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    • 27. 发明公开
    • 유기반사방지막 조성물 및 그의 제조방법
    • 有机防反射膜组合物及其生产方法
    • KR1020020002906A
    • 2002-01-10
    • KR1020000037270
    • 2000-06-30
    • 에스케이하이닉스 주식회사
    • 홍성은정민호정재창이근수백기호
    • G03F7/004
    • C08F220/36C07C251/54C08F220/40G03F7/091Y10S430/111C08F2220/281C08F216/38
    • PURPOSE: Provided is an organic anti-reflection film composition which has excellent solubilities to hydrocarbon solvents but is not dissolved in any solvent upon hard baking and does not generate an under cutting or putting. The film composition also has an excellent etching rate, thereby increasing etching selection ratio. CONSTITUTION: The anti-reflection film composition includes a compound prepared by reacting a compound represented by formula 10 wherein R is hydrogen or methyl group; n is an integer of 1 to 5; Ra, Rb, R1 to R9 are independently -H, -OH, -OCOCH3, -COOH, -CH2OH or substituted or non-substituted, straight or branched alkyl or alkoxyalkyl having 1 to 5 carbon atom(s); and n is an integer of 1 to 5, with a hydroxyacrylate monomer in the presence of a polymerization initiating agent in a solvent; and a compound represented by formula 2 wherein R10 and R11 are independently substituted straight or branched C1-C10 alkyl; and R12 is H or methyl group.
    • 目的:提供一种有机抗反射膜组合物,它对烃类溶剂具有优异的溶解性,但在硬烘烤时不溶于任何溶剂,并且不会产生下切割或放置。 膜组合物也具有优异的蚀刻速率,从而增加蚀刻选择比。 构成:防反射膜组合物包括通过使式10表示的化合物(其中R是氢或甲基)反应制备的化合物; n为1〜5的整数, R a,R b,R 1至R 9独立地为-H,-OH,-OCOCH 3,-COOH,-CH 2 OH或具有1至5个碳原子的取代或未取代的直链或支链烷基或烷氧基烷基; n为1〜5的整数,在聚合引发剂存在下,在溶剂中使用羟基丙烯酸酯单体; 和由式2表示的化合物,其中R 10和R 11独立地为取代的直链或支链C 1 -C 10烷基; R 12为H或甲基。