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    • 9. 发明公开
    • 옥심 에스테르기와 트리아진기를 동시에 포함하는 광활성화합물 및 이를 포함하는 감광성 조성물
    • 包含氧化酯和TRIAZINE的光学化合物和包含它们的光敏组合物
    • KR1020080068368A
    • 2008-07-23
    • KR1020070006078
    • 2007-01-19
    • 주식회사 엘지화학
    • 김성현윤정애카르바쉬라이사이건우조창호오동궁곽상규
    • G03F7/004C07D251/14
    • C07D251/14G03F7/0045G03F7/027G03F7/028G03F7/032
    • A photoactive compound, and a photosensitive composition containing the photoactive compound are provided to improve sensitivity, residual film rate, mechanical strength, heat resistance, chemical resistance and development resistance. A photoactive compound comprises an oxime ester group and a triazine group and is represented by the formula 1, wherein R is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkyl group substituted with at least one selected from NL2, OL and SL, a phenyl group substituted or unsubstituted with at least one selected from a C1-C6 alkyl group, a halogen atom, a nitrile group, OH and COOH, or a C2-C5 alkyl carboxylic acid group; L is H or a C1-C6 alkyl group; R' is H, a C1-C6 alkyl group, a nitrile group, or a phenyl group; X is a single bond, CH2, C=O, O, S, S=O, SO2, NR'', or CH=CH; R'' is H, a C1-C6 alkyl group, or a C2-C6 alkyl carboxylic acid group; and Y and Y' are independently H, a halogen atom, CN, a C1-C6 alkyl group, a C1-C6 alkoxy group, or a C1-C6 alkylthio group.
    • 提供光敏化合物和含有光敏化合物的光敏组合物以提高灵敏度,残留膜速率,机械强度,耐热性,耐化学性和显影性。 光活性化合物包含肟酯基和三嗪基,由式1表示,其中R是C1-C6烷基,C1-C6卤代烷基,被至少一个选自 NL2,OL和SL,被选自C1-C6烷基,卤素原子,腈基,OH和COOH中的至少一种取代或未取代的苯基或C2-C5烷基羧酸基团; L是H或C1-C6烷基; R'是H,C1-C6烷基,腈基或苯基; X是单键,CH2,C = O,O,S,S = O,SO2,NR“或CH = CH; R“是H,C1-C6烷基或C2-C6烷基羧酸基团; Y和Y'独立地为H,卤素原子,CN,C1-C6烷基,C1-C6烷氧基或C1-C6烷硫基。