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    • 5. 发明专利
    • Semiconductor laser device and manufacture thereof
    • 半导体激光器件及其制造
    • JPS5723292A
    • 1982-02-06
    • JP9739880
    • 1980-07-16
    • Sony Corp
    • MORI YOSHIFUMIMATSUDA OSAMU
    • H01S5/00H01S3/06H01S5/223H01S5/30H01S5/323
    • H01S5/305H01S5/2232H01S5/2234H01S5/2237H01S5/3077H01S5/32308
    • PURPOSE: To prevent an unnecessary spreading of current and decrease a threshold value of current, by a method wherein the configurations of the current passage and light passage of a laser device are made sufficiently narrow, and the current reduction for limiting the current passage is performed in an active layer and in the vicinity thereof.
      CONSTITUTION: On the surface of an N type GaAs substrate 1 whose crystal in the surfacewise direction is (100), a groove 2 having inclined surfaces 3 is formed by etching, and over the whole surface including this, an N type GaAs buffer layer 4 and an N type GaAlAs trapping layer 5 are epitaxially grown, in a laminating manner, following the groove 2. Then, thereon, a P type GaAs active layer 6 is formed having an energy gap width smaller than that of the layer 5, and inclined surfaces 13' parallel to the inclined surfaces 3 are formed, on which an N type GaAlAs trapping layer 7 is grown having a large energy gap. Thus, hetero junctions J
      1 and J
      2 resulting from the gap width differences are produced at the respective interfaces between the layer 6 and the lower layer 5 and between the layer 6 and the upper layer 7. At the same time, a P-N junction part J
      pe is formed at the interface between the layers 5 and 6, and then, a P type GaAs layer 8 having a flat surface is grown on the whole surface.
      COPYRIGHT: (C)1982,JPO&Japio
    • 目的:为了防止电流的不必要的扩散和电流的阈值降低,通过使激光器件的电流通道和光通路的结构变得足够窄的方法,并且进行用于限制电流通过的电流减小 在活性层及其附近。 构成:在其表面方向的晶体为(100)的N型GaAs衬底1的表面上,通过蚀刻形成具有倾斜表面3的沟槽2,并且在包括其的整个表面上形成N型GaAs缓冲层4 并且N型GaAlAs捕获层5以层叠方式沿着沟槽2外延生长。然后,形成具有比层5的能隙宽度小的能隙间隙宽度的P型GaAs有源层6,并且倾斜 形成平行于倾斜表面3的表面13',其上生长具有大能隙的N型GaAlAs捕获层7。 因此,在层6和下层5之间以及层6和上层7之间的各个界面处产生由间隙宽度差产生的异质结J1和J2。同时,PN结部分Jpe为 形成在层5和6之间的界面处,然后在整个表面上生长具有平坦表面的P型GaAs层8。