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1. 发明授权

US06700916B1 E-diagnostic, laser simulator, automated testing and deconvolution of spectra for lithographic exposure radiation generating systems such as excimer or molecular fluorine laser or EUV source systems 失效
标题翻译：电子诊断，激光模拟器，用于光刻曝光辐射发生系统的光谱的自动测试和去卷积，例如准分子或分子氟激光或EUV源系统
公开(公告)号：US06700916B1
公开(公告)日：2004-03-02
申请号：US10259212
申请日：2002-09-26
申请人： Matthias Kramer , Günter Nowinski , Juergen Kleinschmidt , Marcus Serwazi
发明人： Matthias Kramer , Günter Nowinski , Juergen Kleinschmidt , Marcus Serwazi
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70525 , H01S3/036 , H01S3/08004 , H01S3/1055 , H01S3/134 , H01S3/1392 , H01S3/225
摘要： An E-Diagnostic system for monitoring a state of an excimer laser or molecular fluorine laser system includes a processing device and an interface. The processing device runs a program for outputting parameter requests to the laser system, receiving parameter values from the laser system in response to the parameter requests, and storing the parameter values such that a record of the state of the excimer or molecular fluorine laser system is kept. The interface signal-couples the processing device with the laser system permitting the outputting of the parameter requests and the receiving of the parameter values between the processing device and the laser system.
摘要翻译：用于监测准分子激光或分子氟激光系统的状态的电子诊断系统包括处理装置和界面。处理装置运行用于向激光系统输出参数请求的程序，响应于参数请求从激光系统接收参数值，并存储参数值，使得准分子或分子氟激光系统的状态记录为保持接口将处理装置与激光系统进行信号耦合，允许输出参数请求和接收处理装置与激光系统之间的参数值。

2. 发明授权

US06822977B1 Method and apparatus for compensation of beam property drifts detected by measurement systems outside of an excimer laser 失效
标题翻译：用于补偿由准分子激光器外部的测量系统检测的光束特性漂移的方法和装置
公开(公告)号：US06822977B1
公开(公告)日：2004-11-23
申请号：US10165767
申请日：2002-06-06
申请人： Uwe Stamm , Hans-Stephan Albrecht , Günter Nowinski
发明人： Uwe Stamm , Hans-Stephan Albrecht , Günter Nowinski
IPC分类号： H01S310
CPC分类号： H01S3/225 , H01S3/1305 , H01S3/1312 , H01S3/134
摘要： A lithography laser system for incorporating with a semiconductor processing system includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber and connected with a discharge circuit for energizing the laser gas, a resonator including the discharge chamber for generating a laser beam, and a processor. The processor runs an energy control algorithm and sends a signal to the discharge circuit based on said algorithm to apply electrical pulses to the electrodes so that the laser beam exiting the laser system has a specified first energy distribution over a group of pulses. The energy control algorithm is based upon a second energy distribution previously determined of a substantially same pattern of pulses as the group of pulses having the first energy distribution. The second energy distribution is determined for the laser beam at a location after passing the beam through beam shaping optical elements of the semiconductor processing system while a value of the energy of the laser beam exiting the laser system is maintained at an approximately constant first energy.
摘要翻译：一种用于与半导体处理系统结合的光刻激光系统包括：填充有分子氟和缓冲气体的激光气体的放电室，放电室内的多个电极，并与用于激励激光气体的放电电路连接，包括用于产生激光束的放电室和处理器。处理器运行能量控制算法，并且基于所述算法将信号发送到放电电路，以将电脉冲施加到电极，使得离开激光系统的激光束在一组脉冲上具有规定的第一能量分布。能量控制算法基于先前确定的具有与具有第一能量分布的脉冲群基本相同的脉冲模式的第二能量分布。在将光束通过半导体处理系统的光束整形光学元件之后的位置处的激光束确定第二能量分布，同时离开激光系统的激光束的能量的值保持在大致恒定的第一能量。

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