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1. 发明授权

US06260562B1 Substrate cleaning apparatus and method 有权
标题翻译：基板清洗装置及方法
公开(公告)号：US06260562B1
公开(公告)日：2001-07-17
申请号：US09166593
申请日：1998-10-06
申请人： Kenya Morinishi , Masami Ohtani , Joichi Nishimura , Akihiko Morita
发明人： Kenya Morinishi , Masami Ohtani , Joichi Nishimura , Akihiko Morita
IPC分类号： B08B302
CPC分类号： H01L21/67051 , B05C11/08 , Y10S134/902
摘要： A substrate cleaning apparatus includes a spin support for supporting and spinning a substrate, a nozzle for discharging a cleaning liquid with a given cleaning condition from a discharge opening, a moving mechanism for moving the nozzle at least between center and edge of the substrate, a cleaning condition adjuster for adjusting the cleaning condition, and a controller for controlling the cleaning condition adjuster to vary the cleaning condition according to a cleaning liquid supply position movable over the substrate surface.
摘要翻译：基板清洗装置包括用于支撑和旋转基板的旋转支撑件，用于从排出口排出具有给定清洁条件的清洁液体的喷嘴，用于至少在基板的中心和边缘之间移动喷嘴的移动机构，清洁条件调节器，用于调节清洁状态;以及控制器，用于控制清洁状态调节器，以根据可移动到基板表面上的清洁液体供应位置来改变清洁状态。

2. 发明授权

US06051101A Substrate processing apparatus, substrate transport apparatus and substrate transfer apparatus 失效
标题翻译：基板处理装置，基板输送装置和基板输送装置
公开(公告)号：US06051101A
公开(公告)日：2000-04-18
申请号：US39824
申请日：1998-03-16
申请人： Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Takanori Kawamoto , Masaki Iwami , Joichi Nishimura , Akihiko Morita
发明人： Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Takanori Kawamoto , Masaki Iwami , Joichi Nishimura , Akihiko Morita
IPC分类号： B65G49/07 , H01L21/00 , H01L21/027 , H01L21/677 , B65H1/00
CPC分类号： H01L21/67161 , H01L21/67178 , H01L21/67742 , H01L21/67745
摘要： A unit arrangement part comprises a chemical cabinet on its lowermost part, while coating units for forming a resist film on a substrate and developing units for developing the substrate after exposure are arranged on four corners of an apparatus above the chemical cabinet. Further, multistage thermal processing units for thermal-processing the substrate are arranged on front and rear portions of the apparatus above these wet processing units. A cleaning unit for supplying a cleaning liquid such as pure water and cleaning the substrate is arranged on a front side of the apparatus between the coating units as a substrate processing unit. Thus provided is a substrate processing apparatus having excellent workability in maintenance with a high degree of freedom in arrangement of processing units.
摘要翻译：单元布置部分包括在其最下部分的化学柜，而在基板上形成抗蚀剂膜的涂布单元和曝光后用于显影基板的显影单元布置在化学柜上方的设备的四个角上。此外，用于热处理基板的多级热处理单元布置在这些湿处理单元上方的设备的前部和后部。在作为基板处理单元的涂布单元之间的设备的前侧设置有用于供应诸如纯水的清洁液体并清洁基板的清洁单元。因此，提供了一种具有优异的维护可加工性的基板处理装置，并且处理单元的布置自由度高。

3. 发明申请

US20130258299A1 EXPOSURE DEVICE, SUBSTRATE PROCESSING APPARATUS, METHOD FOR EXPOSING SUBSTRATE AND SUBSTRATE PROCESSING METHOD 有权
标题翻译：曝光装置，基板处理装置，用于曝光基板的方法和基板处理方法
公开(公告)号：US20130258299A1
公开(公告)日：2013-10-03
申请号：US13845211
申请日：2013-03-18
申请人： Kazuhiro NISHIMURA , Akihiko MORITA , Yukihiko INAGAKI
发明人： Kazuhiro NISHIMURA , Akihiko MORITA , Yukihiko INAGAKI
IPC分类号： G03F7/20
CPC分类号： G03F7/2012 , G03F7/0035 , G03F7/38
摘要： In an entire region exposure unit, a platform section and a local transfer mechanism are arranged in one direction. The local transfer mechanism is provided with a local transfer hand. A substrate on which a resist film having a predetermined pattern is formed is held by the local transfer hand. A light-emitting device is attached to the upper portion of the local transfer mechanism. Strip-shaped light is emitted from the light-emitting device toward below. The local transfer mechanism operates such that the local transfer hand is moved relative to the light-emitting device. At this time, the light-emitting device irradiates one surface of the substrate that is moving horizontally with the strip-shaped light. The resist film is modified by the light.
摘要翻译：在整个区域曝光单元中，平台部分和局部传送机构沿一个方向布置。本地传送机构设有本地传送手。其上形成有预定图案的抗蚀剂膜的基板由本地转印手保持。发光装置安装在本地传送机构的上部。带状光从发光装置向下方射出。本地传送机构的操作使得本地传送手相对于发光装置移动。此时，发光装置照射与条状光水平移动的基板的一个面。抗蚀剂膜被光改性。

4. 发明授权

US07359840B2 Remote order acceptance design system and elevator remote order acceptance method 失效
标题翻译：远程订单验收设计系统和电梯远程订单验收方法
公开(公告)号：US07359840B2
公开(公告)日：2008-04-15
申请号：US11812692
申请日：2007-06-21
申请人： Shingo Akasaka , Atsuhiro Ishida , Shinichi Taniguchi , Masahiro Oka , Akihiko Morita , Hideaki Suzuki
发明人： Shingo Akasaka , Atsuhiro Ishida , Shinichi Taniguchi , Masahiro Oka , Akihiko Morita , Hideaki Suzuki
IPC分类号： G06F17/50
CPC分类号： B66B19/00 , G06F17/5004 , G06F2217/04 , G06F2217/06 , G06Q10/087
摘要： A specification plan of an order-made product suitable for a building structure plan is generated promptly. A WWW server 11 and a database server 12 are provided to the equipment designer's side. The database server 12 has a drawing database 9 that registers a CAD symbol for each product. A CAD symbol for each product includes: effective space information, which expresses a space to be secured for installation of the product; product name information expressing a name of the product; structure information expressing structural features (size, shape, etc.); product specification information; option data; etc. On the other hand, WWW server 11 has a symbol generation data interface 3, through which requirements specification data for an order-made product can be received from a WWW client terminal 2, and a CAD symbol of the order-made product can be taken out from the side of the WWW client terminal.
摘要翻译：迅速生成适合建筑结构图的定制产品的规格方案。将WWW服务器11和数据库服务器12提供给设备设计者侧。数据库服务器12具有绘制数据库9，其为每个产品注册CAD符号。每个产品的CAD符号包括：有效的空间信息，表示用于安装产品的空间; 表示产品名称的产品名称信息; 表示结构特征（尺寸，形状等）的结构信息; 产品规格信息; 期权数据; 另一方面，WWW服务器11具有符号生成数据接口3，通过该符号生成数据接口3可以从WWW客户终端2接收订购产品的需求指定数据，并且订购产品的CAD符号可以从WWW客户终端的一边取出。

5. 发明授权

US07048801B2 Chemical pump and method of discharging chemical solution 有权
标题翻译：化学泵和排放化学溶液的方法
公开(公告)号：US07048801B2
公开(公告)日：2006-05-23
申请号：US10680322
申请日：2003-10-07
申请人： Akihiko Morita
发明人： Akihiko Morita
IPC分类号： B05C11/08 , B05C11/10
CPC分类号： F04B13/02 , F04B53/06 , H01L21/67017 , H01L21/6715 , Y10T137/7838
摘要： A chemical pump includes a pressure chamber, a partition member for dividing the pressure chamber into a cleaning pressure chamber and a discharging pressure chamber, a filter part disposed on the primary side of the discharging pressure chamber, and a single drive mechanism. A pair of openings with respective check valves mounted therein are provided in each of the cleaning and discharging pressure chambers, and are positioned so as to cause a resist solution to flow only in the +Z direction. The drive mechanism moves the partition member in the −X direction to cause the resist solution to be sucked into the cleaning pressure chamber and to cause the resist solution to be discharged from the discharging pressure chamber. The drive mechanism moves the partition member in the +X direction to cause the resist solution to be sucked from the filter part into the discharging pressure chamber and to cause the resist solution to be supplied from the cleaning pressure chamber to the filter part so that the sucked resist solution is equal in amount to the supplied resist solution. This prevents vapor lock and micro-bubble phenomena during the discharge of the resist solution.
摘要翻译：化学泵包括压力室，用于将压力室分隔成清洁压力室和排出压力室的分隔构件，设置在排出压力室的初级侧的过滤器部分和单个驱动机构。安装有各自的止回阀的一对开口设置在每个清洁和排出压力室中，并且被定位成使得抗蚀剂溶液仅在+ Z方向流动。驱动机构使分隔构件向-X方向移动，使得抗蚀剂溶液被吸入清洗压力室，并使抗蚀剂溶液从排出压力室排出。驱动机构使分隔构件沿+ X方向移动，使得抗蚀剂溶液从过滤器部分吸入排出压力室，并使抗蚀剂溶液从清洁压力室供应到过滤器部分，使得吸附抗蚀剂溶液的量与供给的抗蚀剂溶液相等。这防止了在抗蚀剂溶液的放电过程中的气泡锁定和微气泡现象。

6. 发明授权

US06286525B1 Substrate cleaning apparatus and method 失效
标题翻译：基板清洗装置及方法
公开(公告)号：US06286525B1
公开(公告)日：2001-09-11
申请号：US09071683
申请日：1998-05-01
申请人： Joichi Nishimura , Akihiko Morita , Masami Ohtani
发明人： Joichi Nishimura , Akihiko Morita , Masami Ohtani
IPC分类号： B08B300
CPC分类号： H01L21/67051 , B08B1/04 , B08B3/00 , H01L21/67046 , Y10S134/902
摘要： A plurality of cleaning devices of the same type are attached to one support arm. The cleaning devices are simultaneously moved over a surface to be cleaned of a substrate supported and spun by a substrate supporting and spinning mechanism. Thus, the same type of cleaning devices share the task of cleaning the entire surface of the substrate, thereby to improve cleaning efficiency and shorten cleaning time. Different types of cleaning devices may be attached to the support arm for simultaneous cleaning of the entire surface of the substrate. Where different types of cleaning brushes are attached to the support arm, a cleaning operation may be carried out by simultaneously using cleaning brushes of optimal hardness for different regions on the substrate surface.
摘要翻译：多个相同类型的清洁装置连接到一个支撑臂。清洁装置同时移动到由基板支撑和旋转机构支撑和纺出的基板的待清洁表面上。因此，相同类型的清洁装置共享清洁基板的整个表面的任务，从而提高清洁效率并缩短清洁时间。可以将不同类型的清洁装置连接到支撑臂上，以同时清洁基板的整个表面。在不同类型的清洁刷附接到支撑臂的情况下，清洁操作可以通过同时使用基板表面上不同区域的最佳硬度的清洁刷进行。

7. 发明授权

US08608885B2 Substrate heat treatment apparatus 有权
标题翻译：基板热处理装置
公开(公告)号：US08608885B2
公开(公告)日：2013-12-17
申请号：US11566442
申请日：2006-12-04
申请人： Shigehiro Goto , Keiji Matsuchika , Akihiko Morita
发明人： Shigehiro Goto , Keiji Matsuchika , Akihiko Morita
IPC分类号： B29C65/02
CPC分类号： F27D5/0037 , H01L21/6875 , H01L21/68757
摘要： A substrate heat treatment apparatus includes a heat-treating plate having a flat upper surface, support devices formed of a heat-resistant resin for contacting and supporting a substrate, a seal device disposed annularly for rendering gastight a space formed between the substrate and heat-treating plate, and exhaust bores for exhausting gas from the space. The support devices are formed of resin, and the upper surface of the heat-treating plate is made flat, whereby a reduced difference in the rate of heat transfer occurs between contact parts and non-contact parts on the surface of the substrate. Consequently, the substrate is heat-treated effectively while suppressing variations in heat history over the surface of the substrate.
摘要翻译：基板热处理装置包括具有平坦的上表面的热处理板，用于接触和支撑基板的耐热树脂形成的支撑装置，环形地设置用于气密地形成在基板和加热基板之间的空间的密封装置，处理板和用于从空间排出气体的排气孔。支撑装置由树脂形成，并且热处理板的上表面平坦，从而在基板表面的接触部分和非接触部分之间发生减少的传热速率差异。因此，在抑制基板表面的热历史变化的同时，有效地对基板进行热处理。

8. 发明授权

US07432476B2 Substrate heat treatment apparatus 有权
标题翻译：基板热处理装置
公开(公告)号：US07432476B2
公开(公告)日：2008-10-07
申请号：US11417691
申请日：2006-05-03
申请人： Akihiko Morita , Shigehiro Goto , Keiji Matsuchika
发明人： Akihiko Morita , Shigehiro Goto , Keiji Matsuchika
IPC分类号： H05B3/68 , C23C16/00
CPC分类号： F27B17/0025 , F27B5/04 , F27D3/0084 , H01L21/67109 , H01L21/67126 , H01L21/68735 , H01L21/68742 , H01L21/6875
摘要： A substrate heat treatment apparatus for heat-treating a substrate includes a bake plate having projections on an upper surface thereof, a seal unit disposed peripherally of the upper surface of the bake plate for closing a lateral area of a minute space formed between a lower surface of the substrate and the upper surface of the bake plate when the substrate is placed on the bake plate, and exhaust bores for exhausting gas from the minute space. The substrate placed on the bake plate is heat-treated in a state of the gas exhausted from the minute space through the exhaust bores.
摘要翻译：用于热处理基板的基板热处理装置包括：在其上表面上具有突起的烘烤板;密封单元，设置在烘烤板的上表面周围，用于封闭在下表面之间形成的微小空间的横向区域的基板和烘烤板的上表面，以及用于从微小空间排出气体的排气孔。放置在烘烤板上的基板在通过排气孔从微小空间排出的气体的状态下进行热处理。

9. 发明申请

US20070250199A1 Remote order acceptance design system and elevator remote order acceptance method 失效
公开(公告)号：US20070250199A1
公开(公告)日：2007-10-25
申请号：US11812692
申请日：2007-06-21
申请人： Shingo Akasaka , Atsuhiro Ishida , Shinichi Taniguchi , Masahiro Oka , Akihiko Morita , Hideaki Suzuki
发明人： Shingo Akasaka , Atsuhiro Ishida , Shinichi Taniguchi , Masahiro Oka , Akihiko Morita , Hideaki Suzuki
IPC分类号： G06F19/00
CPC分类号： B66B19/00 , G06F17/5004 , G06F2217/04 , G06F2217/06 , G06Q10/087
摘要： A specification plan of an order-made product suitable for a building structure plan is generated promptly. A WWW server 11 and a database server 12 are provided to the equipment designer's side. The database server 12 has a drawing database 9 that registers a CAD symbol for each product. A CAD symbol for each product includes: effective space information, which expresses a space to be secured for installation of the product; product name information expressing a name of the product; structure information expressing structural features (size, shape, etc.); product specification information; option data; etc. On the other hand, WWW server 11 has a symbol generation data interface 3, through which requirements specification data for an order-made product can be received from a WWW client terminal 2, and a CAD symbol of the order-made product can be taken out from the side of the WWW client terminal.

10. 发明申请

US20070128570A1 SUBSTRATE HEAT TREATMENT APPARATUS 有权
标题翻译：基材热处理设备
公开(公告)号：US20070128570A1
公开(公告)日：2007-06-07
申请号：US11566442
申请日：2006-12-04
申请人： Shigehiro Goto , Keiji Matsuchika , Akihiko Morita
发明人： Shigehiro Goto , Keiji Matsuchika , Akihiko Morita
IPC分类号： F27D5/00
CPC分类号： F27D5/0037 , H01L21/6875 , H01L21/68757
摘要： A substrate heat treatment apparatus includes a heat-treating plate having a flat upper surface, support devices formed of a heat-resistant resin for contacting and supporting a substrate, a seal device disposed annularly for rendering gastight a space formed between the substrate and heat-treating plate, and exhaust bores for exhausting gas from the space. The support devices are formed of resin, and the upper surface of the heat-treating plate is made flat, whereby a reduced difference in the rate of heat transfer occurs between contact parts and non-contact parts on the surface of the substrate. Consequently, the substrate is heat-treated effectively while suppressing variations in heat history over the surface of the substrate.
摘要翻译：基板热处理装置包括具有平坦的上表面的热处理板，用于接触和支撑基板的耐热树脂形成的支撑装置，环形地设置用于气密地形成在基板和加热基板之间的空间的密封装置，处理板和用于从空间排出气体的排气孔。支撑装置由树脂形成，并且热处理板的上表面平坦，从而在基板表面的接触部分和非接触部分之间发生减少的传热速率差异。因此，在抑制基板表面的热历史变化的同时，有效地对基板进行热处理。

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