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1. 发明公开

KR1020010063394A 그 표면에 세라믹이 코팅된 정전척과 세라믹 코팅방법 无效
标题翻译：用陶瓷和陶瓷涂层方法涂覆表面的静电卡盘
公开(公告)号：KR1020010063394A
公开(公告)日：2001-07-09
申请号：KR1019990060465
申请日：1999-12-22
申请人： 주식회사 케이씨
发明人： 배규호 , 방철용 , 오세태 , 조규태
IPC分类号： H01L21/68
摘要： PURPOSE: An electrostatic chuck whose surface is coated with a ceramic and a ceramic coating method are provided to improve the productivity and to prolong the lifetime of the electrostatic chuck by reducing the generation of particle as minimizing the influence of the electrostatic chuck body by plasma. CONSTITUTION: The electrostatic chuck includes an insulation layer(32) coated by plasma jet on an upper part of an aluminum body(30), an anodizing film(34) formed on the above coating film, an insulation film adhered onto the anodizing film by intervening an adhesive film(42). The chuck also includes a conductive copper film(38) adhered onto the insulation film by the adhesive film and a polyimide insulation film(40) thermally compressed onto the copper film. According to the method for fabricating the electrostatic chuck, a prepared electrostatic chuck body is fixed, and a revealed part and an unrevealed part are separated by masking the body partially. And an insulation film is formed by jetting a ceramic powder using a high temperature of plasma into the revealed part of the body. Then a surface roughness is increased by polishing the insulation film.
摘要翻译：目的：提供一种表面涂有陶瓷和陶瓷涂层方法的静电卡盘，以通过减少静电卡盘体等离子体的影响来减少颗粒的产生来提高生产率和延长静电卡盘的使用寿命。构成：静电卡盘包括在铝体（30）的上部涂覆有等离子体射流的绝缘层（32），形成在上述涂膜上的阳极氧化膜（34），通过以下方式附着在阳极氧化膜上的绝缘膜插入粘合膜（42）。卡盘还包括通过粘合剂膜粘合到绝缘膜上的导电铜膜（38）和热压缩到铜膜上的聚酰亚胺绝缘膜（40）。根据制造静电卡盘的方法，固定制备的静电卡盘体，并且通过部分地遮蔽身体来分离透明部分和未显露部分。并且通过使用高温等离子体将陶瓷粉末喷射到身体的显露部分中形成绝缘膜。然后通过抛光绝缘膜来增加表面粗糙度。

2. 发明授权

KR100481398B1 과불화 탄화물 가스의 처리 방법 및 이를 위한 장치 失效
标题翻译：处理全氟碳化合物气体的方法及其处理装置
公开(公告)号：KR100481398B1
公开(公告)日：2005-04-07
申请号：KR1020010066532
申请日：2001-10-27
申请人： 주식회사 케이씨
发明人： 이태우 , 전병섭 , 방철용 , 송선재 , 이찬봉 , 박순규
IPC分类号： B01D53/32
CPC分类号： Y02C20/30
摘要： 높은 효율로 과불화 탄화물 가스를 처리할 수 있는 방법 및 이를 수행하기 위하여 내구성이 향상되고 안정화된 장치가 개시되어 있다. 먼저, 처리될 가스를 주입하도록 한다. 주입된 가스에 유도 결합 플라즈마를 인가하여 이를 분해시키도록 한다. 상기 분해 반응이 일어나는 반응부의 주변을 연속적으로 흐르는 냉각제에 접촉시키는 것에 의해 분해 반응에서 발생되는 열을 냉각시켜 주도록 한다. 배출되는 가스를 처리하도록 한다. 이러한 처리 방법을 수행하기 위한 장치는 내부에 처리될 가스가 흐를 수 있는 공간이 형성된 절연성 내용기와 상기 내용기가 삽입되는 원통형의 외용기를 구비하는 반응기와 상기 내용기의 외표면을 따라 냉각제의 순환이 가능하도록 상기 내용기와 외용기의 사이에 형성된 냉각제 순환 장치를 구비하여 이루어진다. 고주파 유도결합 플라즈마 방식의 과불화 탄화물 처리 장치에 있어서 과불화 탄화물 가스의 분해 과정에서 발생되는 열을 즉시로 냉각시켜 주기 때문에 열에 의한 반응기 식각과 파손을 방지할 수 있다. 따라서 본 발명의 장치는 수명이 길고 장시간 동작이 가능하다.

3. 发明公开

KR1020010002466A 반도체장치 제조 설비의 스크러버 시스템 失效
标题翻译：半导体制造设备的SCRUBBER系统
公开(公告)号：KR1020010002466A
公开(公告)日：2001-01-15
申请号：KR1019990022284
申请日：1999-06-15
申请人： 주식회사 케이씨
发明人： 배규호 , 방철용 , 오세태 , 박순규
IPC分类号： H01L21/304
摘要： PURPOSE: A scrubber system of a semiconductor manufacturing equipment is provided to prevent unnecessary power consumption and to improve reliability without generating secondary harmful gas, by transforming exhaust gas from the equipment into a stable state by an ionization process using a short pulse power. CONSTITUTION: A scrubber system(20) of a semiconductor manufacturing equipment comprises a housing(22), an inducing unit, an exhaust unit, an anode/cathode electrode terminal, a cathode electrode tube(27), an anode electrode tube(28) and an insulating tube. The housing is a closed space, of which the inside is divided. In the inducing unit, a pipe that induces an exhaust gas flow from the semiconductor manufacturing equipment is connected to one side of the housing. In the exhaust unit, another pipe coupled to an exhaust duct is connected to the other side of the housing. The anode/cathode electrode terminal is fixedly established by penetrating a side portion of the housing, connected to a short pulse power generator(24a) of the outside. The cathode electrode tube is fixed inside the housing, having a hole forming a flow path of the exhaust gas in a predetermined portion on its upper part. The anode electrode tube is fixed to the anode electrode terminal extended through the hole of the cathode electrode tube, established on an inner wall of the cathode electrode tube by a predetermined interval. The insulating tube is connected to the exhaust unit, corresponding to an inner wall of the anode electrode tube by a predetermined interval.
摘要翻译：目的：提供半导体制造设备的洗涤器系统，通过使用短脉冲功率的电离过程将废气从设备转变为稳定状态，以防止不必要的功率消耗并提高可靠性而不产生二次有害气体。构成：半导体制造设备的洗涤器系统（20）包括壳体（22），感应单元，排气单元，阳极/阴极电极端子，阴极电极管（27），阳极电极管（28）和绝缘管。外壳是封闭的空间，内部是分开的。在诱导单元中，引导来自半导体制造设备的废气流动的管道连接到壳体的一侧。在排气单元中，连接到排气管的另一管连接到壳体的另一侧。阳极/阴极电极端子通过穿过壳体的侧部连接到外部的短脉冲发电机（24a）而固定地建立。阴极电极管固定在壳体内，具有在其上部形成有预定部分的排气流路的孔。阳极电极管固定在通过阴极电极管的孔延伸的阳极电极端子，该阳极电极端子以预定间隔设置在阴极电极管的内壁上。绝缘管以与预定间隔相对应于阳极电极管的内壁的排气单元连接。

4. 发明公开

KR1020020079343A 과불화 탄화물 가스의 처리 방법 및 이를 위한 장치 失效
标题翻译：用于处理全氟碳化合物气体的方法和装置
公开(公告)号：KR1020020079343A
公开(公告)日：2002-10-19
申请号：KR1020010066532
申请日：2001-10-27
申请人： 주식회사 케이씨
发明人： 이태우 , 전병섭 , 방철용 , 송선재 , 이찬봉 , 박순규
IPC分类号： B01D53/32
CPC分类号： Y02C20/30 , B01D53/32 , B01D53/70 , B01D2257/2066 , B01D2259/818
摘要： PURPOSE: A method for treating perfluorocarbon compound gas is provided to treat the perfluorocarbon compound gas highly efficiently and stably without using of decomposition promoter, and an apparatus for treating perfluorocarbon compound gas is provided in which easily performs treatment of the perfluorocarbon compound gas, and durability of a reactor is improved. CONSTITUTION: The method for treating perfluorocarbon compound gas comprises the steps of injecting a gas to be treated; decomposing the gas by applying inductively coupled plasma to the injected gas; contacting the surroundings of a reaction part where decomposition reaction is occurred with continuously flowing coolant, thereby cooling heat generated from the decomposition reaction so that temperature of the surface of the reaction part where the decomposition reaction is occurred is controlled to the temperature range of 0 to 100 deg.C; and treating the gas exhausted. The apparatus for treating perfluorocarbon compound gas comprises a reactor equipped with an insulating inner container(31) in which a space is formed so that gas to be treated flows in the space, and a cylindrical outer container(32) into which the inner container(31) is inserted; a coolant circulating unit which is formed between the inner container(31) and the outer container(32) so that the coolant is circulated along the outer surface of the inner container(31); a pair of first and second flanges which are installed at an end part of the inner container(31) and the outer container(32) to fix the inner container(31) and the outer container(32) and seal the inside thereof at the same time; a coil(39) which is coiled along the outer wall of the outer container(32) with spaced apart from each other in a certain distance; a high frequency power supply impression unit for impressing a high frequency power supply to the coil(39); and a controller for controlling whether the high frequency power supply is impressed or not according to whether the gas is flown in or not.
摘要翻译：目的：提供一种处理全氟化碳化合物气体的方法，高效稳定地处理全氟化碳化合物气体而不使用分解促进剂，并且提供了一种处理全氟化碳化合物气体的设备，其中易于进行全氟化碳化合物气体的处理和耐久性的反应器。构成：处理全氟化碳复合气体的方法包括注入待处理气体的步骤; 通过向注入的气体施加电感耦合等离子体来分解气体; 使发生分解反应的反应部分的周围与连续流动的冷却剂接触，从而冷却由分解反应产生的热，使得发生分解反应的反应部分的表面的温度被控制在0〜 100℃; 并处理排气。用于处理全氟化碳复合气体的设备包括一个装有绝缘内容器（31）的反应器，在该反应器内形成有空间，使待处理的气体在空间中流动，而圆筒形外容器（32） 31）插入; 冷却剂循环单元，其形成在所述内部容器（31）和所述外部容器（32）之间，使得所述冷却剂沿着所述内部容器（31）的外表面循环; 一对第一和第二凸缘，其安装在内部容器（31）的端部和外部容器（32）上，以固定内部容器（31）和外部容器（32），并将内部容器同时; 线圈（39），其沿着外部容器（32）的外壁以一定距离彼此间隔地卷绕; 用于向线圈（39）施加高频电源的高频电源压印单元; 以及控制器，用于根据气体是否流动来控制是否施加高频电源。

5. 发明授权

KR100335508B1 반도체장치 제조 설비의 스크러버 시스템 失效
标题翻译：半导体器件制造设施的洗涤器系统
公开(公告)号：KR100335508B1
公开(公告)日：2002-05-21
申请号：KR1019990022284
申请日：1999-06-15
申请人： 주식회사 케이씨
发明人： 배규호 , 방철용 , 오세태 , 박순규
IPC分类号： H01L21/304
摘要： 본발명은하우징의일측으로제조설비로부터배출가스를유도하는배관의단부와연통연결되는유입부와, 상기하우징의다른일측부위에배기덕트로연결되는다른배관의단부와연통연결되는배출부와, 상기하우징의측부를관통하여설치되며외부의쇼트펄스파워제너레이터에연결되는애노드/캐소드전극단자와, 상기하우징의측부소정위치에외부의집진기파워제너레이터와연결되는집진전극단자와, 상기하우징내부에캐소드전극단자에고정되며상부소정부위에배출가스의유동통로를이루는구멍이형성된캐소드전극관과, 상기캐소드전극관의내측벽에일정간격으로대응하도록캐소드전극관의구멍을통해연장된애노드전극단자에고정되는애노드전극관, 및상기애노드전극관의외측부위에근접대응하는소정용기형상으로집진전극단자에고정설치되는집진관을구비함으로써, 배출가스중 PFC 계열가스의분해효율을높이도록하고, PFC 계열가스의분해시 NOx나 SOx와같은 2차유해가스가생성되는것을방지토록하며, 수소가스와전기히터의미사용으로폭발위험성과장치의안전성및 전력소모량을감소토록하는반도체장치제조설비의스크러버시스템을제공한다.
摘要翻译：本发明涉及到入口连接端和用于从制造工厂将排气气体引导到所述壳体的一侧上的连通管，以及连接到所述端部在与所述其它管连接到排气管上的壳体部分的另一侧部分的漏极，通过壳体和集尘电极端子和被连接到外部短脉冲功率发生器的阳极/阴极端子侧安装在所述外壳内的阴极壳体的侧面规定位置，连接到集尘器发电机的外它被固定到电极端子，以通过在所述阴极管中的孔延伸的阳极端子，以对应于预定的距离到阴极管的内壁，并且具有孔形成至预定部的排气的流动路径中的阴极管并且集尘管以与阳极电极管的外侧紧密对应的预定容器形状固定安装在集尘电极端子上旨在提高废气中PFC气体的分解效率并防止在PFC气体分解过程中产生诸如NOx和SOx等二次有毒气体。提供了用于降低设备的安全性和功耗的半导体器件制造设施的洗涤器系统。

6. 发明公开

KR1020010063395A 내식성을 향상시킬 수 있는 정전척의 제조방법 및 그에따른 정전척 无效
标题翻译：用于制造耐腐蚀性和静电卡住的静电卡盘的方法
公开(公告)号：KR1020010063395A
公开(公告)日：2001-07-09
申请号：KR1019990060466
申请日：1999-12-22
申请人： 주식회사 케이씨
发明人： 배규호 , 방철용 , 오세태 , 조규태
IPC分类号： H01L21/68
摘要： PURPOSE: A method for fabricating an electrostatic chuck capable of improving a corrosion resistance and an electrostatic chuck according thereof are provided to prevent a crack of an edge part as minimizing a curvature of the edge part of a minor diametric part of an upper part of the electrostatic chuck. CONSTITUTION: A body(2) fabricated with an aluminum has a flange part(4) and its bottom is wide and its top is narrow. A focus ring(6) is located on the flange part to prevent the separation of a wafer(W), and an anodizing film(8) as thick as 50 micrometer is formed on a part except the part where the focus ring is located. A dielectric layer(10) is formed on a surface of the anodizing film to absorb the wafer in vacuum by a polarization phenomenon occurring between a conductive part of the chuck and the wafer when a high voltage is applied. The dielectric film comprises the first insulation layer film(12) attached to the anodizing film and the second insulation film having a conductive copper film(14). The surface of the dielectric film has a number of paths(11) connected from a center path.
摘要翻译：目的：提供一种用于制造能够提高耐腐蚀性的静电卡盘的方法和一种静电卡盘，以防止边缘部分的裂纹使得上部的小直径部分的边缘部分的曲率最小化静电吸盘。构成：用铝制成的主体（2）具有凸缘部分（4），并且其底部较宽并且其顶部较窄。焦点环（6）位于凸缘部分上以防止晶片（W）分离，并且在除了聚焦环所在部分之外的部分上形成厚度为50微米的阳极氧化膜（8）。在阳极氧化膜的表面上形成电介质层（10），以在施加高电压时通过在卡盘的导电部分和晶片之间发生的偏振现象在真空中吸收晶片。电介质膜包括附着到阳极化膜的第一绝缘层膜（12）和具有导电铜膜（14）的第二绝缘膜。电介质膜的表面具有从中心路径连接的多条路径（11）。

7. 发明公开

KR1020010063393A 열 압착 원리를 이용한 필름의 완전 평면 접착 방법 및 그장치 无效
标题翻译：使用热压缩原理无空气孔的完全遮盖膜的方法和装置
公开(公告)号：KR1020010063393A
公开(公告)日：2001-07-09
申请号：KR1019990060464
申请日：1999-12-22
申请人： 주식회사 케이씨
发明人： 배규호 , 방철용 , 오세태 , 조규태
IPC分类号： B29C65/70
CPC分类号： B29C65/02 , B29C65/4835 , B29C65/50 , B29C65/7847 , B29C66/0242 , B29C66/472 , B29C66/7422 , B29C66/74281 , B29C66/74283 , B29C66/8266 , B29C66/914 , B29C66/924 , B29C66/944 , B29K2677/00 , B29K2705/02 , B29K2705/10 , B29K2705/12 , H01L21/6833
摘要： PURPOSE: A complete film sticking method without pores using a thermal compression principle and a sticking device thereof are provided to completely stick a film with regular sticking force without damages and to stick the film regardless of the surface shape of a film contacted body. CONSTITUTION: A complete film sticking device comprises a chamber(1) having a sealing space, with at least one jig(3) inside the sealing space; a worktable(7) putting a body(5) on, inside the jig; a vacuum pump(11) connected to the jig and controlled by a vacuum valve(9) to evacuate the jig; a compressor(15) connected to the chamber and controlled by a compression valve(13), to generate a pressure difference between the chamber and the jig with compressed gas; and a pressurizing cover(21) sealing the jig to stick the body, a sticking film(17) and a stuck film(19) with the pressure difference and equally pressurizing the films.
摘要翻译：目的：提供一种使用热压缩原理的无毛孔的完全膜粘贴方法及其粘贴装置，以便在不损坏的情况下以规则的粘附力完全粘贴薄膜，并且不管膜接触体的表面形状如何，都能粘贴薄膜。构成：完整的胶片粘贴装置包括具有密封空间的腔室（1），在密封空间内具有至少一个夹具（3）; 工作台（7）将身体（5）放在夹具内部; 连接到夹具并由真空阀（9）控制以抽真空的真空泵（11）; 压缩机（15），其连接到所述室并由压缩阀（13）控制，以利用压缩气体产生所述室和所述夹具之间的压力差; 以及密封夹具以粘贴身体的加压盖（21），粘贴膜（17）和具有压力差的粘膜（19），同时加压膜。

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