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    • 1. 发明授权
    • Light activated semiconductor device
    • 光激活半导体器件
    • US4404580A
    • 1983-09-13
    • US172072
    • 1980-07-24
    • Nobutake KonishiMasayoshi NaitoTsutomu YatsuoYoshio Terasawa
    • Nobutake KonishiMasayoshi NaitoTsutomu YatsuoYoshio Terasawa
    • H01L29/74H01L31/111H01L29/12H01L29/14
    • H01L31/1113H01L29/74
    • A light activated thyristor with high dv/dt capability is provided by disposing first and second thyristors, one a primary and the other a pilot thyristor, in a semiconductor body having first and second major surface. The two thyristors have common first emitter, first base, and second base regions, and have spaced apart second emitter regions adjoining the second major surface of the body. The second emitter region of the second thyristor consists of first and second portions, first portion abutting the second base region of the second thyristor to create a ratarded electrical field. An exposed portion of the second major surface at the second emitter region of the second thyristor activates the second thyristor when electromagnetic radiation of wavelengths corresponding substantially to the energy bandgap of the semiconductor body strikes this exposed portion. The cathode electrode makes ohmic contact with the second emitter region of the first thyristor, and the anode electrode makes ohmic contact with the common first emitter regions. A floating contact also makes ohmic contact to the second emitter region of the second thyristor and the common second base region between the thyristors.
    • 具有高dv / dt能力的光激活晶闸管通过在具有第一和第二主表面的半导体本体中设置第一和第二晶闸管,一个一个导电晶闸管和另一个晶闸管。 两个晶闸管具有共同的第一发射极,第一基极和第二基极区域,并且具有邻接主体的第二主表面的间隔开的第二发射极区域。 第二晶闸管的第二发射极区域由第一和第二部分组成,第一部分邻接第二晶闸管的第二基极区域以产生经过电压的电场。 当第二晶闸管的第二发射极区域处的第二主表面的暴露部分激活第二晶闸管,当基本上对应于半导体主体的能带隙的波长的电磁辐射撞击该暴露部分时。 阴极电极与第一晶闸管的第二发射极区域欧姆接触,并且阳极电极与共同的第一发射极区域欧姆接触。 浮动接触还使第二晶闸管的第二发射极区域和晶闸管之间的公共第二基极区域欧姆接触。
    • 3. 发明授权
    • High breakdown voltage semiconductor device
    • 高击穿电压半导体器件
    • US4388635A
    • 1983-06-14
    • US164946
    • 1980-07-01
    • Atsuo WatanabeMasayoshi NaitoTsutomu YatsuoMasahiro Okamura
    • Atsuo WatanabeMasayoshi NaitoTsutomu YatsuoMasahiro Okamura
    • H01L29/06H01L29/40H01L29/74
    • H01L29/408H01L29/0638H01L29/0661
    • A novel structure of a high breakdown voltage semiconductor device has a pair of major surfaces on which a pair of main electrodes are formed and a PN junction formed between the pair of major surfaces with a side surface to which the PN junction is exposed being covered with a passivation material. An auxiliary electrode of a conductive member is provided, which is disposed externally of the peripheral edge of the major surface of the semiconductor substrate, and which contacts to the passivation material and is electrically connected to the main electrode. When a voltage for reverse biasing the PN junction is applied between the pair of main electrodes, ions in the passivation material are collected by an electric field established in the passivation material so that the deterioration of the breakdown on the surface of the semiconductor substrate is prevented.
    • 高击穿电压半导体器件的新颖结构具有一对主表面,其上形成有一对主电极,并且在一对主表面之间形成有PN结被暴露的侧表面覆盖的PN结 钝化材料。 提供了一种导电构件的辅助电极,其设置在半导体衬底的主表面的外围边缘的外侧,并与钝化材料接触并与主电极电连接。 当在一对主电极之间施加用于反向偏置PN结的电压时,通过在钝化材料中建立的电场来收集钝化材料中的离子,从而防止半导体衬底的表面上的击穿劣化 。
    • 5. 发明授权
    • Field controlled thyristor with dual resistivity field layer
    • 具有双电阻率场层的场控晶闸管
    • US4223328A
    • 1980-09-16
    • US911311
    • 1978-06-01
    • Yoshio TerasawaKenji MiyataMasayoshi NaitoTakuzo OgawaMasahiro Okamura
    • Yoshio TerasawaKenji MiyataMasayoshi NaitoTakuzo OgawaMasahiro Okamura
    • H01L29/80H01L29/08H01L29/10H01L29/167H01L29/74H01L29/744
    • H01L29/744H01L29/0834H01L29/1066H01L29/167
    • A field controlled thyristor is disclosed which comprises a first emitter region exposed to one main surface of a semiconductor substrate and having a first conductivity type, a second emitter region exposed to the other main surface of the substrate and having a second conductivity type, a base region connecting the first and the second emitter region, and a gate region provided in the base region. The gate region consists of a slab-like first portion disposed parallel to both the emitter and a second portion connecting the first slab-like portion with one of the main surfaces of the semiconductor substrate. The impurity concentration of the base region is higher in the portion of the base region nearer to the emitter region having the same conductivity type as that of the base region than in the portion of the base region nearer to the emitter region having the opposite conductivity type to that of the base region. The field controlled thyristor has a high forward blocking voltage gain (anode-cathode voltage/gate bias voltage), a large current rating, and a high switching power capability and its switching time is very short.
    • 公开了一种场控晶闸管,其包括暴露于半导体衬底的一个主表面并具有第一导电类型的第一发射极区域,暴露于衬底的另一个主表面并具有第二导电类型的第二发射极区域, 连接第一和第二发射极区域的区域,以及设置在基极区域中的栅极区域。 栅极区域由平行于发射极的板状第一部分和将第一板状部分与半导体衬底的主表面中的一个连接的第二部分组成。 基极区域的杂质浓度比基极区域具有与基极区域相同的导电类型的发射极区域的部分比在具有相反导电类型的发射极区域更靠近的部分的基极区域更高 到基地区。 场控晶闸管具有高正向阻断电压增益(阳极 - 阴极电压/栅极偏置电压),大额定电流和高开关功率能力,其开关时间非常短。
    • 9. 发明授权
    • Device for picking up tissues from a body cavity
    • 从体腔拾取组织的装置
    • US4235245A
    • 1980-11-25
    • US958622
    • 1978-11-08
    • Masayoshi Naito
    • Masayoshi Naito
    • A61B1/00A61B10/00A61B10/02A61B10/04A61B17/32G01N33/48
    • A61B10/04A61B2010/0216A61B2017/320012
    • A device for picking up tissues comprises a flexible outer sheath, an extension wire extending through the outer sheath, a connector fixed by one end of the wire and having an outer diameter larger than the inner diameter of the outer sheath for abutting on one end of the outer sheath, a tissue picking-up section connected to said one end of the wire by the connector, a wire holding section for holding the other end of the extension wire and receiving the other end of the outer sheath, a chamber formed in the wire holding section, and a compression spring disposed in the wire holding section for resiliently urging the other end of the outer sheath toward the tissue picking-up section. The device is inserted into an endoscope disposed in a body cavity, and its outer sheath can be easily bent according to the shape of the body cavity.
    • 用于拾取组织的装置包括柔性外护套,延伸穿过外护套的延伸线,由导线的一端固定的连接器,其外径大于外护套的内径,用于邻接在外护套的一端 所述外护套,通过所述连接器连接到所述线的所述一端的组织拾取部,用于保持所述延长线的另一端并且接收所述外护套的另一端的线保持部,形成在所述外护套中的腔 线保持部,以及设置在线保持部中的压缩弹簧,用于将外护套的另一端弹性地推向组织拾取部。 该装置被插入到设置在体腔内的内窥镜中,其外护套可以根据体腔的形状容易地弯曲。
    • 10. 发明授权
    • Apparatus for exposing peripheral portion of substrate
    • 用于暴露衬底的周边部分的装置
    • US5420663A
    • 1995-05-30
    • US210275
    • 1994-03-18
    • Masao NakajimaMasayoshi Naito
    • Masao NakajimaMasayoshi Naito
    • G03F7/20G03B27/48G03B27/50
    • G03F7/2022
    • An exposure apparatus for exposing a peripheral portion of a substrate to light comprises a rotating member for rotating a substrate to which a resist is applied, an irradiating system for irradiating the substrate with light which is sensed by the resist, a position detecting system for detecting a relative position between the light and the substrate in a radial direction of the substrate, a moving system for making a relative movement between the light and the substrate in the radial direction of the substrate, a periphery detecting member for detecting outer-periphery information corresponding to a shape of an outer periphery of the substrate, a control system for servo-controlling the moving system in accordance with the outer periphery of the substrate to make the width of the light emitted on the substrate constant, a characteristic detecting member for detecting a specific part of the peripheral portion of the substrate, and a control characteristic changing member for changing a control quantity of the control system at the specific part of the peripheral portion of the substrate.
    • 用于将基板的周边部分曝光的曝光装置包括用于旋转施加有抗蚀剂的基板的旋转构件,用于通过由抗蚀剂感测的光照射基板的照射系统,用于检测的位置检测系统 在基板的径向方向上的光和基板之间的相对位置,用于在基板的径向方向上在光和基板之间进行相对移动的移动系统,用于检测对应于外部信息的外周信息的周边检测部件 基板的外周的形状,根据所述基板的外周对所述移动体进行伺服控制以使所述基板的光的宽度恒定的控制系统,检测所述基板的特性检测部件 基板的外围部分的特定部分,以及用于改变的控制特性变化部件 在基板周边部分的特定部分处的控制系统的控制量。