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    • 9. 发明专利
    • Photosensitive resin composition
    • 感光树脂组合物
    • JP2013182174A
    • 2013-09-12
    • JP2012046691
    • 2012-03-02
    • Toyo Ink Sc Holdings Co Ltd東洋インキScホールディングス株式会社
    • KUWABARA AKIFUMIOGIWARA NAOTO
    • G03F7/038C08G59/14C08G59/46G03F7/004H05K3/28H05K3/46
    • PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having excellent photosensitivity to active energy rays, allowing formation of a fine pattern, exhibiting excellent developability, insulating property, heat resistance and folding resistance in a cured coating film of the composition, and suitably used for a photosolder resist.SOLUTION: The photosensitive resin composition comprises: a photosensitive resin (A) having a double bond equivalent of 200 to 5000 g/eq, an acid value of 10 to 200 mgKOH/g and a weight average molecular weight of 1000 to 100000; at least one curing agent (B) selected from a non-blocked isocyanate compound and a blocked isocyanate compound; a photopolymerization initiator (C); and a fatty acid alkanolamide (D).
    • 要解决的问题:为了提供对活性能量射线具有优异的光敏性的感光性树脂组合物,能够形成精细图案,在组合物的固化涂膜中表现出优异的显影性,绝缘性,耐热性和耐折叠性,并且适合使用 光敏树脂组合物包含:双键当量为200〜5000g / eq,酸值为10〜200mgKOH / g,重均分子量为1000的感光性树脂(A) 至100000; 至少一种选自非封端异氰酸酯化合物和封端异氰酸酯化合物的固化剂(B); 光聚合引发剂(C); 和脂肪酸烷醇酰胺(D)。