专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明公开

KR1020030077793A 플라즈마를 이용한 유해가스 처리장치 失效
标题翻译：用于使用等离子体处理危险气体的装置
公开(公告)号：KR1020030077793A
公开(公告)日：2003-10-04
申请号：KR1020020016687
申请日：2002-03-27
申请人： 최경수 , 고찬규
发明人： 최경수 , 고찬규 , 박동화 , 고동윤
IPC分类号： B01D53/32
CPC分类号： B01D53/323 , B01D2258/0216 , B01D2259/818 , H05H1/24 , H05H2245/121
摘要： PURPOSE: Provided is a hazardous gas treatment apparatus using high temperature zone of plasma. CONSTITUTION: The apparatus comprises an anode member(70) having a reaction room therein, in which at least 1000°C of plasma is generated and hazardous gas is treated by the plasma, a cathode assembly(20) having an upper end outside of the reaction room and a lower end inside of the reaction room, wherein plasma is generated by direct current arc discharge between the lower end of the cathode assembly(20) and the anode member(70), a gas guide unit(40,50,60) surrounding a lower portion of the cathode assembly(20), and an upper portion and outer side surface of the anode member(70) and having a gas distributing room therein for distributing harmful gas around the anode member(70) before the hazardous gas is introduced into the reaction room, wherein the gas guide unit(40,50,60) has at least one plasma gas passage way, and the anode member(70) has a hazardous gas passage for introducing hazardous gas to the reaction room therethrough, a treated gas passage for exhausting treated gas, and a cooling water passage.
摘要翻译：目的：提供使用等离子体高温区的危险气体处理装置。构成：该装置包括在其中具有反应室的阳极构件（70），其中产生至少1000℃的等离子体并且有害气体被等离子体处理;阴极组件（20），其具有位于反应室和反应室内的下端，其中通过在阴极组件（20）的下端和阳极部件（70）之间的直流电弧放电产生等离子体，气体引导单元（40,50,60 ）和阳极部件（70）的上部和外侧表面，并且在其中具有气体分配室，用于在危险气体之前在阳极部件（70）周围分布有害气体引入到反应室中，其中气体引导单元（40,50,60）具有至少一个等离子体气体通道，并且阳极部件（70）具有用于将有害气体引入反应室的危险气体通道，用于排出处理气体的经处理气体通道，冷却水通道。

12. 发明公开

KR1020030067241A 고온 플라즈마를 이용한 다이옥신 및 분진 제거방법 및 그장치 无效
标题翻译：使用高温等离子体去除二氧化铅和粉尘的方法和装置
公开(公告)号：KR1020030067241A
公开(公告)日：2003-08-14
申请号：KR1020020007143
申请日：2002-02-07
申请人： 주식회사 유민이엔씨
发明人： 김신도 , 김종호 , 유애권
IPC分类号： B01D53/32
CPC分类号： A62D3/19 , A62D2101/22 , A62D2101/28 , B01D53/32 , B01D53/50 , B01D53/52 , B01D53/70 , B01D2257/302 , B01D2257/304 , B01D2259/818 , F23G7/065 , F23G2204/201 , F23J15/04 , F23J15/06 , F23J2215/301 , F23J2219/80 , H05H1/28 , H05H2245/121
摘要： PURPOSE: A method and an apparatus for removing dioxin and dust using high temperature plasma are provided to prevent resynthesis of dioxin or production of nitrogen oxides in the post process and clean various environmental materials contained in flue gas by promptly cooling the flue gas after burning the flue gas using plasma. CONSTITUTION: The method for removing dioxin and dust using high temperature plasma comprises decomposition step(100) of thermochemically breaking flue gas that is produced in an incinerator of incineration facility and contains dioxin, soot, dust and incompletely burnt materials using high temperature plasma; cooling and cleaning step(200) of rapidly cooling high temperature flue gas generated in the decomposition step(100) and cleaning contaminants contained in the flue gas at the same time; moisture removing step(300) of removing moisture contained in the flue gas cooled in the cooling and cleaning step(200); and cooled wastewater drain step(400) of discharging cooling water used in the cooling and cleaning step(200) and cooled wastewater condensed in the moisture removing step(300), wherein temperature of the decomposition step(100) is maintained to 900 deg.C or more using high temperature plasma, and wherein temperature of the cooling and cleaning step(200) is promptly lowered to 200 deg.C or less using sprayed cooling water.
摘要翻译：目的：提供使用高温等离子体去除二恶英和粉尘的方法和设备，以防止后处理中二恶英的再合成或氮氧化物的生成，并清洁烟道气中所含的各种环境物质，燃烧后立即冷却烟道气使用等离子体的烟气。构成：使用高温等离子体除去二恶英和粉尘的方法包括在焚烧设备的焚烧炉中产生的热化学烟气的分解步骤（100），并使用高温等离子体包含二恶英，烟灰，粉尘和不完全燃烧的材料; 在分解步骤（100）中产生的快速冷却高温烟道气的同时清洗废气中的污染物的冷却和清洁步骤（200）; 去除在冷却和清洁步骤（200）中冷却的烟道气中所含的水分的除湿步骤（300）; 以及冷却和清洁步骤（200）中使用的冷却水的冷却废水排放步骤（400）和在除湿步骤（300）中冷凝的冷却废水，其中分解步骤（100）的温度保持在900℃。 C以上的高温等离子体，使用喷雾冷却水将冷却和清洁步骤（200）的温度迅速降至200℃或更低。

13. 发明公开

KR1020170106363A 비열 소프트 플라즈마 세정 审中-实审
标题翻译：比热软式等离子清洗
公开(公告)号：KR1020170106363A
公开(公告)日：2017-09-20
申请号：KR1020177021732
申请日：2016-01-22
申请人： 찬, 치아 선
发明人： 찬,치아선
IPC分类号： H01J37/32
CPC分类号： H01J37/32623 , B08B7/0035 , H01J37/32 , H01J37/3244 , H01J37/32532 , H01J37/32541 , H01J37/32577 , H01J37/32825 , H01J2237/335 , H01L21/67017 , H05H2245/121
摘要： 본발명은가이드식소프트-플라즈마세정(Guided Soft-Plasma Cleaning : G-SPC)(30)을포함하는소프트플라즈마세정(SPC) 시스템(30, 130, 230)을제공한다. SPC 시스템은비열(non-thermal)이고, 저온프로세스이며, 대기압에서, 공기및 액체매체모두에서작동할수 있다. 일실시예에서, 공급원료가스(40)가공급되어세정챔버(34) 내에방전유체(50)를제공한다. 플라즈마가이딩및 증폭컴포넌트(52)는가공물(32) 위의큰 어블레이션(ablation) 영역을커버하도록방전유체를가이드및 확장시킴으로써, 이온및 전자충격손상또는에칭을또한억제한다. 플라즈마가이딩및 증폭컴포넌트(52)는유전체플레이트또는튜브(37, 56, 58)로형성될수 있으며, 각각의유전체는개구(37a, 56a, 58a)를갖는다. 세정챔버내의전기장및 이온에너지는 SPC 동안플라즈마손상을억제하기위해플로팅전극(160, 160a)을통해부가적으로제어될수 있다
摘要翻译：本发明提供了一种软等离子体清洁（SPC）系统30,130,230，其包括引导式软等离子体清洁（G-SPC） SPC系统是一种非热能，低温工艺，可以在大气压和空气和液体介质中工作。在一个实施例中，原料气体40被处理以在清洁室34内提供排放流体50。等离子体引导和放大部件52也被抑制，和离子蚀刻或损坏的电子撞击由所述引导件和延伸的流体排出以覆盖大的消融（烧蚀）在所述工件（32）的区域。等离子体引导和放大部件52可以由电介质板或管（37，56，58）形成，每个电介质具有开口（37A，56A，58A）。清洁腔室内的电场和离子能量可另外通过浮动电极160,160a控制以抑制SPC期间的等离子体损伤

14. 发明授权

KR101601654B1 플라즈마 발생 장치, 플라즈마 발생 방법, 및 오존 발생 억제 방법 有权
标题翻译：等离子体生成装置等离子体生成方法和方法，用于支持臭氧发生
公开(公告)号：KR101601654B1
公开(公告)日：2016-03-09
申请号：KR1020137014854
申请日：2011-11-09
申请人： 삼성전자주식회사
发明人： 다케노시타카즈토시 , 미야모토마코토 , 유게세이로 , 쿠마가이유키 , 나카야마요코 , 노지마히데오 , 김명철
IPC分类号： B01J19/12 , A61L9/22 , H05H1/24
CPC分类号： A61L9/015 , A61L9/22 , A61L2209/212 , H05H1/2406 , H05H2001/2412 , H05H2245/121
摘要： 본발명은활성종의생성량을증가시키면서도오존의발생량을억제하는것을목적으로하고, 대향면의적어도일측에유전체막(21a, 22a)을마련한한 쌍의전극(21, 22), 상기전극(21, 22) 간에펄스전압을인가하여플라즈마방전시키는전압인가수단(4), 및각 전극(21, 22)의대응하는개소에각각설치되어전체적으로관통하도록구성된유체유통홀(21b, 22b)을포함하고, 상기유체유통홀(21b, 22b)을유체가통과하는경우에상기플라즈마와접해서이온또는라디칼이발생하도록구성된플라즈마발생장치(100)로서, 상기전압인가수단(4)은상기전극(21, 22) 간에인가되는펄스전압의피크값 또는펄스폭 혹은그 양자를변화시킨다.

15. 发明授权

KR101535904B1 균일 전기장 유전체 장벽 방전 반응기 有权
标题翻译：均质电场屏障放电反应器
公开(公告)号：KR101535904B1
公开(公告)日：2015-07-13
申请号：KR1020110066015
申请日：2011-07-04
申请人： 홍 쿤량
发明人： 홍쿤량
IPC分类号： B01J19/12 , C02F1/46 , B01D53/32 , A61L9/16
CPC分类号： H05H1/2406 , A61L9/22 , B01J19/088 , B01J2219/0004 , B01J2219/0835 , B01J2219/0875 , B01J2219/0877 , B01J2219/0892 , C02F1/4608 , H05H2001/2456 , H05H2245/121
摘要： 균일전기장유전체장벽방전반응기는전극유닛, 유전체촉매용기및 절연하우징으로구성된다. 전극유닛의각 전극판은절연평면프레임구조와절연평면프레임구조위에고르게분산된방전니들을포함한다. 유전체촉매용기는금속촉매코팅층이내부에코팅된속이빈 고체부재이다. 흐름방향결정판은도체기판으로제조되고, 금속촉매코팅층이덮인두 반대면을구비한다. 본발명은공기청정기, 유체살균기또는폐수처리장치에사용하는데유용하다.

16. 发明公开

KR1020130126592A 기상 매체의 처리를 위한 장치 및 방법과, 기상 매체, 액체, 고체, 표면 또는 이들의 임의의 조합의 처리를 위한 장치의 용도 审中-实审
标题翻译：用于处理气体介质的装置和方法以及用于处理气体介质，液体，固体，表面或其任何组合的装置的使用
公开(公告)号：KR1020130126592A
公开(公告)日：2013-11-20
申请号：KR1020137007578
申请日：2011-09-01
申请人： 보두엥 장-미셸
发明人： 보두엥장-미셸
IPC分类号： B01D53/32 , B01D53/44 , H05H1/46 , A61L9/22
CPC分类号： A61L2/14 , A61L9/22 , B01D53/007 , B01D53/32 , B01D53/44 , B01D2257/91 , B01D2259/804 , B01D2259/806 , B01D2259/818 , H01J25/50 , H05H1/46 , H05H2245/121
摘要： 본 발명에 따른 기상 매체의 처리 장치는 기상 매체의 유동 방향으로 기상 매체에서 플라즈마를 발생시키기 위한 플라즈마 발생 장치를 포함한다. 플라즈마는 특히 여기 분자, 라디칼, 이온, 자유 전자, 광자 및 이들의 임의의 조합을 포함한다. 더욱이, 본 발명에 따른 장치는 적어도 하나의 유전체 구조물, 특히 적어도 하나의 용융 실리카 튜브를 포함한다. 플라즈마는 특히 플라즈마 발생 장치에서 플라즈마의 발생 후에 적어도 하나의 유전체 구조물 내로 이송될 수 있다.
摘要翻译：用于处理根据本发明的气体介质的装置包括气态介质的流动方向，用于在气体介质中产生等离子体的等离子体产生装置。等离子体特别包括激发的分子，自由基，离子，自由电子，光子及其任何组合。此外，根据本发明的装置包括至少一个电介质结构，特别是至少一个熔融石英管。等离子体可输送到至少一个电介质结构中，特别是在等离子体产生装置中产生之后。

17. 发明公开

KR1020130045344A 봉입된 금속 마이크로팁 마이크로플라즈마 장치, 어레이 및 제조 방법 有权
标题翻译：包埋金属微孔微波器件，阵列和制造方法
公开(公告)号：KR1020130045344A
公开(公告)日：2013-05-03
申请号：KR1020137002619
申请日：2011-07-27
申请人： 더 보오드 오브 트러스티스 오브 더 유니버시티 오브 일리노이즈
发明人： 에덴제이.개리 , 박성진 , 윤제권 , 청브라이언
IPC分类号： H05H1/24 , B01D53/00 , C02F1/48 , C01B13/11
CPC分类号： H01T21/00 , B01D53/32 , B01D2257/104 , B01D2257/91 , B01D2258/06 , B01D2259/818 , C01B13/10 , C02F1/32 , C02F1/4608 , C02F1/46109 , C02F1/48 , C02F1/78 , C02F2001/46133 , C02F2001/46152 , C02F2303/04 , H05H1/2406 , H05H2001/2418 , H05H2245/121
摘要： Methods of the invention can form microtip microplasma devices having the first and second metal microtips and metal oxide in a monolithic, unitary structure. Methods can form arrays that can be flexible, can be arranged in stacks, and can be formed into cylinders, for example, for gas and liquid processing devices, air filters and other applications. A preferred method of forming an array of microtip microplasma devices provides a metal mesh with an array of micro openings therein. Electrode areas of the metal mesh are masked leaving planned connecting metal oxide areas of the metal mesh unmasked. Planned connecting metal oxide areas are electrochemically etched to convert the planned connecting metal oxide areas to metal oxide that encapsulates opposing metal microtips therein. The mask is removed. The electrode areas are electrochemically etched to encapsulate the electrode areas in metal oxide.

18. 发明授权

KR100711070B1 공기정화장치 失效
标题翻译：空气净化器
公开(公告)号：KR100711070B1
公开(公告)日：2007-04-24
申请号：KR1020067006639
申请日：2005-06-24
申请人： 다이킨 고교 가부시키가이샤
发明人： 다나카도시오 , 모테기간지 , 가가와겐키치
IPC分类号： B01D53/32
CPC分类号： F24F3/166 , B01D46/0023 , B01D46/10 , B01D53/32 , B01D53/885 , B01D2259/818 , B01D2267/40 , B01D2273/30 , B03C3/016 , B03C3/017 , B03C3/12 , B03C3/14 , H05H1/48 , H05H2001/486 , H05H2245/121
摘要： 스트리머 방전에 의해 플라즈마를 생성하는 스트리머 방전부(40)와, 플라즈마에 포함되는 활성종에 의한 공기의 처리를 촉진하는 촉매부(34)와, 공기 중의 먼지를 포집하는 집진부(33)를 구비하는 공기정화장치에 있어서, 촉매부(34) 전면을 효과적으로 기능시킴과 더불어, 집진부(33)에서의 제균이나 알레르겐 불활성화도 가능하게 하기 위해, 공기 흐름방향의 상류 쪽으로부터 차례로, 스트리머 방전부(40), 집진부(33), 및 촉매부(34)를 배치한다.
摘要翻译：用于通过流光放电产生等离子体的流光放电部40，用于促进等离子体中含有的活性种对空气进行处理的催化剂部34以及用于收集空气中的尘埃的集尘部33 为了有效地起作用催化单元34的整个表面并且能够对空气净化装置中的灰尘收集单元33进行灭菌和使过敏原失活，前部40，集尘部33和催化剂部34被配置。

19. 发明公开

KR1020030080447A 가스 스크러버 无效
标题翻译：气体滚筒
公开(公告)号：KR1020030080447A
公开(公告)日：2003-10-17
申请号：KR1020020019056
申请日：2002-04-08
申请人： 최경수 , 고찬규 , (주)플라즈마테크놀로지
发明人： 최경수 , 고찬규 , 박동화 , 고동윤
IPC分类号： B01D53/32
CPC分类号： B01D53/75 , B01D47/06 , B01D47/14 , B01D53/266 , B01D53/323 , B01D53/78 , B01D2258/0216 , B01D2259/818 , H05H1/24 , H05H2245/121
摘要： PURPOSE: A gas scrubber for eliminating noxious gases generated from semiconductor manufacturing process using plasma is provided. CONSTITUTION: The gas scrubber(10) comprises a plasma generation means(1) for generating plasma of at least 1,000 deg.C by injecting plasma forming gas into DC arc discharge generated by applying voltage between anode member and cathode member; a noxious gas treatment means(2) separately connected to the plasma generation means to treat plasma introduced from the plasma generation means and noxious gases; an adsorption means(3) connected to the noxious gas treatment means to adsorb the treated gas or powder by spraying water to treated gas or powder introduced from the noxious gas treatment means; and a wastewater storage means(4) connected to the adsorption means to store the introduced wastewater by flowing in wastewater formed by the adsorption means, wherein the plasma generation means comprises cathode member, and anode member comprising at least one plasma forming gas inflow passageway and at least one cooling water passageway and at least one reactive gas inflow passageway, wherein the noxious gas treatment means comprises reaction chamber, at least one noxious gas inflow passageway and noxious gas guiding chamber, wherein the adsorption means comprises at least one water sprayer and collection chamber, and wherein the wastewater storage means comprises at least one pump and at least one sensor.
摘要翻译：目的：提供一种用于消除使用等离子体的半导体制造工艺产生的有害气体的气体洗涤器。构成：气体洗涤器（10）包括等离子体产生装置（1），用于通过将等离子体形成气体注入通过在阳极构件和阴极构件之间施加电压而产生的直流电弧放电来产生至少1000摄氏度的等离子体; 分离地连接到等离子体产生装置以处理从等离子体产生装置引入的等离子体和有害气体的有害气体处理装置（2）连接到有害气体处理装置的吸附装置（3），用于通过将水喷洒到从有害气体处理装置引入的处理气体或粉末中来吸附处理过的气体或粉末; 和连接到所述吸附装置的废水存储装置（4），用于通过在由所述吸附装置形成的废水中流动来存储引入的废水，其中所述等离子体产生装置包括阴极部件，以及包括至少一个等离子体形成气体流入通道和至少一个冷却水通道和至少一个反应性气体流入通道，其中有害气体处理装置包括反应室，至少一个有害气体流入通道和有毒气体引导室，其中吸附装置包括至少一个喷水器和收集并且其中所述废水存储装置包括至少一个泵和至少一个传感器。

20. 发明公开

KR1020030075472A 플라즈마 반응기 및 그 제조방법과 플라즈마 반응기가채용된 차량의 배기가스 저감장치 无效
标题翻译：等离子体反应器及其制造方法及减少车辆适应等离子体反应器排气的装置
公开(公告)号：KR1020030075472A
公开(公告)日：2003-09-26
申请号：KR1020020014716
申请日：2002-03-19
申请人： 현대자동차주식회사
发明人： 김연승 , 조형제 , 정치영 , 홍은기
IPC分类号： F01N3/08
CPC分类号： B01D53/92 , B01D2259/818 , B01J15/005 , B01J19/088 , B01J2219/0835 , B01J2219/0849 , B01J2219/0896 , F01N3/0892 , F01N2240/28 , H05H1/2406 , H05H2001/2418 , H05H2245/121
摘要： PURPOSE: A plasma reactor, its production method and an exhaust gas reducer of a vehicle are provided to simultaneously reduce particulate materials and gas, to reduce the power consumption, to prevent the spark transition and to improve the durability. CONSTITUTION: A second dielectric(22) is installed corresponding to a first dielectric(21). Gap spacers(23) are installed between the dielectrics to form a plasma area between the dielectrics. An electrode member(24) and a grounding member(25) generate corona electric discharge by installing correspondingly. Lead line members(26) are installed in the dielectrics by contacting to the electrode member and the grounding member to supply electricity to the electrode member and the grounding member. Thereby, particular materials and gas are simultaneously reduced by using the corona electric discharge through high voltage.
摘要翻译：目的：提供一种等离子体反应器及其制造方法和车辆的废气减少器，以同时减少颗粒物质和气体，降低功耗，防止火花过渡，提高耐久性。构成：对应于第一电介质（21）安装第二电介质（22）。间隙垫片（23）安装在电介质之间以在电介质之间形成等离子体区域。电极构件（24）和接地构件（25）相应地安装产生电晕放电。引线构件（26）通过与电极构件和接地构件接触而安装在电介质中，以向电极构件和接地构件供电。因此，通过使用高电压的电晕放电，同时减少了特定的材料和气体。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式