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    • 5. 发明公开
    • 합성 석영 유리의 제조 방법, 합성 석영 유리 제조용 지그및 광학 부재용 합성 석영 유리
    • 用于生产合成石英玻璃的合成石英玻璃生产方法和用于光学成员的合成石英玻璃
    • KR1020070108178A
    • 2007-11-08
    • KR1020077018944
    • 2006-02-17
    • 아사히 가라스 가부시키가이샤
    • 히노,게이고
    • C03B8/04C03B19/14C03B37/014C03B37/018
    • C03B19/1453C03B2201/02C03C3/06
    • An object of the invention is to provide a process for producing a synthetic quartz glass while taking account of a refractive index distribution remaining in the synthetic quartz glass; a jig for use in the synthetic-quartz-glass production process; and a synthetic quartz glass for an optical member, produced by the process. A process for producing a synthetic quartz glass, which comprises: depositing and growing fine quartz glass particles synthesized by flame hydrolysis of a glass-forming material on a rotating target to thereby form a porous quartz glass base of a substantially cylindrical shape; presintering the porous quartz glass base (1); and heating the presintered porous quartz glass base to a temperature not lower than the vitrification temperature to convert the base into a transparent glass, wherein in the step of conversion into a transparent glass, the porous quartz glass base is placed so as to make its growth axis vertical and a load (13, 14) is vertically imposed on the thus-placed porous quartz glass base.
    • 本发明的目的是提供一种在合成石英玻璃中考虑到折射率分布的同时制造合成石英玻璃的方法; 用于合成石英玻璃生产工艺的夹具; 以及通过该方法制造的用于光学部件的合成石英玻璃。 一种合成石英玻璃的制造方法,其特征在于,包括:在旋转靶上沉积并生长由玻璃形成材料的火焰水解合成的精细石英玻璃粒子,形成大致圆筒状的多孔石英玻璃基材; 预烧结多孔石英玻璃基底(1); 将预烧结的多孔石英玻璃基体加热到不低于玻璃化温度的温度,将基底转变为透明玻璃,其中在转化为透明玻璃的步骤中,放置多孔石英玻璃基底使其生长 并且负载(13,14)垂直施加在如此放置的多孔石英玻璃基底上。
    • 8. 发明公开
    • 실리카 유리 도가니 제조 방법 및 실리카 유리 도가니 제조 장치
    • 用于制造维生素二氧化硅可溶性的方法和装置
    • KR1020120078619A
    • 2012-07-10
    • KR1020110144112
    • 2011-12-28
    • 쟈판 스파 쿼츠 가부시키가이샤
    • 스도토시아키스즈키에리코
    • C03B20/00C30B15/10C30B29/06
    • C03B19/095C03B2201/02G01J5/0022G01J5/0037G01J5/0862Y02P40/57
    • PURPOSE: A manufacturing method of silica glass crucible and apparatus thereof are provided to accurately measure temperature during manufacturing of the silica glass crucible by detecting radiation energy having wave length of 4.8-5.2 micro meters by using a radiation thermometer. CONSTITUTION: An apparatus for manufacturing silica glass crucible comprises a mold(10), an arc discharge part, and a temperature measuring part. The mold forms a silica powder layer(11). The arc discharge part comprises a plurality of carbon electrodes(13) and a power supply unit. The silica powder layer is heat melted by the arc discharge. The temperature measuring part measures the temperature of a melting part within the mold. The temperature measuring part is a radiation thermometer(Cam) and measures the temperature by detecting the radiation energy having wave length of 4.8-5.2 micro meters. A manufacturing method of silica glass crucible comprises the following steps: forming a silica powder layer by providing silica powder inside a mold; and melting the silica powder layer by arc discharge using a plurality of carbon electrodes.
    • 目的:提供石英玻璃坩埚的制造方法及其装置,通过使用辐射温度计检测波长为4.8-5.2微米的辐射能量,在制造石英玻璃坩埚期间精确测量温度。 构成:用于制造石英玻璃坩埚的装置包括模具(10),电弧放电部分和温度测量部件。 模具形成二氧化硅粉末层(11)。 电弧放电部分包括多个碳电极(13)和电源单元。 二氧化硅粉末层通过电弧放电加热熔化。 温度测量部件测量模具内的熔化部件的温度。 温度测量部分是辐射温度计(Cam),通过检测波长为4.8-5.2微米的辐射能量来测量温度。 石英玻璃坩埚的制造方法包括以下步骤:通过在模具内提供二氧化硅粉末形成二氧化硅粉末层; 并使用多个碳电极通过电弧放电熔化二氧化硅粉末层。