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1. 发明公开

KR1020160058490A 뷰 포트(view port)를 포함하는 플라즈마 공정 설비 审中-实审
标题翻译：具有视图端口的等离子体处理装置
公开(公告)号：KR1020160058490A
公开(公告)日：2016-05-25
申请号：KR1020140160035
申请日：2014-11-17
申请人： 삼성전자주식회사
发明人： 선종우 , 정경석 , 김지희
IPC分类号： H05H1/46 , H01L21/3065
CPC分类号： H01J37/32935 , H01J37/32807 , H01J37/32972
摘要： 플라즈마공정설비가제공된다. 상기플라즈마공정설비는뷰 포트(view port)를포함하는공정챔버; 상기공정챔버의상기뷰 포트내에위치하는윈도우플레이트; 및상기공정챔버의내측을향한상기윈도우플레이트의표면상에위치하는광 가이드를포함한다. 상기광 가이드는일측방향으로평행하게연장하는개구부들을포함한다.
摘要翻译：提供了一种等离子体处理装置。等离子体处理装置包括具有视口的处理室; 位于处理室的视图端口内的窗板; 以及位于窗板的表面上朝向处理室内部的光导。光导包括沿一个方向平行延伸的开口。可以使用由处理室内部产生的等离子体产生的光来精确地监测等离子体状态和等离子体处理。

2. 发明公开

KR1020160043389A 플라즈마 처리 장치 审中-实审
标题翻译：等离子体加工装置
公开(公告)号：KR1020160043389A
公开(公告)日：2016-04-21
申请号：KR1020140137711
申请日：2014-10-13
申请人： 삼성전자주식회사
发明人： 김학영 , 이지명 , 김지희 , 성덕용 , 정경석 , 최성철
IPC分类号： H05H1/34 , H05H1/46
CPC分类号： H01J37/32119 , H01J37/321 , H01J37/32522 , H01J37/3299 , H01J37/3211 , H01J37/3244 , H01J37/32449 , H01J37/32798 , H01Q1/366 , H05H1/46 , H05H2001/4667
摘要： 플라즈마처리장치가제공된다. 상기플라즈마처리장치는, 플라즈마처리가수행되는챔버의상부를덮는윈도우(window)와자기장을생성하는안테나(antenna) 사이에형성되는플레이트(plate); 및윈도우와안테나의온도를제어하기위한유체를제공하는유체공급부를포함하되, 플레이트는유체를제공받는제1 및제2 영역을포함하고, 유체공급부는제1 및제2 영역을각각독립적으로제어한다.
摘要翻译：本发明公开了一种等离子体处理装置，其特征在于，包括：形成在覆盖室内顶部的窗口中进行等离子体处理的板与产生磁场的天线之间的板; 以及提供用于控制窗口和天线的温度的流体的流体供应单元。板包括接收流体的第一和第二区域，并且流体供应单元独立地控制第一和第二区域。本发明提供能够降低窗口的中心部分和周边部分之间的温度差的等离子体处理装置。

3. 发明公开

KR1020100083917A 플라즈마 식각 장치의 가스공급장치 有权
标题翻译：用于等离子体蚀刻装置的气体供应系统
公开(公告)号：KR1020100083917A
公开(公告)日：2010-07-23
申请号：KR1020090003247
申请日：2009-01-15
申请人： 삼성전자주식회사
发明人： 정경석 , 이재봉 , 한경현 , 신한수
IPC分类号： H01L21/3065 , H01L21/02 , H01L21/205
CPC分类号： H01J37/32449 , H01L21/67069
摘要： PURPOSE: A gas supply system for a plasma etching apparatus is provided to effectively regulate the uniformity of an etching operation using separate distributors according to the characteristics of processing gases. CONSTITUTION: A processing gas is injected into a chamber trough a gas inlet. The gas inlet includes a first gas inlet(20) and a second gas inlet(21). A supplying line(33) includes a first supplying line(33a) and a second supplying line(33b). A plurality of distributors obtains the processing gas from the supplying line and distributes the processing gas. The processing gas flows from the distributor to the gas inlet through a flowing path(36).
摘要翻译：目的：提供一种用于等离子体蚀刻装置的气体供应系统，以根据处理气体的特性有效地调节使用分开的分配器的蚀刻操作的均匀性。构成：处理气体通过气体入口注入室内。气体入口包括第一气体入口（20）和第二气体入口（21）。供给线（33）包括第一供给线（33a）和第二供给线（33b）。多个分配器从供应管路获得处理气体并分配处理气体。处理气体通过流动路径（36）从分配器流到气体入口。

4. 发明公开

KR1020080041913A 어레이 기판 无效
标题翻译：阵列基板
公开(公告)号：KR1020080041913A
公开(公告)日：2008-05-14
申请号：KR1020060110124
申请日：2006-11-08
申请人： 삼성전자주식회사
发明人： 손우성 , 양병덕 , 정경석
IPC分类号： H01L29/786
CPC分类号： H01L22/12 , G02F1/1309 , H01L22/30 , H01L22/32
摘要： An array substrate is provided to enhance reliability of a test using test patterns by forming the same stacked structure as the stacked structure of patterns formed on a display region. A base substrate includes a display region and a peripheral region for surrounding the display region. A gate line(GL) and a data line(DL) are formed on the display region in order to define a pixel region. A thin film transistor includes a gate electrode branched from the gate line, an active pattern arranged on the gate electrode, a source electrode formed on the active pattern and branched from the data line, and a drain electrode separated from the source electrode on the active pattern. A test pattern includes a first test pattern(221) formed on the peripheral region, a second test pattern(241) formed on the first test pattern, a third test pattern(251) formed on the second test pattern, and a fourth test pattern(252) separated from the third test pattern on the second test pattern. A first to third holes are formed at centers of the first to third test patterns. The sizes of the first to third holes are proportional to a distance from the base substrate.
摘要翻译：提供阵列基板，以通过形成与形成在显示区域上的图案的层叠结构相同的堆叠结构来提高使用测试图案的测试的可靠性。基底基板包括用于围绕显示区域的显示区域和周边区域。为了定义像素区域，在显示区域上形成栅极线（GL）和数据线（DL）。薄膜晶体管包括从栅极线分支的栅极电极，布置在栅电极上的有源图案，形成在有源图案上并从数据线分支的源电极，以及在源极上与源极分离的漏电极模式。测试图案包括形成在周边区域上的第一测试图案（221），形成在第一测试图案上的第二测试图案（241），形成在第二测试图案上的第三测试图案（251）和第四测试图案（252）在第二测试图案上与第三测试图案分离。在第一至第三测试图案的中心处形成第一至第三孔。第一至第三孔的尺寸与距离基底的距离成正比。

5. 发明公开

KR1020080038608A 어레이 기판 无效
标题翻译：阵列基板
公开(公告)号：KR1020080038608A
公开(公告)日：2008-05-07
申请号：KR1020060105707
申请日：2006-10-30
申请人： 삼성전자주식회사
发明人： 양병덕 , 손우성 , 송영구 , 정경석
IPC分类号： G02F1/1345 , G02F1/13
CPC分类号： G02F1/13458 , G02F1/1309 , G02F1/1362 , G09G3/006
摘要： An array substrate is provided to inspect the film characteristics of a pattern constituting a pixel array using an inspection pattern equipped with a base substrate and incline the section of a film exposed through a hole formed as the diameter of the hole is increased according as the hole recedes from the base substrate, thereby inspecting the interface characteristics of the film easily. A base substrate is comprised of a display area(DA), on which a pixel array(180) is formed, and areas(PA1,PA2) adjacent to the display area. A pad unit is formed the adjacent area and receives a driving signal from the outside. Input lines(IL1,IL2) are respectively connected to the pad unit and the pixel array and transmits the driving signal inputted to the pad unit to the pixel array. An inspection pattern(VIP) is respectively insulated from the pad unit and the input line. The inspection pattern includes a first metal film, a gate insulating film, a first active pattern, a first ohmic contact pattern and a passivation film which are successively laminated to cover a lower film on the base substrate. A hole is formed to penetrate the gate insulating film, the first active pattern, the first ohmic contact pattern, and the passivation film to expose the first metal film. The diameter of the hole is increased as the hole recedes from the base substrate.
摘要翻译：提供了一种阵列基板，用于使用配备有基底基板的检查图案来检查构成像素阵列的图案的膜特性，并且通过孔的直径形成的孔露出的膜的部分因孔而增大从基底基板后退，从而容易地检查膜的界面特性。基底由包括像素阵列（180）的显示区域（DA）和与显示区域相邻的区域（PA1，PA2）组成。在相邻区域形成垫单元，并从外部接收驱动信号。输入线（IL1，IL2）分别连接到焊盘单元和像素阵列，并将输入到焊盘单元的驱动信号发送到像素阵列。检查图案（VIP）分别与垫单元和输入线绝缘。检查图案包括依次层叠以覆盖基底上的下膜的第一金属膜，栅极绝缘膜，第一有源图案，第一欧姆接触图案和钝化膜。形成孔以穿透栅绝缘膜，第一有源图案，第一欧姆接触图案和钝化膜以暴露第一金属膜。当孔从基底延伸时，孔的直径增加。

6. 发明公开

KR1020120073884A 유도 결합 플라즈마 공정 장치 无效
标题翻译：电感耦合等离子体加工设备
公开(公告)号：KR1020120073884A
公开(公告)日：2012-07-05
申请号：KR1020100135805
申请日：2010-12-27
申请人： 삼성전자주식회사
发明人： 신한수 , 정경석 , 이지명 , 백동석 , 전윤광
IPC分类号： H05H1/46 , H01L21/205 , H01L21/3065
CPC分类号： H01J37/32467 , H01J37/3211 , H01J37/32119 , H01J37/32522 , H05H1/46 , H05H2001/4652
摘要： PURPOSE: An inductively coupled plasma processing apparatus is provided to prevent the dispersion of the inductive electromagnetic field by arranging a heater at the outer side of a dielectric window. CONSTITUTION: An inductively coupled plasma processing apparatus(1b) comprises a chamber(20), a dielectric window(11b), an antenna(100), a heater(13b), a thermal conductive material(110b) stored in an inner space of the dielectric window, a electrostatic chuck(22), and a susceptor. The heater is arranged in outer both sides of the dielectric window. The thermal conductive material regularly maintains the temperature of a dielectric window by improving heat transmission to the dielectric window. The thermal conductive material has electrical non-conductivity. An inductive electromagnetic field regularly passes through the inside of the chamber without dispersion or distortion.
摘要翻译：目的：提供电感耦合等离子体处理装置，通过在电介质窗的外侧布置加热器来防止感应电磁场的分散。电感耦合等离子体处理装置（1b）包括一个室（20），一个电介质窗（11b），一个天线（100），一个加热器（13b），一个保存在内部空间的导热材料电介质窗，静电卡盘（22）和基座。加热器布置在电介质窗口的两侧。导热材料通过改善对电介质窗的传热来有规律地保持电介质窗的温度。导热材料具有非导电性。感应电磁场定期地通过腔室内部，而没有分散或变形。

7. 发明公开

KR1020080048627A 어레이 기판 및 이를 갖는 표시패널 无效
标题翻译：阵列基板和显示面板
公开(公告)号：KR1020080048627A
公开(公告)日：2008-06-03
申请号：KR1020060118819
申请日：2006-11-29
申请人： 삼성전자주식회사
发明人： 손우성 , 정경석 , 송상헌
IPC分类号： G02F1/1345
CPC分类号： G02F1/1362 , G02F1/1309 , G02F1/136204 , G02F2001/136254 , H01L27/12
摘要： An array substrate and a display panel having the same are provided to form a test member to an array substrate, thereby measuring the characteristics of a test transistor clearly, thereby preventing the destruction of a panel from generating by omitting a de-cap process. A gate line member is formed toward the first direction and has gate lines and at least one gate dummy lines. A data line member(120) is formed toward the second direction crossed with the first direction and has data lines and at least one data dummy line. A pixel member is connected with gate and data lines electrically. At least one test transistor is connected with the gate dummy line and data dummy line electrically. A test pad member(150) is connected with the gate dummy line, data dummy line and a drain electrode of the test transistor electrically. The test pad member includes a gate test pad connected with the gate dummy line electrically. A data test pad is connected with the data dummy line electrically. A drain test pad is connected with the drain electrode electrically.
摘要翻译：提供阵列基板和具有该阵列基板的显示面板以形成测试构件到阵列基板，从而清楚地测量测试晶体管的特性，从而通过省略去帽工艺来防止面板的破坏。栅极线部件朝向第一方向形成，具有栅极线和至少一个栅极虚线。数据线构件朝向与第一方向交叉的第二方向形成，并且具有数据线和至少一个数据虚线。像素部件与栅极和数据线电连接。至少一个测试晶体管与栅极虚拟线路和数据虚拟线路电连接。测试焊盘构件（150）与测试晶体管的栅极虚拟线，数据虚线和漏电极电连接。测试焊盘构件包括与栅极虚拟线电连接的栅极测试焊盘。数据测试板与数据虚拟线电连接。漏极测试焊盘与漏电极电连接。

8. 发明公开

KR1020080013163A 마스크, 이를 이용한 표시기판 및 표시기판 제조 방법 无效
标题翻译：掩模，显示基板和使用其制造的方法
公开(公告)号：KR1020080013163A
公开(公告)日：2008-02-13
申请号：KR1020060074299
申请日：2006-08-07
申请人： 삼성전자주식회사
发明人： 김인우 , 송영구 , 양병덕 , 박민욱 , 손우성 , 정경석
IPC分类号： H01L21/027 , G02F1/133 , G02F1/136
CPC分类号： G03F1/54 , G02F1/13306 , G03F7/0005 , G03F7/70216
摘要： A mask, a display substrate using the same, and a method for fabricating the display substrate are provided to stably supply a signal equivalent for an image to a signal line by preventing an electrode pad and the signal line from being shorted together even if under-cut is partially generated in a via hole. A blocking unit(110) blocks light. At least one penetration unit(120) transmits the light. At least slit unit(130) transmits and blocks the light in the form of a slit. The slit unit includes a first slit(131), a second slit(132), and a third slit(133). The first slit transmits the light. The second slit is separated from the first slit in a predetermined distance to enclose the first slit. The second slit transmits the light. The third slit is disposed between the first slit and the second slit to block the light. The third slit has a non-uniform width and is a band-shape.
摘要翻译：提供掩模，使用其的显示基板和制造显示基板的方法，以便通过防止电极焊盘和信号线短路在一起来稳定地将与图像等价的信号提供给信号线，在通孔中部分地产生切割。阻挡单元（110）阻挡光。至少一个穿透单元（120）透射光。至少狭缝单元（130）以狭缝的形式透射和阻挡光。狭缝单元包括第一狭缝（131），第二狭缝（132）和第三狭缝（133）。第一个狭缝透光。第二狭缝以预定距离与第一狭缝分离以包围第一狭缝。第二狭缝透光。第三狭缝被设置在第一狭缝和第二狭缝之间以阻挡光。第三狭缝具有不均匀的宽度并且是带状。

9. 发明授权

KR100688985B1 기판검사장치 및 그의 제어방법 有权
标题翻译：用于检查基板的装置及其控制方法
公开(公告)号：KR100688985B1
公开(公告)日：2007-03-08
申请号：KR1020050071940
申请日：2005-08-05
申请人： 삼성전자주식회사
发明人： 이수호 , 안드레이유사코 , 임순규 , 민경선 , 정경석
IPC分类号： G01N21/88
摘要： 본 발명은, 기판검사장치 및 그의 제어방법에 관한 것으로서, 본 발명에 따른 기판검사장치는, 상기 기판을 검사하는 검사유닛과; 상기 검사유닛의 입구영역에 마련되며, 상기 검사유닛으로 상기 기판을 순차적으로 공급하도록 적어도 하나의 상기 기판을 지지하는 복수의 공급스테이지와, 상기 검사유닛의 입구측에 대응하여 복수의 상기 공급스테이지를 이동시키는 공급구동부를 갖는 공급유닛과; 상기 검사유닛의 출구영역에 마련되며, 상기 검사유닛에서 순차적으로 배출되는 적어도 하나의 상기 기판을 지지하는 복수의 배출스테이지와, 상기 검사유닛의 출구측에 대응하여 복수의 상기 배출스테이지를 이동시키는 배출구동부를 갖는 배출유닛을 포함하는 것을 특징으로 한다. 이에 의하여, 비교적 신속하며 간단하게 기판을 검사할 수 있는 기판검사장치 및 그의 제어방법이 제공된다.

10. 发明授权

KR100686726B1 플라즈마 화학기상증착장치 有权
标题翻译： 플라즈마화학기상증착장치
公开(公告)号：KR100686726B1
公开(公告)日：2007-02-26
申请号：KR1020050080836
申请日：2005-08-31
申请人： 삼성전자주식회사
发明人： 정경석 , 안드레이유스코브 , 박선미 , 정화준 , 김응수
IPC分类号： H01L21/205
摘要： A plasma chemical vapor deposition apparatus is provided to effectively disassemble a gas injection part supported on an upper portion of a chamber lead by connecting a chamber body with the chamber lead with a hinge part. A plasma chemical vapor deposition apparatus comprises a chamber body(10) having a desired reaction chamber and an access opening, a gas injection part(30) disposed in the reaction chamber for spraying a deposition gas, and a chamber lead(20) coupled to the chamber body by a first hinge part(90). The hinge part is pivoted between an open position for opening the access opening and a close position for closing the access opening. A cleaning gas supply unit(50) supplies a cleaning gas to the reaction chamber.
摘要翻译：提供一种等离子体化学气相沉积设备，用于通过利用铰链部分将室体与室引线连接而有效地拆卸支撑在室引线上部的气体注入部分。一种等离子体化学气相沉积设备包括：具有期望的反应室和进入开口的室主体（10）;布置在反应室中用于喷射沉积气体的气体注入部件（30）;以及室引线（20），耦合到腔室本体通过第一铰链部分（90）。铰链部件在用于打开进入开口的打开位置和用于关闭进入开口的关闭位置之间枢转。清洁气体供应单元（50）将清洁气体供应到反应室。

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