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    • 7. 发明公开
    • 페라이트 박막의 형성 방법 및 그 방법에 의해 얻어진 페라이트 박막
    • 形成薄膜薄膜和薄膜薄膜的方法
    • KR1020130111309A
    • 2013-10-10
    • KR1020130028181
    • 2013-03-15
    • 미쓰비시 마테리알 가부시키가이샤
    • 도이도시히로사쿠라이히데아키나카무라겐조이가라시가즈노리소야마노부유키
    • C23C26/00C23C30/00
    • H01F41/22C23C18/1208C23C18/1254C23C18/1283H01F10/20H01F41/24
    • PURPOSE: A ferrite thin film forming method and a ferrite thin film thereof are provided to manufacture a thick film with a thickness of 1 um or greater without generating a crack by using a sol-gel method. CONSTITUTION: A ferrite thin film forming method is as follows. A coating film is formed by coating a composition for forming a ferrite thin film on a heat resistant substrate. The process of plasticizing the coating film is performed once or several times to make the thickness of the coat on the substrate to be a desired thickness after plasticizing. The plasticized film which is formed on the substrate is sintered to form the ferrite thin film. The sintering condition of the plasticized film which is formed on the substrate has the heating rate of 1-50 °C/min, the maintaining temperature of 500-800°C, and the maintaining time of 30-120 minutes under the atmosphere, an oxygen gas, or an inert gas atmosphere. [Reference numerals] (AA) Initial permeability μ'; (BB) Example 1-2: (Ni_0.36Zn_0.64)(Fe_2O_3); (CC) Example 2-2: (Cu_0.40Zn_0.60)(Fe_2O_3); (DD) Example 3-2: (Ni_0.40Cu_0.20Zn_0.40)(Fe_2O_3); (EE) Frequency [kHz]
    • 目的:提供一种铁氧体薄膜形成方法及其铁氧体薄膜来制造厚度为1μm以上的厚膜,而不会产生裂纹。 构成:铁氧体薄膜形成方法如下。 通过在耐热基材上涂布用于形成铁氧体薄膜的组合物来形成涂膜。 对涂膜进行塑化的过程进行一次或数次,以使基材上的涂层的厚度在增塑之后达到期望的厚度。 形成在基板上的塑化膜被烧结以形成铁氧体薄膜。 形成在基板上的塑化膜的烧结条件为:加热速度为1-50℃/分钟,保持温度为500-800℃,保持时间为30-120分钟。 氧气或惰性气体气氛。 (标号)(AA)初始磁导率μ' (BB)实施例1-2:(Ni_0.36Zn_0.64)(Fe_2O_3); (CC)实施例2-2:(Cu_0.40Zn_0.60)(Fe_2O_3); (DD)实施例3-2:(Ni_0.40Cu_0.20Zn_0.40)(Fe_2O_3); (EE)频率[kHz]
    • 9. 发明授权
    • 유기발광소자용 광추출 기판 제조방법, 유기발광소자용 광추출 기판 및 이를 포함하는 유기발광소자
    • 制造光提取衬底的方法,用于OLED和包括其的OLED的光提取衬底
    • KR101567335B1
    • 2015-11-09
    • KR1020140118894
    • 2014-09-05
    • 코닝정밀소재 주식회사
    • 최은호김서현이주영김동현김의수
    • H01L51/56H01L51/54H01L51/52
    • H01L51/5268B03C1/015H01F1/0045H01F1/0063H01F41/24H01F41/30H01L51/5215H01L51/56H01L2251/303H01L51/5262
    • 본발명은유기발광소자용광추출기판제조방법에관한것으로서더욱상세하게는매트릭스층 내부에분포되는광 산란입자의분산성및 기판부착력을향상시킴으로써, 유기발광소자의광추출효율및 구조적인안정성을증가시킬수 있는유기발광소자용광추출기판제조방법에관한것이다. 이를위해, 본발명은, 투명자성나노입자를휘발성의제1 용액과혼합하는제1 혼합단계; 상기제1 혼합단계를통해만들어진혼합액및 광산란입자를비자성산화물입자를포함하는제2 용액과혼합하는제2 혼합단계; 상기제2 혼합단계를통해만들어진코팅액을베이스기판상에코팅하는코팅단계; 및상기베이스기판의하부에서상기코팅액측으로자기장을인가하여, 상기코팅액내부에포함되어있는상기투명자성나노입자를자기정렬시키는자기장인가단계를포함하는것을특징으로하는유기발광소자용광추출기판제조방법을제공한다.
    • 本发明涉及一种用于制造有机发光器件的光提取衬底的方法,更具体地,涉及一种用于制造有机发光器件的光提取衬底的方法,其提高了光散射的分散性和衬底附着力 颗粒分散在基质层中,从而提高有机发光器件的光提取效率和结构稳定性。 为此,本发明提供了制造用于有机发光器件的光提取衬底的方法,包括:第一混合步骤,将透明磁性纳米颗粒与易挥发的第一溶液混合; 第二混合步骤,将通过第一混合步骤制备的混合液和光散射颗粒与含有非磁性氧化物颗粒的第二溶液混合; 涂布步骤,将经由第二混合步骤制备的涂布液涂覆在基底基材上; 以及磁场施加步骤,将来自基底基板的下部的磁场施加到涂布液体,使包含在涂布液中的透明磁性纳米颗粒磁性取向。