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    • 4. 发明公开
    • 박막 트랜지스터 내에 집적된 유기 초전기 센서 및 그 제조방법
    • 集成在薄膜晶体管中的有机电子传感器及其制造方法
    • KR1020110013560A
    • 2011-02-09
    • KR1020110006033
    • 2011-01-20
    • 성균관대학교산학협력단
    • 이내응원탄티엔
    • H01L29/786B82Y30/00
    • H01L51/0516B82Y30/00H01L51/0537
    • PURPOSE: An organic pyroelectric functional sensor integrated in a thin film transistor and a manufacturing method thereof are provided to secure high linearity and reliability by introducing a P(VDF-TrFE) layer in an OTFT(Organic Thin-Film Transistor) as a functional gate dielectric layer. CONSTITUTION: An Ni gate electrode(2) is deposited on a film(1) by electroplating. A dielectric layer(3) is formed by coating a P(VDF-TrFE) layer on the Ni gate electrode. A crystalline property is improved by re-crystallizing after dissolving a dielectric layer through annealing. A semiconductor layer(4) is deposited on the dielectric layer. A source and drain electrode(5,6) is deposited on the semiconductor layer.
    • 目的:提供集成在薄膜晶体管中的有机热释电功能传感器及其制造方法,以通过在作为功能栅极的OTFT(有机薄膜晶体管)中引入P(VDF-TrFE)层来确保高线性度和可靠性 电介质层。 构成:通过电镀将Ni栅电极(2)沉积在膜(1)上。 通过在Ni栅极上涂覆P(VDF-TrFE)层来形成电介质层(3)。 在通过退火溶解介电层之后通过再结晶来提高结晶性。 半导体层(4)沉积在电介质层上。 源极和漏极(5,6)沉积在半导体层上。
    • 6. 发明公开
    • 도금공정을 이용한 플렉시블 유기물 기판 상의 게이트전극제작 방법과, 이를 이용한 유기 반도체 소자 제조 방법
    • 使用电镀工艺的有机基板上的门电极的制造方法和使用该方法制造有机半导体器件的方法
    • KR1020080034274A
    • 2008-04-21
    • KR1020060100275
    • 2006-10-16
    • 성균관대학교산학협력단
    • 이내응설영국이재근
    • H01L21/336H01L21/288
    • A method of fabricating a gate electrode on an organic substrate using an electroplating process and a Method of fabricating an organic semiconductor device using the same are provided to improve flexibility and electrical property of an organic semiconductor device as a low temperature process by forming an insulating layer and a semiconductor layer as organic materials. A substrate(10) composed of a flexible organic material is provided. An adhesive layer(20) is formed on the substrate. A seed layer(30) for increasing electroplating capability of a gate electrode is formed at the one surface of the adhesive layer. A photoresist is formed on the seed layer. The photoresist is patterned by a mask(50) on which a pattern is formed in advance. A gate electrode is formed on the pattern by using the electroplating or the electroless plating process. The photoresist is removed. The adhesive layer and the seed layer in a region except for gate electrode are removed.
    • 提供使用电镀工艺在有机基板上制造栅电极的方法和使用其制造有机半导体器件的方法,以通过形成绝缘层来提高作为低温工艺的有机半导体器件的柔性和电性能 和半导体层作为有机材料。 提供由柔性有机材料构成的基板(10)。 在基板上形成粘合剂层(20)。 在粘合剂层的一个表面上形成用于增加栅电极的电镀能力的籽晶层(30)。 在种子层上形成光致抗蚀剂。 通过预先形成有图案的掩模(50)对光致抗蚀剂进行图案化。 通过使用电镀或化学镀处理,在图案上形成栅电极。 去除光致抗蚀剂。 去除除栅电极之外的区域中的粘合剂层和种子层。
    • 7. 发明公开
    • 유도 결합형 플라즈마를 이용한 산화아연박막의 식각 방법
    • 使用电感耦合等离子体蚀刻ZNO薄膜的方法
    • KR1020060118259A
    • 2006-11-23
    • KR1020050040866
    • 2005-05-16
    • 성균관대학교산학협력단
    • 이내응나선웅신명훈정윤모한전건부진효
    • H05B33/10
    • H01L51/0018H01L21/0279H01L21/32136H01L51/56H01L2924/12044
    • A method for etching a zinc oxide thin film using inductively coupled plasma is provided to improve productivity by processing selective etching for a zinc oxide thin film used as a transparent conductive electrode material based on the inductively coupled plasma. A method for etching a zinc oxide thin film using an inductively coupled plasma includes the steps of: preparing a substrate(28) on which a zinc oxide thin film or a metal-doped zinc oxide thin film is evaporated, and a photoresist for forming a pattern on the zinc oxide thin film is formed; installing the substrate on a side of a chamber which maintains a predetermined pressure; and providing a gas for forming a plasma in the chamber(10) by applying a first RF power to an inductive coil(24) installed on a position confronted with the substrate, and applying a second RF power to the substrate.
    • 提供了使用电感耦合等离子体蚀刻氧化锌薄膜的方法,以通过对基于电感耦合等离子体的透明导电电极材料使用的氧化锌薄膜进行选择性蚀刻来提高生产率。 使用电感耦合等离子体蚀刻氧化锌薄膜的方法包括以下步骤:制备在其上蒸发氧化锌薄膜或金属掺杂的氧化锌薄膜的基板(28),以及用于形成 形成氧化锌薄膜上的图案; 将基板安装在保持预定压力的室的一侧上; 以及通过向安装在与所述基板相对的位置的感应线圈(24)施加第一RF功率并且向所述基板施加第二RF功率来提供用于在所述室(10)中形成等离子体的气体。
    • 10. 发明授权
    • 3차원 그래핀 소자의 제작 방법 및 이를 포함한 센서
    • 制造三维图形装置和包含其的传感器的方法
    • KR101437289B1
    • 2014-09-02
    • KR1020130097958
    • 2013-08-19
    • 성균관대학교산학협력단
    • 이내응김덕진조형진박준식손일융
    • B81C1/00G01N27/00
    • The present invention relates to a method of forming a three-dimensional graphene device by forming graphene on a three-dimensional microstructure a method of producing an electronic device, such as chemical/bio sensors by using the combination of a one-dimensional nanomaterial (nanowire and nanotube) and a zero-dimensional nanowire (nanoparticles and quantum dots). The three-dimensional microstructure is produced by a selective exposure technique of a light-sensitive polymer. The formation of the three-dimensional structure by the adsorption of a two-dimensional material including graphene is possible by the formation of an oxide film and the formation of a self-assembled monolayer. Further, the present invention includes a method of producing the zero-dimensional nanomaterial and the one-dimension nanomaterial on the three-dimensional graphene structure.
    • 本发明涉及一种通过在三维微结构上形成石墨烯来形成三维石墨烯装置的方法,该方法通过使用一维纳米材料(纳米线)的组合来生产电子器件,例如化学/生物传感器 和纳米管)和零维纳米线(纳米粒子和量子点)。 通过感光聚合物的选择性曝光技术产生三维微结构。 通过形成氧化膜并形成自组装单层,可以通过吸附包括石墨烯在内的二维材料形成三维结构。 此外,本发明包括在三维石墨烯结构上制造零维纳米材料和一维纳米材料的方法。