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1. 发明授权

US10074510B2 Inspection system and inspection image data generation method 有权
公开(公告)号：US10074510B2
公开(公告)日：2018-09-11
申请号：US14455276
申请日：2014-08-08
申请人： EBARA CORPORATION
发明人： Kenichi Suematsu , Shoji Yoshikawa
IPC分类号： H01J37/28 , H01J37/20 , H01J37/285
CPC分类号： H01J37/20 , H01J37/285 , H01J2237/20228
摘要： An inspection system includes a TDI sensor that integrates amounts of secondary charged particles or electromagnetic waves along a predetermined direction at every timing at which a transfer clock is inputted and sequentially transfers the amounts of secondary charged particles or electromagnetic waves so integrated, and a deflector which deflects, based on a difference between an actual position and a target position of the inspection target, the secondary charged particles or electromagnetic waves directed towards the TDI sensor in a direction in which the difference is offset. The target position is set into something like a step-and-riser shape in which the target position is kept staying in the same position by a predetermined period of time that is equal to or shorter than a period of time from an input of the transfer clock to an input of the following transfer clock and thereafter rises by a predetermined distance.

2. 发明授权

US09134261B2 Inspection apparatus 有权
标题翻译：检验仪器
公开(公告)号：US09134261B2
公开(公告)日：2015-09-15
申请号：US14257071
申请日：2014-04-21
申请人： EBARA CORPORATION
发明人： Shoji Yoshikawa , Kiwamu Tsukamoto , Takeshi Murakami , Masahiro Hatakeyama , Tsutomu Karimata
IPC分类号： H01J37/26 , G01N23/22 , H01J37/09 , H01J37/16 , H01J37/20 , H01J37/285 , G01N21/95
CPC分类号： H01J37/023 , G01N21/9501 , G01N23/2204 , H01J37/09 , H01J37/16 , H01J37/20 , H01J37/285 , H01J2237/022 , H01J2237/0264 , H01J2237/1501 , H01J2237/166 , H01J2237/20 , H01J2237/2007 , H01J2237/20221 , H01J2237/20278 , H01J2237/26
摘要： An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.
摘要翻译：提供了能够有助于降低设备成本的检查装置。检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 将光束引导到保持在工作室中的可移动台上的检查对象中并用该束照射检查对象的主光学系统; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。检查装置还包括：驱动可动台的直线电机; 以及亥姆霍兹线圈，其在驱动可动载物台时引起磁场消除由线性马达引起的磁场。

3. 发明申请

US20140319346A1 INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTURING DEVICES USING THE SYSTEM 有权
标题翻译：通过充电颗粒束检查系统和使用系统制造设备的方法
公开(公告)号：US20140319346A1
公开(公告)日：2014-10-30
申请号：US14319620
申请日：2014-06-30
申请人： EBARA CORPORATION
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
IPC分类号： G01N23/225 , G01N23/227
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical systems; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译：电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器，光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 小型环境室20，用于向物体供给清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

4. 发明授权

US08742344B2 Inspection apparatus 有权
标题翻译：检验仪器
公开(公告)号：US08742344B2
公开(公告)日：2014-06-03
申请号：US14026385
申请日：2013-09-13
申请人： Ebara Corporation
发明人： Masahiro Hatakeyama , Yasushi Toma , Shoji Yoshikawa , Kiwamu Tsukamoto
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/22 , G01N23/2251 , G01N2223/204 , G01N2223/611 , H01J3/024 , H01J37/075 , H01J37/28 , H01J2237/063 , H01J2237/2448 , H01J2237/2806
摘要： An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz. A central portion of the inspection object is provided with a central flat portion 390. The periphery of the central flat portion 390 is provided with peripheral flat portion 392 via a step 391. The periphery of the step 391 is provided with an electric field correction plate 400. A surface voltage equivalent to a surface voltage applied to the inspection object is applied to an electrode 401 on the electric field correction plate 400.
摘要翻译：检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。主光学系统包括具有光电子表面的光电子发生器。光电子表面的基材由具有比石英热导率更高的导热性的材料制成。检查对象的中央部设置有中央平坦部390.中央平坦部390的周边经由台阶391设置有周边平坦部392.台阶部391的外周设有电场校正板将与施加到检查对象的表面电压等效的表面电压施加到电场校正板400上的电极401。

5. 发明授权

US10446404B2 Electron-beam irradiated area adjustment method and adjustment system, electron-beam irradiated region correction method, and electron beam irradiation apparatus 有权
公开(公告)号：US10446404B2
公开(公告)日：2019-10-15
申请号：US15873108
申请日：2018-01-17
申请人： EBARA CORPORATION
发明人： Ryo Tajima , Masahiro Hatakeyama , Kenichi Suematsu , Kiwamu Tsukamoto , Kenji Watanabe , Shoji Yoshikawa , Shinichi Okada , Kenji Terao
IPC分类号： H01L37/00 , H01L21/3065 , H01J37/147 , H01J37/305 , H01J37/302 , H01L21/027
摘要： Provided is a method of adjusting an electron-beam irradiated area in an electron beam irradiation apparatus that deflects an electron beam with a deflector to irradiate an object with the electron beam, the method including: emitting an electron beam while changing an irradiation position on an adjustment plate by controlling the deflector in accordance with an electron beam irradiation recipe, the adjustment plate detecting a current corresponding to the emitted electron beam; acquiring a current value detected from the adjustment plate; forming image data corresponding to the acquired current value; determining whether the electron-beam irradiated area is appropriate based on the formed image data; and updating the electron beam irradiation recipe when the electron-beam irradiated area is determined not to be appropriate.

6. 发明授权

US09601302B2 Inspection apparatus 有权
公开(公告)号：US09601302B2
公开(公告)日：2017-03-21
申请号：US14813768
申请日：2015-07-30
申请人： EBARA CORPORATION
发明人： Shoji Yoshikawa , Kiwamu Tsukamoto , Takeshi Murakami , Masahiro Hatakeyama , Tsutomu Karimata
IPC分类号： H01J37/26 , H01J37/02 , G01N23/22 , H01J37/09 , H01J37/16 , H01J37/20 , H01J37/285 , G01N21/95
CPC分类号： H01J37/023 , G01N21/9501 , G01N23/2204 , H01J37/09 , H01J37/16 , H01J37/20 , H01J37/285 , H01J2237/022 , H01J2237/0264 , H01J2237/1501 , H01J2237/166 , H01J2237/20 , H01J2237/2007 , H01J2237/20221 , H01J2237/20278 , H01J2237/26
摘要： An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.

7. 发明授权

US09368314B2 Inspection system by charged particle beam and method of manufacturing devices using the system 有权
标题翻译：带电粒子束的检测系统及使用该系统的制造装置的方法
公开(公告)号：US09368314B2
公开(公告)日：2016-06-14
申请号：US14319620
申请日：2014-06-30
申请人： EBARA CORPORATION
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
IPC分类号： G01N23/225 , H01J29/70 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/67 , G01N23/227 , H01J37/26 , H01J37/141
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical systems; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译：电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器，光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 小型环境室20，用于向物体供给清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

8. 发明申请

US20150041646A1 INSPECTION SYSTEM AND INSPECTION IMAGE DATA GENERATION METHOD 审中-公开
标题翻译：检验系统和检查图像数据生成方法
公开(公告)号：US20150041646A1
公开(公告)日：2015-02-12
申请号：US14455276
申请日：2014-08-08
申请人： EBARA CORPORATION
发明人： Kenichi Suematsu , Shoji Yoshikawa
IPC分类号： H01J37/20 , G01N21/64 , H01J37/285
CPC分类号： H01J37/20 , H01J37/285 , H01J2237/20228
摘要： An inspection system includes a TDI sensor that integrates amounts of secondary charged particles or electromagnetic waves along a predetermined direction at every timing at which a transfer clock is inputted and sequentially transfers the amounts of secondary charged particles or electromagnetic waves so integrated, and a deflector which deflects, based on a difference between an actual position and a target position of the inspection target, the secondary charged particles or electromagnetic waves directed towards the TDI sensor in a direction in which the difference is offset. The target position is set into something like a step-and-riser shape in which the target position is kept staying in the same position by a predetermined period of time that is equal to or shorter than a period of time from an input of the transfer clock to an input of the following transfer clock and thereafter rises by a predetermined distance.
摘要翻译：检查系统包括在输入传送时钟的每个定时将预定方向上的次级带电粒子或电磁波的量进行积分的TDI传感器，并依次传送如此一体化的二次带电粒子或电磁波的量;以及偏转器，基于检查对象的实际位置和目标位置之间的差异，在差异偏移的方向上偏转朝向TDI传感器的二次带电粒子或电磁波。目标位置被设置成类似于升降器形状的东西，其中目标位置保持在相同位置的预定时间段等于或短于从传送的输入的时间段时钟到下一个传送时钟的输入，然后上升预定的距离。

9. 发明授权

US08803103B2 Inspection system by charged particle beam and method of manufacturing devices using the system 有权
标题翻译：带电粒子束的检测系统及使用该系统的制造装置的方法
公开(公告)号：US08803103B2
公开(公告)日：2014-08-12
申请号：US13732897
申请日：2013-01-02
申请人： Ebara Corporation , Kabushiki Kaisha Toshiba
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
IPC分类号： G21K5/04 , H01J37/26 , H01J29/70 , H01J37/141
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译：电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器，光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在迷你环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

10. 发明申请

US20140158885A1 TESTING APPARATUS USING CHARGED PARTICLES AND DEVICE MANUFACTURING METHOD USING THE TESTING APPARATUS 有权
标题翻译：使用充电颗粒的测试装置和使用测试装置的设备制造方法
公开(公告)号：US20140158885A1
公开(公告)日：2014-06-12
申请号：US14156140
申请日：2014-01-15
申请人： EBARA CORPORATION
发明人： Nobuharu Noji , Tohru Satake , Hirosi Sobukawa , Toshifumi Kimba , Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Kenichi Suematsu , Yutaka Tabe , Ryo Tajima , Keiichi Tohyama
IPC分类号： G01N23/225
CPC分类号： H01J37/20 , G01N23/2204 , G01N23/225 , H01J37/05 , H01J37/28 , H01J2237/202 , H01J2237/2441 , H01J2237/2446 , H01J2237/2801 , H01J2237/2817 , H01L21/6833 , H01L2223/54466
摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.
摘要翻译：提供了一种用于进一步提高速度的系统，即提高SEM型检查装置中的生产量。用于检查基板的表面的检查装置产生从电子束源25·1发射的电子的交叉，然后在样品W的方向上以期望的倍率形成图像以产生交叉。当交叉通过时，作为噪声的电子从具有孔的交叉点移除，进行调整，使得交叉成为平行电子束以以期望的分段形式照射基板。产生电子束，使照度不均匀为10％以下。从样品W发射的电子被检测器25·11检测。

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