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    • 87. 发明公开
    • 전자 비임 용접 방법
    • SHIMMED电子束焊接工艺
    • KR1020020013698A
    • 2002-02-21
    • KR1020010018173
    • 2001-04-06
    • 제너럴 일렉트릭 캄파니
    • 펭간지앙노왁다니엘앤소니머피존토마스
    • B23K15/00
    • B23K35/0255B23K15/0006B23K35/004
    • PURPOSE: A welding process is provided which not only increases fatigue life of a welded joint by three to four times compared with the prior art, but also insures a full penetration of a butt joint up to six inches in depth with a consistent percentage of filler material in a single pass. CONSTITUTION: The method of electron beam welding a joint(10) between superalloy materials(12) comprises the steps of inserting a weldable shim(14) in the joint and heating the superalloy materials with an electron beam, wherein the inserting step comprises the step of inserting a shim(14) formed of metal or alloy in the joint(10), the shim(14) is formed by wrought, cast or powder metallurgy processes, the heating step comprises the step of powering the electron beam with either a high or low voltage electron beam welding machine, with voltage high enough to completely penetrate the joint(10), and the current is such that a complete melting of the base metal and shim(14) is achieved, and the heating step is completed in a single pass. The method of welding a joint gap(10) up to at least 0.040 inch between superalloy materials(12) comprises the steps of inserting a shim(14) in the gap and heating the superalloy materials with an electron beam, wherein the joint gap(10) is up to 0.100 inch.
    • 目的:提供了一种焊接工艺,不仅使焊接接头的疲劳寿命比现有技术提高了三到四倍,而且还确保了一个直径为六英寸深的对接接头的完全穿透,并具有一致的填充率 材料在单程中。 构成:在超合金材料(12)之间的电子束焊接接头(10)的方法包括将可焊垫片(14)插入接头中并用电子束加热超合金材料的步骤,其中插入步骤包括步骤 将由金属或合金形成的垫片(14)插入到接头(10)中,垫片(14)通过锻造,铸造或粉末冶金工艺形成,加热步骤包括用高电压 或低压电子束焊接机,其电压足够高以完全穿透接头(10),并且电流使得能够实现基体金属和垫片(14)的完全熔化,并且加热步骤在 单程 将高合金材料(12)之间的至少0.040英寸处的接合间隙(10)焊接的方法包括以下步骤:在间隙中插入垫片(14)并用电子束加热超合金材料,其中接合间隙( 10)高达0.100英寸。
    • 89. 发明公开
    • 질화규소와 탄소강의 접합방법
    • 氮化硅和碳钢的接合方法
    • KR1020000009463A
    • 2000-02-15
    • KR1019980029908
    • 1998-07-24
    • 한국화학연구원
    • 이재도최영민
    • B23K20/00B23K1/19
    • C04B37/026B23K1/19B23K20/16B23K35/004B23K2035/008C04B2235/6581C04B2237/125C04B2237/126C04B2237/16C04B2237/368C04B2237/406C04B2237/55C04B2237/568C04B2237/704C04B2237/72
    • PURPOSE: A joining method is provided to join a nitriding silicon and a carbon steel by using an inexpensive ordinary lead without sputtering or an expensive activated lead. CONSTITUTION: A joining method comprises:separating a surface of a nitriding silicon(Si3N4) sinter to a metal silicon(Si) and a nitric gas(N2) by heat treating a nitriding silicon mold in temperature of 1790 ¯ 1950°C. in a nitrogen state or by heat treating a nitriding silicon sinter in temperature of 1250 ¯ 1700°C. in a vacuum state; forming a metal silicon activated film with 1 ¯ 100 micrometers in thickness on the surface of the nitric gas eliminated sinter; and joining the metal silicon activated film on the surface of the nitriding silicon and a carbon steel by using an ordinary lead in the Ag-Cu group or joining by inducing an eutectic melting reaction between the metal silicon and an iron(Fe) in the carbon steel.
    • 目的:提供一种接合方法,通过使用便宜的普通导线而不溅镀或昂贵的活性铅来连接氮化硅和碳钢。 构成:接合方法包括:通过在1790〜1950℃的温度下热处理氮化硅模具将氮化硅(Si 3 N 4)烧结体的表面分离成金属硅(Si)和硝酸(N 2)。 在氮气状态下或通过在1250℃的温度下热处理氮化硅烧结体。 处于真空状态; 在硝酸的表面上形成厚度为1〜100微米的金属硅活化膜去除烧结体; 并通过在Ag-Cu基中使用普通引线将氮化硅和碳钢的表面上的金属硅活化膜接合,或者通过在碳中引入金属硅与铁(Fe)之间的共晶熔融反应来接合 钢。