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    • 1. 发明公开
    • 분배전극이 구비된 전계방출표시소자 및 그 제조방법
    • 具有合金电极的场发射显示装置及其制造方法
    • KR1020000002653A
    • 2000-01-15
    • KR1019980023504
    • 1998-06-22
    • 오리온전기 주식회사
    • 권기진
    • H05B33/00
    • H01J1/46H01J1/72H01J9/02
    • PURPOSE: A manufacturing method of a field emission display device is provided to decrease the cost of a driving circuit, etc. by reducing the number of lead lines for connecting negative electrode outside and increasing a fixing space. CONSTITUTION: The manufacturing method of a field emission display device comprises the processes of: forming a gate insulating film(13), a gate metal(15) and an allotted insulating film(17) on the upper part of a cathode metal(11); forming a groove by partly etching the allotted insulating film; forming metal for allotted electrode use on the upper entire surface; forming the allotted electrode by anisotropically etching the metal for allotted electrode use; etching the allotted insulating film of the lower allotted electrode; and forming a gate hole bi etching the gate metal and the gate insulating film, and forming an emitter tip inside.
    • 目的:提供一种场致发射显示装置的制造方法,通过减少用于将负极连接到外部的引出线的数量并增加固定空间来降低驱动电路等的成本。 构成:场发射显示装置的制造方法包括以下处理:在阴极金属(11)的上部形成栅绝缘膜(13),栅极金属(15)和分配绝缘膜(17) ; 通过部分蚀刻分配的绝缘膜形成凹槽; 在整个表面上形成用于分配电极的金属; 通过各向异性蚀刻用于分配电极的金属来形成分配的电极; 蚀刻下分配电极的分配绝缘膜; 以及形成栅极双蚀刻栅极金属和栅极绝缘膜,并在其内部形成发射极尖端。
    • 5. 发明公开
    • 전자빔 집속 전극 및 이를 이용한 전자총
    • 光束形成电极和电子枪使用它
    • KR1020090120777A
    • 2009-11-25
    • KR1020080046748
    • 2008-05-20
    • 삼성전자주식회사재단법인서울대학교산학협력재단
    • 백찬욱아누락스리바스타바김종민김선일손영목박건식소진규
    • H01J29/51H01J29/48H01J29/02
    • G21K1/087H01J1/13H01J1/30H01J1/46
    • PURPOSE: An electron beam focusing electrode and an electron gun using the same are provided to focus the electron to an anode direction separated from a cathode by passing the electron through the penetration hole of the electron beam focusing electrode. CONSTITUTION: A cross section of a second surface(32) of a penetration hole(33) emitting the electron is larger than the cross section of a first surface(31) of the penetration hole. The cross section of the penetration hole is inclined to the progressing direction of the electron beam passing through the inside of the penetration hole. A protrusion(34) is formed in at least one side of the penetration hole. The orbit of the electrons passing through the inside of the penetration hole is controlled by the protrusion. The distortion of the electric field is decreased in an edge part of the electron beam. The uniformity of the electron beam from the electron gun is improved.
    • 目的:提供电子束聚焦电极和使用该电子束聚焦电极的电子枪,以通过使电子通过电子束聚焦电极的穿透孔将电子聚焦到与阴极分离的阳极方向上。 构成:发射电子的穿透孔(33)的第二表面(32)的横截面大于穿透孔的第一表面(31)的横截面。 穿透孔的横截面向穿过穿透孔内部的电子束的前进方向倾斜。 突起(34)形成在贯通孔的至少一侧。 穿过穿透孔内部的电子的轨道由突起控制。 在电子束的边缘部分,电场的变形减小。 来自电子枪的电子束的均匀性得到改善。
    • 6. 发明公开
    • 전자빔 방출장치
    • 电子束源
    • KR1020090033579A
    • 2009-04-06
    • KR1020070098661
    • 2007-10-01
    • 박흥균
    • 박흥균
    • H01J1/15
    • H01J1/15C01B32/20H01J1/20H01J1/22H01J1/46H01J1/88H01J9/04H01J2209/383H01J2209/3896
    • An electron beam emission apparatus is provided to emit electrons on an object in an exact penetration depth by adjusting the emission speed of electrons through a grid electrode. A hollow cathode micro jet array(20), an anode electrode(25) and a grid electrode(30) are sequentially installed inside a chamber(10). A wafer(50) is mounted on a lower-side wafer chuck(35). A plurality of gas holes(11) are formed at the upper part of the chamber in order to supply the process gas into the chamber. A ventilation hole(13) is formed at a lower part of the chamber in order to exhaust the gas outside the chamber. A vacuum pump(75) for controlling the inner pressure of the chamber is installed at one side of the ventilation hole. A valve(70) is installed between the vacuum pump and ventilation hole.
    • 电子束发射装置被设置为通过调整电子通过栅电极的发射速度,在精确穿透深度的物体上发射电子。 空腔阴极微型喷射阵列(20),阳极电极(25)和栅格电极(30)依次安装在室(10)的内部。 晶片(50)安装在下侧晶片卡盘(35)上。 在室的上部形成多个气孔(11),以便将处理气体供应到室中。 在室的下部形成通气孔(13),以便将气体排出室外。 用于控制室内压的真空泵(75)安装在通气孔的一侧。 阀(70)安装在真空泵和通风孔之间。