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111. 发明公开

KR1020110024445A 플라즈마 균일도 향상을 위한 플라즈마 발생장치 无效
标题翻译：改进等离子体源的等离子体均匀性的方法
公开(公告)号：KR1020110024445A
公开(公告)日：2011-03-09
申请号：KR1020090082443
申请日：2009-09-02
申请人： 한국기초과학지원연구원
发明人： 김대철 , 김종식 , 유석재 , 이봉주
IPC分类号： H05H1/34 , H05H1/24
CPC分类号： H05H1/46 , H01J37/3211 , H01J37/32174 , H01J37/32559 , H05H2001/4667 , H05H2001/4682
摘要： PURPOSE: A method for generating plasma to increase plasma uniformity is provided to control an antenna installed in a plasma reactor and an external insulating body and a location of the antenna, thereby preventing sputtered insulating materials. CONSTITUTION: The first insulator(300) of a fixed length surrounds the outer circumference of an antenna(200) inserted into a plasma reactor. The first insulator protects the antenna from plasma. The second insulator(310) surrounds a fixed length of the first insulator. The second insulator controls capacitive coupling. The antenna is made of copper materials. The first insulator and the second insulator are made of quartz or alumina.
摘要翻译：目的：提供一种用于产生等离子体以增加等离子体均匀性的方法，以控制安装在等离子体反应器中的天线，外部绝缘体和天线的位置，从而防止溅射的绝缘材料。构成：固定长度的第一绝缘体（300）围绕插入等离子体反应器中的天线（200）的外圆周。第一绝缘体保护天线免受等离子体的影响。第二绝缘体（310）围绕第一绝缘体的固定长度。第二绝缘体控制电容耦合。天线由铜材料制成。第一绝缘体和第二绝缘体由石英或氧化铝制成。

112. 发明公开

KR1020100125573A 플라즈마 기판 가공 장치 失效
标题翻译：用于基板等离子体处理的装置
公开(公告)号：KR1020100125573A
公开(公告)日：2010-12-01
申请号：KR1020090044349
申请日：2009-05-21
申请人： 세메스 주식회사
发明人： 문상민 , 이승배
IPC分类号： H05H1/24 , H01L21/3065
CPC分类号： H01J37/32082 , H01J37/32174 , H01J37/32715 , H01J37/32917 , H05H1/46 , H05H2001/4682
摘要： PURPOSE: An apparatus for plasma processing for a substrate is provided to make the potential between a stage and a center electrode and the potential between the stage and an edge electrode even. CONSTITUTION: A stage(120) supports a substrate. A ground electrode(150) comprises a center electrode corresponding to the center of the substrate. The ground electrode includes an edge electrode corresponding to the edge of the substrate. An RF power source(130) is connected to the stage. The RF power source supplies energy to the stage in order to generate the plasma between the stage and the ground electrode. A variable load(160) is formed in the ground path of the ground electrode in order to control the ground electrode.
摘要翻译：目的：提供一种用于衬底的等离子体处理装置，以使台阶和中心电极之间的电位与平台与边缘电极之间的电位均匀。构成：舞台（120）支撑衬底。接地电极（150）包括对应于衬底的中心的中心电极。接地电极包括对应于衬底边缘的边缘电极。 RF电源（130）连接到该级。 RF电源向舞台提供能量，以便在舞台和接地电极之间产生等离子体。在接地电极的接地路径中形成可变负载（160），以控制接地电极。

113. 发明公开

KR1020100066956A 플라즈마 처리장치 및 방법 有权
标题翻译：用于等离子体处理的装置和方法
公开(公告)号：KR1020100066956A
公开(公告)日：2010-06-18
申请号：KR1020080125484
申请日：2008-12-10
申请人： 인베니아 주식회사
发明人： 손형규
IPC分类号： H05H1/24 , H05H1/30 , H05H1/36
CPC分类号： H01J37/32091 , H01J37/32183 , H01J37/32541 , H05H1/46 , H05H2001/4675 , H05H2001/4682
摘要： PURPOSE: An apparatus and a method for processing plasma are provided to compensate the non-uniformity of plasma density by connecting two power sources with different frequencies with an upper electrode. CONSTITUTION: A chamber(110) includes a processing space in which plasma is generated. An upper electrode(120) is located in the chamber. The upper electrode includes a plurality of bars which is connected to each other in a ladder shape. A lower electrode(130) is formed on a position which opposes to the upper electrode. A first power unit(140) supplies very high frequency(VHF) power to the upper electrode. A second power unit(150) supplies power with a frequency, which is lower than the VHF frequency, to the upper electrode. A third power unit(160) supplies power with a frequency which is lower than that of the first power unit and is higher than that of the second power unit.
摘要翻译：目的：提供一种用于处理等离子体的装置和方法，以通过使用上电极连接具有不同频率的两个电源来补偿等离子体密度的不均匀性。构成：室（110）包括其中产生等离子体的处理空间。上电极（120）位于腔室中。上部电极包括以梯子形状彼此连接的多个杆。下电极（130）形成在与上电极相对的位置。第一功率单元（140）向上电极提供非常高的频率（VHF）功率。第二电力单元（150）向上电极供给频率低于VHF频率的电力。第三电力单元（160）以比第一电力单元的频率低的频率供电，并且高于第二电力单元的电力。

114. 发明公开

KR20100030806A Plasma generating apparatus 审中-公开
标题翻译：等离子体发生装置
公开(公告)号：KR20100030806A
公开(公告)日：2010-03-19
申请号：KR20080089704
申请日：2008-09-11
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： SUNG DOUG YONG , KWON TAE YONG , KIM KYUNG SUN
IPC分类号： H05H1/34 , H05H1/24 , H05H1/30
CPC分类号： H01J37/32091 , H01J37/3211 , H01J37/32183 , H05H1/46 , H05H2001/4667 , H05H2001/4675 , H05H2001/4682
摘要： PURPOSE: A plasma generating device is provided to obtain uniform impedance by repetitively reducing a voltage increased according to an elapsed time through a uniform device. CONSTITUTION: An inductive coupled type plasma source part comprises a plurality of antennas(42a,42b,42e,42f) and a distribution ring(43a). The antennas are connected each other in parallel. The distribution ring supplies a RF power to the antennae. One terminal of the antenna is connected to the distribution ring. The other end of the antenna is connected to the ground. The distribution ring has the hook shape. The shape of the distribution ring is cylindrical shape which has a narrower upper surface area than a bottom surface area. A plurality of uniform devices are formed between the antennae. The uniform devices are serially connected to the antennae.
摘要翻译：目的：提供一种等离子体产生装置，通过重复地降低通过均匀装置的经过时间而增加的电压来获得均匀的阻抗。构成：电感耦合型等离子体源部分包括多个天线（42a，42b，42e，42f）和分配环（43a）。天线彼此并联连接。配电环为天线提供射频功率。天线的一个端子连接到配电环。天线的另一端连接到地面。分配环具有钩形。分布环的形状是具有比底表面积更窄的上表面积的圆柱形形状。在天线之间形成多个均匀装置。均匀器件串联连接到天线。

115. 发明公开

KR1020100026530A 용량 결합 플라즈마 반응기 및 이를 이용한 플라즈마 처리 방법 및 이것에 의해 제조된 반도체 장치 有权
标题翻译：使用其的电容耦合等离子体反应器和等离子体处理方法及其制造的半导体器件
公开(公告)号：KR1020100026530A
公开(公告)日：2010-03-10
申请号：KR1020080085563
申请日：2008-08-29
申请人： 주식회사 뉴파워 프라즈마
发明人： 위순임
IPC分类号： H05H1/24 , H05H1/34
CPC分类号： H01J37/32541 , H01J37/32091 , H01J37/3211 , H01J37/32119 , H01J37/32174 , H01J37/3244 , H01J37/32522 , H05H1/46 , H05H2001/4675 , H05H2001/4682
摘要： PURPOSE: A plasma reactor, a plasma processing method using the same, and a semiconductor device manufactured by the same are provided to uniformly generate plasma with a large area using a plurality of capacitively coupled electrodes. CONSTITUTION: A reactor body forms a plasma discharge space. A capacitively coupled electrode assembly(30) forms one side of the plasma discharge space. The capacitively coupled electrode assembly generates plasma in the plasma discharge space. The capacitively coupled electrode assembly includes a common electrode(31) with a plurality of trench regions and a plurality of division electrodes(33) installed on the trench regions. The plasma is generated to surround the division electrode on the trench region. A plasma controller is installed on the capacitively coupled electrode assembly and provides electrical energy or magnetic energy.
摘要翻译：目的：提供等离子体反应器，使用其的等离子体处理方法及其制造的半导体装置，以使用多个电容耦合电极均匀地产生具有大面积的等离子体。构成：反应堆主体形成等离子体放电空间。电容耦合电极组件（30）形成等离子体放电空间的一侧。电容耦合电极组件在等离子体放电空间中产生等离子体。电容耦合电极组件包括具有多个沟槽区域的公共电极（31）和安装在沟槽区域上的多个分隔电极（33）。产生等离子体以围绕沟槽区域上的分隔电极。等离子体控制器安装在电容耦合电极组件上并提供电能或磁能。

116. 发明公开

KR1020100026529A 용량 결합 플라즈마 반응기 有权
标题翻译：使用其的电容耦合等离子体反应器和等离子体处理方法及其制造的半导体器件
公开(公告)号：KR1020100026529A
公开(公告)日：2010-03-10
申请号：KR1020080085562
申请日：2008-08-29
申请人： 주식회사 뉴파워 프라즈마
发明人： 위순임
IPC分类号： H05H1/24 , H05H1/34
CPC分类号： H01J37/32541 , H01J37/32091 , H01J37/32174 , H01J37/32183 , H01J37/3244 , H05H1/46 , H05H2001/4675 , H05H2001/4682
摘要： PURPOSE: A capacitively coupled plasma reactor, a plasma processing method using the same, and a semiconductor device manufactured by the same are provided to uniformly generate plasma with high density by uniformly controlling capacitive coupling between capacitively coupled electrodes. CONSTITUTION: A reactor body forms a plasma discharge space. A capacitively coupled electrode assembly(30) is formed on one side of the plasma discharge space. The capacitively coupled electrode assembly generates plasma in the plasma discharge space. The capacitively coupled electrode assembly includes a common electrode(31) with a plurality of trench regions and a plurality of division electrodes(33) which is installed on the plurality of trench regions. The plasma surrounding the division electrodes is generated on the trench region.
摘要翻译：目的：提供一种电容耦合等离子体反应器，使用其的等离子体处理方法及其制造的半导体器件，通过均匀地控制电容耦合电极之间的电容耦合，均匀地产生高密度等离子体。构成：反应堆主体形成等离子体放电空间。电容耦合电极组件（30）形成在等离子体放电空间的一侧。电容耦合电极组件在等离子体放电空间中产生等离子体。电容耦合电极组件包括具有多个沟槽区域的公共电极（31）和安装在多个沟槽区域上的多个分隔电极（33）。围绕分割电极的等离子体在沟槽区域上产生。

117. 发明公开

KR1020100010069A 유도 결합 플라즈마 반응기 有权
标题翻译：电感耦合等离子体反应器
公开(公告)号：KR1020100010069A
公开(公告)日：2010-02-01
申请号：KR1020080070902
申请日：2008-07-22
申请人： 위순임
发明人： 위순임
IPC分类号： H05H1/24 , H05H1/30 , H05H1/34 , H05H1/36
CPC分类号： H01J37/32669 , H01J37/3211 , H01J37/32119 , H01J37/32174 , H01J37/3244 , H05H1/46 , H05H2001/4652 , H05H2001/4667 , H05H2001/4682
摘要： PURPOSE: An inductively coupled plasma reactor is provided to generate uniform high density plasma by varying the distance between a radio frequency antenna and a magnetic core cover. CONSTITUTION: A vacuum chamber(10) has a space accepting a processed substrate. A dielectric window(34) is installed at the vacuum chamber. The radio frequency antenna is installed inside the dielectric window domain. The magnetic core cover covers the radio frequency antenna so that a magnetic flux way is arranged toward the vacuum chamber. A driving unit(20) controls the magnetic flux density delivered to the vacuum chamber. The driving unit transfers the magnetic cover in order to relatively vary distance between the magnetic core cover and the radio frequency antenna.
摘要翻译：目的：提供电感耦合等离子体反应器，通过改变射频天线和磁芯盖之间的距离来产生均匀的高密度等离子体。构成：真空室（10）具有接受经处理的基板的空间。电介质窗（34）安装在真空室。射频天线安装在电介质窗口域内。磁芯盖覆盖射频天线，使得朝向真空室布置磁通方式。驱动单元（20）控制传递到真空室的磁通密度。驱动单元传送磁盖，以便在磁芯盖和射频天线之间相对变化的距离。

118. 发明公开

KR1020100006881A 유도 결합 플라즈마 반응기 有权
标题翻译：电感耦合等离子体反应器
公开(公告)号：KR1020100006881A
公开(公告)日：2010-01-22
申请号：KR1020080067186
申请日：2008-07-10
申请人： 최대규
发明人： 최대규
IPC分类号： H05H1/30 , H05H1/34 , H05H1/36
CPC分类号： H01J37/32669 , H01J37/3211 , H01J37/32119 , H01J37/32174 , H01J37/3244 , H01J37/32715 , H05H1/46 , H05H2001/4652 , H05H2001/4682
摘要： PURPOSE: An inductively coupled plasma reactor is provided to improve controllability about a plasma ion energy using the variable control of a power level and a power distribution ratio. CONSTITUTION: A reactive chamber(10) has a plasma discharge area. A wireless frequency antenna(30) supplies induced electromotive force for generating the plasma discharge in the plasma discharge area. A dielectric window(20) is installed between the wireless frequency antenna and the discharge area of the reactive chamber. A power supply unit(40) supplies the wireless frequency power to the wireless frequency antenna. A power variable distribution circuit(42) includes a variable magnetic core for varying the power and varies the wireless frequency power supplied from the power supply unit according to the displacement of the variable magnetic core.
摘要翻译：目的：提供电感耦合等离子体反应器，以使用功率电平和功率分配比的可变控制来改善关于等离子体离子能量的可控性。构成：反应室（10）具有等离子体放电区域。无线频率天线（30）提供用于在等离子体放电区域中产生等离子体放电的感应电动势。电介质窗口（20）安装在无线频率天线和反应室的放电区域之间。电源单元（40）向无线频率天线提供无线频率功率。功率可变分配电路（42）包括用于改变功率的可变磁芯，并且根据可变磁芯的位移改变从电源单元提供的无线频率功率。

119. 发明授权

KR100934402B1 RF SPLIT MONITORING SYSTEM 有权
标题翻译：射频分离监测系统
公开(公告)号：KR100934402B1
公开(公告)日：2009-12-31
申请号：KR20090084069
申请日：2009-09-07
申请人： ARIONTECH CO LTD
发明人： CHOI YONG TAE
IPC分类号： H05H1/36 , H05H1/24 , H05H1/46
CPC分类号： H01J37/32935 , H01J37/32091 , H01J37/32174 , H01J37/32183 , H01J37/3244 , H01J37/32458 , H05H1/46 , H05H2001/4645 , H05H2001/4675 , H05H2001/4682
摘要： PURPOSE: An RF split monitoring system is provided to prevent the difference of an etching rate and uniformity between wafers by distributing the RF power to a plurality of divided shower heads in a plasma chamber device. CONSTITUTION: A matching network unit(120) matches the plasma impedance of the RF power provided from a high frequency generator. The distribution network distributes the RF power which is impedance-matched by the matching network unit to the plurality of divided shower heads uniformly. A sensor(150) monitors the RF power distributed from the distribution network unit to the shower head. A shunt part(160) controls the RF power according to the impedance variation by changing impedance if the RF power is not distributed to each shower head uniformly. The shunt part is comprised of a variable capacitor and a DC motor connected to the cable of the distribution network unit. A controller(170) distributes the RF power to the showr head by controlling the shunt based on the monitoring result of the sensor uniformly.
摘要翻译：目的：提供RF分离监测系统，通过将RF功率分配到等离子体室装置中的多个分离的喷淋头来防止蚀刻速率和晶片之间的均匀性的差异。构成：匹配网络单元（120）匹配从高频发生器提供的RF功率的等离子体阻抗。分配网络将由匹配网络单元阻抗匹配的RF功率均匀地分配给多个分开的淋浴喷头。传感器（150）监视从分配网络单元分配到淋浴喷头的RF功率。如果RF功率不均匀地分配到每个淋浴喷头，则分流部分（160）根据阻抗变化通过改变阻抗来控制RF功率。分流部分由可变电容器和连接到配电网络单元的电缆的直流电动机组成。控制器（170）通过基于传感器的监视结果均匀地控制分流器将RF功率分配给显示器头。

120. 发明公开

KR20090069347A Multi loop core dual plasma reactor with multi laser scanning line 有权
标题翻译：多循环核心双等离子体反应器与多激光扫描线
公开(公告)号：KR20090069347A
公开(公告)日：2009-07-01
申请号：KR20070136981
申请日：2007-12-26
申请人： NEW POWER PLASMA CO LTD
发明人： WI SOON IM
IPC分类号： H05H1/24 , H05H1/34
CPC分类号： H01J37/32899 , C23C14/3471 , H01J37/32119 , H01J37/32183 , H01J37/3244 , H01J37/32834 , H05H1/46 , H05H2001/4652 , H05H2001/4682
摘要： A multi loop core dual plasma reactor is provided to generate the plasma with a large area uniformly by including a multi laser scanning line and a multi loop core plasma generator. A first multi loop core plasma generator(10) includes a first multi loop core, a first core protective tube and a plurality of primary wire coils. The first multi loop core crosses the inside of the body of a first reactor. The first core protective tube protects the first multi loop core. The plurality of primary wire coils are wound around the first multi loop core. A second multi loop core plasma generator(15) includes a second multi loop core, a second core protective tube, and the plurality of primary wire coils. A main power supply source supplies the wireless frequency power source to the primary wire coil of the first and second multi loop core plasma generators. A laser supply source(80) comprises a multi laser scanning line consisting of a plurality of laser scanning lines inside the first and the second reactor.
摘要翻译：提供多环芯双等离子体反应器，通过包括多激光扫描线和多环芯等离子体发生器来均匀地产生具有大面积的等离子体。第一多环芯等离子体发生器（10）包括第一多环芯，第一芯保护管和多个初级线圈。第一多环芯穿过第一反应器的主体的内部。第一个核心保护管保护第一个多环芯。多个初级线圈缠绕在第一多环芯上。第二多环芯等离子体发生器（15）包括第二多环芯，第二芯保护管和多个初级线圈。主电源将无线频率电源提供给第一和第二多环芯等离子体发生器的主线圈。激光源（80）包括由第一和第二反应器内的多个激光扫描线组成的多激光扫描线。

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