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1. 发明申请

US20200234995A1 Wafer Processing Tools and Methods Thereof 审中-公开
公开(公告)号：US20200234995A1
公开(公告)日：2020-07-23
申请号：US16738798
申请日：2020-01-09
申请人： Jagan Rangarajan , Edward Golubovsky , Shaun Van Der Veen , Justin Ho Kuen Wong , Steven M. Zuniga
发明人： Jagan Rangarajan , Edward Golubovsky , Shaun Van Der Veen , Justin Ho Kuen Wong , Steven M. Zuniga
IPC分类号： H01L21/687 , B24B41/06 , H01L21/677
摘要： A wafer processing device may include a wafer exchanger including two or more blades, each of the two or more blades may be configured to receive a wafer, the two or more blades may be rotatable about an axis on a single horizontal plane, and the two or more blades may be movable between at least a load cup and a robot access location; wherein the load cup may include a wafer station that is vertically moveable relative a blade located in the load cup and may be configured to remove a wafer from a blade located in the load cup and place a wafer on a blade located in the load cup. Other devices, load cups and methods are also disclosed herein.

2. 发明申请

US20100130107A1 METHOD AND APPARATUS FOR LINEAR PAD CONDITIONING 审中-公开
标题翻译：线性条件调节的方法和装置
公开(公告)号：US20100130107A1
公开(公告)日：2010-05-27
申请号：US12615216
申请日：2009-11-09
申请人： Alpay Yilmaz , Edward Golubovsky , Jagan Rangarajan
发明人： Alpay Yilmaz , Edward Golubovsky , Jagan Rangarajan
IPC分类号： B24B53/02
CPC分类号： B24B53/017
摘要： A method and apparatus for conditioning a polishing pad is described. The apparatus includes a base coupled to a platform, a first arm member having a first end coupled to the base, and a second arm member having a first end pivotably coupled to a second end of the first arm member and a conditioning disk coupled to a second end opposite the first end. The method includes rotating a polishing pad, urging a rotating conditioning disk against a polishing surface of the polishing pad, and moving the conditioning disk in a linear direction relative to the rotating polishing pad to perform a conditioning process.
摘要翻译：描述了一种用于调节抛光垫的方法和装置。该装置包括联接到平台的基座，具有联接到基座的第一端的第一臂构件和第二臂构件，第二臂构件具有可枢转地联接到第一臂构件的第二端的第一端和耦合到第一臂构件的调节盘第二端与第一端相对。该方法包括旋转抛光垫，将旋转的调节盘推向抛光垫的抛光表面，并相对于旋转的抛光垫沿直线方向移动调节盘以执行调节处理。

3. 发明申请

US20200246841A1 Substrate Cleaning Devices and Methods Thereof 审中-公开
公开(公告)号：US20200246841A1
公开(公告)日：2020-08-06
申请号：US16777432
申请日：2020-01-30
申请人： Steven M. Zuniga , Jay Gurusamy , Jagan Rangarajan
发明人： Steven M. Zuniga , Jay Gurusamy , Jagan Rangarajan
IPC分类号： B08B1/00 , H01L21/67 , H01L21/02 , B08B3/08
摘要： A substrate cleaning device may include a chamber body configured to hold a substrate and a brush assembly. The brush assembly may include a first roller, a second roller, and a belt extending between the first roller and the second roller. At least one of the first roller and the second roller may be movable between a first position where the belt contacts a first surface of a substrate disposed in the chamber body and a second position where the belt is spaced from the first surface. Other substrate cleaning devices and methods of cleaning substrates are disclosed.

4. 发明授权

US08444129B2 Methods of verifying effectiveness of a put of a substrate onto a substrate support 有权
标题翻译：验证将衬底放置在衬底支架上的有效性的方法
公开(公告)号：US08444129B2
公开(公告)日：2013-05-21
申请号：US12506308
申请日：2009-07-21
申请人： Douglas MacLeod , Dhruv Gajaria , Jagan Rangarajan
发明人： Douglas MacLeod , Dhruv Gajaria , Jagan Rangarajan
IPC分类号： B23Q1/06
CPC分类号： H01L21/67265 , H01L21/67259 , H01L21/67778
摘要： In a first aspect, a method of manufacturing a substrate is provided wherein an end effector mounted substrate is attempted to be placed, that is put, onto a substrate support, such as a pedestal or slotted support of a substrate carrier, and the effectiveness of the put is verified by a sensor associated with the end effector. In one embodiment, the verification takes place during the retraction motion of the end effector and is accomplished by sensing the presence, absence, or location of the substrate on the substrate support. The sensor may be a through beam sensor, and may be mounted on, coupled to or otherwise move with the end effector adapted to carry the substrate. Numerous other aspects are described.
摘要翻译：在第一方面，提供一种制造基板的方法，其中试图将端部执行器安装的基板放置在衬底支撑件（例如基板载体的基座或开槽支撑件）上，并且其有效性通过与末端执行器相关联的传感器验证放置。在一个实施例中，验证发生在端部执行器的收回运动期间，并且通过感测衬底支撑件上的衬底的存在，不存在或位置来实现。传感器可以是通过光束传感器，并且可以安装在其上，耦合到或者以其它方式与适于承载衬底的端部执行器移动。描述了许多其他方面。

5. 发明申请

US20090258574A1 POLISHING SYSTEM HAVING A TRACK 失效
标题翻译：具有轨迹的抛光系统
公开(公告)号：US20090258574A1
公开(公告)日：2009-10-15
申请号：US12420996
申请日：2009-04-09
申请人： Alpay Yilmaz , Allen L. D'Ambra , Jagan Rangarajan , Lakshmanan Karuppiah
发明人： Alpay Yilmaz , Allen L. D'Ambra , Jagan Rangarajan , Lakshmanan Karuppiah
IPC分类号： B24B1/00 , B24B7/20 , B24B41/02 , E01B25/24
CPC分类号： B24B37/04 , B24B41/047 , B24B45/003
摘要： Embodiments described herein relate to a track system in a polishing system. One embodiment described herein provides a track system configured to transfer polishing heads in a polishing system. The track system comprises a supporting frame, a track coupled to the supporting frame and defining a path along which the polishing heads are configured to move, and one or more carriages configured to carry at least one polishing head along the path defined by the track, wherein the one or more carriages are coupled to the track and independently movable along the track.
摘要翻译：本文所述的实施例涉及抛光系统中的轨道系统。本文所述的一个实施例提供了一种配置成在抛光系统中传送抛光头的轨道系统。轨道系统包括支撑框架，轨道，其联接到支撑框架并且限定抛光头被配置为移动的路径，以及一个或多个托架，其构造成沿着由轨道限定的路径承载至少一个抛光头，其中所述一个或多个托架联接到所述轨道并且可以沿着所述轨道独立地移动。

6. 发明申请

US20140020830A1 Carrier Head Sweep Motor Current for In-Situ Monitoring 审中-公开
标题翻译：载波头扫描电机电流进行现场监控
公开(公告)号：US20140020830A1
公开(公告)日：2014-01-23
申请号：US13553009
申请日：2012-07-19
申请人： Jagan Rangarajan , Alpay Yilmaz
发明人： Jagan Rangarajan , Alpay Yilmaz
IPC分类号： B24B29/00
CPC分类号： B24B37/013 , B24B37/105 , B24B49/10
摘要： A chemical mechanical polishing system includes a platen to support a polishing pad, two carrier heads configured to hold two substrates against the polishing pad at the same time, two actuators to sweep the two carrier heads laterally across the polishing pad, an in-situ polishing monitoring system including a two current sensors to sense two currents supplied to the two actuators and generate two signals, and a controller to receive the two signals and independently detect a two endpoints for the two substrates based on the two signals.
摘要翻译：化学机械抛光系统包括用于支撑抛光垫的压板，配置成将两个基板同时固定在抛光垫上的两个载体头，两个致动器横向扫掠抛光垫横向扫描两个载体头，原位抛光监测系统包括两个电流传感器以感测提供给两个致动器的两个电流并产生两个信号，以及控制器，用于接收两个信号，并且基于两个信号独立地检测两个基板的两个端点。

7. 发明授权

US08172643B2 Polishing system having a track 失效
标题翻译：具有轨道的抛光系统
公开(公告)号：US08172643B2
公开(公告)日：2012-05-08
申请号：US12420996
申请日：2009-04-09
申请人： Alpay Yilmaz , Allen L. D'Ambra , Jagan Rangarajan , Lakshmanan Karuppiah
发明人： Alpay Yilmaz , Allen L. D'Ambra , Jagan Rangarajan , Lakshmanan Karuppiah
IPC分类号： B24B49/00 , B24B5/00
CPC分类号： B24B37/04 , B24B41/047 , B24B45/003
摘要： Embodiments described herein relate to a track system in a polishing system. One embodiment described herein provides a track system configured to transfer polishing heads in a polishing system. The track system comprises a supporting frame, a track coupled to the supporting frame and defining a path along which the polishing heads are configured to move, and one or more carriages configured to carry at least one polishing head along the path defined by the track, wherein the one or more carriages are coupled to the track and independently movable along the track.
摘要翻译：本文所述的实施例涉及抛光系统中的轨道系统。本文所述的一个实施例提供了一种配置成在抛光系统中传送抛光头的轨道系统。轨道系统包括支撑框架，轨道，其联接到支撑框架并且限定抛光头被配置为移动的路径，以及一个或多个托架，其构造成沿着由轨道限定的路径承载至少一个抛光头，其中所述一个或多个托架联接到所述轨道并且可以沿着所述轨道独立地移动。

8. 发明申请

US20100019431A1 METHODS OF VERIFYING EFFECTIVENESS OF A PUT OF A SUBSTRATE ONTO A SUBSTRATE SUPPORT 有权
标题翻译：将基板的切片的有效性验证到基板支撑的方法
公开(公告)号：US20100019431A1
公开(公告)日：2010-01-28
申请号：US12506308
申请日：2009-07-21
申请人： Douglas MacLeod , Dhruv Gajaria , Jagan Rangarajan
发明人： Douglas MacLeod , Dhruv Gajaria , Jagan Rangarajan
IPC分类号： B23Q3/00
CPC分类号： H01L21/67265 , H01L21/67259 , H01L21/67778
摘要： In a first aspect, a method of manufacturing a substrate is provided wherein an end effector mounted substrate is attempted to be placed, that is put, onto a substrate support, such as a pedestal or slotted support of a substrate carrier, and the effectiveness of the put is verified by a sensor associated with the end effector. In one embodiment, the verification takes place during the retraction motion of the end effector and is accomplished by sensing the presence, absence, or location of the substrate on the substrate support. The sensor may be a through beam sensor, and may be mounted on, coupled to or otherwise move with the end effector adapted to carry the substrate. Numerous other aspects are described.
摘要翻译：在第一方面，提供一种制造基板的方法，其中试图将端部执行器安装的基板放置在衬底支撑件（例如基板载体的基座或开槽支撑件）上，并且其有效性通过与末端执行器相关联的传感器验证放置。在一个实施例中，验证发生在端部执行器的收回运动期间，并且通过感测衬底支撑件上的衬底的存在，不存在或位置来实现。传感器可以是通过光束传感器，并且可以安装在其上，耦合到或者以其它方式与适于承载衬底的端部执行器移动。描述了许多其他方面。

9. 发明申请

US20130199405A1 CIRCULAR TRACK ACTUATOR SYSTEM 审中-公开
标题翻译：圆形跟踪致动器系统
公开(公告)号：US20130199405A1
公开(公告)日：2013-08-08
申请号：US13368477
申请日：2012-02-08
申请人： Jagan Rangarajan , Alpay Yilmaz
发明人： Jagan Rangarajan , Alpay Yilmaz
IPC分类号： B60L15/00
CPC分类号： B24B37/04 , B24B27/0023
摘要： Embodiments of the present invention relate to an apparatus and a method for transferring substrate processing equipment. One embodiment of the present invention includes a track assembly having a continuous guide rail formed from a unitary body. The track assembly also includes vertically arranged stator strips for driving motor coils of a plurality of carriages. The motor coils in the carriages may be modular including coil segments of various lengths. The coil segments and the carriages may be driven individually and jointly.
摘要翻译：本发明的实施例涉及一种用于转移衬底处理设备的装置和方法。本发明的一个实施例包括具有由整体形成的连续导轨的轨道组件。轨道组件还包括用于驱动多个滑架的电动机线圈的垂直布置的定子条。托架中的马达线圈可以是模块化的，包括各种长度的线圈段。线圈段和托架可以单独和共同地驱动。

10. 发明申请

US20120322345A1 APPARATUS FOR CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：化学机械抛光装置
公开(公告)号：US20120322345A1
公开(公告)日：2012-12-20
申请号：US13163227
申请日：2011-06-17
申请人： Jagan Rangarajan , Alpay Yilmaz
发明人： Jagan Rangarajan , Alpay Yilmaz
IPC分类号： B24B1/00
CPC分类号： B24B37/04
摘要： Embodiments of the invention generally relate to systems and methods to CMP substrates. The systems generally include a polishing system that has a polishing module and cleaning module. Each of the polishing module and the cleaning module can be partitioned into independently operable sections. Each section of the polishing module includes a platen, at least one load cup, and at least one polishing head. Each section of the cleaning module includes a cleaning station and one or more robots adapted to advance substrates through the cleaning station. The methods generally include polishing a plurality of substrates in a polishing system having independently operable sections. During the polishing of the substrates in one section, a second of the independently operable stations may be maintained or cleaned.
摘要翻译：本发明的实施例一般涉及CMP衬底的系统和方法。该系统通常包括具有抛光模块和清洁模块的抛光系统。抛光模块和清洁模块中的每一个可以被划分成可独立操作的部分。抛光模块的每个部分包括压板，至少一个负载杯和至少一个抛光头。清洁模块的每个部分包括清洁站和一个或多个机器人，其适于使基板通过清洁站。所述方法通常包括在具有可独立操作的部分的抛光系统中抛光多个基板。在一个部分中抛光衬底期间，可以维持或清洁可独立操作的第二个工位。

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