. Therefore, even if a magnetic field in the beam separator is set to deflect the primary electron beam by a small angle equal to or less than approximately 10 degrees, the secondary electron beam can be deflected by approximately 30 degrees, so that the primary and secondary electron beams are sufficiently separated. Also, since the primary electron beam is deflected by a small angle, less aberration occurs in the primary electron beam. Accordingly, since a light path length of a primary electro-optical system, it is possible to reduce the influence of space charge and the occurrence of deflection aberration.
摘要翻译：从电子枪（G）发射的电子束通过非分散维恩滤波器（5-1），电磁偏转器（11-1），光束分离器（12- 1）和作为物镜的平板电脑镜头（17-1）。束分离器（12-1）被构造成使得二次电子束通过分束器的距离比一次电子束通过分束器的距离大约三倍。因此，即使将分束器中的磁场设定为使一次电子束偏转等于或小于约10度的小角度，二次电子束可以偏转大约30度，使得初级和次级电子束充分分离。此外，由于一次电子束以小角度偏转，所以在一次电子束中产生较小的像差。因此，由于一次电光学系统的光路长度，可以减小空间电荷的影响和偏转像差的发生。

9. 发明申请

US20090110273A1 Image Processing Device and Image Processing Program 审中-公开
标题翻译：图像处理设备和图像处理程序
公开(公告)号：US20090110273A1
公开(公告)日：2009-04-30
申请号：US12280520
申请日：2007-07-09
申请人： Tomotaka Shinoda , Toshihiro Mitaka , Satoshi Mori , Naoki Watanabe , Hideki Ito
发明人： Tomotaka Shinoda , Toshihiro Mitaka , Satoshi Mori , Naoki Watanabe , Hideki Ito
IPC分类号： G06K9/36 , G06K9/00
CPC分类号： H04N1/60 , G06T5/009 , G06T5/40 , G06T2207/10024 , G06T2207/30004 , H04N1/6075
摘要： An inspection apparatus includes an imaging device and an image processing device. The imaging device photographs a specimen and outputs a color image of the specimen to the image processing device. The image processing device subjects the color image of the specimen to negative-positive reversal. After detecting a mode value of the hue of the color image having been subjected to negative-positive reversal, the image processing device changes the hue of the color image in accordance with a difference between a boundary value of two predefined hues and the detected mode value. In accordance with the change of the hue, a plurality of target pixels different in the saturation is extracted and the saturation and the intensity of each pixel are changed, or the gradation of each pixel is converted so that the plurality of target pixels becomes most distant from one another in a color space.
摘要翻译：检查装置包括成像装置和图像处理装置。成像装置拍摄样本并将样本的彩色图像输出到图像处理装置。图像处理装置使样本的彩色图像呈负反转。在检测到经过负反转的彩色图像的色相的模式值之后，图像处理装置根据两个预定色调的边界值与检测到的模式值之间的差异来改变彩色图像的色调。根据色调的变化，提取饱和度不同的多个目标像素，并且改变每个像素的饱和度和强度，或者转换每个像素的灰度，使得多个目标像素变得最远在一个色彩空间中彼此之间。

10. 发明授权

US07288397B2 Nicotianamine aminotransferase and gene therefor 失效
标题翻译：尼古丁胺氨基转移酶及其基因
公开(公告)号：US07288397B2
公开(公告)日：2007-10-30
申请号：US11013391
申请日：2004-12-17
申请人： Satoshi Mori , Hiromi Nakanishi , Michiko Takahashi
发明人： Satoshi Mori , Hiromi Nakanishi , Michiko Takahashi
IPC分类号： C12N9/10 , C12N15/82 , C12N1/00 , C12N5/04
CPC分类号： C12N15/8271 , C12N9/1096 , C12N15/8261 , Y02A40/146
摘要： A protein having an amino acid sequence represented by SEQ ID NO: 2 or 4 or an amino acid sequence having said amino acid sequence with a single or plural amino acids deleted, replaced or added, and having the nicotianamine aminotransferase activity, a gene encoding said protein as well as utilization thereof for enhancement of ability of absorbing insoluble iron in soil and for improvement of resistance to iron deficiency are provided.
摘要翻译：具有SEQ ID NO：2或4所示的氨基酸序列的蛋白质或具有缺失，替换或添加的单个或多个氨基酸并具有烟酰胺氨基转移酶活性的具有所述氨基酸序列的氨基酸序列的编码所述提供蛋白质以及其用于增强土壤中不溶性铁吸收能力和提高耐铁缺乏能力的用途。

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