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1. 发明公开

KR1020110045418A 포토레지스트 조성물 및 이를 이용한 표시 기판의 제조 방법 无效
标题翻译：光电组合物和使用光电组合物制造显示基板的方法
公开(公告)号：KR1020110045418A
公开(公告)日：2011-05-04
申请号：KR1020090101988
申请日：2009-10-27
申请人： 삼성디스플레이 주식회사 , 동우 화인켐 주식회사
发明人： 박정민 , 이정수 , 장원영 , 이은상 , 유인호 , 김성현
IPC分类号： G03F7/023 , G03F7/00 , G03F7/022 , G03F7/038 , H01L27/12
CPC分类号： H01L27/1288 , G03F7/0007 , G03F7/0226 , G03F7/0233 , H01L27/1214 , Y10S438/948 , G03F7/0385
摘要： PURPOSE: A photo-resist composition and a method for manufacturing a display substrate using the same are provided to strip a photo-resist pattern and minimize the generation possibility of cracks in the photo-resist pattern. CONSTITUTION: A photo-resist composition includes an alkaline soluble resin, a dissolution inhibitor containing a quinine diazide-based compound, a first additive containing a benzenol-based compound, a second additive containing acrylic copolymer, and an organic solvent. The benzenol-based compound is represented by chemical formula 1. The acrylic copolymer is represented by chemical formula 2. In the chemical formula 1, R1, R2, and R3 are respectively hydrogen, hydroxyl group, C1 to C1 alkyl group, or C1 to C10 alkyl hydroxyl group. One of the R1 to R3 is hydroxyl group. In the chemical formula 2, R4 to R6 is respectively hydrogen atom or C1 to C3 alkyl group. R7 represents hydrogen atom substituted or non-substituted C1 to C6 hydro carbon, and R8 represents benzyl group or phenyl group. m, n, and k are respectively natural number of 1 to 99. m+n+k is 100.
摘要翻译：目的：提供光致抗蚀剂组合物和使用该光致抗蚀剂组合物的显示基板的制造方法，以剥离光致抗蚀剂图案并使光致抗蚀剂图案中的裂纹的产生可能性最小化。构成：光致抗蚀剂组合物包括碱溶性树脂，含有奎宁重氮化合物的溶解抑制剂，含有苯酚类化合物的第一添加剂，含有丙烯酸共聚物的第二添加剂和有机溶剂。苯酚类化合物由化学式1表示。丙烯酸共聚物由化学式2表示。在化学式1中，R 1，R 2和R 3分别为氢，羟基，C 1至C 1烷基或C 1至 C10烷基羟基。 R1至R3之一是羟基。在化学式2中，R 4至R 6分别为氢原子或C 1至C 3烷基。 R 7表示氢原子取代或未取代的C1〜C6氢碳，R8表示苄基或苯基。 m，n和k分别为1〜99的自然数。m + n + k为100。

2. 发明公开

KR1020110121301A 포토레지스트 조성물, 이를 이용한 패턴 형성 방법 및 박막 트랜지스터 기판의 제조 방법 无效
标题翻译：光刻胶组合物，形成图案的方法和使用其制造薄膜晶体管基板的方法
公开(公告)号：KR1020110121301A
公开(公告)日：2011-11-07
申请号：KR1020100040837
申请日：2010-04-30
申请人： 삼성디스플레이 주식회사 , 동우 화인켐 주식회사
发明人： 홍필순 , 박귀현 , 주진호 , 송진호 , 김상태 , 김성현 , 장원영 , 윤종흠 , 이은상 , 임민주
IPC分类号： G03F7/022 , H01L21/027
CPC分类号： H01L27/1288 , G03F7/0226 , G03F7/0236 , G03F7/085 , G03F7/40 , H01L21/32139 , H01L27/1214 , H01L21/0274
摘要： PURPOSE: A photo-resist composition, a method for forming patterns using the same, and a method for manufacturing a thin film transistor substrate using the same are provided to prevent the delamination of photo-resist patterns after an etching process. CONSTITUTION: A photo-resist composition includes an alkali soluble resin, a photo-sensitive compound, a compound represented by chemical formula 1, and a solvent. In the chemical formula 1, the R is hydrogen C1-C1 alkyl group, C4-C8 cycloalkyl group, or benzene group. A method for forming patterns using the composition includes the following: A photo-resist film is formed on a film to be etched by applying the composition. The photo-resist film is exposed by the irradiation of light. The photo-resist film is developed to form photo-resist patterns. The photo-resist pattern is used as an etching mask to etch the film to be etched.
摘要翻译：目的：提供光致抗蚀剂组合物，使用其形成图案的方法以及使用其制造薄膜晶体管基板的方法，以防止在蚀刻工艺之后的光致抗蚀剂图案的分层。构成：光致抗蚀剂组合物包括碱溶性树脂，光敏化合物，化学式1表示的化合物和溶剂。在化学式1中，R是氢C1-C1烷基，C4-C8环烷基或苯基。使用该组合物形成图案的方法包括以下：通过施加该组合物在待蚀刻的膜上形成光致抗蚀剂膜。通过照射光使光致抗蚀剂膜曝光。显影光致抗蚀剂膜以形成光刻胶图案。光刻胶图案用作蚀刻掩模以蚀刻待蚀刻的膜。

3. 发明授权

KR102017246B1 다관능 (메타)아크릴계 화합물, 이를 포함하는 착색 감광성 수지 조성물, 컬러 필터 및 표시 장치 有权
公开(公告)号：KR102017246B1
公开(公告)日：2019-09-03
申请号：KR1020130081457
申请日：2013-07-11
申请人： 동우 화인켐 주식회사
发明人： 김성현 , 김주호 , 김훈식 , 이종수
IPC分类号： C07C57/02 , G02B1/04 , G03F7/004

4. 发明授权

KR101791265B1 포지티브형 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴 형성방법 有权
标题翻译：正型光刻胶组合物及使用其的光刻胶图案形成方法
公开(公告)号：KR101791265B1
公开(公告)日：2017-10-30
申请号：KR1020100126680
申请日：2010-12-13
申请人： 동우 화인켐 주식회사
发明人： 임민주 , 이은상 , 김성현
IPC分类号： G03F7/039 , H01L21/027
摘要： 본발명은알칼리가용성수지; 감광성화합물; 하기화학식 1의화합물; 및용매를포함하여하부기판, 예컨대구리계또는몰리브덴계금속막과의밀착성을개선한포지티브형포토레지스트조성물및 이를이용한포토레지스트패턴형성방법에관한것이다. [화학식 1]상기화학식 1에서, R및 R는각각독립적으로탄소수 1 내지 10의알킬기로치환또는비치환된탄소수 1 내지 10의알킬렌기; 탄소수 1 내지 10의알킬기로치환또는비치환된탄소수 2 내지 10의알케닐렌기; 또는탄소수 1 내지 10의알킬기로치환또는비치환된탄소수 2 내지 10의알키닐렌기이고, X는수소또는탄소수 1 내지 10의알킬기이다.
摘要翻译：本发明涉及一种碱溶性树脂; 光敏化合物; 下式1的化合物; 以及溶剂，以及使用其形成光刻胶图案的方法。背景技术其中R和R各自独立地表示未取代的或被具有1至10个碳原子的烷基取代的具有1至10个碳原子的亚烷基; 具有1至10个碳原子的烷基取代或未取代的具有2至10个碳原子的亚烯基; 或者被具有1-10个碳原子的烷基取代或未被取代的具有2-10个碳原子的亚炔基，并且X是氢或具有1-10个碳原子的烷基。

5. 发明公开

KR1020140137047A 포지티브 포토레지스트 조성물 审中-实审
标题翻译：积极的光电组成
公开(公告)号：KR1020140137047A
公开(公告)日：2014-12-02
申请号：KR1020130057170
申请日：2013-05-21
申请人： 동우 화인켐 주식회사
发明人： 김성현 , 이은상
IPC分类号： G03F7/004 , G03F7/008 , H01L21/335
CPC分类号： G03F7/0392 , G03F7/004 , G03F7/0045 , G03F7/008 , G03F7/039
摘要： The present invention relates to a positive photoresist composition, comprising (A) an alkali-soluble resin; (B) diazide based photosensitive compounds; and (C) solvents wherein certain two composition based solvents in certain mixed rate are used, leading to an outstanding photosensitive speed, a good residual film rate and a good resolution and also an outstanding uniformity of the film property and a good stain property under the condition of coating large substrates in a vacuum device (VCD).
摘要翻译：本发明涉及一种正型光致抗蚀剂组合物，其包含（A）碱溶性树脂; （B）二叠氮基光敏化合物; 和（C）溶剂，其中使用某些混合速率的某些两种基于组合物的溶剂，导致出色的感光速度，良好的残留膜速率和良好的分辨率，并且还具有优异的膜性能均匀性和良好的染色性在真空装置（VCD）中涂覆大基材的条件。

6. 发明公开

KR1020120068461A 포지티브 포토레지스트 조성물 无效
标题翻译：积极的光电组成
公开(公告)号：KR1020120068461A
公开(公告)日：2012-06-27
申请号：KR1020100130095
申请日：2010-12-17
申请人： 동우 화인켐 주식회사
发明人： 윤종흠 , 김성현 , 성시진 , 송인각
IPC分类号： G03F7/039 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/004 , G03F7/0045 , G03F7/022 , G03F7/039
摘要： PURPOSE: A positive photo-resist composition is provided to improve sensitivity and to reduce failure rate by stably securing thermal distribution. CONSTITUTION: A positive photo-resist composition includes a first alkali soluble resin represented by chemical formula 1, a second alkali soluble resin, a dissolution inhibitor, and a solvent. The polystyrene-reduced weight average molecular weight of the first alkali soluble resin is between 1,000 and 5,000. In chemical formula 1, R9 to R14 are respectively hydrogen atoms, C1 to C6 linear or branched alkyl groups, C1 to C6 linear or branched alkoxy groups, or C3 to C6 cycloalkyl groups; R16 to R18 are respectively selected from a group including hydrogen atoms, C1 to C6 linear or branched alkyl groups, and C6 to C18 aryl groups; N is 10 to 200.
摘要翻译：目的：提供正光致抗蚀剂组合物，以通过稳定地确保热分布来提高灵敏度和降低故障率。构成：正型光致抗蚀剂组合物包括由化学式1表示的第一碱溶性树脂，第二碱溶性树脂，溶解抑制剂和溶剂。第一碱溶性树脂的聚苯乙烯换算的重均分子量为1,000-5,000。在化学式1中，R 9至R 14分别为氢原子，C 1至C 6直链或支链烷基，C 1至C 6直链或支链烷氧基或C 3至C 6环烷基; R16〜R18分别选自氢原子，C1〜C6直链或支链烷基和C6〜C18芳基; N为10〜200。

7. 发明公开

KR1020120065513A 포지티브형 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴 형성방법 有权
标题翻译：使用它的光电子体的正电子成像组合物和图案方法
公开(公告)号：KR1020120065513A
公开(公告)日：2012-06-21
申请号：KR1020100126680
申请日：2010-12-13
申请人： 동우 화인켐 주식회사
发明人： 임민주 , 이은상 , 김성현
IPC分类号： G03F7/039 , H01L21/027
CPC分类号： G03F7/0395 , G03F7/004 , H01L21/0273 , H01L21/0274
摘要： PURPOSE: A positive type photoresist composition and a method for forming a photoresist pattern using the same are provided to prevent the pattern exfoliation and pattern collapse and to improve dispersibility. CONSTITUTION: A positive type photoresist composition includes 10 to 30 weight% of an alkali soluble resin, 1 to 15 weight% of a photo-sensitive compound, 0.01 to 0.1 weight% of a compound represented by chemical formula 1, and a solvent. In chemical formula 1, R1 and R2 are respectively C1 to C10 alkyl group substituted or non-substituted C1 to C10 alkylene group; C1 to C10 alkyl group substituted or non-substituted C2 to C10 alkenylene group; or C1 to C10 alkyl group substituted or non-substituted C2 to C10 alkynylene group; X is a hydrogen atom or a C1 to C10 alkyl group. The alkali soluble resin is a novolak resin. The photo-sensitive composition is the ester compound of a phenolic compound with a hydroxyl group and a diazide-based compound.
摘要翻译：目的：提供正型光致抗蚀剂组合物和使用其形成光致抗蚀剂图案的方法，以防止图案剥离和图案塌陷并提高分散性。构成：正型光致抗蚀剂组合物包含10〜30重量％的碱溶性树脂，1〜15重量％的感光性化合物，0.01〜0.1重量％的化学式1表示的化合物和溶剂。在化学式1中，R1和R2分别为C1至C10烷基取代或未取代的C1至C10亚烷基; C1至C10烷基取代或未取代的C2至C10亚烯基; 或C 1至C 10烷基取代或未取代的C 2至C 10亚炔基; X是氢原子或C1〜C10烷基。碱溶性树脂是酚醛清漆树脂。光敏组合物是具有羟基的酚类化合物和二叠氮基化合物的酯化合物。

8. 发明公开

KR1020110035528A 포지티브 포토레지스트 조성물 无效
标题翻译：一个积极的光电组成
公开(公告)号：KR1020110035528A
公开(公告)日：2011-04-06
申请号：KR1020090093295
申请日：2009-09-30
申请人： 동우 화인켐 주식회사
发明人： 이은상 , 임민주 , 진성열 , 김성현
IPC分类号： G03F7/023 , G03F7/039 , G03F7/038 , C08F2/48
CPC分类号： G03F7/023 , C08F2/48 , G03F7/0381 , G03F7/0385 , G03F7/0392 , Y10S430/1055
摘要： PURPOSE: A positive photo-resist composition is provided to overcome the damage of substrates and metal films in a four masks-based dry etching process by forming patterns into a nearly vertical shape. CONSTITUTION: A positive photo-resist composition includes an alkaline soluble resin, a photo-resist agent, an additive containing a compound represented by chemical formula 1, and a solvent. In the chemical formula 1, R1, R2, and R3 are respectively H or a group represented by chemical formula 2. The alkaline soluble resin is a novolak resin. The photo-resist agent is the ester compound of a phenolic compound containing hydroxyl group and a quinone diazide sulfonic acid compound. The solvent is one or more, or two or more selected from a group including glycol ether ester, glycol ether, ester, ketone, and cyclic ester.
摘要翻译：目的：提供正型光致抗蚀剂组合物，以通过将图案形成几乎垂直的形状来克服基于四个基于掩模的干蚀刻工艺中的基板和金属膜的损伤。构成：正型光致抗蚀剂组合物包括碱溶性树脂，光致抗蚀剂，含有由化学式1表示的化合物的添加剂和溶剂。在化学式1中，R1，R2和R3分别为H或由化学式2表示的基团。碱溶性树脂是酚醛清漆树脂。光致抗蚀剂是含羟基的酚类化合物和醌二叠氮磺酸化合物的酯化合物。溶剂是选自包括乙二醇醚酯，二醇醚，酯，酮和环酯的一个或多个或两个或更多个。

9. 发明公开

KR1020110035527A 착색감광성수지조성물, 이를 이용한 패턴형성방법 및 상기 방법으로 제조된 컬러필터 有权
标题翻译：彩色防晒组合物，使用其的图案形成方法和由该方法制成的彩色滤光片
公开(公告)号：KR1020110035527A
公开(公告)日：2011-04-06
申请号：KR1020090093294
申请日：2009-09-30
申请人： 동우 화인켐 주식회사
发明人： 이승노 , 온정훈 , 김성현
IPC分类号： G03F7/032 , G03F7/028 , G03F7/00 , G02F1/1335 , C08F2/48
CPC分类号： G03F7/032 , C08F2/48 , G02F1/133514 , G03F7/0007 , G03F7/028 , Y10S430/106
摘要： PURPOSE: A colored photo-resist composition, a pattern forming method using the same and a color filter fabricated by the method are provided to prevent the sagging phenomenon of the patterns and obtain the superior developing property. CONSTITUTION: A colored photo-resist composition includes a coloring agent, binder polymer, a photo-polymerizable compound containing acidic modified hyperbranched polyester amide acrylate oligomer, a photo-polymerization initiator, and a solvent. 50 to 90 weight% of the solvent is included in the composition, based on the weight of the composition. The molecular weight of the oligomer is between 400 and 10,000. Based on the composition, color patterns(5,5',5'') are obtained.
摘要翻译：目的：提供一种着色光致抗蚀剂组合物，使用其的图案形成方法和通过该方法制造的滤色器，以防止图案的下垂现象并获得优异的显影性能。构成：有色光致抗蚀剂组合物包括着色剂，粘合剂聚合物，含有酸改性的超支化聚酯酰胺丙烯酸酯低聚物的光聚合性化合物，光聚合引发剂和溶剂。基于组合物的重量，组合物中包含50至90重量％的溶剂。低聚物的分子量在400至10,000之间。基于组成，获得颜色图案（5,5'，5“）。

10. 发明公开

KR1020060098439A 칼라 필터 보호막 및 평탄화막용 경화성 조성물 无效
标题翻译： OVERCOAT用于过滤器的颜色过滤器和可固化树脂组合物
公开(公告)号：KR1020060098439A
公开(公告)日：2006-09-19
申请号：KR1020050017516
申请日：2005-03-03
申请人： 동우 화인켐 주식회사
发明人： 이종수 , 김성현 , 전성현 , 이종서 , 이헌희
IPC分类号： C08L67/02
CPC分类号： C08L67/02 , G02F1/133514
摘要： 본 발명은 프탈레이트계 수지 조성물에 관한 것으로, 보다 상세하게는 평탄성이 높은 경화막을 형성하여 칼라 필터 보호막 및 평탄화막의 작용을 하는 경화성 조성물에 관한 것이다. 화학식 1 로 대표되는 프탈레이트계 바인더 중합체와 화학식 2 로 표시되는 아크릴 공중합체의 혼합물, 다기능 모노머, 광중합 개시제, 열중합 개시제, 용제 및 첨가제 등을 혼합하여 칼라 필터 보호막 및 평탄화막용 경화성 조성물을 제공한다. 이렇게 제조된 혼합형 조성물은 내열성과 투명성, 잔막율, 평탄화율이 우수하며, 각 성분계의 최적화된 조성으로 칼라 필터의 보호막 및 평탄화막으로써 요구되는 물성을 조정 최적화 하는데 용이하다.

경화성 조성물, 평탄화막, 칼라 필터 보호막, 내열성, 투명성, 잔막율, 평탄화율

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