会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 94. 发明公开
    • 가열로
    • 加热炉
    • KR1020120121557A
    • 2012-11-06
    • KR1020110039420
    • 2011-04-27
    • 현대제철 주식회사
    • 박영국이성철강대훈황병일
    • F27B9/20F27B9/02F27B9/30
    • F27B9/40F27B9/02F27B9/20F27D3/06F27D21/02F27D2099/0083
    • PURPOSE: A heating furnace is provided to press a material for a predetermined time after sensing contact with the material, thereby preventing excessive movement of the material and collision against a furnace body. CONSTITUTION: A heating furnace comprises a body, a transfer unit(100), and a pressing unit(200). The body has an inlet hole and an outlet hole and heats a material(S) inserted through the inlet hole. The transfer unit is located inside the body and transfers the material to the inlet hole. The transfer unit comprises a skid pipe part including a cooling path storing cooling water and a skid button part coupled to the skid pipe part and allowed to rotate. The pressing unit detects contact with the material and moves the material for a predetermined time when detecting contact with the material.
    • 目的:提供一种加热炉,用于在感测到与材料接触之后按压预定时间的材料,从而防止材料的过度移动并碰撞炉体。 构成:加热炉包括主体,转印单元(100)和加压单元(200)。 主体具有入口孔和出口孔,并加热插入入口孔的材料(S)。 转移单元位于主体内部并将材料转移到入口孔。 转移单元包括滑动管部分,其包括存储冷却水的冷却路径和连接到滑动管部分并允许旋转的滑动按钮部分。 当检测到与材料的接触时,按压单元检测与材料的接触并移动材料预定的时间。
    • 99. 发明公开
    • 가열로의 로울러 높이 조절장치
    • 调节加热炉滚筒高度的装置
    • KR1020080031597A
    • 2008-04-10
    • KR1020060097695
    • 2006-10-04
    • 주식회사 대명이엠씨
    • 이호은
    • F27B9/14
    • F27B9/40F27B9/20F27D3/06F27D3/12F27D2019/0059
    • An apparatus of adjusting a height of a roller of a heating furnace is provided to effectively convey products by forming a body, which includes crisscrossed frames and has rollers successively installed thereon, such that the roller is adjusted according to a horizontal adjustment device. An apparatus of adjusting a height of a roller of a heating furnace comprises a support(10) having a driving member, a base body(20), a height adjustment frame(30), a horizontal adjustment member(40) fixed to the support, a bolt(50) and a nut(51). The base body includes crisscrossed frames and is provided with a plurality of rollers(22). Two sides of the base body are supported by a first frame(21) of the crisscrossed frames. The height adjustment frame is fixed to two sides of the first frame, and has a lower part, on which a fixing hole(31) is formed, and an upper part having a support piece(32). The horizontal adjustment member has a projection surface which has an elongation hole(41). The projection surface is bent and has a coupling hole(42) coupled to the bolt. An end of the bolt is in contact with the support piece.
    • 提供一种调节加热炉的辊高度的装置,通过形成包括交叉框架并且连续安装在其上的辊的主体,通过形成根据水平调节装置来调节辊的主体来有效地输送产品。 一种调节加热炉的辊高度的装置包括:支撑件(10),其具有驱动构件,基体(20),高度调节框架(30),水平调节构件(40),固定到支撑件 ,螺栓(50)和螺母(51)。 基体包括十字交叉的框架,并且设置有多个辊(22)。 基体的两侧由交叉框架的第一框架(21)支撑。 高度调节框架固定在第一框架的两侧,并且具有下部,其上形成有固定孔(31),上部具有支撑件(32)。 水平调节构件具有伸出孔(41)的突出表面。 突出表面弯曲并且具有联接到螺栓的联接孔(42)。 螺栓的端部与支撑件接触。
    • 100. 发明授权
    • 소성로
    • 燃烧装置
    • KR100776370B1
    • 2007-11-15
    • KR1020060054945
    • 2006-06-19
    • (주)와이에스썸텍
    • 강동신
    • F27B21/00
    • F27B9/3077F27B9/12F27B9/20F27B9/36F27B2009/124F27B2009/126
    • A burning furnace is provided to heat a silicon wafer on a step-by-step basis by dividing a chamber into a plurality of spaces and controlling each space with different temperatures. A burning furnace comprises a chamber(110) having a space for heating a silicon wafer(160). A transfer shuttle unit(120) transfers the silicon wafer(160) into the chamber(110) and comprises at least two transfer bars(121), a bar(122) connected to the transfer bars(121), a plate(123) installed below the transfer bars(121), and an apparatus(124) for moving the transfer bars(121) in vertical direction. A heater(130) is provided in the chamber(110) to heat the silicon wafer(160). An air feeding and exhausting apparatus(140) is installed at one side of the chamber(110) to supply air to the chamber(110) or to exhaust air from the chamber(110). A cooling fan(150) is installed at one side of the transfer shuttle unit(120) to cool the heated silicon wafer(160).
    • 提供燃烧炉,以逐步加热硅晶片,通过将室分成多个空间并且以不同的温度控制每个空间。 燃烧炉包括具有用于加热硅晶片(160)的空间的室(110)。 转移穿梭单元(120)将硅晶片(160)转移到腔室(110)中并且包括至少两个传送杆(121),连接到传送杆(121)的杆(122),板(123) 安装在转移杆(121)下方的装置(124)和用于沿垂直方向移动转移杆(121)的装置(124)。 在室(110)中设置加热器(130)以加热硅晶片(160)。 空气供给和排出装置(140)安装在腔室(110)的一侧以将空气供应到腔室(110)或从腔室(110)排出空气。 冷却风扇(150)安装在转运梭单元(120)的一侧以冷却加热的硅晶片(160)。