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    • 33. 发明公开
    • 광학 부재용 석영 유리 블랭크 및 그 이용 방법
    • 用于光学元件的QUARTZ玻璃空白及其应用
    • KR1020030047751A
    • 2003-06-18
    • KR1020020076621
    • 2002-12-04
    • 신에쯔 세끼에이 가부시키가이샤헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지
    • 위빙브르노큔보도
    • C03C4/00
    • C03B19/1453C03B19/1415C03B2201/07C03B2201/20C03B2201/21C03B2201/23C03C3/06C03C2201/11C03C2201/21C03C2201/23C03C2203/44C03C2203/52
    • PURPOSE: A quartz glass blank for an optical component for the transmission of ultraviolet radiation of a wave length of 250 nm and under is provided, and its utilization in microlithography in connection with ultraviolet radiation of a wavelength of 250 nm and under is provided. CONSTITUTION: In a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wave length of 250 nm and under, the quartz glass blank is characterized in that it has a glass structure which is essentially free of oxygen defect sites, an H2 content in the range of 3x10¬17 molecules/cm¬3 to 2.0x10¬18 molecules/cm¬3, an OH content in the range of 500 weight ppm to 1,000 weight ppm, an SiH group content of less than 2x10¬17 molecules/cm¬3, a chlorine content in the range of 60 weight ppm to 120 weight ppm, a non-homogeneity in the refractive index Δn of less than 2 ppm, and a stress birefringence of less than 2 nm/cm, wherein the OH content is in the range of 600 weight ppm to 900 weight ppm, preferably in the range of 750 weight ppm to 900 weight ppm, and wherein the quartz glass blank has a chlorine content is in the range of 80 weight ppm to 100 weight ppm.
    • 目的:提供一种用于传输波长为250nm及以下的紫外线辐射的光学部件的石英玻璃坯料,并且提供了其在与250nm以下的波长的紫外线照射有关的微光刻中的应用。 构成:在用于透射波长为250nm及以下的紫外线辐射的光学部件的石英玻璃坯料中,石英玻璃坯料的特征在于具有基本上不含氧缺陷部位的玻璃结构,H2 含量范围为3×10 17分子/ cm 3至2.0×10 18分子/ cm 3,OH含量为500重量ppm至1,000重量ppm,SiH基含量小于2×10 17分子 / cm 3,氯含量在60重量ppm至120重量ppm的范围内,折射率Δn的非均匀性小于2ppm,应力双折射小于2nm / cm,其中OH 含量在600重量ppm至900重量ppm的范围内,优选在750重量ppm至900重量ppm的范围内,并且其中石英玻璃坯料的氯含量在80重量ppm至100重量ppm的范围内。