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    • 1. 发明公开
    • 내식성을 향상시킬 수 있는 정전척의 제조방법 및 그에따른 정전척
    • 用于制造耐腐蚀性和静电卡住的静电卡盘的方法
    • KR1020010063395A
    • 2001-07-09
    • KR1019990060466
    • 1999-12-22
    • 주식회사 케이씨
    • 배규호방철용오세태조규태
    • H01L21/68
    • PURPOSE: A method for fabricating an electrostatic chuck capable of improving a corrosion resistance and an electrostatic chuck according thereof are provided to prevent a crack of an edge part as minimizing a curvature of the edge part of a minor diametric part of an upper part of the electrostatic chuck. CONSTITUTION: A body(2) fabricated with an aluminum has a flange part(4) and its bottom is wide and its top is narrow. A focus ring(6) is located on the flange part to prevent the separation of a wafer(W), and an anodizing film(8) as thick as 50 micrometer is formed on a part except the part where the focus ring is located. A dielectric layer(10) is formed on a surface of the anodizing film to absorb the wafer in vacuum by a polarization phenomenon occurring between a conductive part of the chuck and the wafer when a high voltage is applied. The dielectric film comprises the first insulation layer film(12) attached to the anodizing film and the second insulation film having a conductive copper film(14). The surface of the dielectric film has a number of paths(11) connected from a center path.
    • 目的:提供一种用于制造能够提高耐腐蚀性的静电卡盘的方法和一种静电卡盘,以防止边缘部分的裂纹使得上部的小直径部分的边缘部分的曲率最小化 静电吸盘。 构成:用铝制成的主体(2)具有凸缘部分(4),并且其底部较宽并且其顶部较窄。 焦点环(6)位于凸缘部分上以防止晶片(W)分离,并且在除了聚焦环所在部分之外的部分上形成厚度为50微米的阳极氧化膜(8)。 在阳极氧化膜的表面上形成电介质层(10),以在施加高电压时通过在卡盘的导电部分和晶片之间发生的偏振现象在真空中吸收晶片。 电介质膜包括附着到阳极化膜的第一绝缘层膜(12)和具有导电铜膜(14)的第二绝缘膜。 电介质膜的表面具有从中心路径连接的多条路径(11)。
    • 3. 发明公开
    • 그 표면에 세라믹이 코팅된 정전척과 세라믹 코팅방법
    • 用陶瓷和陶瓷涂层方法涂覆表面的静电卡盘
    • KR1020010063394A
    • 2001-07-09
    • KR1019990060465
    • 1999-12-22
    • 주식회사 케이씨
    • 배규호방철용오세태조규태
    • H01L21/68
    • PURPOSE: An electrostatic chuck whose surface is coated with a ceramic and a ceramic coating method are provided to improve the productivity and to prolong the lifetime of the electrostatic chuck by reducing the generation of particle as minimizing the influence of the electrostatic chuck body by plasma. CONSTITUTION: The electrostatic chuck includes an insulation layer(32) coated by plasma jet on an upper part of an aluminum body(30), an anodizing film(34) formed on the above coating film, an insulation film adhered onto the anodizing film by intervening an adhesive film(42). The chuck also includes a conductive copper film(38) adhered onto the insulation film by the adhesive film and a polyimide insulation film(40) thermally compressed onto the copper film. According to the method for fabricating the electrostatic chuck, a prepared electrostatic chuck body is fixed, and a revealed part and an unrevealed part are separated by masking the body partially. And an insulation film is formed by jetting a ceramic powder using a high temperature of plasma into the revealed part of the body. Then a surface roughness is increased by polishing the insulation film.
    • 目的:提供一种表面涂有陶瓷和陶瓷涂层方法的静电卡盘,以通过减少静电卡盘体​​等离子体的影响来减少颗粒的产生来提高生产率和延长静电卡盘的使用寿命。 构成:静电卡盘包括在铝体(30)的上部涂覆有等离子体射流的绝缘层(32),形成在上述涂膜上的阳极氧化膜(34),通过以下方式附着在阳极氧化膜上的绝缘膜 插入粘合膜(42)。 卡盘还包括通过粘合剂膜粘合到绝缘膜上的导电铜膜(38)和热压缩到铜膜上的聚酰亚胺绝缘膜(40)。 根据制造静电卡盘的方法,固定制备的静电卡盘体​​,并且通过部分地遮蔽身体来分离透明部分和未显露部分。 并且通过使用高温等离子体将陶瓷粉末喷射到身体的显露部分中形成绝缘膜。 然后通过抛光绝缘膜来增加表面粗糙度。